公开(公告)号：US20120097863A1

公开(公告)日：2012-04-26

申请号：US13381623

申请日：2010-06-04

Applicant: Norihide Saho ,  Hiroyuki Tanaka ,  Noriaki Arai ,  Hiroyasu Shichi ,  Yoichi Ose

Inventor： Norihide Saho ,  Hiroyuki Tanaka ,  Noriaki Arai ,  Hiroyasu Shichi ,  Yoichi Ose

IPC: H01J37/26 ,  H01J37/20

CPC classification number: H01J37/08 ,  H01J37/28 ,  H01J2237/002 ,  H01J2237/0216 ,  H01J2237/061 ,  H01J2237/0807

Abstract: Provided are a large-current and highly stable gas field ionization ion source, and a high-resolution ion microscope with a large focal depth.The present invention relates to an ion microscope provided with a gas field ionization ion source, in which disposed are a refrigerator for cooling the gas field ionization ion source independent of the main body of the ion microscope, and a refrigerant circulation circuit cooling mechanism for circulating a refrigerant between the gas field ionization ion source and the refrigerator. Consequently it is possible to reduce the mechanical vibration of the refrigerator, which propagates to the gas field ionization ion source, and to achieve both the improvement of the brightness of the ion source and the improvement of ion beam focusing performance.

Abstract translation: 提供大电流和高度稳定的气田电离离子源，以及具有大焦深的高分辨率离子显微镜。 本发明涉及一种具有气田电离离子源的离子显微镜，其中设置有用于冷却与离子显微镜主体无关的气田电离离子源的制冷机，以及用于循环的制冷剂循环回路冷却机构 气体离子源和冰箱之间的制冷剂。 因此，可以减小传播到气田电离离子源的冰箱的机械振动，并且实现离子源的亮度的提高和离子束聚焦性能的提高。

公开(公告)号：US20110315890A1

公开(公告)日：2011-12-29

申请号：US13226931

申请日：2011-09-07

Applicant: DIETER WINKLER ,  Thomas Jasinski

Inventor： DIETER WINKLER ,  Thomas Jasinski

IPC: H01J27/02 ,  B23P11/00

CPC classification number: F25D19/006 ,  F25B2500/13 ,  H01J27/26 ,  H01J37/08 ,  H01J37/28 ,  H01J2237/002 ,  H01J2237/0216 ,  H01J2237/061 ,  H01J2237/0807 ,  Y10T29/49826

Abstract: A gas field ion source is described for a charged particle beam device having a charged particle beam column. The gas field ion source includes an emitter unit, a cooling unit, and a thermal conductivity unit for thermal conductivity from the cooling unit to the emitter unit, wherein the thermal conductivity unit is adapted for reduction of vibration transfer from the cooling unit to the emitter unit.

Abstract translation: 对具有带电粒子束柱的带电粒子束装置描述了气体场离子源。 气体离子源包括发射器单元，冷却单元和用于从冷却单元到发射器单元的导热性的导热单元，其中导热单元适于减少从冷却单元到发射极的振动传递 单元。

公开(公告)号：US20110266465A1

公开(公告)日：2011-11-03

申请号：US13144620

申请日：2010-01-08

Applicant: Hiroyasu Shichi ,  Shinichi Matsubara ,  Norihide Saho ,  Noriaki Arai ,  Tohru Ishitani

Inventor： Hiroyasu Shichi ,  Shinichi Matsubara ,  Norihide Saho ,  Noriaki Arai ,  Tohru Ishitani

IPC: G01N23/00

CPC classification number: H01J37/08 ,  H01J27/26 ,  H01J37/15 ,  H01J2237/0216 ,  H01J2237/0807 ,  H01J2237/28

Abstract: Provided is an ion beam device provided with a gas electric field ionization ion source which can prevent an emitter tip from vibrating in a non-contact manner. The gas electric field ionization ion source is comprised of an emitter tip (21) for generating ions; an emitter base mount (64) for supporting the emitter tip; an ionizing chamber which has an extraction electrode (24) opposed to the emitter tip and which is configured so as to surround the emitter tip (21); and a gas supply tube (25) for supplying gas to the vicinity of the emitter tip. The emitter base mount and a vacuum container magnetically interact with each other.

