中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

37 records (took 0.015 seconds)

    INSPECTION APPARATUS
    21.
    发明申请
    INSPECTION APPARATUS 审中-公开
    检查装置

    公开(公告)号：US20150097116A1

    公开(公告)日：2015-04-09

    申请号：US14571594

    申请日：2014-12-16

    Applicant: EBARA CORPORATION

    Inventor： Masahiro HATAKEYAMA ,  Yasushi TOMA ,  Shoji YOSHIKAWA ,  Kiwamu TSUKAMOTO

    IPC: H01J37/22 ,  H01J37/28

    CPC classification number: H01J37/22 ,  G01N23/2251 ,  G01N2223/204 ,  G01N2223/611 ,  H01J3/024 ,  H01J37/075 ,  H01J37/28 ,  H01J2237/063 ,  H01J2237/2448 ,  H01J2237/2806

    Abstract: An inspection apparatus includes: beam generation means for generating any of charged particles and electromagnetic waves as a beam; a primary optical system that guides the beam into an inspection object held in a working chamber and irradiates the inspection object with the beam; a secondary optical system that detects secondary charged particles occurring from the inspection object; and an image processing system that forms an image on the basis of the detected secondary charged particles. The primary optical system includes a photoelectron generator having a photoelectronic surface. The base material of the photoelectronic surface is made of material having a higher thermal conductivity than the thermal conductivity of quartz.

    Abstract translation: 检查装置包括：用于产生任何带电粒子和电磁波作为光束的光束产生装置; 主光学系统，其将光束引导到保持在工作室中的检查对象中，并用该光束照射检查对象; 第二光学系统，其检测从检查对象发生的次级带电粒子; 以及基于检测到的二次带电粒子形成图像的图像处理系统。 主光学系统包括具有光电子表面的光电子发生器。 光电子表面的基材由具有比石英热导率更高的导热性的材料制成。

    Electron source for ionization with leakage current suppression
    23.
    发明授权
    Electron source for ionization with leakage current suppression 失效
    具有泄漏电流抑制的电离源

    公开(公告)号：US07701123B2

    公开(公告)日：2010-04-20

    申请号：US11301588

    申请日：2005-12-13

    Applicant: Gregory J. Wells ,  Edward G. Marquette

    Inventor： Gregory J. Wells ,  Edward G. Marquette

    IPC: H01J9/02

    CPC classification number: H01J49/14 ,  H01J3/024 ,  H01J49/08

    Abstract: An electron source includes a first electrode, a second electrode, a thermionic element interposed between and electrically isolated from the first electrode and the second electrode, and a guard electrode interposed between and electrically isolated from the first electrode and the second electrode. The thermionic element and the guard electrode may be at substantially the same voltage. Another electron source includes a first electrode, a second electrode, a thermionic element interposed between and electrically isolated from the first electrode and the second electrode, and a thermal expansion component interposed between and electrically isolated from the first electrode and the second electrode. The thermal expansion component may be heated to cause expansion. The heating may be cycled to cause alternating expansion and contraction.

    Abstract translation: 电子源包括插入在第一电极和第二电极之间并且与第一电极和第二电极电绝缘的第一电极，第二电极和热电离元件，以及插入在第一电极和第二电极之间并与之电隔离的保护电极。 热电离元件和保护电极可以处于基本上相同的电压。 另一电子源包括介于第一电极和第二电极之间并与之电隔离的第一电极，第二电极和热电离元件，以及介于第一电极和第二电极之间并与之电隔离的热膨胀组件。 热膨胀部件可能被加热以引起膨胀。 可以循环加热以引起交替的膨胀和收缩。

    ELECTRON BEAM GENERATOR, IMAGE APPARATUS INCLUDING THE SAME AND OPTICAL APPARATUS
    28.
    发明申请
    ELECTRON BEAM GENERATOR, IMAGE APPARATUS INCLUDING THE SAME AND OPTICAL APPARATUS 有权
    电子束发生器，包括其的图像装置和光学装置

    公开(公告)号：US20160260575A1

    公开(公告)日：2016-09-08

    申请号：US15059199

    申请日：2016-03-02

    Applicant: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE

    Inventor： Moon Youn JUNG ,  Dong Hoon SONG ,  Jin Sun KIM

    IPC: H01J37/06 ,  H01J37/244

    CPC classification number: H01J37/06 ,  H01J3/024 ,  H01J2237/049 ,  H01J2237/061 ,  H01J2237/06325 ,  H01J2237/06366 ,  H01J2237/0656 ,  H01J2237/2482

    Abstract: Provided may include an electron beam generator, an image apparatus including the same, and an optical apparatus. The optical apparatus includes a first and second laser apparatuses providing a first and second laser beams on a substrate, and a first optical system provided between the first and second laser apparatuses and the substrate to focus the first and second laser beams. The first and second laser beams overlap with each other generating an interference beam, thereby decreasing a spot size of the interference beam to be smaller than a wavelength of each of the first and second laser beams at a focal point.

