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    Excited gas injection for ion implant control
    21.
    发明授权
    Excited gas injection for ion implant control 有权
    激发气体注入用于离子注入控制

    公开(公告)号：US08501624B2

    公开(公告)日：2013-08-06

    申请号：US12328096

    申请日：2008-12-04

    Applicant: Bon-Woong Koo ,  Victor Benveniste ,  Christopher A. Rowland ,  Craig R. Chaney ,  Frank Sinclair ,  Neil J. Bassom

    Inventor： Bon-Woong Koo ,  Victor Benveniste ,  Christopher A. Rowland ,  Craig R. Chaney ,  Frank Sinclair ,  Neil J. Bassom

    IPC: H01L21/302 ,  H01L21/461

    CPC classification number: H01J27/022 ,  H01J37/08 ,  H01J37/3171 ,  H01J37/32357 ,  H01J37/32412 ,  H01J37/32422 ,  H01J2237/006 ,  H01J2237/061 ,  H01J2237/0815 ,  H01J2237/24514

    Abstract: An ion source that utilizes exited and/or atomic gas injection is disclosed. In an ion beam application, the source gas can be used directly, as it is traditionally supplied. Alternatively or additionally, the source gas can be altered by passing it through a remote plasma source prior to being introduced to the ion source chamber. This can be used to create excited neutrals, heavy ions, metastable molecules or multiply charged ions. In another embodiment, multiple gasses are used, where one or more of the gasses are passed through a remote plasma generator. In certain embodiments, the gasses are combined in a single plasma generator before being supplied to the ion source chamber. In plasma immersion applications, plasma is injected into the process chamber through one or more additional gas injection locations. These injection locations allow the influx of additional plasma, produced by remote plasma sources external to the process chamber.

    Abstract translation: 公开了一种利用离子源和/或原子气体注入的离子源。 在离子束施加中，源气体可以直接使用，如通常提供的。 或者或另外，源气体可以在被引入离子源室之前通过将其通过远程等离子体源来改变。 这可以用于产生兴奋的中性粒子，重离子，亚稳分子或多电荷离子。 在另一个实施例中，使用多个气体，其中一个或多个气体通过远程等离子体发生器。 在某些实施方案中，气体在被提供给离子源室之前组合在单个等离子体发生器中。 在等离子体浸渍应用中，通过一个或多个另外的气体注入位置将等离子体注入到处理室中。 这些注入位置允许通过处理室外部的远程等离子体源产生的附加等离子体的流入。

    Charged particle source with integrated energy filter
    22.
    发明授权
    Charged particle source with integrated energy filter 有权
    带集成能量滤波器的带电粒子源

    公开(公告)号：US08461525B2

    公开(公告)日：2013-06-11

    申请号：US13198640

    申请日：2011-08-04

    Applicant: Alexander Henstra

    Inventor： Alexander Henstra

    IPC: H01J3/26 ,  H01J40/00

    CPC classification number: H01J37/05 ,  H01J3/027 ,  H01J3/04 ,  H01J37/063 ,  H01J2237/045 ,  H01J2237/057 ,  H01J2237/061 ,  H01J2237/08 ,  H01J2237/15 ,  H01J2237/1534

    Abstract: A particle source in which energy selection occurs by sending a beam of electrically charged particles eccentrically through a lens so that energy dispersion will occur in an image formed by the lens. By projecting this image onto a slit in an energy selecting diaphragm, it is possible to allow only particles in a limited portion of the energy spectrum to pass. Consequently, the passed beam will have a reduced energy spread. The energy dispersed spot is imaged on the slit by a deflector. When positioning the energy dispersed spot on the slit, central beam is deflected from the axis to such an extent that it is stopped by the energy selecting diaphragm. Hereby reflections and contamination resulting from this beam in the region after the diaphragm are avoided. Also electron-electron interaction resulting from the electrons from the central beam interacting with the energy filtered beam in the area of deflector is avoided.

