公开(公告)号：US20220406563A1

公开(公告)日：2022-12-22

申请号：US17897080

申请日：2022-08-26

Applicant: ASML Netherlands B.V.

Inventor： Laura DEL TIN ,  Almut Johanna STEGEMANN ,  German AKSENOV ,  Diego MARTINEZ NEGRETE GASQUE ,  Pieter Lucas BRANDT

IPC: H01J37/317 ,  H01J37/12 ,  H01J37/28 ,  H01J37/09 ,  H01J37/20

Abstract: Disclosed herein is an multi-array lens configured in use to focus a plurality of beamlets of charged particles along a multi-beam path, wherein each lens in the array comprises: an entrance electrode; a focusing electrode and a support. The focusing electrode is down beam of the entrance electrode along a beamlet path and is configured to be at a potential different from the entrance electrode. The support is configured to support the focusing electrode relative to the entrance electrode. The focusing electrode and support are configured so that in operation the lens generates a rotationally symmetrical field around the beamlet path.

公开(公告)号：US20220399181A1

公开(公告)日：2022-12-15

申请号：US17805887

申请日：2022-06-08

Applicant: NuFlare Technology, Inc.

Inventor： Toshiki KIMURA ,  Hirofumi MORITA ,  Takanao TOUYA ,  Mitsuhiro OKAZAWA

IPC: H01J37/317 ,  H01J37/04 ,  H01J37/09

Abstract: In one embodiment, a multi charged particle beam writing apparatus includes a blanking aperture array substrate provided with a plurality of blankers configured to respectively perform blanking deflection on a plurality of charged particle beams included in a multi-beam, and a first shield member which is disposed downstream of the blanking aperture array substrate with respect to a travel direction of the multi-beam, has a cylindrical part in which the multi-beam passes through, and is composed of a high magnetic permeability material.

公开(公告)号：US20220392739A1

公开(公告)日：2022-12-08

申请号：US17832054

申请日：2022-06-03

Applicant: JEOL Ltd.

Inventor： Munehiro Kozuka ,  Tsutomu Negishi ,  Tatsuhito Kimura ,  Yoshikazu Ishikawa ,  Hisashi Kawahara

IPC: H01J37/22 ,  H01J37/08 ,  H01J37/09 ,  H01J37/20 ,  H01J37/244 ,  H01J37/305 ,  H01L21/66

Abstract: A specimen machining device for machining a specimen by irradiating the specimen with an ion beam includes an ion source for irradiating the specimen with the ion beam, a shielding member disposed on the specimen to block the ion beam, a specimen stage for holding the specimen, a camera for photographing the specimen, a coaxial illumination device for irradiating the specimen with illumination light along an optical axis of the camera, and a processing unit for determining whether to terminate the machining based on an image photographed by the camera. The processing unit performs processing for acquiring information indicating a target machined width, processing for acquiring the image, processing for measuring a machined width on the acquired image, and processing for terminating the machining when the measured machined width equals or exceeds the target machined width.

公开(公告)号：US20220319797A1

公开(公告)日：2022-10-06

申请号：US17708517

申请日：2022-03-30

Applicant: ASML Netherlands B.V.

Inventor： Shichen GU ,  Weiming REN ,  Qingpo XI

IPC: H01J37/09 ,  H01J37/20

Abstract: Systems and methods of enhancing imaging resolution by reducing crosstalk between detection elements of a secondary charged-particle detector in a multi-beam apparatus are disclosed. The multi-beam apparatus may comprise an electro-optical system comprising a beam-limit aperture plate having a surface substantially perpendicular to an optical axis, the beam-limit aperture plate comprising a first aperture at a first distance relative to the surface of the beam-limit aperture plate, and a second aperture at a second distance relative to the surface of the beam-limit aperture plate, the second distance being different from the first distance. The first aperture may be a part of a first set of apertures of the beam-limit aperture plate at the first distance, and the second aperture may be a part of a second set of apertures of the beam-limit aperture plate at the second distance.

公开(公告)号：US11348756B2

公开(公告)日：2022-05-31

申请号：US15985763

申请日：2018-05-22

Applicant: ASML Netherlands B.V.

Inventor： Alexander Hendrik Vincent Van Veen ,  Willem Henk Urbanus ,  Marco Jan-Jaco Wieland

IPC: H01J37/153 ,  H01J37/12 ,  H01J37/09 ,  H01J37/065 ,  H01J37/317 ,  H01J37/02

Abstract: A lens element of a charged particle system comprises an electrode having a central opening. The lens element is configured for functionally cooperating with an aperture array that is located directly adjacent said electrode, wherein the aperture array is configured for blocking part of a charged particle beam passing through the central opening of said electrode. The electrode is configured to operate at a first electric potential and the aperture array is configured to operate at a second electric potential different from the first electric potential. The electrode and the aperture array together form an aberration correcting lens.

