中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

70 records (took 0.017 seconds)

    ELECTRON BEAM DRAWING APPARATUS AND METHOD OF MANUFACTURING DEVICE
    23.
    发明申请
    ELECTRON BEAM DRAWING APPARATUS AND METHOD OF MANUFACTURING DEVICE 审中-公开
    电子束绘图装置和制造装置的方法

    公开(公告)号：US20120288800A1

    公开(公告)日：2012-11-15

    申请号：US13462088

    申请日：2012-05-02

    Applicant: Jun ITO

    Inventor： Jun ITO

    IPC: G03F7/20 ,  H01J3/02

    CPC classification number: H01J3/06 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/028 ,  H01J37/067 ,  H01J37/3174 ,  H01J2237/0206 ,  H01J2237/022

    Abstract: An electron beam drawing apparatus performs drawing on a substrate with an electron beam emitted by an electron gun. The apparatus includes a conditioning chamber configured to perform conditioning of a spare electrode that is a spare for an electrode which constitutes the electron gun, and a driving mechanism configured to remove a used electrode from the electron gun, and to install, into the electron gun, the spare electrode having been subjected to the conditioning, wherein the conditioning includes supplying of electric power to the spare electrode.

    Abstract translation: 电子束描绘装置利用电子枪发射的电子束对衬底进行绘图。 该装置包括：调节室，被配置为执行作为构成电子枪的电极备用的备用电极的调节;以及驱动机构，其构造成从电子枪中去除使用的电极，并将其安装到电子枪 所述备用电极已经进行了调节，其中所述调节包括向备用电极供电。

    Charged particle gun
    24.
    发明授权
    Charged particle gun 有权
    带电粒子枪

    公开(公告)号：US07855373B2

    公开(公告)日：2010-12-21

    申请号：US11628195

    申请日：2005-05-13

    Applicant: Tao Zhang

    Inventor： Tao Zhang

    IPC: G01F23/00 ,  G21K5/08 ,  G21K5/10

    CPC classification number: H01J3/027 ,  H01J1/16 ,  H01J1/18 ,  H01J37/065 ,  H01J37/067

    Abstract: An electron gun (1) includes an emitter (2), a tubular support (3) and an adaptor (4) for receiving the emitter. The adaptor includes a tapered plugging surface (7) and the tubular support includes a correspondingly tapered seating surface (9) for receiving the plugging surface. The plugging surface and seating surface have conical profiles which help to position the adaptor concentrically with the support.

    Abstract translation: 电子枪（1）包括用于接收发射器的发射器（2），管状支撑件（3）和适配器（4）。 适配器包括锥形堵塞表面（7），并且管状支撑件包括用于接收堵塞表面的相应锥形的座面（9）。 堵塞表面和座面具有锥形轮廓，这有助于将适配器与支撑件同心地定位。

    NANOTIP REPAIR AND CHARACTERIZATION USING FIELD ION MICROSCOPY
    28.
    发明申请
    NANOTIP REPAIR AND CHARACTERIZATION USING FIELD ION MICROSCOPY 有权
    使用场离子显微镜的纳米技术维修和表征

    公开(公告)号：US20100038536A1

    公开(公告)日：2010-02-18

    申请号：US12191855

    申请日：2008-08-14

    Applicant: Vladimir Ukraintsev

    Inventor： Vladimir Ukraintsev

    IPC: G01N23/04

    CPC classification number: G01Q70/16 ,  G01Q30/02 ,  H01J37/023 ,  H01J37/067 ,  H01J37/073 ,  H01J37/08 ,  H01J37/18 ,  H01J37/28 ,  H01J2237/0807 ,  H01J2237/188

    Abstract: A system (100) for characterizing surfaces can include a nanotip microscope (104) in a first pressure envelope (102) at a first pressure with an electrically conductive nanotip (110) mounted thereon for characterizing a sample surface. The system can also include an ion imaging system (122, 124, 128) within a second pressure envelope (120) at a second pressure. The second pressure can less than or equal to the first pressure and the pressure envelopes (102, 120) can be separated by a pressure limiting aperture (PLA) (132). The system can further include gas sources (116, 118) for introducing into the first pressure envelope (102) at least one gas, and a voltage supply (114) coupled to the nanotip (110) for generating an electric field between the nanotip (114) and the PLA (132). In the system, the electric field repels and ionizes molecules or atoms of the gas in proximity to the nanotip (110) and the ion imaging system (122, 124, 128) collects at least a portion the repelled and ionized molecules or atoms traversing the PLA (132) to image the nanotip (110).

    Abstract translation: 用于表征表面的系统（100）可以包括在第一压力下的第一压力外壳（102）中的纳米管显微镜（104），其上安装有用于表征样品表面的导电纳米尖端（110）。 该系统还可以包括在第二压力下的第二压力封套（120）内的离子成像系统（122,124,128）。 第二压力可以小于或等于第一压力，并且压力包络（102,120）可以通过压力限制孔（PLA）（132）分离。 该系统还可以包括用于将至少一种气体引入第一压力外壳（102）的气体源（116,118），以及耦合到所述纳米尖端（110）的电压源（114），用于在所述纳米尖端 114）和解放军（132）。 在系统中，电场排斥并离子化离子纳米尖端（110）附近的气体的分子或原子，并且离子成像系统（122,124,128）收集至少一部分被排斥的和离子化的分子或原子穿过 PLA（132）以对纳米尖端（110）成像。

    Accelerating electrostatic lens gun for high-speed electron beam inspection
    30.
    发明授权
    Accelerating electrostatic lens gun for high-speed electron beam inspection 有权
    加速静电镜头进行高速电子束检测

    公开(公告)号：US07465922B1

    公开(公告)日：2008-12-16

    申请号：US11485542

    申请日：2006-07-12

    Applicant: Mark A. McCord

    Inventor： Mark A. McCord

    IPC: G01N23/00 ,  G21K7/00 ,  A61N5/00 ,  G21G5/00 ,  G21K1/08 ,  H01J3/14 ,  H01J3/26 ,  H01J49/42

    CPC classification number: G01N23/2251 ,  H01J37/063 ,  H01J37/067 ,  H01J37/28 ,  H01J2237/061 ,  H01J2237/06316 ,  H01J2237/06375 ,  H01J2237/065 ,  H01J2237/2817

    Abstract: One embodiment relates to an electron beam apparatus for inspecting or reviewing a manufactured substrate. The apparatus includes a cathode, an extraction electrode, a lens electrode, an anode, deflectors, electron lenses, and a detector. The extraction voltage is positive relative to the cathode voltage, such that electrons are emitted from the cathode. Advantageously, the lens voltage is positive relative to the extraction voltage, such that electrons are accelerated from the extraction electrode to the lens electrode while the electrons are condensed to form an electron beam. The electron beam is transmitted through an opening of the anode and is controllably deflected to scan it over an area of the surface. The detector detects secondary electrons from the substrate so as to form an image of the scanned area. Other embodiments and features are also disclosed.

    Abstract translation: 一个实施例涉及一种用于检查或检查制造的基板的电子束装置。 该装置包括阴极，提取电极，透镜电极，阳极，偏转器，电子透镜和检测器。 提取电压相对于阴极电压为正，使得从阴极发射电子。 有利地，透镜电压相对于提取电压是正的，使得电子被从引出电极加速到透镜电极，同时电子被冷凝以形成电子束。 电子束通过阳极的开口传输并被可控地偏转以在表面的一个区域上扫描。 检测器从衬底检测二次电子，以形成扫描区域的图像。 还公开了其它实施例和特征。

Patent Agency Ranking