Abstract:
In one aspect, the present invention provides a method of managing fluctuations in power supplied to a semiconductor processing apparatus that includes monitoring the power supplied to the apparatus to detect the occurrence of a power fluctuation event during a semiconductor processing session. Upon detection of a power fluctuation event, the semiconductor processing can be interrupted. After the end of the power fluctuation event, at least one operational parameter of the apparatus, e.g., vacuum level in an evacuated processing chamber, can be measured, and the semiconductor processing can be resumed when the measured operational parameter is within an acceptable range. The measured operational parameter can preferably include a parameter that recovers more slowly than others when adversely affected by a power fluctuation event.
Abstract:
Disclosed is an electron beam apparatus and method which can retain the state that minimizes the amount of water content contained at a gap between a high-voltage cable and a high-voltage introduction insulator to thereby prevent creation of high-voltage discharge and current leakage. The apparatus comprises a means for applying a high voltage to an acceleration electrode while eliminating electron release from an electron source and for detecting a change in an emission current corresponding to a change in an acceleration voltage at this time. In addition, the apparatus comprises a means for issuing a cautionary notice or warning when the change of this emission current exceeds a prespecified value. Further, the apparatus comprises a means for letting a dry gas flow in a gap portion between the electron gun's high-voltage cable and the high-voltage introduction insulator to thereby dehumidify said gap portion. With such an arrangement, it is possible to prevent high-voltage discharge due to an increase in water content of the gap portion and also instability of an electron beam due to a leakage current.
Abstract:
A charged particle generating apparatus including a first electrode, a second electrode, a current source supplying a current to the first electrode for heating the first electrode and a voltage source for generating an attraction voltage for generation of an electric field between the first electrode and the second electrode. The first electrode discharges charged particles as a result of the generation of the electric field between the first electrode and the second electrode. The apparatus further includes a heat current measurement unit for measuring the current for heating the first electrode, an electrode current measurement unit for measuring electrode current flowing through the second electrode in accordance with an amount of the charged particles discharged from the first electrode to the second electrode, and a power supply shut-down circuit for terminating at least one of the supply of the current for heating the first electrode and the generation of the attraction voltage based on the current measured by the heat current measurement unit or the electrode current measured by the electrode current measurement unit.
Abstract:
An electron gun for emitting an electron beam traveling along a beam axis includes a cathode having a tip, the tip having substantially a circular conic shape and a tip surface substantially at the beam axis, the cathode being applied with a first voltage, an anode having a first aperture substantially on the beam axis and being applied with a second voltage higher than the first voltage, a control electrode having a second aperture substantially on the beam axis and being applied with a voltage lower that the first voltage to control a current of the cathode, the second aperture being larger than the tip surface, a guide electrode having a third aperture substantially on the beam axis, being arranged between the cathode and the anode, and being applied with a voltage higher than the first voltage and lower than the second voltage, the third aperture being smaller than the tip surface, and a lens electrode having a fourth aperture substantially on the beam axis, being arranged between the guide electrode and the anode, and being applied with a voltage lower than the first voltage to form a cross-over image of the electron beam, the fourth aperture being larger than the third aperture.
Abstract:
A grounded metallic shield which comprises an electrode enclosing the filament leads and emitters of an e-Gun in a high vacuum chamber of the type used in melting and casting metals and other materials and evaporation sources. The shield is spaced from the filament leads and emitters a distance in the order of the electron mean free path for the pressure uses within the high vacuum chamber. The structure and method of use thereof suppresses or eliminates arc-downs or glow discharges.
Abstract:
A high-voltage power supply for an electron-beam gun with a heatable cathode and an anode and of the type having an electronic switch connected in the current circuit for the cathode and controllable for blocking the current to the cathode, includes an impulse protecting filter connected in the current circuit for the cathode. The filter comprises a capacitor connected in parallel to the cathode, a choke connected in series with the cathode current circuit, a blocking diode and a discharge resistor connected in series therewith, with the diode and resistor connected in parallel with the choke.
Abstract:
The diameter of an electron beam at a crossover point can be set to a predetermined value by adjusting a heater current through a heater of an electron gun and a voltage between an emitter of the electron gun and wehnelt electrode. The diameter of the electron beam incident onto an object to be exposed can be varied by varying the diameter of the electron beam at the crossover point. This can be done without adjusting an electron beam lens and deflection electrode of an electron beam exposing apparatus. The diameter of the electron beam incident onto an object to be exposed can be set to a predetermined value dependent upon a pattern to be described.
Abstract:
An electron beam unit for heat treatment by the electron bombardment technique wherein the resistor for limiting the discharge current arising in the vacuum chamber between the cathode and the accelerating electrode of the electron beam gun is connected between the positive pole of the power supply and the accelerating electrode, the accelerating electrode being insulated from the material being processed by means of an insulator.
Abstract:
An electron gun comprising a changeover chamber and changeover circuit between the gun chamber and the insulated cable which connects the power supply circuits to the electrodes which enables adjustment of electrode potentials to accomplish electrode treatment without excessive gun currents.
Abstract:
An arrangement for regulating the operating parameters of an electron beam generator in which the main cathode is indirectly heated by a directly-heated auxiliary cathode. A regulating circuit connected to the auxiliary cathode has three individual regulators connected in tandem for regulating the auxiliary cathode. Three separate signals corresponding to the accelerating voltage of the auxiliary cathode, the emission current of the auxiliary cathode, and the emission current of the main cathode are applied respectively to the inputs of the three individual regulators in feedback arrangement.