公开(公告)号：US11020766B2

公开(公告)日：2021-06-01

申请号：US16576195

申请日：2019-09-19

Applicant: Service Support Specialties, Inc.

Inventor： Gary Hillman ,  Joseph Deghuee

IPC: B05D1/00 ,  B05C11/08 ,  B05C11/06

Abstract: A spin coating apparatus, system, and/or method that increase the uniformity of a coating material on a substrate. The spin coating system may be specifically directed for use with polygonal shaped substrates. The spin coating system may include a process chamber within which the substrate is located, spinning on a chuck, during operation. The spin coating system may include gas injection ports that inject a gas into the process chamber so that the gas contacts the substrate along corner portions of its front surface. This injection of the gas increases pressure and prevents excessive build-up of the coating material that may otherwise occur when spin coating polygonal shaped substrates.

公开(公告)号：US20210157237A1

公开(公告)日：2021-05-27

申请号：US17048214

申请日：2019-04-01

Applicant: Tokyo Electron Limited

Inventor： Masato Hayashi ,  Takuya Mori ,  Hideo Shite ,  Hirokazu Sakamoto

IPC: G03F7/16 ,  B05C9/14 ,  B05C11/08 ,  H01L21/66 ,  H01L21/027

Abstract: A device includes a chemical solution flow path in which a chemical solution containing polymers flows; a laser beam irradiator configured to irradiate a laser beam to the chemical solution flow path such that an optical path is intersected with a flow direction of the chemical solution in the chemical solution flow path; a light receiving element provided in the optical path passing through the chemical solution flow path; a detector configured to detect, based on a signal output from the light receiving element, an abnormality in a state of polymers corresponding to a majority of the polymers contained in the chemical solution or configured to detect a ratio between a chemical solution containing the polymers and another chemical solution in the chemical solution flow path.

公开(公告)号：US20200368389A1

公开(公告)日：2020-11-26

申请号：US16634246

申请日：2018-07-06

Applicant: ISHIHARA SANGYO KAISHA, LTD.

Inventor： Seiji KAJI

IPC: A61L27/34 ,  A61L27/18 ,  B05D1/00 ,  B05C13/02 ,  B05D7/24 ,  B05C11/08 ,  B05C3/09

Abstract: Provided is a three-dimensional structure that makes it possible to obtain a coating film having a uniform thickness and good adhesion even when a three-dimensional structure main body has a concave section and/or a convex section, and that therefore has high durability without the coating film being peeled off even after long-term use. The three-dimensional structure has a three-dimensional structure main body and a coating film having a thickness of 10 nm to 300 nm and formed on a surface of the three-dimensional structure main body, wherein the coating film is made of a metal alkoxide or non-metal alkoxide hydrolysis product; and when a portion of the coating film located on a surface of the concave section and/or convex section in the three-dimensional structure main body is observed with a scanning electron microscope at a magnification of 300, no peeling of the coating film can be recognized.

公开(公告)号：US10825713B2

公开(公告)日：2020-11-03

申请号：US15642928

申请日：2017-07-06

Applicant: SCREEN Holdings Co., Ltd.

Inventor： Naohiko Yoshihara ,  Kenji Kobayashi ,  Manabu Okutani

IPC: H01L21/02 ,  H01L21/687 ,  H01L21/67 ,  B05C11/08

Abstract: A substrate processing apparatus includes a substrate heating unit arranged to heat the underside of a substrate while supporting the substrate thereon and an attitude changing unit arranged to cause the substrate heating unit to undergo an attitude change between a horizontal attitude and a tilted attitude. In an organic solvent removing step to be performed following a substrate heating step of heating the substrate, the substrate heating unit undergoes an attitude change to the tilted attitude so that the upper surface of the substrate becomes tilted with respect to the horizontal surface.

公开(公告)号：US10668497B2

公开(公告)日：2020-06-02

申请号：US15559076

申请日：2016-02-25

Applicant: SCREEN Holdings Co., Ltd.

Inventor： Yusuke Akizuki

IPC: B05C11/10 ,  G03F7/42 ,  H01L21/67 ,  H01L21/311 ,  B05C11/08 ,  B05D7/24 ,  H01L21/027 ,  C09K13/08

Abstract: In order to solve the problem of satisfactorily removing a resist from the surface of a substrate, the present invention is a substrate processing device (1) having a spin chuck (5) and an SPM feed unit (6) for feeding SPM to the substrate (W) held by the spin chuck (5), wherein the SPM feed unit (6) includes a mixing unit (30) for mixing an aqueous hydrogen peroxide solution and hydrofluoric acid and producing a liquid mixture of hydrogen peroxide water and hydrofluoric acid, and an HF-mixed SPM production unit (14) for mixing the liquid mixture and sulfuric acid and producing HF-mixed SPM.

