PROTECTIVE FILM FORMING METHOD, AND SURFACE FLATTENING METHOD
    142.
    发明申请
    PROTECTIVE FILM FORMING METHOD, AND SURFACE FLATTENING METHOD 审中-公开
    保护膜形成方法和表面平滑方法

    公开(公告)号:US20130230663A1

    公开(公告)日:2013-09-05

    申请号:US13777310

    申请日:2013-02-26

    Applicant: ULVAC, INC.

    Abstract: A method for flattening a surface of a substrate in which a film formation surface has a recess and a convex and a method for forming a protective film by using a photo-curable organic thin film material are provided. A gas of an organic thin film material having photocurability is liquefied on the surface of a substrate having the recess and the convex and a liquid organic layer is grown on the surface of the substrate (first liquid layer growing step T1); and the growth is terminated when a liquid organic layer having a flat surface is formed (first growth termination step T2).

    Abstract translation: 提供了一种使成膜表面具有凹凸的基板的表面平坦化的方法和使用光固化型有机薄膜材料形成保护膜的方法。 具有光固化性的有机薄膜材料的气体在具有凹部的基板的表面液化并且在基板的表面(第一液层生长步骤T1)上生长液体有机层。 并且当形成具有平坦表面的液体有机层(第一生长终止步骤T2)时,生长终止。

    METHOD AND APPARATUS FOR ENABLING THE CURING OF THE COATING OF A PART BY MEANS OF FREE RADICALS GENERATED BY ULTRAVIOLET RADIATION (UV)
    143.
    发明申请
    METHOD AND APPARATUS FOR ENABLING THE CURING OF THE COATING OF A PART BY MEANS OF FREE RADICALS GENERATED BY ULTRAVIOLET RADIATION (UV) 审中-公开
    用于通过紫外线辐射(UV)产生的免费辐射来实现部分涂层的固化的方法和装置

    公开(公告)号:US20130129936A1

    公开(公告)日:2013-05-23

    申请号:US13812786

    申请日:2011-07-28

    CPC classification number: B05C9/12 B05D3/0466 B05D3/0486 B05D3/067

    Abstract: Apparatus for curing the coating of a workpiece (1), which comprises at least one tank (2) with inert gas heavier than air into which the workpiece (1) is inserted, and at least one UV-radiation source (3) that generates radiation that falls on the workpiece (1) to bring about the curing. The apparatus also comprises an extraction area (4), a recirculation circuit (5) and an insertion area (6), where, respectively, inert gas is extracted from the tank (2), recirculated, and reintroduced into the tank (2). At least one inert gas cooling member (7) is situated in the recirculation circuit (5), thus preventing the inert gas inside the tank (2) from overheating and reducing the risk of instability in the inert gas atmosphere.

    Abstract translation: 用于固化工件(1)的涂层的装置,其包括具有比工件(1)插入的空气更重的惰性气体的至少一个罐(2)和产生至少一个UV辐射源(3)的至少一个UV辐射源 落在工件(1)上以产生固化的辐射。 该设备还包括提取区域(4),再循环回路(5)和插入区域(6),其中惰性气体分别从储罐(2)中抽出,再循环并重新引入到罐(2)中, 。 至少一个惰性气体冷却构件(7)位于再循环回路(5)中,从而防止罐(2)内的惰性气体过热,并降低惰性气体气氛中不稳定的风险。

    SUBSTRATE TREATMENT APPARATUS AND METHOD FOR MANUFACTURING THIN FILM
    144.
    发明申请
    SUBSTRATE TREATMENT APPARATUS AND METHOD FOR MANUFACTURING THIN FILM 有权
    基板处理装置和制造薄膜的方法

    公开(公告)号:US20130059076A1

    公开(公告)日:2013-03-07

    申请号:US13643873

    申请日:2010-04-28

    Abstract: To provide a substrate treatment apparatus capable of suppressing adherence of dust to a film coated on a substrate. As an aspect of the present invention is a substrate treatment apparatus provided with a spin-coating treatment chamber 4a for coating a film on the substrate by spin-coating, a first air-conditioning mechanism that regulates an amount of dust in the air in the spin-coating treatment chamber, an annealing treatment chamber 7a for performing lamp annealing treatment on the film coated on the substrate, a conveying chamber 2a that is connected to each of the spin-coating treatment chamber and the annealing treatment chamber and is for conveying the substrate between the spin-coating treatment chamber and the annealing treatment chamber each other, and a second air-conditioning mechanism that regulate an amount of dust in the air in the conveying chamber.

    Abstract translation: 提供能够抑制灰尘对涂布在基材上的膜的粘附性的基板处理装置。 作为本发明的一个方面,提供一种基板处理装置,该基板处理装置具有旋转涂布处理室4a,用于通过旋转涂布在基板上涂覆膜;第一空调机构,其调节空气中的灰尘量 旋涂处理室,对涂布在基板上的膜进行灯退火处理的退火处理室7a,与旋涂处理室和退火处理室连接的输送室2a, 旋转涂布处理室和退火处理室之间的基板,以及调节输送室中的空气中的灰尘量的第二空调机构。

    Method for protecting silver and silver alloy surfaces against tarnishing
    145.
    发明申请
    Method for protecting silver and silver alloy surfaces against tarnishing 有权
    保护银和银合金表面免受玷污的方法

    公开(公告)号:US20120305141A1

    公开(公告)日:2012-12-06

    申请号:US13578241

    申请日:2011-02-23

    Applicant: Dario Narducci

    Inventor: Dario Narducci

    Abstract: A method for protecting silver and silver alloy surfaces against tarnishing, characterized by initially subjecting the surface to be treated to cleaning pre-treatment in organic solvents; immersing the cleaned surface in an acid solution able to ensure formation of a thin layer of silver oxide; immersing the oxidized surface in a solution of at least one thiol of formula CH3(CH2)nSH where n is between 10 and 16; and chemically reacting the molecules of said thiol with the previously oxidized silver surface, in an environment containing water vapor at a temperature of at least 50° C.

