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    Multipole lens and method of fabricating same
    91.
    发明申请
    Multipole lens and method of fabricating same 失效
    多极透镜及其制造方法

    公开(公告)号：US20070278416A1

    公开(公告)日：2007-12-06

    申请号：US11784698

    申请日：2007-04-09

    Applicant: Eiji Kawai

    Inventor： Eiji Kawai

    IPC: H01J1/50

    CPC classification number: H01J37/153 ,  H01J2237/1405 ,  H01J2237/1532 ,  H01J2237/26 ,  H01J2237/28

    Abstract: There is disclosed a multipole lens that can be machined with improved accuracy. A method of fabricating this lens is also disclosed. The multipole lens has a blank material from which polar elements will be fabricated. The blank material is sandwiched vertically between two layers of filmy insulator. The blank material and the two layers of filmy insulator are sandwiched vertically between an upper ring and a lower ring. These members are provided with injection holes for injecting a curing agent. The injection holes of these members are aligned. The curing agent is injected into the holes and cured. Then, the blank material is machined by electric discharge machining to form the polar elements.

    Abstract translation: 公开了可以提高准确度来加工的多极镜头。 还公开了一种制造该透镜的方法。 多极镜头具有制造极性元件的空白材料。 坯料垂直夹在两层薄膜绝缘体之间。 空白材料和两层薄膜绝缘体垂直夹在上环和下环之间。 这些构件设置有用于注入固化剂的注入孔。 这些构件的注入孔对齐。 将固化剂注入孔中并固化。 然后，通过放电加工对坯料进行加工以形成极性元件。

    Electron beam apparatus and method for production of its specimen chamber
    94.
    发明申请
    Electron beam apparatus and method for production of its specimen chamber 有权
    电子束装置及其试样室的制造方法

    公开(公告)号：US20040135082A1

    公开(公告)日：2004-07-15

    申请号：US10742901

    申请日：2003-12-23

    Inventor： Tsuyoshi Inanobe ,  Sho Takami ,  Yoichi Ose ,  Katsuhiro Sasada

    IPC: H01J037/28

    CPC classification number: H01J37/09 ,  H01J37/16 ,  H01J2237/1405 ,  H01J2237/16 ,  H01J2237/2614 ,  H01J2237/2617 ,  H01J2237/28

    Abstract: A structure of an electron beam apparatus having shielding properties for shielding against an environmental magnetic field is provided. The electron beam apparatus comprises a mirror barrel for housing a magnetic lens for converging an electron beam onto a specimen and a specimen chamber for housing the specimen, wherein a non-magnetic material having conductivity is used as a material for at least one of the mirror barrel and a main body of the specimen chamber. The material for the mirror barrel or the main body of the specimen chamber is an aluminum alloy and a thickness of a sidewall of the mirror barrel or the main body of the specimen chamber is 10 mm or more. A magnetic plate having a thickness smaller than that of the sidewall of the mirror barrel or the main body of the specimen chamber is provided on an inner sidewall of the mirror barrel or the main body of the specimen chamber.

    Abstract translation: 提供了具有屏蔽性能以防止环境磁场的电子束装置的结构。 电子束装置包括用于容纳用于将电子束会聚在试样上的磁性透镜的反射镜筒和用于容纳样本的试样室，其中具有导电性的非磁性材料用作至少一个反射镜的材料 桶和样品室的主体。 用于镜筒的材料或试样室的主体是铝合金，镜筒的侧壁或试样室的主体的厚度为10mm以上。 厚度小于镜筒侧壁或试样室主体的磁性板设置在镜筒的内侧壁或试样室的主体上。

    Scanning electron microscope and method of detecting electrons therein
    95.
    发明授权
    Scanning electron microscope and method of detecting electrons therein 有权
    扫描电子显微镜及其中检测电子的方法