公开(公告)号：US10578969B2

公开(公告)日：2020-03-03

申请号：US16245631

申请日：2019-01-11

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Cong Liu ,  Doris H. Kang ,  Deyan Wang ,  Cheng-Bai Xu ,  Mingqi Li ,  Irvinder Kaur

IPC: G03F7/11 ,  G03F7/09 ,  G03F7/038 ,  B05C11/08 ,  G03F7/00 ,  G03F7/16 ,  H01L21/027 ,  G03F7/40 ,  G03F7/38 ,  G03F7/20

Abstract: Photoresist topcoat compositions, comprising: a first polymer comprising a first repeat unit of general formula (I) and a second repeat unit of general formula (II): wherein: R1 independently represents H, F or optionally fluorinated C1 to C4 alkyl; R2 represents optionally fluorinated linear, branched or cyclic C1 to C20 alkyl; L1 represents a single bond or a multivalent linking group; and n is an integer of from 1 to 5; a second polymer comprising a first repeat unit of general formula (III) and a second repeat unit of general formula (IV): wherein: R3 independently represents H, F or optionally fluorinated C1 to C4 alkyl; R4 represents linear, branched or cyclic C1 to C20 alkyl; R5 represents linear, branched or cyclic C1 to C20 fluoroalkyl; L2 represents a single bond or a multivalent linking group; and n is an integer of from 1 to 5; and a solvent. Coated substrates coated with the described topcoat compositions and methods of processing a photoresist composition are also provided. The invention finds particular applicability in the manufacture of semiconductor devices.

公开(公告)号：US10459340B2

公开(公告)日：2019-10-29

申请号：US14953109

申请日：2015-11-27

Applicant: TOKYO ELECTRON LIMITED

Inventor： Koshi Muta ,  Hideharu Kyoda ,  Minoru Kubota

IPC: G03F7/30 ,  B05D1/00 ,  B05C11/08 ,  H01L21/67

Abstract: A developing method includes: forming a liquid pool of a diluted developing solution diluted with pure water in a central portion of a substrate; forming a liquid film of the diluted developing solution on a surface of the substrate by accelerating rotation of the substrate to diffuse the liquid pool of the diluted developing solution on the entire surface of the substrate; and then supplying a developing solution onto the substrate. Supplying a developing solution includes: supplying the developing solution from a developing solution supply nozzle having a liquid contact surface while securing a gap having a predetermined size between the developing solution supply nozzle and the substrate; and moving the developing solution supply nozzle in a radial direction passing through a center of the substrate while forming a liquid pool of the developing solution between the substrate and the liquid contact surface of the developing solution supply nozzle.

公开(公告)号：US10281628B2

公开(公告)日：2019-05-07

申请号：US15026634

申请日：2014-10-03

Applicant: Transitions Optical, Inc.

Inventor： Jerry L. Koenig, II ,  Joseph David Turpen ,  Glen Todd Owens ,  Nancyanne Gruchacz

IPC: H05H1/00 ,  G02B5/22 ,  B29D11/00 ,  G03C1/73 ,  C08G18/62 ,  C08G18/78 ,  C08G18/80 ,  C08G18/81 ,  C08G18/22 ,  C08G18/28 ,  C09D175/06 ,  C08G18/40 ,  C08G18/44 ,  G02B1/14 ,  C08J7/04 ,  C08J7/12 ,  C09D5/32 ,  G02B5/23 ,  G02C7/10 ,  B05C11/08 ,  B05C11/10 ,  B05D3/14 ,  B05D7/00 ,  C09K9/02 ,  B05C5/02 ,  B05C13/00 ,  B05D1/00 ,  B05D3/00 ,  B05D3/02

Abstract: A method of preparing a photochromic optical article is provided, which includes: (i) applying a first organic solvent to a surface of an optical substrate, thereby forming an organic solvent wetted surface on the optical substrate; and (ii) applying a curable photochromic coating composition over the organic solvent wetted surface of said optical substrate, thereby forming a curable photochromic coating layer over the surface of the optical substrate. The curable photochromic coating composition includes a second organic solvent, and the first and second organic solvents are miscible with each other. With some embodiments, the first and second organic solvents are the same.

公开(公告)号：US20180333740A1

公开(公告)日：2018-11-22

申请号：US16061029

申请日：2016-12-12

Applicant: Hyun Jae LEE

Inventor： Hyun Jae LEE

IPC: B05C11/08 ,  H01L21/02 ,  H01L21/683 ,  G03F7/16 ,  H01L21/67 ,  B05D1/00

CPC classification number: B05C11/08 ,  B05D1/005 ,  G03F7/162 ,  H01L21/02 ,  H01L21/67 ,  H01L21/6715 ,  H01L21/683

Abstract: A spin device includes a mounting unit on which a wafer is mounted, a control unit configured to generate a control signal for motor driving, a motor configured to spin the mounting unit on which the wafer is mounted, based on the control signal, and a display unit configured to display sectional driving data of the motor and real-time driving information of the motor, wherein the sectional driving data indicating a number of revolutions set for the motor to be driven for each of at least one section, and the real-time driving information is displayed in relation to the sectional driving data when the motor is driven.

公开(公告)号：US20180333738A1

公开(公告)日：2018-11-22

申请号：US15597908

申请日：2017-05-17

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.

Inventor： Chien-Hung WANG ,  Chun-Chih LIN ,  Chi-Hung LIAO ,  Yung-Yao LEE ,  Wei Chang CHENG

IPC: B05C5/02 ,  B05C11/08 ,  B05C11/10

Abstract: A drippage prevention system including: a first automatic control valve (ACV), an input of the first ACV fluidically connected to a source of fluid to be dispensed, the first ACV having a position ranging from fully closed to fully open; a second ACV, an input of the second ACV being fluidically connected to the output of the first ACV, and an output of the second ACV being fluidically connected to a nozzle, the second ACV having positions ranging from fully closed to fully open; a proxy sensor configured to generate a proxy signal representing an indirect measure of a position of the first ACV; and a controller electrically connected to the first and second ACVs and the proxy sensor, the controller being configured to cause the second ACV to close based on the proxy signal and thereby stop flow of the liquid to the nozzle.