Abstract:
To reduce artifacts in a surface exposed by a focused ion beam for viewing, a trench is milled next to the region of interest, and the trench is filled to create a bulkhead. The ion beam is directed through the bulkhead to expose a portion of the region of interest for viewing. The trench is filled, for example, by charged particle beam-induced deposition. The trench is typically milled and filled from the top down, and then the ion beam is angled with respect to the sample surface to expose the region of interest.
Abstract:
A method and apparatus for performing a slice and view technique with a dual beam system. The feature of interest in an image of a sample is located by machine vision, and the area to be milled and imaged in a subsequent slice and view iteration is determined through analysis of data gathered by the machine vision at least in part. A determined milling area may be represented as a bounding box around a feature, which dimensions can be changed in accordance with the analysis step. The FIB is then adjusted accordingly to slice and mill a new face in the subsequent slice and view iteration, and the SEM images the new face. Because the present invention accurately locates the feature and determines an appropriate size of area to mill and image, efficiency is increased by preventing the unnecessary milling of substrate that does not contain the feature of interest.
Abstract:
A method for performing high resolution electron microscopy of a soft matter object is described. The method comprises irradiating a soft matter object using an electron microscope having a spherical aberration correction with a substantially constant transfer function in a frequency band of thermal diffuse scattered electrons scattered at the soft matter object. The method comprises detecting the thermal diffuse scattered (TDS) electrons scattered at the soft matter, and using the detected thermal diffuse scattered electrons for deriving therefrom an image of the soft matter object.
Abstract:
A method for using differential imaging for applications involving TEM samples by allowing operators to take multiple images during a procedure involving a focused ion beam procedure and overlaying the multiple images to create a differential image that clearly shows the differences between milling steps. The methods also involve generating real-time images of the area being milled and using the overlays of the differential images to show small changes in each image, and thus highlight the ion beam milling location. The methods also involve automating the process of creating differential images and using them to automatically mill subsequent slices.
Abstract:
A method of calibrating a Scanning Transmission Charged-Particle Microscope, operable in a non-scanning mode, whereby said beam is relatively broad, and a scanning mode, whereby said beam is relatively narrow and an image is formed as a function of scan position of said beam, the method comprising: providing a calibration specimen on said specimen holder; in non-scanning mode, using said detector to form a calibration image of the calibration specimen, using a given configuration of said imaging system; utilizing a known dimension of said calibration specimen and comparing it to a corresponding dimension in said calibration image to calibrate a characteristic dimension of a field of view of said detector; and, in scanning mode, recording a beam pattern of said beam in the calibrated field of view of said detector, and examining the recorded beam pattern to derive a geometric aspect thereof.
Abstract:
A computed tomography imaging process, including: acquiring projection images of an object by detecting radiation that has passed through the object for respective different relative orientations of the object and the radiation; and processing the projection images to generate a tomogram of the object; wherein the radiation passes through the object in the form of a diverging beam, and the different relative orientations of the object and the beam of radiation define two or more complete trajectories of the beam along the object, the complete trajectories being mutually offset to reduce the degradation of spatial resolution in portions of the generated tomogram due to the divergence of the beam through the object.
Abstract:
A spectroscopic analysis method, comprising: Directing a beam of radiation onto a location P on a specimen, thereby causing a flux of X-rays to emanate from said location; Examining said flux using a detector arrangement, thus accruing a measured spectrum; Choosing a set of mutually different measurement directions d={dn} that originate from P, where n is a member of an integer sequence; Recording an output On of said detector arrangement for different values of dn, thus compiling a measurement set M={(On, dn)}; Adopting a spectral model On′ for On that is a convoluted mix of terms Band Lp, where: B is a substantially continuous spectral component associated with Bremsstrahlung; Lp is a substantially discrete spectral component associated with the specimen composition at location P; automatically deconvolving the measurement set Mon the basis of said spectral model On′ and distill Lp therefrom.
Abstract:
A single column charged particle source with user selectable configurations operates in ion-mode for FIB operations or electron mode for SEM operations. Equipped with an x-ray detector, energy dispersive x-ray spectroscopy analysis is possible. A user can selectively configure the source to prepare a sample in the ion-mode or FIB mode then essentially flip a switch selecting electron-mode or SEM mode and analyze the sample using EDS or other types of analysis.
Abstract:
A method and apparatus for aligning a laser beam coincident with a charged particle beam. The invention described provides a method for aligning the laser beam through the center of an objective lens and ultimately targeting the eucentric point of a multi-beam system. The apparatus takes advantage of components of the laser beam alignment system being positioned within and outside of the vacuum chamber of the charged particle system.
Abstract:
When preparing a Hole-Free Phase Plates (HFPP) a preferably featureless thin film should be placed with high accuracy in the diffraction plane of the TEM, or a plane conjugate to it. Two methods for accurately placing the thin film in said plane are described. One method uses a Ronchigram of the thin film while the TEM is in imaging mode, and the magnification of the Ronchigram is tuned so that the magnification in the middle of the Ronchigram is infinite. The second method uses electrons scattered by the thin film while the TEM is in diffraction mode. When the thin film does not coincide with the diffraction plane, electrons scattered by the thin film seem to originate from another location than the cross-over of the zero beam. This is observed as a halo. The absence of the halo is proof that the thin film coincides with the diffraction plane.