Abstract translation: 提供了一种具有气体电离电离离子源的离子束装置，其能够防止发射极尖端以非接触的方式振动。 气体电场离子源由用于产生离子的发射极尖端（21）组成; 发射极底座（64），用于支撑发射器尖端; 电离室具有与发射极尖端相对的引出电极（24），其构造为围绕发射极尖端（21）; 以及用于将气体供给到发射极尖端附近的气体供给管（25）。 发射极基座和真空容器彼此磁性相互作用。

公开(公告)号：US07956333B2

公开(公告)日：2011-06-07

申请号：US12457929

申请日：2009-06-25

Applicant: Ting-Wei Lin

Inventor： Ting-Wei Lin

IPC: G21K5/10

CPC classification number: H01J37/3171 ,  H01J37/023 ,  H01J37/20 ,  H01J2237/0216 ,  H01J2237/20221 ,  H01J2237/20257

Abstract: A moving module of a wafer ion-implanting machine includes a wafer carrier, a moving shaft, a base, a pair of first magnets, a fixture body, and a plurality of second magnets. One end of the wafer carrier is pivotally connected to a wafer tray; and the other end is fixed onto one end of the moving shaft. The base is fixed to the other end of the moving shaft. The moving shaft drives the wafer carrier and the base to move lengthwise. The pair of first magnets is fixed to the base. The fixture body is located between the pair of first magnets. The second magnets are fixed onto the fixture body and one of them forms compelling magnetic force between one of the first magnets. Thereby, the friction generated by contacting any of the first magnets with the fixture body can be prevented, thus increasing the production yield.

Abstract translation: 晶片离子注入机的移动模块包括晶片载体，移动轴，基座，一对第一磁体，夹具本体和多个第二磁体。 晶片载体的一端枢转地连接到晶片托盘; 另一端固定在移动轴的一端。 底座固定在移动轴的另一端。 移动轴驱动晶片载体和基座纵向移动。 一对第一磁体固定在基座上。 夹具本体位于一对第一磁体之间。 第二磁体被固定在夹具本体上，其中之一在第一磁体之间形成强制磁力。 因此，可以防止通过使任何第一磁体与夹具本体接触而产生的摩擦，从而提高产量。

公开(公告)号：US07932494B2

公开(公告)日：2011-04-26

申请号：US12397042

申请日：2009-03-03

Applicant: Nan Zhang

Inventor： Nan Zhang

IPC: G21K7/00

CPC classification number: H01J37/261 ,  H01J2237/0216 ,  H01J2237/282

Abstract: A method of characterizing the vibrational performance of a charged particle beam microscope system having at least one encoder is disclosed. The encoder is part of a control system for controlling the speed of a stage whereupon a sample is secured for imaging. A plurality of images each corresponding to a specific encoder working frequency are analyzed to generate imaged pattern vibration amplitude information over an imaging time period. The generated imaged pattern vibration amplitude information is then transformed to generate an imaged pattern vibration amplitude information over a range of encoder working frequencies. Information of system vibrational performance is then derived from the encoder working frequency-based vibration amplitude information. As a result, the vibrational performance of the system is characterized to describe the system vibrational behavior in terms of imaged pattern vibration amplitudes at varying working frequencies of the encoder.

Abstract translation: 公开了一种表征具有至少一个编码器的带电粒子束显微镜系统的振动性能的方法。 编码器是控制系统的一部分，用于控制用于成像的样品固定的阶段的速度。 分析对应于特定编码器工作频率的多个图像，以在成像时间周期上生成成像图案振幅信息。 然后生成的成像图案振幅信息被变换以在编码器工作频率的范围上生成成像图案振幅信息。 然后从编码器工作频率振动幅度信息中得出系统振动性能的信息。 结果，系统的振动性能的特征在于描述了在编码器的变化的工作频率下的成像图案振幅的系统振动特性。

