公开(公告)号：US20190062157A1

公开(公告)日：2019-02-28

申请号：US16015640

申请日：2018-06-22

Applicant: HITACHI, LTD.

Inventor： Keiji WATANABE ,  Hiroyasu SHICHI ,  Misuzu SAGAWA ,  Toshiyuki MINE ,  Daisuke RYUZAKI

IPC: B81C99/00 ,  B81C1/00 ,  H01J37/317 ,  H01J37/304 ,  H01J37/147 ,  G03F7/20

CPC classification number: B81C99/0025 ,  B81C1/00412 ,  B81C99/0065 ,  B81C2201/0143 ,  B81C2201/0159 ,  B81C2201/0198 ,  G03F7/2059 ,  H01J37/1474 ,  H01J37/304 ,  H01J37/3056 ,  H01J37/3174 ,  H01J2237/28 ,  H01J2237/31749 ,  H01J2237/31755 ,  H01J2237/31776

Abstract: The invention is to reduce non-uniformity of a processing shape over a wide range of a single field-of-view.The invention is directed to a method of processing micro electro mechanical systems with a first step and a second step in a processing apparatus including an irradiation unit that irradiates a sample with a charged particle beam, a shape measuring unit that measures a shape of the sample, and a control unit. In the first step, the irradiation unit irradiates a plurality of single field-of-view points with the charged particle beam in a first region of the sample, the shape measuring unit measures the shape of a spot hole formed in the first region of the sample, and the control unit sets, based on measurement results of the shape of the spot hole, a scan condition of the charged particle beam or a forming mask of the charged particle beam at each of the single field-of-view points. In the second step, the irradiation unit irradiates, based on the scan condition or the forming mask set in the first step, a second region of the sample with the charged particle beam.

公开(公告)号：US09910352B2

公开(公告)日：2018-03-06

申请号：US14702648

申请日：2015-05-01

Applicant: Patrick Seamus Doyle ,  Daniel Colin Pregibon ,  Dhananjay Dendukuri

Inventor： Patrick Seamus Doyle ,  Daniel Colin Pregibon ,  Dhananjay Dendukuri

IPC: G03F7/00 ,  G02B1/04 ,  H01B1/20 ,  H01F1/42

CPC classification number: G03F7/0037 ,  B81C99/0095 ,  B81C2201/0159 ,  G02B1/04 ,  G03F7/2012 ,  G03F7/2035 ,  G03F7/2053 ,  H01B1/20 ,  H01F1/42 ,  Y10T428/1352 ,  Y10T428/24 ,  Y10T428/24273 ,  Y10T428/24298

Abstract: In a method for synthesizing polymeric microstructures, a monomer stream is flowed, at a selected flow rate, through a fluidic channel. At least one shaped pulse of illumination is projected to the monomer stream, defining in the monomer stream a shape of at least one microstructure corresponding to the illumination pulse shape while polymerizing that microstructure shape in the monomer stream by the illumination pulse. An article of manufacture includes a non-spheroidal polymeric microstructure that has a plurality of distinct material regions.

公开(公告)号：US20170167878A1

公开(公告)日：2017-06-15

申请号：US15444127

申请日：2017-02-27

Applicant: Chinese Academy of Sciences Institute of Geology and Geophysics

Inventor： Lian Zhong Yu ,  Chen Sun

IPC: G01C19/5769 ,  B81C1/00 ,  B81B3/00 ,  G01C19/574

CPC classification number: G01C19/5769 ,  B81B3/0048 ,  B81B2201/0242 ,  B81B2203/0118 ,  B81B2203/0136 ,  B81C1/00531 ,  B81C2201/0132 ,  B81C2201/0159 ,  B81C2201/0176 ,  B81C2203/0118 ,  G01C19/574 ,  G01C19/5747

Abstract: A MEMS anti-phase vibratory gyroscope includes two measurement masses with a top cap and a bottom cap each coupled with a respective measurement mass. The measurement masses are oppositely coupled with each other in the vertical direction. Each measurement mass includes an outer frame, an inner frame located within the outer frame, and a mass located within the inner frame. The two measurement masses are coupled with each other through the outer frame. The inner frame is coupled with the outer frame by a plurality of first elastic beams. The mass is coupled with the inner frame by a plurality of second elastic beams. A comb coupling structure is provided along opposite sides of the outer frame and the inner frame. The two masses vibrate toward the opposite direction, and the comb coupling structure measures the angular velocity of rotation.

