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    INSPECTION APPARATUS
    1.
    发明申请
    INSPECTION APPARATUS 有权
    检查装置

    公开(公告)号：US20140312227A1

    公开(公告)日：2014-10-23

    申请号：US14257071

    申请日：2014-04-21

    Applicant: EBARA CORPORATION

    Inventor： Shoji YOSHIKAWA ,  Kiwamu TSUKAMOTO

    IPC: G01N23/22 ,  G01N21/95 ,  H01J37/02

    CPC classification number: H01J37/023 ,  G01N21/9501 ,  G01N23/2204 ,  H01J37/09 ,  H01J37/16 ,  H01J37/20 ,  H01J37/285 ,  H01J2237/022 ,  H01J2237/0264 ,  H01J2237/1501 ,  H01J2237/166 ,  H01J2237/20 ,  H01J2237/2007 ,  H01J2237/20221 ,  H01J2237/20278 ,  H01J2237/26

    Abstract: An inspection apparatus capable of facilitating reduction in cost of the apparatus is provided. The inspection apparatus includes: beam generation means for generating any of charged particles and electromagnetic waves as a beam; a primary optical system that guides the beam into an inspection object held on a movable stage in a working chamber and irradiates the inspection object with the beam; a secondary optical system that detects secondary charged particles occurring from the inspection object; and an image processing system that forms an image on the basis of the detected secondary charged particles. The inspection apparatus further includes: a linear motor that drives the movable stage; and a Helmholtz coil that causes a magnetic field for canceling a magnetic field caused by the linear motor when the movable stage is driven.

    Abstract translation: 提供了能够有助于降低设备成本的检查装置。 检查装置包括：用于产生任何带电粒子和电磁波作为光束的光束产生装置; 将光束引导到保持在工作室中的可移动台上的检查对象中并用该束照射检查对象的主光学系统; 第二光学系统，其检测从检查对象发生的次级带电粒子; 以及基于检测到的二次带电粒子形成图像的图像处理系统。 检查装置还包括：驱动可动台的直线电机; 以及亥姆霍兹线圈，其在驱动可动载物台时引起磁场消除由线性马达引起的磁场。

    SURFACE PROCESSING APPARATUS
    2.
    发明申请
    SURFACE PROCESSING APPARATUS 有权
    表面加工设备

    公开(公告)号：US20150371813A1

    公开(公告)日：2015-12-24

    申请号：US14747488

    申请日：2015-06-23

    Applicant: EBARA CORPORATION

    Inventor： Masahiro HATAKEYAMA ,  Kenichi SUEMATSU ,  Ryo TAJIMA ,  Kiwamu TSUKAMOTO ,  Kenji TERAO ,  Shoji YOSHIKAWA

    IPC: H01J37/20 ,  H01J37/305 ,  H01J37/22 ,  H01J37/073 ,  H01J37/10

    CPC classification number: H01J37/20 ,  H01J37/226 ,  H01J37/3005 ,  H01J37/3023 ,  H01J37/3056 ,  H01J37/3177 ,  H01J2237/24535

    Abstract: A surface processing apparatus is an apparatus which performs surface processing on an inspection object 20 by irradiating the inspection object with an electron beam. A surface processing apparatus includes: an electron source 10 (including lens system that controls beam shape of electron beam) which generates an electron beam; a stage 30 on which an inspection object 20 to be irradiated with the electron beam is set; and an optical microscope 110 for checking a position to be irradiated with the electron beam. The current value of the electron beam which irradiates the inspection object 20 is set at 10 nA to 100 A.