公开(公告)号：US20090001266A1

公开(公告)日：2009-01-01

申请号：US12209079

申请日：2008-09-11

Applicant: JUERGEN FROSIEN

Inventor： JUERGEN FROSIEN

IPC: G01N23/00

CPC classification number: H01J37/08 ,  H01J37/30 ,  H01J2237/0216 ,  H01J2237/061 ,  H01J2237/06316 ,  H01J2237/06341 ,  H01J2237/08 ,  H01J2237/0807 ,  H01J2237/26

Abstract: The present invention provides a charged particle beam apparatus with a charged particle beam source including an emitter with an emitter tip; and supporting member for supporting the emitter. Further, the apparatus includes an emitter location-measuring device for repeatedly measuring the location of the emitter; and a deflector system for compensating variations in the location of the emitter.

Abstract translation: 本发明提供带电粒子束装置，带电粒子束源包括具有发射极尖端的发射极; 以及用于支撑发射器的支撑构件。 此外，该装置包括用于反复测量发射器的位置的发射器位置测量装置; 以及用于补偿发射器位置变化的偏转器系统。

公开(公告)号：US20080308729A1

公开(公告)日：2008-12-18

申请号：US12216160

申请日：2008-06-30

Applicant: Toshifumi Kimba ,  Tohru Satake ,  Tsutomu Karimata ,  Kenji Watanabe ,  Nobuharu Noji ,  Takeshi Murakami ,  Masahiro Hatakeyama ,  Mamoru Nakasuji ,  Hirosi Sobukawa ,  Shoji Yoshikawa ,  Shin Oowada ,  Mutsumi Saito

Inventor： Toshifumi Kimba ,  Tohru Satake ,  Tsutomu Karimata ,  Kenji Watanabe ,  Nobuharu Noji ,  Takeshi Murakami ,  Masahiro Hatakeyama ,  Mamoru Nakasuji ,  Hirosi Sobukawa ,  Shoji Yoshikawa ,  Shin Oowada ,  Mutsumi Saito

IPC: G01N23/20

CPC classification number: H01J37/222 ,  G01N23/225 ,  G01N23/2251 ,  H01J37/06 ,  H01J37/073 ,  H01J37/185 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/0216 ,  H01J2237/082 ,  H01J2237/2002 ,  H01J2237/2007 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/22 ,  H01J2237/24564 ,  H01J2237/2806 ,  H01J2237/2813 ,  H01J2237/2816 ,  H01J2237/2817 ,  H01L2224/48227 ,  H01L2924/01019 ,  H01L2924/01025 ,  H01L2924/01057 ,  H01L2924/01067 ,  H01L2924/01078 ,  H01L2924/10253 ,  H01L2924/12032 ,  H01L2924/3025 ,  H01L2924/00

Abstract: A substrate inspection apparatus 1-1 (FIG. 1) of the present invention performs the following steps of: carrying a substrate “S” to be inspected into an inspection chamber 23-1; maintaining a vacuum in said inspection chamber; isolating said inspection chamber from a vibration; moving successively said substrate by means of a stage 26-1 with at least one degree of freedom; irradiating an electron beam having a specified width; helping said electron beam reach to a surface of said substrate via a primary electron optical system 10-1; trapping secondary electrons emitted from said substrate via a secondary electron optical system 20-1 and guiding it to a detecting system 35-1; forming a secondary electron image in an image processing system based on a detection signal of a secondary electron beam obtained by said detecting system; detecting a defective location in said substrate based on the secondary electron image formed by said image processing system; indicating and/or storing said defective location in said substrate by CPU 37-1; and taking said completely inspected substrate out of the inspection chamber. Thereby, the defect inspection on the substrate can be performed successively with high level of accuracy and efficiency as well as with higher throughput.

