Antireflection laminate
    131.
    发明申请
    Antireflection laminate 审中-公开
    防反射层压板

    公开(公告)号:US20060269733A1

    公开(公告)日:2006-11-30

    申请号:US10569363

    申请日:2004-08-26

    Abstract: There is provided an antireflective laminate having a low refractive index and excellent mechanical strength, which comprises a coating layer of an ionizing radiation curing-type resin composition comprising ionizing radiation curing group-containing hollow silica fine particles. The antireflective laminate comprises a light transparent base material and at least a low refractive index layer having a refractive index of not more than 1.45 provided on the light transparent base material, wherein the low refractive index layer comprises an ionizing radiation curing-type resin composition and silica fine particles having an outer shell layer with the interior of the silica fine particles being porous or void, and, for a part or all of the silica fine particles, at least a part of the surface of the silica fine particle has been treated with an ionizing radiation curing group-containing silane coupling agent.

    Abstract translation: 提供了具有低折射率和优异的机械强度的抗反射层压体,其包括含有电离辐射固化基团的中空二氧化硅细颗粒的电离辐射固化型树脂组合物的涂层。 所述抗反射层叠体包含透光性基材和至少具有设在所述透光性基材上的折射率为1.45以下的低折射率层,其中所述低折射率层包含电离辐射固化型树脂组合物和 具有外壳层的二氧化硅细颗粒,二氧化硅细颗粒的内部是多孔的或空隙的,并且对于二氧化硅微粒的一部分或全部,二氧化硅细颗粒的至少一部分表面已经用 含电离辐射固化基团的硅烷偶联剂。

    Selective area fusing of a slurry coating using a laser
    132.
    发明申请
    Selective area fusing of a slurry coating using a laser 审中-公开
    选择性区域使用激光熔化浆料涂层

    公开(公告)号:US20060269687A1

    公开(公告)日:2006-11-30

    申请号:US11141278

    申请日:2005-05-31

    CPC classification number: C23C10/30 B05D1/32 B05D3/06 C23C10/04 C23C26/02 G03F1/20

    Abstract: A method of depositing thin coating layers a wide variety of coating materials on a wide variety of substrate by fusing a slurry coating of the coating material onto a coating surface of the substrate by application of energy from a laser. The coating materials and substrates may include pure metals and metal alloys, ceramics, cements, polymers and composites of these materials. The method produces a fused coating layer in a predetermined pattern by the use of a reflective mask, such as a polished metal mask of a metal that is particularly adapted to reflect the wavelengths of the laser energy used to fuse the coating. The method may be implemented as an additive process to produce the fused coating layer, or alternately, it may be implemented as an additive and subtractive process.

    Abstract translation: 通过施加来自激光的能量将涂覆材料的浆料涂层熔合到基材的涂层表面上,在各种基材上沉积薄涂层的各种涂层材料的方法。 涂料和基材可以包括这些材料的纯金属和金属合金,陶瓷,水泥,聚合物和复合材料。 该方法通过使用反射掩模(例如金属的抛光金属掩模)特别适于反映用于熔化涂层的激光能量的波长而以预定图案产生熔融涂层。 该方法可以实施为生产熔敷涂层的添加方法,或者可以将其实施为加成和减色法。

    Strongly adherent surface coatings
    133.
    发明申请
    Strongly adherent surface coatings 审中-公开
    强烈粘附的表面涂层

