Charged particle beam energy width reduction system for charged particle beam system
    21.
    发明申请
    Charged particle beam energy width reduction system for charged particle beam system 有权
    带电粒子束系统的带电粒子束能量减小系统

    公开(公告)号:US20070069150A1

    公开(公告)日:2007-03-29

    申请号:US10571346

    申请日:2004-09-02

    CPC classification number: H01J37/05 H01J37/153 H01J2237/057 H01J2237/1534

    Abstract: The present invention provides a charged particle beam energy width reduction system. The system comprises a first element (110) acting in a focusing and dispersive manner in an x-z-plane; a second element (112) acting in a focusing and dispersive manner in the x-z-plane; a charged particle selection element (116; 116a; 116b) positioned between the first and the second element acting in a focusing and dispersive manner; and a focusing element (114; 314, 712; 714) positioned between the first and the second element acting in a focusing and dispersive manner.

    Abstract translation: 本发明提供一种带电粒子束能量减少系统。 该系统包括以x-z平面聚焦和分散的方式起作用的第一元件(110) 在x-z平面中以聚焦和分散方式起作用的第二元件(112); 位于第一和第二元件之间的带电粒子选择元件(116; 116a; 116b)以聚焦和分散方式起作用; 以及位于第一和第二元件之间的以聚焦和分散方式起作用的聚焦元件(114; 314,712; 714)。

    Stabilized emitter and method for stabilizing same
    22.
    发明申请
    Stabilized emitter and method for stabilizing same 审中-公开
    稳定发射体及其稳定方法

    公开(公告)号:US20060226753A1

    公开(公告)日:2006-10-12

    申请号:US11387090

    申请日:2006-03-22

    Abstract: An emitter for a charged particle beam apparatus is provided, said emitter comprising a filament extending between and being attached to first and second supports, an emitter tip attached to the filament, and a stabilization element attached to a third support and to the filament, wherein the first, second and third supports define a triangle so that the stabilization element extends at least partially in a direction perpendicular to the direction in which the filament extends.

    Abstract translation: 提供了一种用于带电粒子束装置的发射器,所述发射器包括在第一和第二支撑件之间延伸并连接到第一和第二支撑件的灯丝,连接到灯丝的发射极尖端以及连接到第三支撑件和灯丝的稳定元件,其中 第一,第二和第三支撑件限定三角形,使得稳定元件至少部分地沿垂直于灯丝延伸方向的方向延伸。

    Deflection system
    23.
    发明授权
    Deflection system 失效
    偏转系统

    公开(公告)号:US5847399A

    公开(公告)日:1998-12-08

    申请号:US876876

    申请日:1997-06-16

    CPC classification number: H01J37/147 H01J37/09 H01J2237/0264

    Abstract: A deflection system (6) for a charged particle beam (2), in particular for rrangement in an objective lens for a charged particle beam device with a deflection means (60) for generating a magnetic field acting on the charged particle beam (2) and a shield (61) for avoiding eddy currents, which surrounds the deflection means and guides the formed outer magnetic field. The shield (61) consists, transversely to the direction of the charged particle beam (2), of at least one soft magnetic layer which is preferably formed as a strip material and rolled up to a cylinder together with an electrically insulating layer.

    Abstract translation: 一种用于带电粒子束(2)的偏转系统(6),特别用于布置在用于产生作用在带电粒子束(2)上的磁场的偏转装置(60)的带电粒子束装置的物镜中, 以及用于避免涡流的屏蔽件(61),其围绕偏转装置并引导所形成的外部磁场。 至少一个软磁性层的横向于带电粒子束(2)的方向的屏蔽层(61),其优选地形成为带状材料并与电绝缘层一起卷绕到圆柱体上。

    Scanning electron beam device
    24.
    发明授权
    Scanning electron beam device 失效
    扫描电子束装置

    公开(公告)号:US5422486A

    公开(公告)日:1995-06-06

    申请号:US58959

    申请日:1993-05-07

    CPC classification number: H01J37/244 H01J2237/151

    Abstract: The invention relates to a scanning electron beam device in which at least one electrostatic reflector is provided for reflection of a secondary electron beam emitted by the primary electron beam on the object. This reflector is preferably located outside the beam path of the primary electron beam, and at least one electron-optical element which effects a preliminary deflection of the secondary electron beam by a small angle with respect to the beam path of the primary electron beam is provided between the object and the reflector. Such an arrangement makes it possible with comparatively low technical expenditure to reflect the secondary electron beam by a relatively large angle with respect to the unaffected primary electron beam which travels on a straight axis.