    公开(公告)号：US06710340B2

    公开(公告)日：2004-03-23

    申请号：US10072805

    申请日：2002-02-08

    Applicant: Hiroyoshi Kazumori

    Inventor： Hiroyoshi Kazumori

    IPC: H01J37244

    CPC classification number: H01J37/244 ,  H01J2237/1405

    Abstract: There is disclosed a scanning electron microscope capable of detecting secondary electrons emitted from a specimen, using a semi-in-lens type objective lens. A voltage is applied to the specimen from a power supply to decelerate the electron beam immediately ahead of the specimen. Secondary electrons produced from the specimen are confined by a magnetic lens field and move spirally upward. The secondary electrons moving upward travel linearly from a location where the magnetic field of the objective lens is weak. Then, the electrons strike first and second conversion electrodes, producing a large amount of secondary electrons. A voltage is applied to the front face of a detector to produce an electric field near the first opening in the inner polepiece. This field directs the secondary electrons toward the detector, where they are detected.

    Abstract translation: 公开了能够使用半透镜型物镜来检测从试样发出的二次电子的扫描型电子显微镜。 从电源向试样施加电压，使电子束在试样前方减速。 从样品产生的二次电子被磁性透镜场限制，并向上螺旋移动。 向上移动的二次电子从物镜的磁场弱的位置线性移动。 然后，电子撞击第一和第二转换电极，产生大量二次电子。 电压被施加到检测器的正面以在内部极靴中的第一开口附近产生电场。 该场将二次电子引导到检测器，在那里检测它们。

    Charged-particle-beam (CPB)-optical systems with improved shielding against stray magnetic fields, and CPB microlithography apparatus comprising same
    96.
    发明授权
    Charged-particle-beam (CPB)-optical systems with improved shielding against stray magnetic fields, and CPB microlithography apparatus comprising same 失效
    具有改进的对杂散磁场屏蔽的带电粒子束（CPB）光学系统，以及包括其的CPB微光刻设备

    公开(公告)号：US06608317B1

    公开(公告)日：2003-08-19

    申请号：US09715442

    申请日：2000-11-16

    Applicant: Mamoru Nakasuji

    Inventor： Mamoru Nakasuji

    IPC: G21K510

    CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/09 ,  H01J2237/1405 ,  H01J2237/31788

    Abstract: Charged-particle-beam (CPB)-optical systems, and CPB microlithography systems including such CPB-optical systems, are disclosed that exhibit improved shielding against external stray magnetic fields. For example, the systems and apparatus exhibit improved shielding against stray magnetic fields from peripheral conductors or moving conductors, such as linear motors used to drive the reticle stage and/or substrate stage. To such end, a magnetic shield can be attached to the downstream-facing edge of a vacuum wall covering the downstream-facing surface of the wafer-side projection lens. Similarly, a magnetic shield can be attached to the upstream-facing edge of a vacuum wall covering the upstream-facing surface of the reticle-side projection lens. The axis-facing surface of the magnetic shield can have a conical profile, and the magnetic shield can be situated just outside a zone for passage of a light beam for a Z-position sensor.

    Abstract translation: 公开了带电粒子束（CPB）光学系统和包括这种CPB光学系统的CPB微光刻系统，其显示出对外部杂散磁场的改进的屏蔽。 例如，系统和装置显示出改进的屏蔽，防止来自外围导体或移动导体的杂散磁场，例如用于驱动掩模版平台和/或衬底台的线性电动机。 为此，可以将磁屏蔽件附接到覆盖晶片侧投影透镜的下游表面的真空壁的下游侧边缘。 类似地，磁屏蔽可以附着到覆盖标线片侧投影透镜的上游面的真空壁的上游侧边缘。 磁屏蔽的面向轴的表面可以具有锥形轮廓，并且磁屏蔽可以位于用于Z位置传感器的光束通过的区域的外侧。

    Scanning electron microscope and method of detecting electrons therein
    97.
    发明申请
    Scanning electron microscope and method of detecting electrons therein 有权
    扫描电子显微镜及其中检测电子的方法

    公开(公告)号：US20030150991A1

    公开(公告)日：2003-08-14

    申请号：US10072805

    申请日：2002-02-08

    Applicant: JEOL Ltd.