Abstract translation: 本发明的基板检查装置1-1（图1）执行以下步骤：将要检查的基板“S”运送到检查室23-1中; 在所述检查室中保持真空; 将所述检查室与振动隔离; 通过具有至少一个自由度的平台26-1连续移动所述衬底; 照射具有指定宽度的电子束; 帮助所述电子束经由一次电子光学系统10-1到达所述衬底的表面; 通过二次电子光学系统20-1捕获从所述衬底发射的二次电子并将其引导到检测系统35-1; 基于由所述检测系统获得的二次电子束的检测信号，在图像处理系统中形成二次电子图像; 基于由所述图像处理系统形成的二次电子图像检测所述基板中的缺陷位置; 通过CPU37-1指示和/或存储所述衬底中的所述缺陷位置; 并将完全检查的基板从检查室中取出。 因此，可以以高水平的精度和效率以及更高的生产量连续地执行基板上的缺陷检查。

公开(公告)号：US07351970B2

公开(公告)日：2008-04-01

申请号：US11344804

申请日：2006-02-01

Applicant: Hirofumi Miyao

Inventor： Hirofumi Miyao

IPC: H01J37/244

CPC classification number: H01J37/28 ,  G01N23/225 ,  H01J37/153 ,  H01J2237/0216 ,  H01J2237/20292 ,  H01J2237/221

Abstract: There is disclosed a scanning electron microscope capable of removing the effects of vibrations on image information easily and reliably by detecting variations in the relative position between a specimen chamber holding a specimen therein and the specimen stage. The microscope has an image-processing portion that obtains information about the relative position between the specimen stage and the specimen chamber from a measurement unit when the beam is scanned. Based on the information about the relative position, a pixel position-correcting unit makes corrections to pixel positions indicated by the image information obtained by the scanning. An image creation unit creates image elements to eliminate pixel dropouts or pixel duplication produced by the aforementioned corrections. An image extraction unit extracts an image to be displayed.

Abstract translation: 公开了一种扫描电子显微镜，其能够通过检测保持试样的样本室与样品台之间的相对位置的变化，容易且可靠地消除振动对图像信息的影响。 显微镜具有图像处理部，当扫描光束时，从测量单元获取关于样品台和样品室之间的相对位置的信息。 基于关于相对位置的信息，像素位置校正单元对由扫描获得的图像信息指示的像素位置进行修正。 图像创建单元创建图像元素以消除由上述校正产生的像素遗漏或像素复制。 图像提取单元提取要显示的图像。

公开(公告)号：US20070085035A1

公开(公告)日：2007-04-19

申请号：US11582848

申请日：2006-10-18

Applicant: Jurgen Frosien

Inventor： Jurgen Frosien

IPC: A61N5/00

CPC classification number: H01J37/08 ,  H01J37/30 ,  H01J2237/0216

Abstract: A charged particle beam apparatus with a charged particle beam source including an emitter with an emitter tip and a supporting member for supporting the emitter is provided. Further, the apparatus includes an emitter location measuring device for repeatedly measuring the location of the emitter and a deflector system for compensating variations in the location of the emitter.

Abstract translation: 提供一种具有带电粒子束源的带电粒子束装置，其包括具有发射极尖端的发射极和用于支撑发射极的支撑构件。 此外，该装置包括用于重复测量发射器的位置的发射器位置测量装置和用于补偿发射器的位置变化的偏转器系统。

公开(公告)号：US07151269B2

公开(公告)日：2006-12-19

申请号：US11125317

申请日：2005-05-10

Applicant: Santokh Singh Bhadare ,  Ian Richard Barkshire ,  Daniel Frank Turner

Inventor： Santokh Singh Bhadare ,  Ian Richard Barkshire ,  Daniel Frank Turner

IPC: H01J37/28

CPC classification number: H01J37/02 ,  H01J2237/0216 ,  H01J2237/2001 ,  H01J2237/2817

Abstract: A sample inspection apparatus comprises a sample support; a detection system for detecting radiation emitted by or transmitted through a sample on the sample support in response to radiation incident on the sample; and a cooling system for cooling at least one of the sample support and detection system. The cooling system includes at least one oscillating, mechanical component which oscillates at a frequency different from the at least one of the support and detection system.

Abstract translation: 样品检查装置包括样品支架; 检测系统，用于响应于入射到样品上的辐射，检测由样品载体上的样品发射或透过样品的辐射; 以及用于冷却样品支撑和检测系统中的至少一个的冷却系统。 该冷却系统包括至少一个振荡的机械部件，该振动机械部件以与支撑和检测系统中的至少一个不同的频率振荡。