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    Electron beam type pattern transfer apparatus
    3.
    发明授权
    Electron beam type pattern transfer apparatus 失效
    电子束式图案转印装置

    公开(公告)号：US4366383A

    公开(公告)日：1982-12-28

    申请号：US165618

    申请日：1980-07-03

    Applicant: Shunichi Sano ,  Toshiaki Shinozaki ,  Ichiro Mori

    Inventor： Shunichi Sano ,  Toshiaki Shinozaki ,  Ichiro Mori

    IPC: H01L21/027 ,  H01J37/317 ,  H01L21/30 ,  A61K27/02 ,  G01N21/64

    CPC classification number: H01J37/3175 ,  B82Y10/00 ,  B82Y40/00 ,  H01L21/30 ,  H01J2237/04735 ,  H01J2237/04922 ,  H01J2237/142 ,  H01J2237/31779 ,  Y10S505/879

    Abstract: An electron beam type pattern transfer apparatus has a photoelectric mask and a sample in a vacuum container made of non-magnetic material. The photoelectric mask is adapted to receive an ultraviolet ray from a light source and emit photoelectrons corresponding to a predetermined transfer pattern and the sample is disposed in parallel with the photoelectric mask with a predetermined distance left therebetween and illuminated with the photoelectrons to form a resist image thereon which corresponds to the transfer pattern. A power source for applying a voltage for accelerating the photoelectrons emitted is connected between the photoelectric mask and the sample. A pair of focusing magnets are disposed around the axis of the vacuum container such that they are located one at one outer side and one in an opposite outer side of the vacuum container to permit a vertical magnetic field to be created between the photoelectric mask and the sample. The focusing magnets have superconductive coils and are driven in a persistent mode.

    Abstract translation: 电子束型图案转印装置在由非磁性材料制成的真空容器中具有光电掩模和样品。 光电掩模适于从光源接收紫外线并发射对应于预定转印图案的光电子，并且将样品与光电掩模平行放置并保持在预定距离处并用光电子照射以形成抗蚀剂图像 对应于转印图案。 用于施加用于加速发射的光电子的电压的电源连接在光电掩模和样品之间。 一对聚焦磁铁设置在真空容器的轴线周围，使得它们位于真空容器的一个外侧和一个在相对的外侧中，从而允许在光电面罩和 样品。 聚焦磁体具有超导线圈并以持续模式驱动。

    Electron lithography using a photocathode
    4.
    发明公开
    Electron lithography using a photocathode 失效
    电子光刻使用光电阴极

    公开(公告)号：EP0605964A3

    公开(公告)日：1994-11-17

    申请号：EP93309854.3

    申请日：1993-12-08

    Applicant: AT&T Corp.

    Inventor： Brandes, George Raymond ,  Platzman, Philip Moss

    IPC: G03F7/20 ,  H01L21/027 ,  H01J37/317

    CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/3175 ,  H01J2237/0492 ,  H01J2237/06333 ,  H01J2237/142 ,  H01J2237/31779 ,  Y10S430/143

    Abstract: Sub-micron pattern delineation, importantly in the fabrication of large scale integrated devices, is based on a patterned photocathode (3,4,6,7). Functionally, the photocathode plays the role of the mask in competing systems, either in proximity printing or in projection. In operation, the photocathode is illuminated by ultraviolet radiation (5) to release electrons (9) which are brought to focus on a resist-coated wafer (12,13) with assistance of a uniform magnetic field (B) together with an accelerating applied voltage (E).

    Abstract translation: 亚微米图案描绘，重要的是制作大规模集成器件，基于图案化的光电阴极（3,4,6,7）。 在功能上，光电阴极在竞争系统中起到掩模的作用，无论是在接近式印刷还是在投影中。 在操作中，光电阴极通过紫外辐射（5）照射以释放电子（9），该电子在均匀磁场（B）的帮助下与施加加速的应力一起聚焦在抗蚀剂涂布的晶片（12,13）上 电压（E）。

    Charged Particle Beam Orbit Corrector and Charged Particle Beam Apparatus
    6.
    发明申请
    Charged Particle Beam Orbit Corrector and Charged Particle Beam Apparatus 有权
    带电粒子束轨道校正器和带电粒子束装置

    公开(公告)号：US20080116391A1

    公开(公告)日：2008-05-22

    申请号：US11943241

    申请日：2007-11-20

    Applicant: Hiroyuki Ito ,  Yuko Sasaki ,  Tohru Ishitani ,  Yoshinori Nakayama

    Inventor： Hiroyuki Ito ,  Yuko Sasaki ,  Tohru Ishitani ,  Yoshinori Nakayama

    IPC: G21K1/087 ,  G21K1/093

    CPC classification number: H01J37/141 ,  H01J37/09 ,  H01J37/12 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/142 ,  H01J2237/1534 ,  H01J2237/303

    Abstract: The present invention relates to an orbit correction method for a charged particle beam, and aims to solve problems inherent in conventional aberration correction systems and to provide a low-cost, high-precision, high-resolution optical converging system for a charged particle beam. To this end, employed is a configuration in which a beam orbit is limited in ring zone form to form a distribution of electromagnetic field converging toward the center of a beam orbit axis. Consequently, a nonlinear action outwardly augmented, typified by spherical aberration of an electron lens, can be cancelled out. Specifically, this effect can be achieved by an electron disposed on the axis and subjected to a voltage to facilitate the occurrence of electrostatic focusing. For a magnetic field, this effect can be achieved by forming a coil radially distributed-wound on a surface equiangularly divided in the direction of rotation to control convergence of a magnetic flux density.