    Inventor： Hiroyoshi Kazumori

    IPC: H01J037/28 ,  H01J037/244

    CPC classification number: H01J37/244 ,  H01J2237/1405

    Abstract: There is disclosed a scanning electron microscope capable of detecting secondary electrons emitted from a specimen, using a semi-in-lens type objective lens. A voltage is applied to the specimen from a power supply to decelerate the electron beam immediately ahead of the specimen. Secondary electrons produced from the specimen are confined by a magnetic lens field and move spirally upward. The secondary electrons moving upward travel linearly from a location where the magnetic field of the objective lens is weak. Then, the electrons strike first and second conversion electrodes, producing a large amount of secondary electrons. A voltage is applied to the front face of a detector to produce an electric field near the first opening in the inner polepiece. This field directs the secondary electrons toward the detector, where they are detected.

    Abstract translation: 公开了能够使用半透镜型物镜来检测从试样发出的二次电子的扫描型电子显微镜。 从电源向试样施加电压，使电子束在试样前方减速。 从样品产生的二次电子被磁性透镜场限制，并向上螺旋移动。 向上移动的二次电子从物镜的磁场弱的位置线性移动。 然后，电子撞击第一和第二转换电极，产生大量二次电子。 电压被施加到检测器的正面以在内部极靴中的第一开口附近产生电场。 该场将二次电子引导到检测器，在那里检测它们。

    Electro-magnetic lens, charged particle beam transferring apparatus, and method for manufacturing electro-magnetic lens
    98.
    发明授权
    Electro-magnetic lens, charged particle beam transferring apparatus, and method for manufacturing electro-magnetic lens 失效
    电磁透镜，带电粒子束传送装置以及电磁透镜的制造方法

    公开(公告)号：US5629526A

    公开(公告)日：1997-05-13

    申请号：US459265

    申请日：1995-06-02

    Applicant: Mamoru Nakasuji

    Inventor： Mamoru Nakasuji

    IPC: H01J37/141

    CPC classification number: H01J37/141 ,  H01J2237/1405 ,  H01J2237/303 ,  H01J2237/3175

    Abstract: A charged particle beam transferring apparatus includes a pair of electro-magnetic lenses spaced apart in the direction of the optical axis. Each electro-magnetic lens consists of a coil and core made of magnetic material and having two magnetic poles. The core of at least one of the electro-magnetic lenses is made of ferrite. An insulating member supports the two magnetic poles of the core of the at least one of the electro-magnetic lenses between its two magnetic poles.

    Abstract translation: 带电粒子束传送装置包括沿光轴方向间隔开的一对电磁透镜。 每个电磁透镜由由磁性材料制成并具有两个磁极的线圈和芯组成。 至少一个电磁透镜的芯由铁氧体制成。 绝缘构件在其两个磁极之间支撑至少一个电磁透镜的芯的两个磁极。

    COMPOSITE BEAM APPARATUS
    99.
    发明申请
    COMPOSITE BEAM APPARATUS 审中-公开

    公开(公告)号：US20190189388A1

    公开(公告)日：2019-06-20

    申请号：US16271575

    申请日：2019-02-08

    Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

    Inventor： Tatsuya ASAHATA

    IPC: H01J37/02 ,  H05H3/00 ,  H01J37/305 ,  H01J37/141 ,  H01J37/29

    CPC classification number: H01J37/026 ,  H01J37/141 ,  H01J37/292 ,  H01J37/3056 ,  H01J2237/1405 ,  H05H3/00

    Abstract: Disclosed is a composite beam apparatus capable of suppressing the influence of charge build-up, or electric field or magnetic field leakage from an electron beam column when subjecting a sample to cross-section processing with a focused ion beam and then performing finishing processing with another beam. The Composite beam apparatus includes: an electron beam column irradiating an electron beam onto a sample; a focused ion beam column irradiating a focused ion beam onto the sample to form a cross section; a neutral particle beam column having an acceleration voltage set lower than that of the focused ion beam column, and irradiating a neutral particle beam onto the sample to perform finish processing of the cross section, wherein the electron beam column, the focused ion beam column, and the neutral particle beam column are arranged such that the beams of the columns cross each other at an irradiation point.

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