公开(公告)号：US20150371813A1

公开(公告)日：2015-12-24

申请号：US14747488

申请日：2015-06-23

Applicant: EBARA CORPORATION

Inventor： Masahiro HATAKEYAMA ,  Kenichi SUEMATSU ,  Ryo TAJIMA ,  Kiwamu TSUKAMOTO ,  Kenji TERAO ,  Shoji YOSHIKAWA

IPC: H01J37/20 ,  H01J37/305 ,  H01J37/22 ,  H01J37/073 ,  H01J37/10

CPC classification number: H01J37/20 ,  H01J37/226 ,  H01J37/3005 ,  H01J37/3023 ,  H01J37/3056 ,  H01J37/3177 ,  H01J2237/24535

Abstract: A surface processing apparatus is an apparatus which performs surface processing on an inspection object 20 by irradiating the inspection object with an electron beam. A surface processing apparatus includes: an electron source 10 (including lens system that controls beam shape of electron beam) which generates an electron beam; a stage 30 on which an inspection object 20 to be irradiated with the electron beam is set; and an optical microscope 110 for checking a position to be irradiated with the electron beam. The current value of the electron beam which irradiates the inspection object 20 is set at 10 nA to 100 A.

Abstract translation: 表面处理装置是通过用电子束照射检查对象对检查对象物20进行表面处理的装置。 表面处理装置包括：产生电子束的电子源10（包括控制电子束的光束形状的透镜系统）; 设置有用电子束照射的检查对象物20的台架30; 以及用于检查用电子束照射的位置的光学显微镜110。 将检查对象物20照射的电子束的当前值设定为10nA〜100A。

公开(公告)号：US20150041645A1

公开(公告)日：2015-02-12

申请号：US14453099

申请日：2014-08-06

Applicant: KABUSHIKI KAISHA TOSHIBA ,  EBARA CORPORATION

Inventor： Susumu IIDA ,  Ryoichi HIRANO ,  Hidehiro WATANABE ,  Masahiro HATAKEYAMA

IPC: H01J37/24 ,  H01J37/26

CPC classification number: H01J37/241 ,  H01J37/265 ,  H01J37/29 ,  H01J2237/047 ,  H01J2237/226

Abstract: According to one embodiment, an image acquisition apparatus includes an electron beam source configured to generate an electron beam to be radiated onto an object to be measured, an image detecting unit configured to detect an electronic image of the object based on the electron beam radiated from the electron beam source onto the object, and a voltage modulating unit configured to modulate at least one of a voltage to be applied to the electron beam source and a voltage to be applied to the object.

Abstract translation: 根据一个实施例，一种图像获取装置包括：电子束源，被配置为产生要被辐射到被测量物体上的电子束;图像检测单元，被配置为基于从所述电子束辐射的电子束来检测物体的电子图像; 电子束源到物体上，电压调制单元被配置为调制要施加到电子束源的电压和要施加到物体的电压中的至少一个。

公开(公告)号：US20240077079A1

公开(公告)日：2024-03-07

申请号：US18508671

申请日：2023-11-14

Applicant: EBARA CORPORATION

Inventor： Keiji MAISHIGI ,  Tetsuro SUGIURA ,  Katsuaki USUI ,  Masahiro HATAKEYAMA ,  Chikako HONMA ,  Toru OSUGA ,  Koichi IWASAKI ,  Jie Yuan LIN

IPC: F04C28/28 ,  F04D27/00 ,  G06F9/54 ,  G06F17/18

CPC classification number: F04C28/28 ,  F04D27/001 ,  G06F9/542 ,  G06F17/18

Abstract: An information processing apparatus detecting presence or absence of abnormality of a vacuum pump derived from a product produced within a target vacuum pump, including: a determination unit configured to determine a normal variation range or a normal time variation behavior of a target state quantity which is a state quantity varying depending on a load of gas flowing into the vacuum pump, based on at least one of past target state quantities of the target vacuum pump or another vacuum pump; and a comparison unit configured to compare a current target state quantity of the target vacuum pump with the normal variation range or the normal time variation behavior and output the comparison result.

公开(公告)号：US20180233374A1

公开(公告)日：2018-08-16

申请号：US15873108

申请日：2018-01-17

Applicant: EBARA CORPORATION

Inventor： Ryo TAJIMA ,  Masahiro HATAKEYAMA ,  Kenichi SUEMATSU ,  Kiwamu TSUKAMOTO ,  Kenji WATANABE ,  Shoji YOSHIKAWA ,  Shinichi OKADA ,  Kenji TERAO

IPC: H01L21/3065 ,  H01J37/302 ,  H01J37/305 ,  H01J37/147

CPC classification number: H01L21/3065 ,  H01J37/073 ,  H01J37/1474 ,  H01J37/20 ,  H01J37/244 ,  H01J37/3023 ,  H01J37/304 ,  H01J37/3053 ,  H01J37/317 ,  H01J2237/043 ,  H01J2237/061 ,  H01J2237/06333 ,  H01J2237/06375 ,  H01J2237/083 ,  H01J2237/1205 ,  H01J2237/1516 ,  H01J2237/166 ,  H01J2237/204 ,  H01J2237/24514 ,  H01J2237/30455 ,  H01J2237/30483 ,  H01L21/0273

Abstract: Provided is a method of adjusting an electron-beam irradiated area in an electron beam irradiation apparatus that deflects an electron beam with a deflector to irradiate an object with the electron beam, the method including: emitting an electron beam while changing an irradiation position on an adjustment plate by controlling the deflector in accordance with an electron beam irradiation recipe, the adjustment plate detecting a current corresponding to the emitted electron beam; acquiring a current value detected from the adjustment plate; forming image data corresponding to the acquired current value; determining whether the electron-beam irradiated area is appropriate based on the formed image data; and updating the electron beam irradiation recipe when the electron-beam irradiated area is determined not to be appropriate.