    Abstract translation: 本发明涉及一种用于带电粒子束的轨道校正方法，其目的在于解决常规像差校正系统中固有的问题，并提供一种用于带电粒子束的低成本，高精度，高分辨率的聚光系统。 为此，所采用的是波束轨道受环形形式限制以形成朝向光束轨道中心收敛的电磁场分布的结构。 因此，可以抵消以电子透镜的球面像差为代表的向外扩大的非线性动作。 具体地说，这种效果可以通过设置在轴上的电子元件实现，并且经受电压以便于静电聚焦的发生。 对于磁场，这种效果可以通过在旋转方向上等角地分割的表面上形成径向分布缠绕的线圈来实现，以控制磁通密度的收敛。

    ELECTROMAGNET WITH ACTIVE FIELD CONTAINMENT
    7.
    发明申请
    ELECTROMAGNET WITH ACTIVE FIELD CONTAINMENT 有权
    具有活动场地容纳的电磁铁

    公开(公告)号：US20070187619A1

    公开(公告)日：2007-08-16

    申请号：US11276128

    申请日：2006-02-15

    Applicant: Peter Kellerman ,  Keneth Purser

    Inventor： Peter Kellerman ,  Keneth Purser

    IPC: H01J37/317 ,  H01J37/141

    CPC classification number: H01J37/05 ,  H01J37/141 ,  H01J37/1472 ,  H01J37/3171 ,  H01J2237/0042 ,  H01J2237/057 ,  H01J2237/141 ,  H01J2237/142 ,  H01J2237/1508 ,  H01J2237/152 ,  H01J2237/31701 ,  H01J2237/31705

    Abstract: An electromagnet and related ion implanter system including active field containment are disclosed. The electromagnet provides a dipole magnetic field within a tall, large gap with minimum distortion and degradation of strength. In one embodiment, an electromagnet for modifying an ion beam includes: a ferromagnetic box structure including six sides; an opening in each of a first side and a second opposing side of the ferromagnetic box structure for passage of the ion beam therethrough; and a plurality of current-carrying wires having a path along an inner surface of the ferromagnetic box structure, the inner surface including the first side and the second opposing side and a third side and a fourth opposing side, wherein the plurality of current-carrying wires are positioned to pass around each of the openings of the first and second opposing sides.

    Abstract translation: 公开了一种包括活性场容纳的电磁体和相关离子注入机系统。 电磁铁在高大的间隙内提供偶极磁场，具有最小的变形和强度的降低。 在一个实施例中，用于修改离子束的电磁体包括：包括六个边的铁磁盒结构; 所述铁磁盒结构的第一侧和第二相对侧中的每一个中的开口用于使所述离子束通过其中; 以及多个载流线，其具有沿铁磁箱结构的内表面的路径，内表面包括第一侧和第二相对侧，以及第三侧和第四相对侧，其中多个载流 电线定位成绕过第一和第二相对侧的每个开口。

    Electron lithography using a photocathode
    8.
    发明授权
    Electron lithography using a photocathode 失效
    使用光电阴极进行电子光刻

    公开(公告)号：US5395738A

    公开(公告)日：1995-03-07

    申请号：US997817

    申请日：1992-12-29

    Applicant: George R. Brandes ,  Philip M. Platzman

    Inventor： George R. Brandes ,  Philip M. Platzman

    IPC: H01L21/30 ,  G03F7/20 ,  H01J37/317 ,  H01L21/027 ,  F03C5/00

    CPC classification number: B82Y10/00 ,  B82Y40/00 ,  G03F7/2057 ,  H01J37/3175 ,  H01J2237/0492 ,  H01J2237/06333 ,  H01J2237/142 ,  H01J2237/31779 ,  Y10S430/143

    Abstract: Sub-micron pattern delineation, importantly in the fabrication of large scale integrated devices, is based on a patterned photocathode. Functionally, the photocathode plays the role of the mask in competing systems, either in proximity printing or in projection. In operation, the photocathode is illuminated by ultraviolet radiation to release electrons which are brought to focus on a resist-coated wafer with assistance of a uniform magnetic field together with an accelerating applied voltage.

