公开(公告)号：US20150357166A1

公开(公告)日：2015-12-10

申请号：US14734905

申请日：2015-06-09

Applicant: FEI Company

Inventor： Sean Kellogg ,  Anthony Graupera ,  William N. Parker ,  Andrew B. Wells ,  Mark W. Utlaut ,  Walter Skoczylas ,  Gregory A. Schwind ,  Noel Smith ,  Shouyin Zhang

IPC: H01J37/32 ,  H01J9/02

CPC classification number: H01J37/32605 ,  H01J9/02 ,  H01J27/16 ,  H01J37/04 ,  H01J37/08 ,  H01J2237/032

Abstract: An inductively coupled plasma charged particle source for focused ion beam systems includes a plasma reaction chamber with a removably attached source electrode. A fastening mechanism connects the source electrode with the plasma reaction chamber and allows for a heat-conductive, vacuum seal to form. With a removable source electrode, improved serviceability and reuse of the plasma source tube are now possible.

Abstract translation: 用于聚焦离子束系统的电感耦合等离子体带电粒子源包括具有可拆卸地附接的源电极的等离子体反应室。 紧固机构将源电极与等离子体反应室连接，并形成导热的真空密封。 使用可移动的源电极，现在可以提高等离子体源管的可用性和再利用。

公开(公告)号：US20150318140A1

公开(公告)日：2015-11-05

申请号：US14710205

申请日：2015-05-12

Applicant: FEI Company

Inventor： Noel Smith ,  Clive D. Chandler ,  Mark W. Utlaut ,  Paul P. Tesch ,  David William Tuggle

IPC: H01J37/08 ,  H01J37/30

CPC classification number: H01J37/3007 ,  C23C14/0031 ,  C23C14/221 ,  H01J27/16 ,  H01J37/08 ,  H01J37/305 ,  H01J37/3053 ,  H01J37/3056 ,  H01J37/3178 ,  H01J37/32082 ,  H01J37/3211 ,  H01J2237/006 ,  H01J2237/0817 ,  H01J2237/0827 ,  H01J2237/31 ,  H01J2237/31749

Abstract: The present invention provides a plasma ion beam system that includes multiple gas sources and that can be used for performing multiple operations using different ion species to create or alter submicron features of a work piece. The system preferably uses an inductively coupled, magnetically enhanced ion beam source, suitable in conjunction with probe-forming optics sources to produce ion beams of a wide variety of ions without substantial kinetic energy oscillations induced by the source, thereby permitting formation of a high resolution beam.

Abstract translation: 本发明提供了一种等离子体离子束系统，其包括多个气体源，并且可用于使用不同离子种类进行多个操作以产生或改变工件的亚微米特征。 该系统优选使用电感耦合的磁增强离子束源，其适合与探针形成光学源结合以产生各种离子的离子束，而不会由源引起的实质动能振荡，从而允许形成高分辨率 光束。

公开(公告)号：US09159534B2

公开(公告)日：2015-10-13

申请号：US14159227

申请日：2014-01-20

Applicant: FEI Company

Inventor： Anthony Graupera ,  Sean Kellogg ,  Mark W. Utlaut ,  N. William Parker

IPC: H01J27/00 ,  H01J37/30 ,  H01J37/08 ,  H01J37/18

CPC classification number: H01J37/3002 ,  H01J37/08 ,  H01J37/18 ,  H01J2237/006 ,  H01J2237/08 ,  H01J2237/0827

Abstract: An openable gas passage provides for rapid pumpout of process or bake out gases in an inductively coupled plasma source in a charged particle beam system. A valve, typically positioned in the source electrode or part of the gas inlet, increases the gas conductance when opened to pump out the plasma chamber and closes during operation of the plasma source.

Abstract translation: 可打开的气体通道提供在带电粒子束系统中的电感耦合等离子体源中快速抽出工艺或烘烤气体。 通常定位在源电极或气体入口的一部分中的阀在打开时增加气体导电性，以便在等离子体源的操作期间泵出等离子体室并关闭。

公开(公告)号：US20140306607A1

公开(公告)日：2014-10-16

申请号：US14159227

申请日：2014-01-20

Applicant: FEI Company

Inventor： Anthony Graupera ,  Sean Kellogg ,  Mark W. Utlaut ,  N. William Parker

IPC: H01J37/30

CPC classification number: H01J37/3002 ,  H01J37/08 ,  H01J37/18 ,  H01J2237/006 ,  H01J2237/08 ,  H01J2237/0827

Abstract: An openable gas passage provides for rapid pumpout of process or bake out gases in an inductively coupled plasma source in a charged particle beam system. A valve, typically positioned in the source electrode or part of the gas inlet, increases the gas conductance when opened to pump out the plasma chamber and closes during operation of the plasma source.