公开(公告)号：US09566610B2

公开(公告)日：2017-02-14

申请号：US14122576

申请日：2012-05-18

Applicant: Raluca Tiron ,  Stéphanie Gaugiran ,  Xavier Chevalier ,  Serge Tedesco

Inventor： Raluca Tiron ,  Stéphanie Gaugiran ,  Xavier Chevalier ,  Serge Tedesco

IPC: B05D5/00 ,  B81C1/00 ,  H01L21/027 ,  H01L21/033

CPC classification number: B05D5/00 ,  B81C1/00031 ,  B81C2201/0149 ,  B81C2201/0159 ,  H01L21/0273 ,  H01L21/0337

Abstract: A method for making patterns on the surface of a substrate by graphoepitaxy, includes depositing a layer of resin on the surface of the substrate; making patterns in the resin on the surface of a substrate; curing the patterns in the resin by producing a layer of amorphous carbon on the surface of the patterns in the resin; depositing a layer of statistical copolymer after curing the patterns in the resin; grafting the layer of statistical copolymer onto the patterns in the resin by annealing; and depositing a layer of a block copolymer into the spaces defined by the patterns in the resin after curing the patterns and the grafting of the layer of statistical copolymer.

Abstract translation: 一种用于通过石刻电泳法在衬底表面上制作图案的方法，包括在衬底的表面上沉积一层树脂; 在基板表面上的树脂中形成图案; 通过在树脂中的图案的表面上产生无定形碳层来固化树脂中的图案; 在固化树脂中的图案之后沉积一层统计共聚物; 通过退火将统计共聚物层接枝到树脂上的图案上; 以及在固化图案和统计共聚物层的接枝之后，将一层嵌段共聚物沉积在由树脂中的图案限定的空间中。

公开(公告)号：US20150050746A1

公开(公告)日：2015-02-19

申请号：US14527039

申请日：2014-10-29

Applicant: CALIFORNIA INSTITUTE OF TECHNOLOGY

Inventor： Michael D. HENRY ,  Andrew P. HOMYK ,  Axel SCHERER ,  Thomas A. TOMBRELLO ,  Sameer WALAVALKAR

IPC: G01N1/40

CPC classification number: B81C1/00111 ,  B01J19/0046 ,  B01J2219/00504 ,  B01J2219/00664 ,  B81B1/006 ,  B81B2203/0361 ,  B81B2207/056 ,  B81C2201/0112 ,  B81C2201/0132 ,  B81C2201/0133 ,  B81C2201/0159 ,  G01N1/405 ,  H01L21/3065 ,  H01L21/30655 ,  H01L21/3081 ,  H01L21/3086 ,  Y10T436/25375

Abstract: Methods for fabricating of high aspect ratio probes and deforming micropillars and nanopillars are described. Use of polymers in deforming nanopillars and micropillars is also described.

Abstract translation: 描述了制造高纵横比探针和变形微柱和纳米柱的方法。 还描述了聚合物在变形纳米柱和微柱体中的使用。

公开(公告)号：US08641404B2

公开(公告)日：2014-02-04

申请号：US13554288

申请日：2012-07-20

Applicant: Sunghoon Kwon ,  SeungAh Lee ,  Wook Park ,  Su Eun Chung

Inventor： Sunghoon Kwon ,  SeungAh Lee ,  Wook Park ,  Su Eun Chung

IPC: B28B7/30

CPC classification number: G03F7/70341 ,  B29C64/106 ,  B29L2031/756 ,  B33Y30/00 ,  B81C99/0095 ,  B81C2201/0159 ,  F15B7/08 ,  F15B15/10 ,  G03B27/54 ,  G03F7/20 ,  G03F7/70416

Abstract: An optofluidic lithography system including a membrane, a microfluidic channel, and a pneumatic chamber is provided. The membrane may be positioned between a pneumatic chamber and a microfluidic channel. The microfluidic channel may have a height corresponding to a displacement of the membrane and have a fluid flowing therein, the fluid being cured by light irradiated from the bottom to form a microstructure. The pneumatic chamber may induce the displacement of the membrane depending on an internal atmospheric pressure thereof.