    Abstract translation: 本发明涉及一种扫描电子束装置,其中提供至少一个静电反射器用于反射由一次电子束在物体上发射的二次电子束。 该反射器优选位于一次电子束的光束路径的外侧,并且提供至少一个电子光学元件,该电子光学元件相对于一次电子束的光束路径以小的角度实现二次电子束的初步偏转 物体与反射体之间。 这样的布置使得相对于在直轴上行进的未受影响的一次电子束相对较大的角度反射二次电子束,可以以相对较低的技术支出反射二次电子束。

    CONTAMINATION REDUCTION ELECTRODE FOR PARTICLE DETECTOR
    25.
    发明申请
    CONTAMINATION REDUCTION ELECTRODE FOR PARTICLE DETECTOR 审中-公开
    用于颗粒检测器的污染减少电极

    公开(公告)号:US20130320228A1

    公开(公告)日:2013-12-05

    申请号:US13543568

    申请日:2012-07-06

    Applicant: Stefan Lanio

    Inventor: Stefan Lanio

    CPC classification number: H01J37/244 H01J37/28 H01J2237/022 H01J2237/2449

    Abstract: A charged particle detector arrangement is described. The detector arrangement includes a detection element and a collector electrode configured to collect charged particles released from the detection element upon impact of signal charged particles.

    Abstract translation: 描述带电粒子检测器装置。 检测器装置包括检测元件和收集器电极,其被配置为在信号带电粒子撞击时收集从检测元件释放的带电粒子。

    SIMPLIFIED PARTICLE EMITTER AND METHOD OF OPERATING THEREOF
    26.
    发明申请
    SIMPLIFIED PARTICLE EMITTER AND METHOD OF OPERATING THEREOF 审中-公开
    简化粒子发射器及其操作方法

    公开(公告)号:US20120091359A1

    公开(公告)日:2012-04-19

    申请号:US12910240

    申请日:2010-10-22

    Abstract: An emitter assembly for emitting a charged particle beam along an optical axis is described. The emitter assembly being housed in a gun chamber and includes an emitter having an emitter tip, wherein the emitter tip is positioned at a first plane perpendicular to the optical axis and wherein the emitter is configured to be biased to a first potential, an extractor having an opening, wherein the opening is positioned at a second plane perpendicular to the optical axis and wherein the extractor is configured to be biased to a second potential, wherein the second plane has a first distance from the first plane of 2.25 mm and above.

    Abstract translation: 描述了用于沿光轴发射带电粒子束的发射器组件。 发射器组件被容纳在枪室中并且包括具有发射极尖端的发射器,其中发射极尖端位于垂直于光轴的第一平面处,并且其中发射器被配置为偏置到第一电位,提取器具有 开口,其中所述开口定位在垂直于所述光轴的第二平面处,并且其中所述提取器构造成被偏置到第二电位,其中所述第二平面具有距离所述第一平面2.25mm及以上的第一距离。

    Multi-axis lens, beam system making use of the compound lens, and method of manufacturing the compound lens
    27.
    发明授权
    Multi-axis lens, beam system making use of the compound lens, and method of manufacturing the compound lens 有权
    使用复合透镜的多轴透镜,光束系统以及复合透镜的制造方法

    公开(公告)号:US08158954B2

    公开(公告)日:2012-04-17

    申请号:US12492610

    申请日:2009-06-26

    Applicant: Stefan Lanio

    Inventor: Stefan Lanio

    Abstract: The invention provides a lens system for a plurality of charged particle beams. The lens system comprises an excitation coil providing a magnetic flux to a pole piece unit having a first pole piece, a second pole piece and at least two openings for charged particle beams, wherein the two openings are arranged in one row, thereby forming a lens row, and wherein the pole piece unit has an elongated shape.

    Abstract translation: 本发明提供一种用于多个带电粒子束的透镜系统。 所述透镜系统包括向具有第一极片,第二极片和用于带电粒子束的至少两个开口的极片单元提供磁通的激励线圈,其中两个开口布置成一排,从而形成透镜 并且其中所述极靴单元具有细长形状。

    MULTI-AXIS LENS, BEAM SYSTEM MAKING USE OF THE COMPOUND LENS, AND METHOD OF MANUFACTURING THE COMPOUND LENS
    28.
    发明申请
    MULTI-AXIS LENS, BEAM SYSTEM MAKING USE OF THE COMPOUND LENS, AND METHOD OF MANUFACTURING THE COMPOUND LENS 有权
    多轴透镜,使用该化合物镜头的光束系统及其制造方法

    公开(公告)号:US20120037813A1

    公开(公告)日:2012-02-16

    申请号:US12856152

    申请日:2010-08-13

    Applicant: Stefan LANIO

    Inventor: Stefan LANIO

    Abstract: A lens system for a plurality of charged particle beams comprises a lens body with a first pole piece, a second pole piece and a plurality of lens openings for the respective charged particle beams; a common excitation coil arranged around the plurality of lens openings for providing a respective first magnetic flux to the lens openings; and a compensation coil arranged between the lens openings for providing a respective second magnetic flux to at least some of the lens openings so as to compensate for an asymmetry of the first magnetic flux.