    Abstract translation: 通过使透过透镜偏心地发送带电粒子的束使能量分散发生在由透镜形成的图像中而发生能量选择的粒子源。 通过将该图像投影到能量选择隔膜的狭缝上，可以仅允许能谱范围的有限部分中的粒子通过。 因此，通过的光束将具有减小的能量扩展。 能量分散点通过偏转器在狭缝上成像。 当将能量分散点定位在狭缝上时，中心束从轴线偏转到其被能量选择隔膜停止的程度。 因此避免了在隔膜之后的区域中由该光束产生的反射和污染。 避免了来自中心束的电子的电子 - 电子相互作用，与偏转器区域中的能量过滤光束相互作用。

    GAS FIELD IONIZATION ION SOURCE APPARATUS AND SCANNING CHARGED PARTICLE MICROSCOPE EQUIPPED WITH SAME
    26.
    发明申请
    GAS FIELD IONIZATION ION SOURCE APPARATUS AND SCANNING CHARGED PARTICLE MICROSCOPE EQUIPPED WITH SAME 审中-公开
    气体放电离子源装置和扫描带有粒子的微粒显微镜

    公开(公告)号：US20120132802A1

    公开(公告)日：2012-05-31

    申请号：US13381638

    申请日：2010-06-08

    Applicant: Noriaki Arai ,  Tohru Ishitani

    Inventor： Noriaki Arai ,  Tohru Ishitani

    IPC: H01J27/02 ,  H01J37/26

    CPC classification number: H01J27/26 ,  H01J37/023 ,  H01J37/08 ,  H01J37/28 ,  H01J2237/006 ,  H01J2237/061 ,  H01J2237/0807

    Abstract: A gas field ionization ion source apparatus is provided which is small-sized, has high-performance, and is capable of performing a tilt adjustment in a state in which an emitter tip position is maintained approximately constant. An emitter (1) is surrounded by a chamber wall (4) of an emitter chamber and ions are emitted from the tip of the emitter (1). A gas that is an ion material is introduced into the emitter chamber, through an extraction electrode (3) to which a high voltage is applied and a tube (15). The emitter (1) is cooled by a freezing means (10) through a metallic net (11) and an emitter base (12). The emitter base (12) is fixed to a movable portion (13a) of a tilting means (13). The movable portion (13a) is connected to a non-movable portion (13b) through a sliding surface (14). The sliding surface (14) forms a part of a cylindrical surface whose central axis is an axis that passes through the tip of the emitter (1) and is orthogonal to an optical axis. If the surface forms such a shape, and the amount of sliding of the sliding surface (14) is controlled, control on the tilt of the emitter (1) can be performed without moving the tip of the emitter (1).

    Abstract translation: 提供了一种小型化，高性能的气体电离离子源装置，并且能够在发射极尖端位置保持大致恒定的状态下进行倾斜调整。 发射器（1）被发射器室的室壁（4）包围，离子从发射器（1）的尖端发射。 作为离子材料的气体通过施加高电压的引出电极（3）和管（15）引入发射室。 发射器（1）由冷冻装置（10）通过金属网（11）和发射极基座（12）冷却。 发射极基座（12）固定在倾斜装置（13）的可动部分（13a）上。 可移动部分（13a）通过滑动表面（14）连接到不可移动部分（13b）。 滑动表面（14）形成圆柱形表面的一部分，其中心轴是穿过发射器（1）的尖端并与光轴正交的轴线。 如果表面形成这样的形状，并且控制滑动表面（14）的滑动量，则可以在不移动发射器（1）的尖端的情况下执行对发射器（1）的倾斜的控制。

    ION MICROSCOPE
    28.
    发明申请
    ION MICROSCOPE 有权
    离子显微镜

    公开(公告)号：US20120097863A1

    公开(公告)日：2012-04-26

    申请号：US13381623

    申请日：2010-06-04

    Applicant: Norihide Saho ,  Hiroyuki Tanaka ,  Noriaki Arai ,  Hiroyasu Shichi ,  Yoichi Ose

    Inventor： Norihide Saho ,  Hiroyuki Tanaka ,  Noriaki Arai ,  Hiroyasu Shichi ,  Yoichi Ose

    IPC: H01J37/26 ,  H01J37/20

    CPC classification number: H01J37/08 ,  H01J37/28 ,  H01J2237/002 ,  H01J2237/0216 ,  H01J2237/061 ,  H01J2237/0807

    Abstract: Provided are a large-current and highly stable gas field ionization ion source, and a high-resolution ion microscope with a large focal depth.The present invention relates to an ion microscope provided with a gas field ionization ion source, in which disposed are a refrigerator for cooling the gas field ionization ion source independent of the main body of the ion microscope, and a refrigerant circulation circuit cooling mechanism for circulating a refrigerant between the gas field ionization ion source and the refrigerator. Consequently it is possible to reduce the mechanical vibration of the refrigerator, which propagates to the gas field ionization ion source, and to achieve both the improvement of the brightness of the ion source and the improvement of ion beam focusing performance.

