Abstract:
The invention relates to an optical spectral sensor for determining the spectral information of incident light, in particular in the visible and infrared spectral range, with at least one optoelectronic semiconductor arrangement and at least one metal film, which is surrounded by a dielectric, wherein the metal film has a periodic pattern, wherein the at least one optoelectronic semiconductor arrangement and the at least one patterned metal film are arranged in such a way that light to be detected initially passes through the patterned metal film and then impinges on the optoelectronic semiconductor arrangement, wherein the optical spectral sensor is formed in such a way that the spectral sensitivity is determined essentially by the optical properties of the patterned metal film.
Abstract:
An apparatus for ascertaining properties of a light beam, comprises a means for splitting a measured beam out from the light beam and comprises at least one detector that at least partially receives the measured beam. A polarization-influencing means is arranged in the beam path of the measured beam in order to enhance reliability and reproducibility.
Abstract:
Apparatus and method for increasing the sensitivity in the detection of optical coherence tomography and low coherence interferometry (“LCI”) signals by detecting a parallel set of spectral bands, each band being a unique combination of optical frequencies. The LCI broad bandwidth source is split into N spectral bands. The N spectral bands are individually detected and processed to provide an increase in the signal-to-noise ratio by a factor of N. Each spectral band is detected by a separate photo detector and amplified. For each spectral band the signal is band pass filtered around the signal band by analog electronics and digitized, or, alternatively, the signal may be digitized and band pass filtered in software. As a consequence, the shot noise contribution to the signal is reduced by a factor equal to the number of spectral bands. The signal remains the same. The reduction of the shot noise increases the dynamic range and sensitivity of the system.
Abstract:
A spectroscope capable of suppressing the dimension and the cost with avoiding a problem caused by polarization dependency of the diffraction grating. The spectroscope includes a polarizing beam splitter plate 3 that divides the light from an input fiber 1 into a first and a second optical paths and polarizes each light of each optical path having different direction of polarization with each other, a Fresnel rhomb half wave plate 5 that arranges the direction of polarization of the light in the first optical path into that in the second optical path and a plane mirror 4 that deflects the second optical path such that at least a portion of an area where the light through the first optical path is incident on the diffraction grating 6 and an area where the light through the second optical path is incident on the diffraction grating overlap each other.
Abstract:
An ellipsometer measures any point of a sample by a first spectrometer and a second spectrometer. The ellipsometer performs analysis based on the measurement results obtained by the first spectrometer, performs analysis based on the measurement results obtained by the second spectrometer, and calculates an approximation formula for approximating the analysis results obtained by the second spectrometer to the analysis results obtained by the first spectrometer. The remaining points of the sample are measured with the second spectrometer, and the results of analysis using the measurement results are corrected based on the approximation formula.
Abstract:
A spectroscopic ellipsometer is provided for measuring a small target surface with a high degree of precision. An irradiating optical system provides a polarized light to the surface of the target, while a detecting optical system is provided with a higher F-number for collecting the reflected light from the target surface to introduce it into the spectrometer for measuring a thickness of a thin film on the surface of the sample in accordance with the polarization state of change of the detected light rays.
Abstract:
The invention concerns a polarimetric system and a method of polarimetric measurement of the Mueller matrix coefficients of a sample (7). The polarimetric system contains an excitation section (1) emitting a light beam (2). Said light beam passes through a polarisation state generator (PSG) (5) and is focused on the sample (7) on a sample holder (3). After reflection on the sample surface (8), the beam goes through an analysis section (4) containing a polarisation state detector (PSD) or polarimeter (9) and detection means (10). According to the invention, the light beam (2) emitted by the excitation section (1) is in the spectral range from the far ultraviolet to the visible. The light beam propagates through the excitation section (1) up to through the analysis section (4) under a low partial pressure of far ultraviolet absorbing gases. The polarimetric system comprises one or more air tight chamber (17), said chambers containing said excitation section, said analysis section, and said sample holder.
Abstract:
This invention provides an inexpensive, noninvasive optical method of quantitatively determining the volume fraction of anisotropic material in a mixture of anisotropic and isotropic material, and more particularly for determining the volume fraction of noncubic crystalline material in a mixed-phase specimen having noncubic crystalline material intermixed with cubic crystalline material. Polarized light is impinged on the specimen and the reflectance or transmission difference between two orthogonal polarization directions is measured. In cubic regions the reflectance or transmission is the same along both polarization directions so the contributions to the difference cancel, leaving a signal only from the noncubic regions. The optical difference can be measured as a function of wavelength and critical points in the band structure, including the band gap, can be profiled. From the band structure the film composition can be determined. This measurement is particularly suited to measuring III-V nitride semiconductor specimens having regions with zincblende symmetry mixed with regions of wurtzite symmetry.
Abstract:
A cavity ring-down system for performing cavity ring-down spectroscopy (CRDS) using optical heterodyne detection of a ring-down wave E.sub.RD during a ring-down phase or a ring-up wave E.sub.RU during a ring up phase. The system sends a local oscillator wave E.sub.LO and a signal wave E.sub.SIGNAL to the cavity, preferably a ring resonator, and derives an interference signal from the combined local oscillator wave E.sub.LO and the ring-down wave E.sub.RD (or ring-up wave E.sub.RU). The local oscillator wave E.sub.LO has a first polarization and the ring-down wave E.sub.RD has a second polarization different from the first polarization. The system has a combining arrangement for combining or overlapping local oscillator wave E.sub.LO and the ring-down wave E.sub.RD at a photodetector, which receives the interference signal and generates a heterodyne current I.sub.H therefrom. Frequency and phase differences between the waves are adjustable.
Abstract:
An apparatus for determining the optical retardation of a material. The apparatus includes a light source emitting light along a light path, and a lens disposed in the light path intermediate the light source and a sample of the material. A waveguide directs the light from the light source to the sample and directs light reflected from the sample to a wavelength analyzer, whereby the wavelength analyzer detects the wavelengths of the reflected light. The apparatus of the present invention includes a sole polarizing element disposed in the light path intermediate the light source and the wavelength analyzer.