公开(公告)号：US20140319345A1

公开(公告)日：2014-10-30

申请号：US14258607

申请日：2014-04-22

Applicant: EBARA CORPORATION

Inventor： Masahiro HATAKEYAMA ,  Yasushi TOMA ,  Shoji YOSHIKAWA ,  Kiwamu TSUKAMOTO

IPC: H01J37/28

CPC classification number: H01J37/22 ,  G01N23/2251 ,  G01N2223/204 ,  G01N2223/611 ,  H01J3/024 ,  H01J37/075 ,  H01J37/28 ,  H01J2237/063 ,  H01J2237/2448 ,  H01J2237/2806

Abstract: An inspection apparatus includes: beam generation means for generating any of charged particles and electromagnetic waves as a beam; a primary optical system that guides the beam into an inspection object held in a working chamber and irradiates the inspection object with the beam; a secondary optical system that detects secondary charged particles occurring from the inspection object; and an image processing system that forms an image on the basis of the detected secondary charged particles. The primary optical system includes a photoelectron generator having a photoelectronic surface. The base material of the photoelectronic surface is made of material having a higher thermal conductivity than the thermal conductivity of quartz.

Abstract translation: 检查装置包括：用于产生任何带电粒子和电磁波作为光束的光束产生装置; 主光学系统，其将光束引导到保持在工作室中的检查对象中，并用该光束照射检查对象; 第二光学系统，其检测从检查对象发生的次级带电粒子; 以及基于检测到的二次带电粒子形成图像的图像处理系统。 主光学系统包括具有光电子表面的光电子发生器。 光电子表面的基材由具有比石英热导率更高的导热性的材料制成。

公开(公告)号：US20240278380A1

公开(公告)日：2024-08-22

申请号：US18571054

申请日：2022-06-14

Applicant: EBARA CORPORATION

Inventor： Shinro OTA ,  Masahiro HATAKEYAMA

IPC: B24B37/013 ,  B24B37/04 ,  B24B37/10

CPC classification number: B24B37/013 ,  B24B37/042 ,  B24B37/10

Abstract: The present invention relates to a polishing method and a polishing apparatus for polishing a substrate, such as a wafer. This method includes: polishing a substrate W; producing a torque waveform while polishing the substrate W; and selecting one reference torque waveform from a plurality of reference torque waveforms accumulated before the polishing of the substrate W. Polishing the substrate W includes an asperity polishing process and a flat polishing process. The asperity polishing process includes: determining film thicknesses at measurements point on the substrate W based on a film thickness of reference film data calculated based on a first relational expression; comparing the torque waveform and the selected reference torque waveform; and determining whether the asperity polishing process should be terminated. The flat polishing process includes determining film thicknesses at measurement points on the substrate W based on a film thickness of reference film data calculated based on a second relational expression.

公开(公告)号：US20180040452A1

公开(公告)日：2018-02-08

申请号：US15667040

申请日：2017-08-02

Applicant: EBARA CORPORATION

Inventor： Masahiro HATAKEYAMA ,  Ryo TAJIMA ,  Kenichi SUEMATSU ,  Kenji WATANABE ,  Yasushi TOMA ,  Kenji TERAO ,  Takeshi MURAKAMI

IPC: H01J37/05 ,  H01J37/147 ,  H01J37/141

CPC classification number: H01J37/05 ,  H01J37/141 ,  H01J37/147 ,  H01J37/244 ,  H01J37/26 ,  H01J37/29

Abstract: An electron beam inspection device includes: a primary electron optical system that irradiates the surface of a sample with an electron beam; and a secondary electron optical system that gathers secondary electrons emitted from the sample and forms an image on the sensor surface of a detector. An electron image of the surface of the sample is obtained from a signal detected by the detector, and the sample is inspected. A cylindrical member that is formed with conductors stacked as an inner layer and an outer layer, and an insulator stacked as an intermediate layer is provided inside a lens tube into which the secondary electron optical system is incorporated. An electron orbital path is formed inside the cylindrical member, and the members constituting the secondary electron optical system are arranged outside the cylindrical member.