    Abstract translation: 一种用于保护银和银合金表面以防止变色的方法,其特征在于,首先使表面经过处理以清洁有机溶剂中的预处理; 将清洁的表面浸入能够确保形成薄层氧化银的酸溶液中; 将氧化的表面浸入至少一种式CH 3(CH 2)nSH的硫醇的溶液中,其中n在10和16之间; 以及在至少50℃的温度下在含有水蒸汽的环境中使所述硫醇的分子与先前氧化的银表面化学反应

    Mold for processing optical film and manufacturing method thereof
    147.
    发明授权
    Mold for processing optical film and manufacturing method thereof 失效
    光学薄膜加工用模具及其制造方法

    公开(公告)号:US08202452B2

    公开(公告)日:2012-06-19

    申请号:US12943018

    申请日:2010-11-10

    Applicant: Chia-Ling Hsu

    Inventor: Chia-Ling Hsu

    Abstract: A mold for processing optical film includes a substrate, a copper oxide film, and a hydrophobic fluorinated self-assembled monolayer film. The substrate has a copper surface. The copper oxide film is formed on the copper surface. The hydrophobic fluorinated self-assembled monolayer film is formed on the surface of the copper oxide film. The mold provides easy release of the hydrophobic fluorinated self-assembled monolayer film.

    Abstract translation: 用于处理光学膜的模具包括基板,氧化铜膜和疏水性氟化自组装单层膜。 基板具有铜表面。 在铜表面上形成氧化铜膜。 疏水性氟化自组装单层膜形成在氧化铜膜的表面上。 该模具提供疏水性氟化自组装单层膜的容易释放。

    Method for Hydrophilizing Surfaces of a Print head Assembly
    148.
    发明申请
    Method for Hydrophilizing Surfaces of a Print head Assembly 有权
    打印头组件的表面亲水化方法

    公开(公告)号:US20110296688A1

    公开(公告)日:2011-12-08

    申请号:US12794777

    申请日:2010-06-07

    Abstract: A method for hydrophilizing surfaces of a printhead assembly includes decontaminating the printhead assembly; plasma activating the surfaces of the printhead assembly; treating the surfaces of the printhead assembly with a treatment solution; drying the printhead assembly; baking the printhead assembly; and performing a print quality and electrical test on the printhead assembly. The step of decontaminating the printhead assembly is performed before the step of plasma activating the surfaces of the printhead assembly.

    Abstract translation: 一种用于使打印头组件的表面亲水化的方法包括净化打印头组件; 等离子体激活打印头组件的表面; 用处理溶液处理打印头组件的表面; 干燥打印头组件; 烘烤打印头组件; 并对打印头组件执行打印质量和电气测试。 在等离子体激活打印头组件的表面的步骤之前执行去污印刷头组件的步骤。

    Method and apparatus for curing coated film
    149.
    发明授权
    Method and apparatus for curing coated film 失效
    固化涂膜的方法和设备

    公开(公告)号:US08007874B2

    公开(公告)日:2011-08-30

    申请号:US11909044

    申请日:2006-03-15

    CPC classification number: B05C9/14 B05D3/0486 B05D3/067 B05D3/12 B05D2252/02

    Abstract: According to the method and the apparatus for curing a coated film of the present invention, since an ionization radiation is applied after the O2 concentration in the near-surface layer within 1 mm above the surface of the coated film is adjusted to 1000 ppm or lower, the coated film can be sufficiently cured by irradiation of the ionization radiation. In other words, according to the method and the apparatus for curing a coated film of the present invention, since the O2 concentration in a thin near-surface layer on the surface of a coated film is decreased, the coated film can be sufficiently cured by irradiation of an ionization radiation. As a result, the amount of inert gas supplied upon irradiation of an ionization radiation can be reduced, and downsizing and cost reduction of equipment can be achieved.

    Abstract translation: 根据本发明的涂膜固化方法和固化装置,由于在涂膜表面以上1mm以内的近表面层中的O2浓度调整为1000ppm以上,因此施加电离辐射 ,通过电离辐射的照射可以充分固化涂膜。 换句话说,根据本发明的涂膜固化方法和装置,由于涂膜表面的薄的近表面层中的O 2浓度降低,所以涂膜可以通过 照射电离辐射。 结果,可以减少在照射电离辐射时供应的惰性气体的量,并且可以实现设备的小型化和成本降低。

    Method for coating implantable medical devices
    150.
    发明授权
    Method for coating implantable medical devices 有权
    可植入医疗器械的涂敷方法

    公开(公告)号:US08007855B2

    公开(公告)日:2011-08-30

    申请号:US11825443

    申请日:2007-07-05

    Inventor: Stephen Pacetti

    CPC classification number: B05D3/0486 A61L31/10

    Abstract: A method of coating an implantable medical device is disclosed, the method includes applying a composition onto the device and drying the composition at elevated temperature in an environment having increased relative humidity.

    Abstract translation: 公开了一种涂覆可植入医疗装置的方法,该方法包括将组合物施加到装置上并在具有相对湿度增加的环境中在升高的温度下干燥组合物。

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