公开(公告)号：US20130228701A1

公开(公告)日：2013-09-05

申请号：US13871624

申请日：2013-04-26

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Muneyuki Fukuda ,  Naomasa Suzuki ,  Tomoyasu Shojo ,  Noritsugu Takahashi

IPC: G01N23/225

CPC classification number: H01J37/28 ,  G01N23/225 ,  H01J37/145 ,  H01J2237/21 ,  H01J2237/28

Abstract: A lower pole piece of an electromagnetic superposition type objective lens is divided into an upper magnetic path and a lower magnetic path. A voltage nearly equal to a retarding voltage is applied to the lower magnetic path. An objective lens capable of acquiring an image with a higher resolution and a higher contrast than a conventional image is provided. An electromagnetic superposition type objective lens includes a magnetic path that encloses a coil, a cylindrical or conical booster magnetic path that surrounds an electron beam, a control magnetic path that is interposed between the coil and sample, an accelerating electric field control unit that accelerates the electron beam using a booster power supply, a decelerating electric field control unit that decelerates the electron beam using a stage power supply, and a suppression unit that suppresses electric discharge of the sample using a control magnetic path power supply.

Abstract translation: 电磁叠加型物镜的下极片分为上磁路和下磁路。 几乎等于延迟电压的电压被施加到下磁路。 提供了能够获得具有比常规图像更高分辨率和更高对比度的图像的物镜。 电磁叠加型物镜包括包围线圈的磁路，围绕电子束的圆柱形或锥形增强器磁路，介于线圈和样品之间的控制磁路，加速电场控制单元，其加速 使用升压电源的电子束，使用级电源减速电子束的减速电场控制部，以及抑制使用控制磁路电源对样品进行放电的抑制部。

公开(公告)号：US20130153782A1

公开(公告)日：2013-06-20

申请号：US13464261

申请日：2012-05-04

Applicant: Weiming Ren ,  Zhongwei Chen

Inventor： Weiming Ren ,  Zhongwei Chen

IPC: H01J3/20 ,  H01F7/02

CPC classification number: H01J37/14 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/20 ,  H01J37/141 ,  H01J37/145 ,  H01J37/3177 ,  H01J2237/1035 ,  H01J2237/1415 ,  H01J2237/31774

Abstract: The present invention provides two ways to form a special permeability-discontinuity unit inside every sub-lens of a multi-axis magnetic lens, which either has a simpler configuration or has more flexibility in manufacturing such as material selection and mechanical structure. Accordingly several types of multi-axis magnetic lens are proposed for various applications. One type is for general application such as a multi-axis magnetic condenser lens or a multi-axis magnetic transfer lens, another type is a multi-axis magnetic non-immersion objective which can require a lower magnetomotive force, and one more type is a multi-axis magnetic immersion objective lens which can generate smaller aberrations. Due to using permeability-discontinuity units, every multi-axis magnetic lens in this invention can also be electrically excited to function as a multi-axis electromagnetic compound lens so as to further reduce aberrations thereof and/or realize electron beam retarding for low-voltage irradiation on specimen.

Abstract translation: 本发明提供了在多轴磁性透镜的每个子透镜内部形成特殊的渗透率不连续单元的两种方式，其具有更简单的构造或者在诸如材料选择和机械结构的制造中具有更大的灵活性。 因此，针对各种应用提出了几种类型的多轴磁性透镜。 一种用于一般应用，例如多轴磁聚焦透镜或多轴磁性转印透镜，另一种类型是可能需要较低磁动势的多轴磁性非浸没物镜，另外一种类型是 可以产生较小像差的多轴磁浸物镜。 由于使用导磁率不连续单位，本发明中的每个多轴磁性透镜也可以被电激励以用作多轴电磁复合透镜，以便进一步降低其像差和/或实现低电压的电子束延迟 对样品照射

公开(公告)号：US20120273677A1

公开(公告)日：2012-11-01

申请号：US13456944

申请日：2012-04-26

Applicant: Lubomir Tuma ,  Petr Hlavenka ,  Petr Sytar ,  Radek Ceska ,  Bohuslav Sed'a