    公开(公告)号:US20060257681A1

    公开(公告)日:2006-11-16

    申请号:US10556609

    申请日:2004-05-14

    Abstract: In a process for the production of a strongly adherent coating on an inorganic or organic substrate, wherein a), a low-temperature plasma treatment, a corona discharge treatment or a flame treatment is carried out on the inorganic or organic substrate, b) one or more photoinitiators or mixtures of photoinitiators with monomers or/and oligomers, containing at least one ethylenically unsaturated group, or solutions, suspensions or emulsions of the afore-mentioned substances, are applied to the inorganic or organic substrate, and optionally, c) using suitable methods those afore-mentioned substances are dried and/or are irradiated with electromagnetic waves, it proves advantageous to use compounds of formula (I), (II), (III) and/or (IV), IN-L-RG (I), >IN-L-RG1-L1-H (II), IN-L-RG1-L1-IN1 (III), IN-L-RG1-L1-RG2-L2-IN1 (IV), wherein IN and IN1 are each independently of the others a monacylphosphine, monoacylphosphine oxide or monoacylphosphine sulfide photoinitiator group; L1 L1 and L2 are a single bond or a spacer group; RG is a monovalent radical having at least one ethylenically unsaturated C═C bond; and RG1 and RG2 are each independently of the other a divalent radical having at least one ethylenically unsaturated C═C bond.

    Abstract translation: 在无机或有机基底上制备强粘附涂层的方法中,其中a)在无机或有机基底上进行低温等离子体处理,电晕放电处理或火焰处理,b)一 或更多的光引发剂或光引发剂与含有至少一个烯键式不饱和基团的单体或/和低聚物或上述物质的溶液,悬浮液或乳液的混合物施用于无机或有机底物,以及任选地,c)使用 使用上述物质干燥和/或用电磁波照射的合适方法,证明使用式(I),(II),(III)和/或(IV)的化合物,IN-L-RG( I),> IN-L-RG 1 -L 1 -H(II),IN-L-RG 1 -L

    Process for the production of strongly adherent coatings
    134.
    发明申请
    Process for the production of strongly adherent coatings 审中-公开
    生产强粘附涂层的方法

    公开(公告)号:US20060257575A1

    公开(公告)日:2006-11-16

    申请号:US10566743

    申请日:2004-07-26

    Abstract: The invention relates to a process for the production of strongly adherent coatings on an inorganic or organic metalized substrate, wherein in a first step a) a low-temperature plasma, a corona discharge or a flame is caused to act on the inorganic or organic substrate, in a second step b) one or more photoinitiators or mixtures of photoinitiators with monomers, containing at least one ethylenically unsaturated group, or solutions, suspensions or emulsions of the afore-mentioned substances, are applied to the inorganic or organic substrate, in a third step c) using suitable methods those afore-mentioned substances are dried and/or irradiated with electromagnetic waves and, optionally, in a fourth step d) the substrate so pretreated is provided with a coating and the coating is cured or dried.

    Abstract translation: 本发明涉及一种用于在无机或有机金属化基底上生产强粘附涂层的方法,其中在第一步骤中,a)使低温等离子体,电晕放电或火焰作用于无机或有机基底上 在第二步中b)将一种或多种光引发剂或光引发剂与含有至少一个烯键式不饱和基团的单体或上述物质的溶液,悬浮液或乳液的单体混合物施加到无机或有机基材上, 第三步骤c)使用合适的方法,将上述物质用电磁波干燥和/或照射,以及任选地在第四步骤中d)将经过预处理的基材设置有涂层,并将涂层固化或干燥。

    Methods and processes for attaching compounds to matrices
    136.
    发明申请
    Methods and processes for attaching compounds to matrices 审中-公开
    将化合物连接到基质上的方法和方法

    公开(公告)号:US20050239112A1

    公开(公告)日:2005-10-27

    申请号:US11095077

    申请日:2005-03-31

    CPC classification number: B05D3/06 C07K1/1077 C07K1/22 G01N33/54353 Y02P20/582

    Abstract: The present invention describes extremely rapid and efficient methods for the attachment of chemical moieties to matrices by the use of microwave technology. The methods of the invention can be applied in a variety of ways for the preparation of different types of matrices for a variety of applications including but not limited to the functionalization of various solid supports, and matrices in the form of powder, beads, sheets, and other suitable surfaces for use in applications including but not limited to oligonucleotide synthesis, peptide synthesis, environmental clean up (removal of toxic materials), immunoassays, affinity chromatography, combinatorial chemistry, microarrays, proteomics and medical diagnostics.