    Abstract translation: 重要的是在大规模集成器件的制造中的亚微米图案描绘基于图案化的光电阴极。 在功能上，光电阴极在竞争系统中起着掩模的作用，无论是在接近印刷还是在投影中。 在操作中，通过紫外线辐射照射光电阴极以释放电子，这些电子随着加速施加电压的均匀磁场的帮助而被聚焦在抗蚀剂涂覆的晶片上。

    ELECTROMAGNET WITH ACTIVE FIELD CONTAINMENT
    9.
    发明申请
    ELECTROMAGNET WITH ACTIVE FIELD CONTAINMENT 审中-公开
    具有活动场地容纳的电磁铁

    公开(公告)号：WO2007095189A2

    公开(公告)日：2007-08-23

    申请号：PCT/US2007/003700

    申请日：2007-02-13

    Applicant: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC. ,  KELLERMAN, Peter, L. ,  PURSER, Kenneth, H.

    Inventor： KELLERMAN, Peter, L. ,  PURSER, Kenneth, H.

    CPC classification number: H01J37/05 ,  H01J37/141 ,  H01J37/1472 ,  H01J37/3171 ,  H01J2237/0042 ,  H01J2237/057 ,  H01J2237/141 ,  H01J2237/142 ,  H01J2237/1508 ,  H01J2237/152 ,  H01J2237/31701 ,  H01J2237/31705

    Abstract: An electromagnet and related ion implanter system including active field containment are disclosed. The electromagnet provides a dipole magnetic field within a tall, large gap with minimum distortion and degradation of strength. In one embodiment, an electromagnet for modifying an ion beam includes: a ferromagnetic box structure including six sides; an opening in each of a first side and a second opposing side of the ferromagnetic box structure for passage of the ion beam therethrough; and a plurality of current-carrying wires having a path along an inner surface of the ferromagnetic box structure, the inner surface including the first side and the second opposing side and third side and a fourth opposing side, wherein the plurality of current-carrying wires are positioned to pass around each of the openings of the first and second opposing sides.

    Abstract translation: 公开了一种包括活性场容纳的电磁体和相关离子注入机系统。 电磁铁在高大的间隙内提供偶极磁场，具有最小的变形和强度的降低。 在一个实施例中，用于修改离子束的电磁体包括：包括六个边的铁磁箱结构; 所述铁磁盒结构的第一侧和第二相对侧中的每一个中的开口用于使所述离子束通过其中; 以及多个载流电线，其具有沿铁磁箱结构的内表面的路径，内表面包括第一侧和第二相对侧以及第三侧和第四相对侧，其中多个载流线 定位成绕过第一和第二相对侧的每个开口。

    MAGNETIC LENS APPARATUS FOR USE IN HIGH-RESOLUTION SCANNING ELECTRON MICROSCOPES AND LITHOGRAPHIC PROCESSES
    10.
    发明申请
    MAGNETIC LENS APPARATUS FOR USE IN HIGH-RESOLUTION SCANNING ELECTRON MICROSCOPES AND LITHOGRAPHIC PROCESSES 审中-公开
    用于高分辨率扫描电子显微镜和光刻工艺的磁性透镜装置

    公开(公告)号：WO1996041362A1

    公开(公告)日：1996-12-19

    申请号：PCT/US1996009906

    申请日：1996-06-07

    Applicant: ARCH DEVELOPMENT CORPORATION ,  CREWE, Albert, V.

    Inventor： ARCH DEVELOPMENT CORPORATION

    IPC: H01J37/141

    CPC classification number: H01J37/141 ,  H01J2237/1035 ,  H01J2237/142

    Abstract: Disclosed are lens apparatus in which a beam of charged particlesis brought to a focus by means of a magnetic field, the lens being situated behind the target position. In illustrative embodiments, a lens apparatus is employed in a scanning electron microscopeas the sole lens for high-resolution focusing of an electron beam, and in particular, an electron beam having an accelerating voltage of from about 10 to about 30,000 V. In one embodiment, the lens apparatus comprises an electrically-conducting coil arranged around the axis of the beam and a magnetic pole piece extending along the axis of the beam at least within the space surrounded by the coil. In other embodiments, the lens apparatus comprises a magnetic dipole or virtual magnetic monopole fabricated from a variety of materials, including permanent magnets, superconducting coils, and magnetizable spheres and needles contained within an energy-conducting coil. Multiple-array lens apparatus are also disclosed for simultaneous and/or consecutive imaging of multiple images on single or multiple specimens. The invention further provides apparatus, methods, and devices useful in focusing charged particle beams for lithographic processes.

    Abstract translation: 公开了一种透镜装置，其中带电粒子束通过磁场被聚焦，透镜位于目标位置之后。 在说明性实施例中，在扫描电子显微镜中使用透镜装置用于电子束的高分辨率聚焦的唯一透镜，特别是具有约10至约30,000V的加速电压的电子束。在一个实施例中 透镜装置包括围绕光束的轴线布置的导电线圈和至少在由线圈包围的空间内沿着光束的轴线延伸的磁极片。 在其他实施例中，透镜装置包括由各种材料制成的磁偶极子或虚拟磁单极子，包括永磁体，超导线圈和可磁化球体以及包含在能量传导线圈内的针。 还公开了多阵列透镜装置，用于在单个或多个标本上同时和/或连续成像多个图像。 本发明还提供了用于聚焦用于光刻工艺的带电粒子束的装置，方法和装置。

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