Inventor： Lubomir Tuma ,  Petr Hlavenka ,  Petr Sytar ,  Radek Ceska ,  Bohuslav Sed'a

IPC: H01J37/26 ,  H01J37/244 ,  H01J37/10

CPC classification number: H01J37/26 ,  H01J37/145 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/04926 ,  H01J2237/2443 ,  H01J2237/24465

Abstract: The invention relates to an in-column back-scattered electron detector, the detector placed in a combined electrostatic/magnetic objective lens for a SEM. The detector is formed as a charged particle sensitive surface, preferably a scintillator disk that acts as one of the electrode faces forming the electrostatic focusing field. The photons generated in the scintillator are detected by a photon detector, such as a photo-diode or a multi-pixel photon detector. The objective lens may be equipped with another electron detector for detecting secondary electrons that are kept closer to the axis. A light guide may be used to offer electrical insulation between the photon detector and the scintillator.

Abstract translation: 本发明涉及一种柱内反向散射电子检测器，该探测器放置在用于SEM的组合静电/磁性物镜中。 检测器形成为带电粒子敏感表面，优选地形成作为形成静电聚焦场的电极面之一的闪烁体盘。 在闪烁体中产生的光子被光子检测器（例如光电二极管或多像素光子检测器）检测。 物镜可以配备有用于检测保持靠近轴线的二次电子的另一电子检测器。 可以使用光导来在光子检测器和闪烁体之间提供电绝缘。

公开(公告)号：US20120070066A1

公开(公告)日：2012-03-22

申请号：US13375085

申请日：2010-06-03

Applicant: Hiroyuki Kitsunai ,  Seiichiro Kanno ,  Masaru Matsushima ,  Shuichi Nakagawa ,  Go Miya

Inventor： Hiroyuki Kitsunai ,  Seiichiro Kanno ,  Masaru Matsushima ,  Shuichi Nakagawa ,  Go Miya

IPC: G06K9/00

CPC classification number: H01L21/6831 ,  H01J37/145 ,  H01J37/28 ,  H01J2237/2817 ,  H01L22/12

Abstract: The charged particle beam device has a problem that a symmetry of equipotential distribution is disturbed near the outer edge of a specimen, an object being evaluated, causing a charged particle beam to deflect there. An electrode plate installed inside the specimen holding mechanism of electrostatic attraction type is formed of an inner and outer electrode plates arranged concentrically. The outer electrode plate is formed to have an outer diameter larger than that of the specimen. The dimensions of the electrode plates are determined so that an overlapping area of the outer electrode plate and the specimen is substantially equal to an area of the inner electrode plate. The inner electrode plate is impressed with a voltage of a positive polarity with respect to a reference voltage and of an arbitrary magnitude, and the outer electrode is impressed with a voltage of a negative polarity and of an arbitrary magnitude.

Abstract translation: 带电粒子束装置具有在试样的外边缘附近等待电位分布的对称性被扰乱的问题，被评估的物体导致带电粒子束在那里偏转。 安装在静电吸引型的检体保持机构内的电极板由同心配置的内外电极板形成。 外电极板的外径大于样品的外径。 确定电极板的尺寸，使得外部电极板和试样的重叠面积基本上等于内部电极板的面积。 内部电极板相对于参考电压和任意大小施加正极性的电压，并且外部电极施加负极性和任意大小的电压。

公开(公告)号：US07781742B2

公开(公告)日：2010-08-24

申请号：US12213493

申请日：2008-06-20

Applicant: Joachim Zach

Inventor： Joachim Zach

IPC: H01J37/153 ,  H01J37/26 ,  H01J37/28

CPC classification number: H01J37/153 ,  H01J37/145 ,  H01J37/28 ,  H01J2237/1534 ,  H01J2237/28 ,  H01J2237/2802