Abstract translation: 可打开的气体通道提供在带电粒子束系统中的电感耦合等离子体源中快速抽出工艺或烘烤气体。 通常定位在源电极或气体入口的一部分中的阀在打开时增加气体导电性，以便在等离子体源的操作期间泵出等离子体室并关闭。

公开(公告)号：US20130309421A1

公开(公告)日：2013-11-21

申请号：US13850721

申请日：2013-03-26

Applicant: FEI Company

Inventor： Noel Smith ,  Clive D. Chandler ,  Mark W. Utlaut ,  Paul P. Tesch ,  Dave Tuggle

IPC: H01J37/32 ,  H01J37/305 ,  C23C14/22

CPC classification number: H01J37/3007 ,  C23C14/0031 ,  C23C14/221 ,  H01J27/16 ,  H01J37/08 ,  H01J37/305 ,  H01J37/3053 ,  H01J37/3056 ,  H01J37/3178 ,  H01J37/32082 ,  H01J37/3211 ,  H01J2237/006 ,  H01J2237/0817 ,  H01J2237/0827 ,  H01J2237/31 ,  H01J2237/31749

Abstract: The present invention provides a plasma ion beam system that includes multiple gas sources and that can be used for performing multiple operations using different ion species to create or alter submicron features of a work piece. The system preferably uses an inductively coupled, magnetically enhanced ion beam source, suitable in conjunction with probe-forming optics sources to produce ion beams of a wide variety of ions without substantial kinetic energy oscillations induced by the source, thereby permitting formation of a high resolution beam.

公开(公告)号：US20130181140A1

公开(公告)日：2013-07-18

申请号：US13669626

申请日：2012-11-06

Applicant: FEI Company

Inventor： N. William Parker ,  Mark W. Utlaut ,  David William Tuggle ,  Jeremy Graham

IPC: G21K1/00

CPC classification number: G21K1/00 ,  H01J37/09 ,  H01J2237/045 ,  H01J2237/0453

Abstract: An improved beam-defining aperture structure and method for fabrication is realized. An aperture opening is made in a thin conductive film positioned over a cavity in a support substrate, where the aperture size and shape is determined by the opening in the conductive film and not determined by the substrate.

Abstract translation: 实现了改进的光束限定孔结构和制造方法。 开口开口形成在位于支撑衬底中的空腔上方的薄导电膜中，其中孔径尺寸和形状由导电膜中的开口确定并且不由衬底确定。

公开(公告)号：US20180190467A1

公开(公告)日：2018-07-05

申请号：US15901858

申请日：2018-02-21

Applicant: FEI Company

Inventor： N. William Parker ,  Mark W. Utlaut ,  Laurens Franz Taemsz Kwakman ,  Thomas G. Miller

IPC: H01J35/08 ,  G21K7/00 ,  G01N23/046

CPC classification number: H01J35/08 ,  G01N23/046 ,  G01N2223/204 ,  G01N2223/419 ,  G21K7/00 ,  H01J35/14 ,  H01J2235/081 ,  H01J2235/086

Abstract: An x-ray target, a method of using the x-ray target, and a computer program product with instructions for carrying out a method of using the x-ray target. The x-ray target includes a substrate made from a soft x-ray producing material and a high aspect ratio structure made from a hard x-ray producing material. The hard x-ray producing material is embedded in the substrate, formed on the substrate, cantilevered out from the edge of the substrate, or any combination thereof. The high aspect ratio structure comprises a plurality of high aspect ratio structures arranged in one or more grids or arrays, and the high aspect ratio structures in one of the one or more grids or arrays are arranged to form a Hadamard matrix structure.