    Abstract translation: 提供大电流和高度稳定的气田电离离子源，以及具有大焦深的高分辨率离子显微镜。 本发明涉及一种具有气田电离离子源的离子显微镜，其中设置有用于冷却与离子显微镜主体无关的气田电离离子源的制冷机，以及用于循环的制冷剂循环回路冷却机构 气体离子源和冰箱之间的制冷剂。 因此，可以减小传播到气田电离离子源的冰箱的机械振动，并且实现离子源的亮度的提高和离子束聚焦性能的提高。

    Ion source apparatus
    29.
    发明授权
    Ion source apparatus 失效
    离子源装置

    公开(公告)号：US08143590B2

    公开(公告)日：2012-03-27

    申请号：US12838309

    申请日：2010-07-16

    Applicant: Tsai-Cheng Wang ,  Chin-Chung Yang ,  An-Ting Hsiao ,  Yu-Li Tsai

    Inventor： Tsai-Cheng Wang ,  Chin-Chung Yang ,  An-Ting Hsiao ,  Yu-Li Tsai

    IPC: H01J49/10 ,  H01J37/08 ,  H01J7/24

    CPC classification number: H01J27/08 ,  H01J37/08 ,  H01J2237/0041 ,  H01J2237/022 ,  H01J2237/061

    Abstract: An ion source apparatus has an ion source assembly and a neutralizer. The ion source assembly has a body, a heat-dissipating device, an anode chunk and a gas distributor. The heat-dissipating device has a thermal transfer plate and a first thermal side sheet. The thermal transfer plate has a top, a protrusion and an annular disrupting recess. The protrusion is formed at the top of the thermal transfer plate. The disrupting recess is radially formed around the protrusion. The first thermal side sheet surrounds the protrusion. The gas distributor is mounted securely in the protrusion. Because the protrusion is located between the gas distributor and the first thermal side sheet and the disrupting recess is radially formed around the protrusion, accumulated ions, molecules and deposition film particles are longitudinally disrupted and do not form a short circuit between the gas distributor and the first thermal side sheet.

    Abstract translation: 离子源装置具有离子源组件和中和器。 离子源组件具有主体，散热装置，阳极块和气体分配器。 散热装置具有热转印板和第一热侧片。 热转印板具有顶部，突起和环形破坏凹部。 突起形成在热转印板的顶部。 破裂凹部围绕突起径向地形成。 第一热侧片围绕突起。 气体分配器牢固地安装在突起中。 因为突起位于气体分配器和第一热侧片之间，并且破裂凹部围绕突起径向地形成，所以累积的离子，分子和沉积膜颗粒被纵向破坏，并且不会在气体分布器和 第一热侧片。

    Ion source
    30.
    发明申请
    Ion source 有权
    离子源

    公开(公告)号：US20120013249A1

    公开(公告)日：2012-01-19

    申请号：US12804277

    申请日：2010-07-19

    Applicant: Manuel A. Jerez

    Inventor： Manuel A. Jerez

    IPC: H01J27/08 ,  H01J61/04 ,  H01J1/88

    CPC classification number: H01J27/08 ,  H01J37/08 ,  H01J2237/061 ,  H01J2237/082 ,  H01J2237/31701

    Abstract: A cathode sub-assembly is comprised of a retainer, a cathode and a collar, each of which has smooth unthreaded surfaces that slidably engage each other. A shield serves to hold the sub-assembly in a support plate. The cathode projects from the sub-assembly into an arc chamber with a tortuous path created therebetween for passage of a plasma flow.

    Abstract translation: 阴极子组件包括保持器，阴极和套环，其中每个具有可滑动地彼此接合的平滑无螺纹表面。 屏蔽件用于将子组件保持在支撑板中。 阴极从子组件突出到具有在其间形成的曲折路径的电弧室，用于通过等离子体流。

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