Abstract: The invention concerns a corrector (10) for chromatic and aperture aberration correction in a scanning electron microscope or a scanning transmission electron microscope, comprising four multipole elements (1, 2, 3, 4) which are consecutively disposed in the optical path (9), the first (1) and fourth (4) of which are used to generate quadrupole fields (5, 6) and the second (2) and third (3) of which are used to generate octupole fields (11, 12) and quadrupole fields (7, 7′, 8, 8′), wherein the latter are superposed magnetic (7, 8) and electric (7′, 8′) fields, and wherein the quadrupole fields (5, 6, 7, 8) of all four multipole elements (1, 2, 3, 4) are successively rotated with respect to one another through 90°. Elimination of errors up to fifth order can be realized with a corrector (10) of this type in that the second (2) and the third (3) multipole elements are designed as twelve-pole elements, and an additional twelve-pole element (13) is inserted between the second (2) and the third (3) multipole element, and is loaded with current and/or voltage, such that an octupole field (14) is generated that is superposed by a twelve-pole field (15).

Abstract translation: 本发明涉及一种用于扫描电子显微镜或扫描透射电子显微镜中的彩色和孔径像差校正的校正器（10），包括连续设置在光路（9）中的四个多极元件（1,2,3,4） ，其第一（1）和第四（4）用于产生四极场（5,6）和第二（2）和第三（3）用于产生八极场（11,12）和四极杆 （7,7'，8,8'），其中后者是重叠的磁（7,8）和电（7'，8'）场，并且其中四极场（5,6,7,8） 所有四个多极元件（1,2,3,4）相对于彼此依次旋转90°。 可以用这种校正器（10）来实现高达五级的误差的消除，因为第二（2）和第三（3）多极元件被设计为十二极元件和另外的十二极元件 13）插入在第二（2）和第三（3）多极元件之间，并且被加载电流和/或电压，使得产生由十二极场（15）叠加的八极场（14） ）。

公开(公告)号：US20100084566A1

公开(公告)日：2010-04-08

申请号：US12445257

申请日：2007-10-09

Applicant: Ho Seob Kim

Inventor： Ho Seob Kim

IPC: H01J37/14

CPC classification number: H01J37/145 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/12 ,  H01J37/143 ,  H01J37/3174 ,  H01J2237/1205 ,  H01J2237/1405 ,  H01J2237/26 ,  H01J2237/3175

Abstract: Disclosed herein is an electron column using a magnetic lens layer. The electron column includes a magnetic lens layer for condensing an electron beam using permanent magnets. The magnetic lens layer includes a support plate, an aperture formed through the support plate, and permanent magnets arranged around the aperture and disposed on or inserted into the support plate.

Abstract translation: 本文公开了使用磁性透镜层的电子柱。 电子柱包括用于使用永久磁体冷凝电子束的磁透镜层。 磁性透镜层包括支撑板，通过支撑板形成的孔和围绕孔布置并设置在支撑板上或插入到支撑板中的永磁体。

公开(公告)号：US07646003B2

公开(公告)日：2010-01-12

申请号：US11311282

申请日：2005-12-20

Applicant: Chang-Wook Moon ,  Dong-Soo Kim ,  Myung-Gon Song ,  Seung-Woon Lee ,  Yun-Sang Oh

Inventor： Chang-Wook Moon ,  Dong-Soo Kim ,  Myung-Gon Song ,  Seung-Woon Lee ,  Yun-Sang Oh

IPC: H01J37/22

CPC classification number: H01J37/067 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/22 ,  H01J37/145 ,  H01J37/304 ,  H01J37/3174 ,  H01J2237/31776 ,  H01J2237/31777 ,  H01J2237/31781

Abstract: A focusing apparatus and a lithography system using the same capable of adjusting a uniformity of an electromagnetic field by moving a portion of a magnetic field generator. The focusing apparatus may control a path of an electron beam generated from an electron-beam emitter of the lithography system. In the focusing apparatus, a uniformity of the magnetic field in the vacuum chamber may be adjusted through movement of the portion of the magnetic field generator with respect to the vacuum chamber.