Abstract translation: 提供了包括膜，微流体通道和气动室的光流体光刻系统。 膜可以位于气动室和微流体通道之间。 微流体通道可以具有对应于膜的位移的高度并且具有在其中流动的流体，流体由从底部照射的光固化以形成微结构。 气动室可以根据其内部大气压力而引起膜的移位。

公开(公告)号：US20130265730A1

公开(公告)日：2013-10-10

申请号：US13910340

申请日：2013-06-05

Applicant: THE AEROSPACE CORPORATION

Inventor： Henry Helvajian

IPC: H05K7/02

CPC classification number: H05K7/02 ,  B01J19/0093 ,  B01J2219/00824 ,  B01J2219/00835 ,  B01J2219/00853 ,  B01J2219/00941 ,  B01J2219/00948 ,  B01L3/502707 ,  B01L2300/0654 ,  B01L2300/0681 ,  B01L2300/0867 ,  B01L2300/0874 ,  B81B7/0077 ,  B81B2207/07 ,  B81B2207/092 ,  B81B2207/095 ,  B81B2207/096 ,  B81C99/0095 ,  B81C2201/0143 ,  B81C2201/0159 ,  G02B2006/12035 ,  G02B2006/12171 ,  H01P3/121 ,  H05K1/0306 ,  H05K1/16 ,  H05K1/162 ,  H05K1/165 ,  H05K3/0023 ,  H05K3/101 ,  Y10T29/42 ,  Y10T29/49002 ,  Y10T29/49005 ,  Y10T29/4908

Abstract: A photostructurable ceramic is processed using photostructuring process steps for embedding devices within a photostructurable ceramic volume, the devices may include one or more of chemical, mechanical, electronic, electromagnetic, optical, and acoustic devices, all made in part by creating device material within the ceramic or by disposing a device material through surface ports of the ceramic volume, with the devices being interconnected using internal connections and surface interfaces.

Abstract translation: 使用用于将器件嵌入可光可陶瓷陶瓷体积内的光学结构化工艺步骤来处理可光电陶瓷，该器件可以包括化学，机械，电子，电磁，光学和声学设备中的一种或多种，​​所有这些都部分地通过在 陶瓷或通过陶瓷体的表面端口设置器件材料，使用内部连接和表面接口互连这些器件。

公开(公告)号：US07655383B2

公开(公告)日：2010-02-02

申请号：US11510276

申请日：2006-08-24

Applicant: Petra Mela ,  Marcell Ott ,  Joachim Spatz ,  Blazej Gorzolnik ,  Martin Möller

Inventor： Petra Mela ,  Marcell Ott ,  Joachim Spatz ,  Blazej Gorzolnik ,  Martin Möller

IPC: G03F7/00

CPC classification number: B81C1/00206 ,  B81C2201/0159 ,  B82Y30/00 ,  G03F7/0047 ,  G03F7/033 ,  G03F7/038 ,  G03F7/0384 ,  G03F7/0751 ,  G03F7/165

Abstract: The present invention relates to a photochemical method for manufacturing nanometrically surface-decorated substrates, i.e. the creation of periodic and aperiodic patterns of highly ordered inorganic nanostructures on a substrate. This method is based on the selective photochemical modification of a self-assembled monolayer of metal compound loaded polymer core-shell systems on widely variable substrates. Light exposure through an appropriate mask causes selective chemical modification of the polymer core shell system. By subsequently placing the substrate in an appropriate chemical solution that eradicates the non-modified polymer, the pattern given by the used mask is reproduced on the surface. Finally, the remaining organic matrix is removed and metal salt is transformed to the single metal or metal oxide nanodots by means of gas plasma treatment.