    Abstract translation: 本发明描述了通过使用微波技术将化学部分附着到基质上的非常快速和有效的方法。 本发明的方法可以以各种方式应用于制备用于各种应用的不同类型的基质,包括但不限于各种固体支持物的功能化,以及粉末,珠粒,片状物的形式的基质, 和其他合适的表面,用于包括但不限于寡核苷酸合成,肽合成,环境清洁(去除有毒物质),免疫测定,亲和层析,组合化学,微阵列,蛋白质组学和医学诊断等应用。

    Process for the production of strongly adherent surface-coatings by plasma-activated grafting
    139.
    发明授权
    Process for the production of strongly adherent surface-coatings by plasma-activated grafting 失效
    通过等离子体激活接枝生产强粘附表面涂层的方法

    公开(公告)号:US06733847B2

    公开(公告)日:2004-05-11

    申请号:US10181008

    申请日:2002-07-11

    CPC classification number: C08J7/18 B05D3/06 B05D3/062 B05D3/068 B05D3/10 B05D3/141

    Abstract: The invention relates to a process for the production of strongly adherent coatings on an inorganic or organic substrate, in which process in a first step: a) the inorganic or organic substrate is subjected to the action of a low-temperature plasma discharge, a corona discharge, high-energy UV radiation or electron radiation, the radiation or discharge is then discontinued, in a further step: b) at least one electron- or H-donor, each containing at least one ethylenically unsaturated group, is applied to the inorganic or organic substrate in vacuo or at normal pressure and reacted with the free radicals formed there, and c1) the substrate so precoated with coinitiator is coated with a composition comprising at least one ethylenically unsaturated monomer or oligomer and a photoinitiator, and the coating is cured by means of electromagnetic and/or ionizing radiation; or c2) the substrate so precoated with coinitiator is coated with a composition comprising at least one ethylenically unsaturated monomer or oligomer and one or more thermally activatable initiators, and the coating is cured thermally. The invention relates also the use of electron- or H-donors, for example amines, thioethers or thiols, having at least one ethylenically unsaturated group in the production of such layers and to the strongly adherent coatings themselves.

    Abstract translation: 本发明涉及一种用于在无机或有机基材上生产强粘附涂层的方法,其中在第一步骤中的方法:a)无机或有机基材经受低温等离子体放电,电晕 放电,高能紫外辐射或电子辐射,然后在另外的步骤中停止辐射或放电:b)将至少一个含有至少一个烯键式不饱和基团的电子或H-给体施加到无机 或有机底物在真空中或在常压下反应并与其中形成的自由基反应,和c1)使用共引发剂预涂的基材涂覆有包含至少一种烯属不饱和单体或低聚物和光引发剂的组合物,并且涂层固化 通过电磁和/或电离辐射; 或c2)使用共引发剂预涂的基材涂覆有包含至少一种烯键式不饱和单体或低聚物和一种或多种可热激活的引发剂的组合物,并且涂层被热固化。 本发明还涉及在制备这些层中具有至少一个烯键式不饱和基团的电子或H给体(例如胺,硫醚或硫醇)以及强粘附性涂层本身。

    Method for coating a substrate having holes
    140.
    发明申请
    Method for coating a substrate having holes 审中-公开
    涂布具有孔的基材的方法

    公开(公告)号:US20040048003A1

    公开(公告)日:2004-03-11

    申请号:US10659219

    申请日:2003-09-10

    Abstract: Prior art coating methods have the following drawback in that the dimensions of existing holes in the substrate are altered when coating them thereby limiting the function and effect of the hole and of the substrate. The inventive method for coating a substrate having holes makes it possible for holes to retain their dimensions due to the fact that they are protected by a plug.

    Abstract translation: 现有技术的涂覆方法具有以下缺点:当涂覆它们时,衬底中现有孔的尺寸被改变,从而限制了孔和衬底的功能和效果。 用于涂覆具有孔的基材的本发明的方法使得孔可以由于它们被塞子保护的事实而保持其尺寸。

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