    Abstract translation: 表面处理装置是通过用电子束照射检查对象对检查对象物20进行表面处理的装置。 表面处理装置包括：产生电子束的电子源10（包括控制电子束的光束形状的透镜系统）; 设置有用电子束照射的检查对象物20的台架30; 以及用于检查用电子束照射的位置的光学显微镜110。 将检查对象物20照射的电子束的当前值设定为10nA〜100A。

    INSPECTION APPARATUS
    3.
    发明申请
    INSPECTION APPARATUS 有权
    检查装置

    公开(公告)号：US20150340193A1

    公开(公告)日：2015-11-26

    申请号：US14813768

    申请日：2015-07-30

    Applicant: EBARA CORPORATION

    Inventor： Shoji YOSHIKAWA ,  Kiwamu TSUKAMOTO ,  Takeshi MURAKAMI ,  Masahiro HATAKEYAMA ,  Tsutomu KARIMATA

    IPC: H01J37/02 ,  H01J37/20 ,  H01J37/285

    CPC classification number: H01J37/023 ,  G01N21/9501 ,  G01N23/2204 ,  H01J37/09 ,  H01J37/16 ,  H01J37/20 ,  H01J37/285 ,  H01J2237/022 ,  H01J2237/0264 ,  H01J2237/1501 ,  H01J2237/166 ,  H01J2237/20 ,  H01J2237/2007 ,  H01J2237/20221 ,  H01J2237/20278 ,  H01J2237/26

    Abstract: An inspection apparatus capable of facilitating reduction in cost of the apparatus is provided. The inspection apparatus includes: beam generation means for generating any of charged particles and electromagnetic waves as a beam; a primary optical system that guides the beam into an inspection object held on a movable stage in a working chamber and irradiates the inspection object with the beam; a secondary optical system that detects secondary charged particles occurring from the inspection object; and an image processing system that forms an image on the basis of the detected secondary charged particles. The inspection apparatus further includes: a linear motor that drives the movable stage; and a Helmholtz coil that causes a magnetic field for canceling a magnetic field caused by the linear motor when the movable stage is driven.

    Abstract translation: 提供了能够有助于降低设备成本的检查装置。 检查装置包括：用于产生任何带电粒子和电磁波作为光束的光束产生装置; 将光束引导到保持在工作室中的可移动台上的检查对象中并用该束照射检查对象的主光学系统; 第二光学系统，其检测从检查对象发生的次级带电粒子; 以及基于检测到的二次带电粒子形成图像的图像处理系统。 检查装置还包括：驱动可动台的直线电机; 以及亥姆霍兹线圈，其在驱动可动载物台时引起磁场消除由线性马达引起的磁场。

    INSPECTION APPARATUS
    4.
    发明申请
    INSPECTION APPARATUS 审中-公开
    检查装置

    公开(公告)号：US20150097116A1

    公开(公告)日：2015-04-09

    申请号：US14571594

    申请日：2014-12-16

    Applicant: EBARA CORPORATION

    Inventor： Masahiro HATAKEYAMA ,  Yasushi TOMA ,  Shoji YOSHIKAWA ,  Kiwamu TSUKAMOTO

    IPC: H01J37/22 ,  H01J37/28

    CPC classification number: H01J37/22 ,  G01N23/2251 ,  G01N2223/204 ,  G01N2223/611 ,  H01J3/024 ,  H01J37/075 ,  H01J37/28 ,  H01J2237/063 ,  H01J2237/2448 ,  H01J2237/2806

    Abstract: An inspection apparatus includes: beam generation means for generating any of charged particles and electromagnetic waves as a beam; a primary optical system that guides the beam into an inspection object held in a working chamber and irradiates the inspection object with the beam; a secondary optical system that detects secondary charged particles occurring from the inspection object; and an image processing system that forms an image on the basis of the detected secondary charged particles. The primary optical system includes a photoelectron generator having a photoelectronic surface. The base material of the photoelectronic surface is made of material having a higher thermal conductivity than the thermal conductivity of quartz.

    Abstract translation: 检查装置包括：用于产生任何带电粒子和电磁波作为光束的光束产生装置; 主光学系统，其将光束引导到保持在工作室中的检查对象中，并用该光束照射检查对象; 第二光学系统，其检测从检查对象发生的次级带电粒子; 以及基于检测到的二次带电粒子形成图像的图像处理系统。 主光学系统包括具有光电子表面的光电子发生器。 光电子表面的基材由具有比石英热导率更高的导热性的材料制成。

