Abstract:
The present invention provides a charged particle beam energy width reduction system. The system comprises a first element (110) acting in a focusing and dispersive manner in an x-z-plane; a second element (112) acting in a focusing and dispersive manner in the x-z-plane; a charged particle selection element (116; 116a; 116b) positioned between the first and the second element acting in a focusing and dispersive manner; and a focusing element (114; 314, 712; 714) positioned between the first and the second element acting in a focusing and dispersive manner.
Abstract:
An emitter for a charged particle beam apparatus is provided, said emitter comprising a filament extending between and being attached to first and second supports, an emitter tip attached to the filament, and a stabilization element attached to a third support and to the filament, wherein the first, second and third supports define a triangle so that the stabilization element extends at least partially in a direction perpendicular to the direction in which the filament extends.
Abstract:
A deflection system (6) for a charged particle beam (2), in particular for rrangement in an objective lens for a charged particle beam device with a deflection means (60) for generating a magnetic field acting on the charged particle beam (2) and a shield (61) for avoiding eddy currents, which surrounds the deflection means and guides the formed outer magnetic field. The shield (61) consists, transversely to the direction of the charged particle beam (2), of at least one soft magnetic layer which is preferably formed as a strip material and rolled up to a cylinder together with an electrically insulating layer.
Abstract:
The invention relates to a scanning electron beam device in which at least one electrostatic reflector is provided for reflection of a secondary electron beam emitted by the primary electron beam on the object. This reflector is preferably located outside the beam path of the primary electron beam, and at least one electron-optical element which effects a preliminary deflection of the secondary electron beam by a small angle with respect to the beam path of the primary electron beam is provided between the object and the reflector. Such an arrangement makes it possible with comparatively low technical expenditure to reflect the secondary electron beam by a relatively large angle with respect to the unaffected primary electron beam which travels on a straight axis.
Abstract:
A charged particle detector arrangement is described. The detector arrangement includes a detection element and a collector electrode configured to collect charged particles released from the detection element upon impact of signal charged particles.
Abstract:
An emitter assembly for emitting a charged particle beam along an optical axis is described. The emitter assembly being housed in a gun chamber and includes an emitter having an emitter tip, wherein the emitter tip is positioned at a first plane perpendicular to the optical axis and wherein the emitter is configured to be biased to a first potential, an extractor having an opening, wherein the opening is positioned at a second plane perpendicular to the optical axis and wherein the extractor is configured to be biased to a second potential, wherein the second plane has a first distance from the first plane of 2.25 mm and above.
Abstract:
The invention provides a lens system for a plurality of charged particle beams. The lens system comprises an excitation coil providing a magnetic flux to a pole piece unit having a first pole piece, a second pole piece and at least two openings for charged particle beams, wherein the two openings are arranged in one row, thereby forming a lens row, and wherein the pole piece unit has an elongated shape.
Abstract:
A lens system for a plurality of charged particle beams comprises a lens body with a first pole piece, a second pole piece and a plurality of lens openings for the respective charged particle beams; a common excitation coil arranged around the plurality of lens openings for providing a respective first magnetic flux to the lens openings; and a compensation coil arranged between the lens openings for providing a respective second magnetic flux to at least some of the lens openings so as to compensate for an asymmetry of the first magnetic flux.
Abstract:
The present invention relates to a charged particle beam device (1) for inspecting or structuring a specimen (3) comprising a charged particle beam source (5) to generate a charged particle beam (7), a focussing lens (9) to focus the charged particle beam (7) onto the specimen (3), and an aperture system (13) for defining an aperture (6) for the charged particle beam (7). The aperture system (13) includes a first member (20) to block a first portion (7a) of the charged particle beam (7) between the charged particle beam source (5) and the focussing lens (9), a second member (30) to block a second portion (7b) of the charged particle beam (7) between the charged particle beam source (5) and the focussing lens (9), first means (24) for moving the first member (20) to adjust the size of the blocked first portion (7a) of the charged particle beam (7), and second means (34) for moving the second member (30) independently from the first portion (7b). With such aperture system (13), it is possible to freely adjust the size of the aperture (6) and align it to the optical axis (8) during operation.
Abstract:
The invention provides a lens system for a plurality of charged particle beams. Therein, at least one common excitation coil for at least two lens modules is provided. The lens modules comprise an first pole piece, a second pole piece and at least one opening for a charged particle beam. The lens modules constitute a component and share the excitation coil. Thereby, raw material availability, processing of work pieces and symmetry conditions for the lens fields are improved.