Abstract translation: 本发明涉及一种用于制造纳米表面装饰的衬底的光化学方法，即在衬底上产生高度有序的无机纳米结构的周期性和非周期性图案。 该方法基于在广泛变化的基底上的金属化合物负载的聚合物核 - 壳体系的自组装单层的选择性光化学修饰。 通过适当的掩模的曝光导致聚合物核壳体系统的选择性化学改性。 通过随后将衬底放置在消除未改性聚合物的合适的化学溶液中，使用的掩模给出的图案在表面上再现。 最后，除去剩余的有机基质，通过气体等离子体处理将金属盐转变成单一金属或金属氧化物纳米点。

公开(公告)号：US20090324904A1

公开(公告)日：2009-12-31

申请号：US12524946

申请日：2008-02-04

Applicant: Thomas G. Mason

Inventor： Thomas G. Mason

IPC: B32B3/10 ,  G03F7/20

CPC classification number: B81C99/008 ,  B81C3/002 ,  B81C3/005 ,  B81C2201/0149 ,  B81C2201/0159 ,  B81C2203/057 ,  G03F7/40 ,  Y10T428/24802

Abstract: Producing composite structures includes dispersing a first plurality of objects, a second plurality of objects, and a third plurality of objects in a fluid, the third and second plurality of objects having an average maximum dimension that is smaller than the first plurality of objects The first plurality of objects comprise a first, a second, a third and a forth object, each having mating surface regions The first and second objects' mating surfaces are complimentary and the third and forth objects' mating surfaces are complementary The first and second object aggregate together in response to the dispersing of the second plurality of objects in the fluid due to a depletion attraction between the first and the second object The third and forth object aggregate together in response to dispersing the third plurality of objects in the fluid due to a depletion attraction between the third and the fourth object

Abstract translation: 生产复合结构包括将第一多个物体，第二多个物体和第三多个物体分散在流体中，第三和第二多个物体具有小于第一多个物体的平均最大尺寸。第一 多个物体包括具有配合表面区域的第一，第二，第三和第四物体。第一和第二物体的配合表面是互补的，并且第三和第四物体的配合表面是互补的。第一和第二物体聚集在一起 响应于由于第一和第二物体之间的耗尽引力而使第二多个物体在流体中的分散。第三和第四个物体响应于由于耗尽吸力而将第三多个物体分散在流体中而聚集在一起 在第三和第四个物体之间

公开(公告)号：US07368228B2

公开(公告)日：2008-05-06

申请号：US10742276

申请日：2003-12-19

Applicant: Michael C. Weisberg

Inventor： Michael C. Weisberg

IPC: G03F7/00

CPC classification number: G03F7/00 ,  B33Y10/00 ,  B81C1/00492 ,  B81C2201/0159 ,  B81C2201/0197 ,  G03F7/0035

Abstract: A method of creating a microelectromechanical systems (MEMS) device includes applying a layer of photoresist to a lower layer to create a multilayer MEMS device. The method includes transferring the layer of photoresist to the lower layer. The method can also include spincoating the photoresist onto a release layer, softbaking the spincoated photoresist to at least partially dry it, transferring the photoresist to form a layer of the multilayer MEMS device, and exposing the photoresist to light to crosslink it. The multilayer MEMS device includes a plurality of layers of photoresist.

Abstract translation: 创建微机电系统（MEMS）装置的方法包括将光致抗蚀剂层施加到下层以产生多层MEMS器件。 该方法包括将光致抗蚀剂层转移到下层。 该方法还可以包括将光致抗蚀剂旋涂到剥离层上，将旋涂的光致抗蚀剂软化至少部分地干燥，转移光致抗蚀剂以形成多层MEMS器件的层，并将光致抗蚀剂曝光以使其交联。 多层MEMS器件包括多层光致抗蚀剂。