公开(公告)号：US20220148849A1

公开(公告)日：2022-05-12

申请号：US17523228

申请日：2021-11-10

Applicant: FEI Company

Inventor： Peter Christiaan Tiemeijer

IPC: H01J37/244 ,  H01J37/09

Abstract: The disclosure relates to a method of determining an energy width of a charged particle beam, comprising the steps of providing a charged particle beam, directing said beam towards a specimen, and forming an energy-dispersed beam from a flux of charged particles transmitted through the specimen. As defined herein, the method comprises the steps of providing a slit element in a slit plane, and using said slit element for blocking a part of said energy-dispersed beam, as well as the step of modifying said energy-dispersed beam at the location of said slit plane in such a way that said energy dispersed beam is partially blocked at said slit element. The unblocked part of said energy-dispersed beam is imaged and an intensity gradient of said imaged energy-dispersed beam is determined, with which the energy width of the charged particle beam can be determined.

公开(公告)号：US11239042B2

公开(公告)日：2022-02-01

申请号：US17060242

申请日：2020-10-01

Applicant: Hitachi High-Tech Corporation

Inventor： Akira Ikegami ,  Yuta Kawamoto ,  Naomasa Suzuki ,  Manabu Yano ,  Yasushi Ebizuka ,  Naoma Ban

IPC: H01J37/141 ,  H01J37/153 ,  H01J37/28 ,  H01J37/147 ,  H01J37/09

Abstract: The present disclosure aims at proposing a multi-beam irradiation device capable of correcting off-axis aberrations. In order to achieve the above object, a beam irradiation device is proposed, which includes a beam source which emits a plurality of beams; an objective lens (17) which focuses a beam on a sample; a first lens (16) which is arranged such that a lens main surface is positioned at an object point of the objective lens and deflects a plurality of incident beams toward an intersection point of a lens main surface of the objective lens and an optical axis; a second lens (15) which is arranged closer to a beam source side than the first lens and focuses the plurality of beams on a lens main surface of the first lens; and a third lens (14) which is arranged closer to the beam source side than the second lens and deflects the plurality of beams toward an intersection point of a lens main surface of the second lens and the optical axis.

公开(公告)号：US11239041B2

公开(公告)日：2022-02-01

申请号：US16973167

申请日：2019-07-19

Applicant: Saes Getters S.p.A.

Inventor： Marco Urbano

IPC: H01J37/00 ,  H01J37/09 ,  H01J37/28

Abstract: The present invention relates to a multi-stage vacuum equipment, preferably a two-stage equipment, whose normal operation requires different pressures to be set, wherein the pressure variation may be achieved by a Shape Memory Alloy (SMA) wire movement of a suitable element. The invention further discloses a method for operating said multi-stage vacuum equipment controlled by a SMA actuator.

公开(公告)号：US20220007556A1

公开(公告)日：2022-01-06

申请号：US17294576

申请日：2019-01-15

Applicant: Hitachi High-Tech Corporation

Inventor： Ichiro MIYANO ,  Osamu KOMURO ,  Masakazu TAKAHASHI ,  Masashi FUJITA

IPC: H05K9/00 ,  H01J37/09

Abstract: Provided is an electromagnetic field shielding plate, etc., in which it is possible to reduce weight while achieving high shielding performance from relatively high-frequency electromagnetic fields. The electromagnetic field shielding plate is configured by layering a permalloy layer 3 comprising a plate or sheet of permalloy, and an amorphous layer 1 comprising an Fe—Si—B—Cu—Nb-based amorphous plate or sheet.

公开(公告)号：US11217428B2

公开(公告)日：2022-01-04

申请号：US16835369

申请日：2020-03-31

Applicant: NuFlare Technology, Inc.

Inventor： Mitsuhiro Okazawa ,  Hirofumi Morita

IPC: H01J37/317 ,  H01J37/09 ,  H01J37/12 ,  H01J37/04

Abstract: Provided is a multi charged particle beam writing apparatus including: an emission unit emitting a charged particle beam; a restriction aperture unit having a first opening having a variable opening area, the restriction aperture unit shielding a portion of the charged particle beam; a shaping aperture array substrate having a plurality of second openings, the shaping aperture array substrate forming multiple beams by allowing the shaping aperture array substrate to be irradiated with the charged particle beam passing through the first opening and allowing a portion of the charged particle beam to pass through the plurality of second openings; and a blanking aperture array substrate having a plurality of third openings, each beam of the multiple beams passing through the plurality of third openings, the blanking aperture array substrate being capable of independently deflecting each beam of the multiple beams.