Monolithic integration type laser diode chip having structure operated as multi-beam laser diode
    1.
    发明专利
    Monolithic integration type laser diode chip having structure operated as multi-beam laser diode 有权
    具有多光束激光二极管结构的单片集成型激光二极管芯片

    公开(公告)号:JP2009016825A

    公开(公告)日:2009-01-22

    申请号:JP2008167248

    申请日:2008-06-26

    Abstract: PROBLEM TO BE SOLVED: To provide a monolithic integration type laser diode chip wherein its local distortion and its lattice mismatch are so reduced between its GaAs semiconductor substrate and its waveguide layer or its clad layer as to delay its degradation and as to improve its life time.
    SOLUTION: The monolithic integration type laser diode chip is the one wherein it has at least two laser laminates on a GaAs semiconductor substrate, and each laminate includes each one active region interposed between waveguides, and further, each waveguide is adjacent to one clad layer on the opposite side to each active region. Further, in the laser diode chip, at least one of the waveguide layer and the clad layer which are present in at least the one laser laminate, has Al
    x Ga
    1x As (0≤x≤1, in the formula) and has at least one main group III additional element or one main group V additional element. Moreover, in the laser diode chip, the lattice mismatch present between the GaAs-possessed semiconductor substrate and at least the one waveguide layer or the one clad layer is reduced.
    COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题:提供一种单片集成型激光二极管芯片,其中局部失真及其晶格失配在其GaAs半导体衬底与其波导层或其包层之间如此减小,以延缓其劣化并改善 它的生活时间。 解决方案:单片集成型激光二极管芯片是其中在GaAs半导体衬底上具有至少两个激光层压板的激光二极管芯片,并且每个层压板包括介于波导之间的每个有源区域,此外,每个波导与一个 在每个有源区域的相对侧上。 此外,在激光二极管芯片中,存在于至少一个激光层叠体中的波导层和包覆层中的至少一个具有Al x SB (式中0≤x≤1),并且具有至少一个主要III族附加元素或一个主要V族附加元素。 此外,在激光二极管芯片中,GaAs所拥有的半导体衬底和至少一个波导层或一个覆盖层之间存在的晶格失配减小。 版权所有(C)2009,JPO&INPIT

    8.
    发明专利
    未知

    公开(公告)号:DE102007030062A1

    公开(公告)日:2009-01-02

    申请号:DE102007030062

    申请日:2007-06-29

    Abstract: The monolithically integrated laser diode chip structured as multi-beam laser diode, comprises laser stacks (4a, 4b, 4c) arranged one above the other on a semiconductor substrate (3) made of gallium arsenide of same lattice parameter, where the laser stacks contain an active zone, which is arranged between two waveguide layers. The laser stacks are connected by tunnel transitions (5). The waveguide layers are adjoined on coat layers at a side turned to the active zone. The monolithically integrated laser diode chip structured as multi-beam laser diode, comprises laser stacks (4a, 4b, 4c) arranged one above the other on a semiconductor substrate (3) made of gallium arsenide of same lattice parameter, where the laser stacks contain an active zone, which is arranged between two waveguide layers. The laser stacks are connected by tunnel transitions (5). The waveguide layers are adjoined on coat layers at a side turned to the active zone. One of the waveguide layers or coat layers comprise Al xGa 1 - xAs, where x is 0-1, and an additional element of III or V main group (15%), so that it reduces the lattice mismatch between the waveguide layer or coat layer with the additional element and the semiconductor substrate. The lattice parameter of the waveguide layer or coat layer is reduced by the additional element. The waveguide layer or coat layer has the additional element in different concentrations. The additional element is spatially varied within the waveguide layer or coat layer.

    Kantenemittierender Halbleiterlaser

    公开(公告)号:DE102009041934A1

    公开(公告)日:2011-03-24

    申请号:DE102009041934

    申请日:2009-09-17

    Abstract: Es wird ein kantenemittierender Halbleiterlaser mit einer aktiven, strahlungserzeugenden Zone (1), und einem Gesamtwellenleiter (8) offenbart, der dazu geeignet ist, die in der aktiven Zone (1) erzeugte Strahlung innerhalb des Halbleiterlasers zu führen. Der Gesamtwellenleiter (8) umfasst eine erste n-dotierte Schicht (4) und eine zweite n-dotierte Schicht (5), die zwischen der ersten n-dotierten Schicht (4) und der aktiven Zone (1) angeordnet ist, wobei der Brechungsindex nder zweiten n-dotierten Schicht (5) um einen Betrag dn größer ist als der Brechungsindex nder ersten n-dotierten Schicht (4).

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