Abstract:
A method for generating an ultrashort charged particle beam, comprising creating a high intensity longitudinal E-field by shaping and tightly focusing, in an on-axis geometry, a substantially radially polarized laser beam, and using the high intensity longitudinal E-field for interaction with a medium to accelerate charged particles.
Abstract:
An apparatus for spin polarizing a particle beam is adapted to process an input particle beam in such a way as to generate an at least partially spin polarized output particle beam. A vortex beam generator for imparting orbital angular momentum to the input particle beam. An electromagnetic field generator generates a transverse magnetic field, space-variant and symmetric with respect to the axis of the input particle beam, in such a way as to change the spin of the particles and attach thereto different values of orbital angular momentum in dependence on their input spin values. A beam component separating group spatially separates the particles in dependence on their orbital angular momentum values, in such a way as to obtain the at least partially spin polarized output particle beam.
Abstract:
In an accelerating tube which uses a conductive insulator, there is a possibility that the dopant concentration on a surface of the conductive insulator becomes non-uniform so that the surface resistance of the conductive insulator becomes non-uniform. Accordingly, a circumferential groove is formed on the inner surface of the conductive insulator accelerating tube in plural stages, and metal is metalized along inner portions of the grooves. When the resistance of a specific portion on the surface of the accelerating tube differs from the resistance of an area around the specific portion, the potential of the metalized region on the inner surface of the accelerating tube becomes a fixed value and hence, the potential distribution on the inner surface of the accelerating tube in the vertical direction can be maintained substantially equal without regard to the circumferential direction.
Abstract:
According to certain embodiments, a linear accelerator comprises a nanotube, a particle, and an energy source. The nanotube has a cylindrical shape, and the particle is disposed within the nanotube. The energy source is configured to apply energy to the nanotube to cause the particle to accelerate.
Abstract:
An object of the present invention is to suppress measurement errors caused by the fact that the shrink amount due to scan of an electron beam differs pattern by pattern.To accomplish this object, according to the invention, functions indicative of a process of change of pattern dimension when the electron beam is irradiated on a sample are prepared in respect of the kinds of sample patterns, and dimension values of a particular pattern measured by scanning the electron beam on the particular pattern are fitted to a function prepared for the particular pattern to calculate a dimension of the particular pattern before it changes.
Abstract:
An electron source includes a planar emission region for generating an electron emission, and a focusing structure for focusing the electron emission into an electron beam.
Abstract:
The present invention provides a source of plurality of radiation types using a single source that is made of ferroelectric material in the form of a cathode. The generated radiation types consist of ion and electron beams, X-ray, visible light and ultraviolet radiation. These types allow testing the surface and bulk of the same medium while placed in the same location and are providing confirmation and independent measurements of the material properties. The cathode is made with a continuous electrode on one side and a grid shape electrode on the other. This cathode is supported with fixtures that are used to produce various radiation types. Also, control elements are used to define the shape and directivity of the emitted beam. The present invention eliminates the need for plurality of instruments for obtaining required properties of test materials covering both the surface and the bulk of the test medium. The disclosed source emits multiple types of charged particles and radiation using switchable electromechanical elements. The source performance is enhanced by use of a ferroelectric wafer with a high dielectric constant, and the control of the driving pulse shape. A set of stacks and arrays of multiplexed ferroelectric cathode wafers are used to offer various options in the design of the Ferrosource.
Abstract:
The invention relates to an electron beam exposure apparatus for transferring a pattern onto the surface of a target, comprising: a beamlet generator for generating a plurality of electron beamlets; a modulation array for receiving said plurality of electron beamlets, comprising a plurality of modulators for modulating the intensity of an electron beamlet; a controller, connected to the modulation array for individually controlling the modulators, an adjustor, operationally connected to each modulator, for individually adjusting the control signal of each modulator; a focusing electron optical system comprising an array of electrostatic lenses wherein each lens focuses a corresponding individual beamlet, which is transmitted by said modulation array, to a cross section smaller than 300 nm, and a target holder for holding a target with its exposure surface onto which the pattern is to be transferred in the first focal plane of the focusing electron optical system.
Abstract:
A thermoelectron generating source including a facial main cathode for emitting thermoelectrons by being heated from behind, a filament for heating the main cathode from behind to emit the thermoelectrons, an extraction electrode for extracting the thermoelectrons emitted from the main cathode under an electric field, the extraction electrode being provided near the front of the main cathode, and two deflecting electrodes and disposed on the left and right sides near the front of the extraction electrode to carry the extraction electrode. The potentials of the two deflecting electrodes are kept in a relation VL>VR≧0, where the potential of one deflecting electrode is VL and the potential of the other deflecting electrode is VR.
Abstract:
An electron source includes a planar emission region for generating an electron emission, and a focusing structure for focusing the electron emission into an electron beam.