公开(公告)号：US20150340193A1

公开(公告)日：2015-11-26

申请号：US14813768

申请日：2015-07-30

Applicant: EBARA CORPORATION

Inventor： Shoji YOSHIKAWA ,  Kiwamu TSUKAMOTO ,  Takeshi MURAKAMI ,  Masahiro HATAKEYAMA ,  Tsutomu KARIMATA

IPC: H01J37/02 ,  H01J37/20 ,  H01J37/285

CPC classification number: H01J37/023 ,  G01N21/9501 ,  G01N23/2204 ,  H01J37/09 ,  H01J37/16 ,  H01J37/20 ,  H01J37/285 ,  H01J2237/022 ,  H01J2237/0264 ,  H01J2237/1501 ,  H01J2237/166 ,  H01J2237/20 ,  H01J2237/2007 ,  H01J2237/20221 ,  H01J2237/20278 ,  H01J2237/26

Abstract: An inspection apparatus capable of facilitating reduction in cost of the apparatus is provided. The inspection apparatus includes: beam generation means for generating any of charged particles and electromagnetic waves as a beam; a primary optical system that guides the beam into an inspection object held on a movable stage in a working chamber and irradiates the inspection object with the beam; a secondary optical system that detects secondary charged particles occurring from the inspection object; and an image processing system that forms an image on the basis of the detected secondary charged particles. The inspection apparatus further includes: a linear motor that drives the movable stage; and a Helmholtz coil that causes a magnetic field for canceling a magnetic field caused by the linear motor when the movable stage is driven.

Abstract translation: 提供了能够有助于降低设备成本的检查装置。 检查装置包括：用于产生任何带电粒子和电磁波作为光束的光束产生装置; 将光束引导到保持在工作室中的可移动台上的检查对象中并用该束照射检查对象的主光学系统; 第二光学系统，其检测从检查对象发生的次级带电粒子; 以及基于检测到的二次带电粒子形成图像的图像处理系统。 检查装置还包括：驱动可动台的直线电机; 以及亥姆霍兹线圈，其在驱动可动载物台时引起磁场消除由线性马达引起的磁场。

公开(公告)号：US20150287570A1

公开(公告)日：2015-10-08

申请号：US14677086

申请日：2015-04-02

Applicant: EBARA CORPORATION

Inventor： Takehide HAYASHI ,  Masahiro HATAKEYAMA ,  Shinji YAMAGUCHI ,  Masato NAKA

IPC: H01J37/22 ,  H01J37/28

CPC classification number: H01J37/28 ,  H01J37/185 ,  H01J37/222 ,  H01J37/224 ,  H01J2237/2448 ,  H01J2237/2806 ,  H01J2237/2817

Abstract: An inspection apparatus includes beam generation means, a primary optical system, a secondary optical system and an image processing system. Irradiation energy of the beam is set in an energy region where mirror electrons are emitted from the inspection object as the secondary charged particles due to the beam irradiation. The secondary optical system includes a camera for detecting the secondary charged particles, a numerical aperture whose position is adjustable along an optical axis direction and a lens that forms an image of the secondary charged particles that have passed through the numerical aperture on an image surface of the camera. In the image processing system, the image is formed under an aperture imaging condition where the position of the numerical aperture is located on an object surface to acquire an image.

Abstract translation: 检查装置包括光束产生装置，主光学系统，二次光学系统和图像处理系统。 光束的照射能量被设定在能够从作为二次带电粒子的检查对象射出的电子束照射的能量区域。 二次光学系统包括用于检测二次带电粒子的相机，其位置沿着光轴方向可调节的数值孔径，以及形成已经通过数字孔径的图像上的次级带电粒子的图像的透镜， 相机。 在图像处理系统中，图像形成在孔径成像条件下，其中数值孔径的位置位于物体表面上以获取图像。

公开(公告)号：US20150097116A1

公开(公告)日：2015-04-09

申请号：US14571594

申请日：2014-12-16

Applicant: EBARA CORPORATION

Inventor： Masahiro HATAKEYAMA ,  Yasushi TOMA ,  Shoji YOSHIKAWA ,  Kiwamu TSUKAMOTO

IPC: H01J37/22 ,  H01J37/28

CPC classification number: H01J37/22 ,  G01N23/2251 ,  G01N2223/204 ,  G01N2223/611 ,  H01J3/024 ,  H01J37/075 ,  H01J37/28 ,  H01J2237/063 ,  H01J2237/2448 ,  H01J2237/2806

Abstract: An inspection apparatus includes: beam generation means for generating any of charged particles and electromagnetic waves as a beam; a primary optical system that guides the beam into an inspection object held in a working chamber and irradiates the inspection object with the beam; a secondary optical system that detects secondary charged particles occurring from the inspection object; and an image processing system that forms an image on the basis of the detected secondary charged particles. The primary optical system includes a photoelectron generator having a photoelectronic surface. The base material of the photoelectronic surface is made of material having a higher thermal conductivity than the thermal conductivity of quartz.

Abstract translation: 检查装置包括：用于产生任何带电粒子和电磁波作为光束的光束产生装置; 主光学系统，其将光束引导到保持在工作室中的检查对象中，并用该光束照射检查对象; 第二光学系统，其检测从检查对象发生的次级带电粒子; 以及基于检测到的二次带电粒子形成图像的图像处理系统。 主光学系统包括具有光电子表面的光电子发生器。 光电子表面的基材由具有比石英热导率更高的导热性的材料制成。