    Abstract translation: 用于多个带电粒子束的透镜系统包括具有第一极靴,第二极靴和用于各个带电粒子束的多个透镜开口的透镜体; 布置在所述多个透镜开口周围的公共激励线圈,用于向所述透镜开口提供相应的第一磁通量; 以及补偿线圈,布置在透镜开口之间,用于向至少一些透镜开口提供相应的第二磁通量,以便补偿第一磁通量的不对称性。

    Charged particle beam device with aperture
    29.
    发明授权
    Charged particle beam device with aperture 有权
    带孔的带电粒子束装置

    公开(公告)号:US07763866B2

    公开(公告)日:2010-07-27

    申请号:US10576547

    申请日:2004-10-19

    CPC classification number: H01J37/09 H01J2237/0455

    Abstract: The present invention relates to a charged particle beam device (1) for inspecting or structuring a specimen (3) comprising a charged particle beam source (5) to generate a charged particle beam (7), a focussing lens (9) to focus the charged particle beam (7) onto the specimen (3), and an aperture system (13) for defining an aperture (6) for the charged particle beam (7). The aperture system (13) includes a first member (20) to block a first portion (7a) of the charged particle beam (7) between the charged particle beam source (5) and the focussing lens (9), a second member (30) to block a second portion (7b) of the charged particle beam (7) between the charged particle beam source (5) and the focussing lens (9), first means (24) for moving the first member (20) to adjust the size of the blocked first portion (7a) of the charged particle beam (7), and second means (34) for moving the second member (30) independently from the first portion (7b). With such aperture system (13), it is possible to freely adjust the size of the aperture (6) and align it to the optical axis (8) during operation.

    Abstract translation: 本发明涉及一种用于检查或构造包括带电粒子束源(5)以产生带电粒子束(7)的样本(3)的带电粒子束装置(1),聚焦透镜(9) 带电粒子束(7)到样品(3)上,以及孔径系统(13),用于限定带电粒子束(7)的孔(6)。 孔径系统(13)包括阻挡带电粒子束源(5)和聚焦透镜(9)之间的带电粒子束(7)的第一部分(7a)的第一构件(20),第二构件 30)阻挡带电粒子束源(5)和聚焦透镜(9)之间的带电粒子束(7)的第二部分(7b),第一装置(24)用于移动第一构件(20)以调整 带电粒子束(7)的阻挡的第一部分(7a)的尺寸以及用于独立于第一部分(7b)移动第二部件(30)的第二装置(34)。 利用这种孔径系统(13),可以在操作期间自由地调整孔径(6)的尺寸并将其对准光轴(8)。

    Multi-axis lens, beam system making use of the compound lens, and method of manufacturing the compound lens
    30.
    发明授权
    Multi-axis lens, beam system making use of the compound lens, and method of manufacturing the compound lens 有权
    使用复合透镜的多轴透镜,光束系统以及复合透镜的制造方法

    公开(公告)号:US07576917B2

    公开(公告)日:2009-08-18

    申请号:US10540178

    申请日:2003-12-12

    Applicant: Stefan Lanio

    Inventor: Stefan Lanio

    Abstract: The invention provides a lens system for a plurality of charged particle beams. Therein, at least one common excitation coil for at least two lens modules is provided. The lens modules comprise an first pole piece, a second pole piece and at least one opening for a charged particle beam. The lens modules constitute a component and share the excitation coil. Thereby, raw material availability, processing of work pieces and symmetry conditions for the lens fields are improved.

    Abstract translation: 本发明提供一种用于多个带电粒子束的透镜系统。 其中,提供至少一个用于至少两个透镜模块的公共激励线圈。 透镜模块包括第一极靴,第二极靴和用于带电粒子束的至少一个开口。 透镜模块构成一个部件并共享励磁线圈。 从而提高了原材料的可利用性,工件的加工和透镜领域的对称条件。

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