公开(公告)号：US09934930B2

公开(公告)日：2018-04-03

申请号：US14645689

申请日：2015-03-12

Applicant: FEI Company

Inventor： N. William Parker ,  Mark W. Utlaut ,  Laurens Franz Taemsz Kwakman ,  Thomas G. Miller

IPC: H01J35/08 ,  G01N23/04 ,  G21K7/00 ,  H01J35/14

CPC classification number: H01J35/08 ,  G01N23/046 ,  G01N2223/204 ,  G01N2223/419 ,  G21K7/00 ,  H01J35/14 ,  H01J2235/081 ,  H01J2235/086

Abstract: An x-ray target, a method of using the x-ray target, and a computer program product with instructions for carrying out a method of using the x-ray target. The x-ray target includes a substrate made from a soft x-ray producing material and a high aspect ratio structure made from a hard x-ray producing material. The hard x-ray producing material is embedded in the substrate, formed on the substrate, cantilevered out from the edge of the substrate, or any combination thereof. The high aspect ratio structure comprises a plurality of high aspect ratio structures arranged in one or more grids or arrays, and the high aspect ratio structures in one of the one or more grids or arrays are arranged to form a Hadamard matrix structure.

公开(公告)号：US09494516B2

公开(公告)日：2016-11-15

申请号：US14721775

申请日：2015-05-26

Applicant: FEI Company

Inventor： N. William Parker ,  Mark W. Utlaut

IPC: G01N23/00 ,  G01N21/64 ,  H01J37/22 ,  H01J37/28 ,  G01N23/225 ,  H01J37/285

CPC classification number: G01N21/6428 ,  G01N21/6458 ,  G01N21/6486 ,  G01N23/225 ,  H01J37/228 ,  H01J37/28 ,  H01J37/285 ,  H01J2237/206 ,  H01J2237/2443 ,  H01J2237/24455 ,  H01J2237/2448 ,  H01J2237/2803 ,  H01J2237/2857

Abstract: A method and system for the imaging and localization of fluorescent markers such as fluorescent proteins or quantum dots within biological samples is disclosed. The use of recombinant genetics technology to insert “reporter” genes into many species is well established. In particular, green fluorescent proteins (GFPs) and their genetically-modified variants ranging from blue to yellow, are easily spliced into many genomes at the sites of genes of interest (GoIs), where the GFPs are expressed with no apparent effect on the functioning of the proteins of interest (PoIs) coded for by the GoIs. One goal of biologists is more precise localization of PoIs within cells. The invention is a method and system for enabling more rapid and precise PoI localization using charged particle beam-induced damage to GFPs. Multiple embodiments of systems for implementing the method are presented, along with an image processing method relatively immune to high statistical noise levels.

公开(公告)号：US20150369737A1

公开(公告)日：2015-12-24

申请号：US14721775

申请日：2015-05-26

Applicant: FEI Company

Inventor： William Parker ,  Mark W. Utlaut

IPC: G01N21/64 ,  H01J37/22 ,  H01J37/285 ,  G01N23/225

CPC classification number: G01N21/6428 ,  G01N21/6458 ,  G01N21/6486 ,  G01N23/225 ,  H01J37/228 ,  H01J37/28 ,  H01J37/285 ,  H01J2237/206 ,  H01J2237/2443 ,  H01J2237/24455 ,  H01J2237/2448 ,  H01J2237/2803 ,  H01J2237/2857

Abstract: A method and system for the imaging and localization of fluorescent markers such as fluorescent proteins or quantum dots within biological samples is disclosed. The use of recombinant genetics technology to insert “reporter” genes into many species is well established. In particular, green fluorescent proteins (GFPs) and their genetically-modified variants ranging from blue to yellow, are easily spliced into many genomes at the sites of genes of interest (GoIs), where the GFPs are expressed with no apparent effect on the functioning of the proteins of interest (PoIs) coded for by the GoIs. One goal of biologists is more precise localization of PoIs within cells. The invention is a method and system for enabling more rapid and precise PoI localization using charged particle beam-induced damage to GFPs. Multiple embodiments of systems for implementing the method are presented, along with an image processing method relatively immune to high statistical noise levels.

Abstract translation: 公开了用于生物样品中荧光标记如荧光蛋白或量子点的成像和定位的方法和系统。 使用重组遗传学技术将“记者”基因插入许多物种已经很成熟。 特别地，绿色荧光蛋白（GFP）及其从蓝色到黄色的遗传修饰的变体易于在感兴趣的基因（GoI）的位点处接合到许多基因组中，其中GFP表达对功能没有明显的影响 的由GoI编码的感兴趣的蛋白质（PoI）。 生物学家的一个目标是更精确地定位细胞内的PoI。 本发明是一种方法和系统，用于使得能够使用带电粒子束对GFP的损伤进行更快速和精确的PoI定位。 提出了用于实现该方法的系统的多个实施例，以及相对不受高统计噪声水平影响的图像处理方法。