    INSPECTION APPARATUS
    7.
    发明申请
    INSPECTION APPARATUS 有权
    检查装置

    公开(公告)号：US20140319345A1

    公开(公告)日：2014-10-30

    申请号：US14258607

    申请日：2014-04-22

    Applicant: EBARA CORPORATION

    Inventor： Masahiro HATAKEYAMA ,  Yasushi TOMA ,  Shoji YOSHIKAWA ,  Kiwamu TSUKAMOTO

    IPC: H01J37/28

    CPC classification number: H01J37/22 ,  G01N23/2251 ,  G01N2223/204 ,  G01N2223/611 ,  H01J3/024 ,  H01J37/075 ,  H01J37/28 ,  H01J2237/063 ,  H01J2237/2448 ,  H01J2237/2806

    Abstract: An inspection apparatus includes: beam generation means for generating any of charged particles and electromagnetic waves as a beam; a primary optical system that guides the beam into an inspection object held in a working chamber and irradiates the inspection object with the beam; a secondary optical system that detects secondary charged particles occurring from the inspection object; and an image processing system that forms an image on the basis of the detected secondary charged particles. The primary optical system includes a photoelectron generator having a photoelectronic surface. The base material of the photoelectronic surface is made of material having a higher thermal conductivity than the thermal conductivity of quartz.

    Abstract translation: 检查装置包括：用于产生任何带电粒子和电磁波作为光束的光束产生装置; 主光学系统，其将光束引导到保持在工作室中的检查对象中，并用该光束照射检查对象; 第二光学系统，其检测从检查对象发生的次级带电粒子; 以及基于检测到的二次带电粒子形成图像的图像处理系统。 主光学系统包括具有光电子表面的光电子发生器。 光电子表面的基材由具有比石英热导率更高的导热性的材料制成。

    INSPECTION SYSTEM, INSPECTION IMAGE DATA GENERATION METHOD, INSPECTION DISPLAY UNIT, DEFECT DETERMINATION METHOD, AND STORAGE MEDIUM ON WHICH INSPECTION DISPLAY PROGRAM IS RECORDED
    8.
    发明申请
    INSPECTION SYSTEM, INSPECTION IMAGE DATA GENERATION METHOD, INSPECTION DISPLAY UNIT, DEFECT DETERMINATION METHOD, AND STORAGE MEDIUM ON WHICH INSPECTION DISPLAY PROGRAM IS RECORDED 有权
    检查系统，检查图像数据生成方法，检查显示单元，缺陷确定方法以及检查显示程序被记录的存储介质

    公开(公告)号：US20140291515A1

    公开(公告)日：2014-10-02

    申请号：US14220719

    申请日：2014-03-20

    Applicant: EBARA CORPORATION

    Inventor： Ryo TAJIMA ,  Kenichi SUEMATSU ,  Shoji YOSHIKAWA

    IPC: H01J37/26 ,  G06T7/00

    CPC classification number: H01J37/222 ,  H01J37/244 ,  H01J37/265 ,  H01J37/285

    Abstract: An inspection system includes a primary optical system configured to irradiate a charged particle or an electromagnetic wave as a beam, a movable unit configured to hold an inspection target and move the target through a position where the beam is irradiated, and a TDI sensor configured to integrate an amount of secondary charged particles in a predetermined direction to sequentially transfer the integrated amount. The secondary charged particles are obtained by irradiating the beam onto the target while moving the movable unit in the predetermined direction. The inspection system further includes a prevention module configured to prevent an arrival of the beam at the target side or an arrival of the secondary charged particles at the TDI sensor during a time period from one transfer to the following transfer after the elapse of a predetermined length of time from the one transfer and until the following transfer.

    Abstract translation: 检查系统包括被配置为照射带电粒子或作为光束的电磁波的主光学系统，被配置为保持检查目标并将目标移动通过射束的位置的移动单元，以及被配置为 在预定方向上积分一定量的二次带电粒子以顺序地转移积分量。 通过在沿着预定方向移动可移动单元的同时将光束照射到目标物上而获得二次带电粒子。 所述检查系统还包括防止模块，所述防止模块被配置为在经过预定长度之后的一次转移到后续转移的时间段期间防止所述束到达所述目标侧或所述二次带电粒子到达所述TDI传感器 的时间从一次转移到下一次转移。

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