    Abstract translation: 可以提供电子束发生器，包括该电子束发生器的图像装置和光学装置。 光学装置包括在基板上提供第一和第二激光束的第一和第二激光装置，以及设置在第一和第二激光装置与基板之间以使第一和第二激光束聚焦的第一光学系统。 第一和第二激光束彼此重叠，产生干涉光束，从而将干涉光束的光点尺寸减小为小于焦点处的第一和第二激光束的波长的波长。

    Electron gun, method of controlling same, and electron beam additive manufacturing machine
    29.
    发明授权
    Electron gun, method of controlling same, and electron beam additive manufacturing machine 有权
    电子枪，控制方法以及电子束添加剂制造机

    公开(公告)号：US09269520B2

    公开(公告)日：2016-02-23

    申请号：US14621526

    申请日：2015-02-13

    Applicant: JEOL Ltd.

    Inventor： Takashi Satoh

    IPC: H01J29/58 ,  H01J3/08 ,  H01J3/02 ,  H01J37/063 ,  H01J37/305 ,  B23K15/00 ,  B23K15/06 ,  B33Y30/00

    CPC classification number: H01J3/08 ,  B22F3/1055 ,  B23K15/002 ,  B23K15/0026 ,  B23K15/0086 ,  B23K15/06 ,  B33Y30/00 ,  H01J3/02 ,  H01J3/024 ,  H01J3/027 ,  H01J37/063 ,  H01J37/305 ,  H01J2237/06308 ,  H01J2237/065 ,  H01J2237/3128 ,  Y02P10/295

    Abstract: There is disclosed a method of controlling an electron gun without causing decreases in brightness of the electron beam if a current-limiting aperture cannot be used. The electron gun (10) has a cathode (11), a Wehnelt electrode (12), a control electrode (13), an anode (14), and a controller (22). The Wehnelt electrode (12) has a first opening (12c) in which the tip of the cathode is inserted, and focuses thermal electrons emitted from the tip of the cathode (11). The thermal electrons emitted from the tip of the cathode (11) are caused to pass into a second opening (13c) by the control electrode (13). The anode (14) accelerates the thermal electrons emitted from the cathode (11) such that the thermal electrons passed through the second opening (13c) pass through a third opening (14b) and impinge as an electron beam (B1) on a powdered sample (8). The controller (22) sets the bias voltage and the control voltage based on combination conditions of the bias voltage and control voltage to maintain the brightness of the beam constant.

    Abstract translation: 如果不能使用限流孔，则公开了一种控制电子枪而不引起电子束亮度降低的方法。 电子枪（10）具有阴极（11），Wehnelt电极（12），控制电极（13），阳极（14）和控制器（22）。 Wehnelt电极（12）具有插入阴极顶端的第一开口（12c），并聚焦从阴极（11）的尖端发射的热电子。 从阴极（11）的顶端发射的热电子被控制电极（13）通入第二开口（13c）。 阳极（14）加速从阴极（11）发射的热电子，使得穿过第二开口（13c）的热电子通过第三开口（14b）并作为电子束（B1）撞击在粉末样品上 （8）。 控制器（22）基于偏置电压和控制电压的组合条件设置偏置电压和控制电压，以保持光束的亮度恒定。

    Inspection apparatus
    30.
    发明授权
    Inspection apparatus 有权
    检验仪器

    公开(公告)号：US08946629B2

    公开(公告)日：2015-02-03

    申请号：US14258607

    申请日：2014-04-22

    Applicant: Ebara Corporation

    Inventor： Masahiro Hatakeyama ,  Yasushi Toma ,  Shoji Yoshikawa ,  Kiwamu Tsukamoto

    IPC: G01N23/00 ,  G21K7/00 ,  H01J37/28

    CPC classification number: H01J37/22 ,  G01N23/2251 ,  G01N2223/204 ,  G01N2223/611 ,  H01J3/024 ,  H01J37/075 ,  H01J37/28 ,  H01J2237/063 ,  H01J2237/2448 ,  H01J2237/2806

    Abstract: An inspection apparatus includes: beam generation means for generating any of charged particles and electromagnetic waves as a beam; a primary optical system that guides the beam into an inspection object held in a working chamber and irradiates the inspection object with the beam; a secondary optical system that detects secondary charged particles occurring from the inspection object; and an image processing system that forms an image on the basis of the detected secondary charged particles. The primary optical system includes a photoelectron generator having a photoelectronic surface. The base material of the photoelectronic surface is made of material having a higher thermal conductivity than the thermal conductivity of quartz.

    Abstract translation: 检查装置包括：用于产生任何带电粒子和电磁波作为光束的光束产生装置; 主光学系统，其将光束引导到保持在工作室中的检查对象中，并用该光束照射检查对象; 第二光学系统，其检测从检查对象发生的次级带电粒子; 以及基于检测到的二次带电粒子形成图像的图像处理系统。 主光学系统包括具有光电子表面的光电子发生器。 光电子表面的基材由具有比石英热导率更高的导热性的材料制成。

Patent Agency Ranking