Abstract translation: 使用该方法的聚焦装置和光刻系统能够通过移动磁场发生器的一部分来调节电磁场的均匀性。 聚焦装置可以控制从光刻系统的电子束发射器产生的电子束的路径。 在聚焦装置中，可以通过磁场发生器的一部分相对于真空室的移动来调节真空室中的磁场的均匀性。

公开(公告)号：US20090057571A1

公开(公告)日：2009-03-05

申请号：US12184586

申请日：2008-08-01

Applicant: Susumu Goto

Inventor： Susumu Goto

IPC: A61N5/00

CPC classification number: H01J37/3175 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/145 ,  H01J37/3174 ,  H01J2237/047 ,  H01J2237/04926 ,  H01J2237/1538

Abstract: This invention discloses a charged-particle beam lithography apparatus which comprises a projection system which projects a charged-particle beam, and images a pattern on a substrate with the projected charged-particle beam. The projection system comprises a symmetrical magnetic doublet lens configured to generate a magnetic field, and an electro-static lens configured to generate an electric field superimposed on the magnetic field. The electro-static lens includes an electrode configured to apply, on at least the pupil plane of the symmetrical magnetic doublet lens, a potential to accelerate the charged-particle beam which has entered the symmetrical magnetic doublet lens.

Abstract translation: 本发明公开了一种带电粒子束光刻设备，其包括投射带电粒子束的投影系统，并用投射的带电粒子束在基片上成像图案。 投影系统包括被配置为产生磁场的对称磁双透镜，以及被配置为产生叠加在磁场上的电场的静电透镜。 静电透镜包括配置成在至少对称磁性双透镜透镜的光瞳面上施加加速已经进入对称磁性双透镜的带电粒子束的电位的电极。

公开(公告)号：US20080121810A1

公开(公告)日：2008-05-29

申请号：US11923012

申请日：2007-10-24

Applicant: Xuedong Liu ,  Xu Zhang ,  Joe Wang ,  Edward Tseng ,  Zhongwei Chen

Inventor： Xuedong Liu ,  Xu Zhang ,  Joe Wang ,  Edward Tseng ,  Zhongwei Chen

IPC: H01J1/50

CPC classification number: H01J37/145 ,  H01J37/28 ,  H01J2237/0475 ,  H01J2237/12 ,  H01J2237/14 ,  H01J2237/24485 ,  H01J2237/2807

Abstract: System and method for charged particle beam. According an embodiment, the present invention provides a charged particle beam apparatus. The apparatus includes a charged particle source for generating a primary charged particle beam. The apparatus also includes at least one condenser lens for pre-focusing the primary charge particle beam. Furthermore, the apparatus includes a compound objective lens for forming the magnetic field and the electrostatic field to focus the primary charged particle beam onto a specimen in the charged particle beam path. The specimen includes a specimen surface. The compound objective lens includes a conical magnetic lens, an immersion magnetic lens, and an electrostatic lens, the conical magnetic lens including an upper pole piece, a shared pole piece being electrically insulated from the upper pole piece, and an excitation coil.

Abstract translation: 带电粒子束的系统和方法。 根据实施例，本发明提供一种带电粒子束装置。 该装置包括用于产生初级带电粒子束的带电粒子源。 该装置还包括用于预聚焦初级充电粒子束的至少一个聚光透镜。 此外，该装置包括用于形成磁场的复合物镜和静电场，以将初级带电粒子束聚焦到带电粒子束路径中的样本上。 样品包括样品表面。 复合物镜包括锥形磁性透镜，浸没式磁透镜和静电透镜，该圆锥形磁性透镜包括上极片，与上极片电绝缘的共用极片和励磁线圈。

公开(公告)号：US20060016988A1

公开(公告)日：2006-01-26

申请号：US10897635

申请日：2004-07-23

Applicant: Igor Petrov ,  Igor Krivts (Krayvitz) ,  Albert Karabekov

Inventor： Igor Petrov ,  Igor Krivts (Krayvitz) ,  Albert Karabekov

IPC: H01J37/28 ,  H01J37/145

CPC classification number: H01J37/147 ,  H01J37/026 ,  H01J37/145 ,  H01J37/28 ,  H01J2237/0044 ,  H01J2237/1405 ,  H01J2237/1526

Abstract: A method and system are presented for directing a charged particle beam towards and away from a sample. The system comprises a lens arrangement having an electrode formed with a beam opening for a charged particle beam passage therethrough; and a magnetic deflector. The magnetic deflector has a magnetic circuit formed by a core part for carrying excitation coils and a polepieces part. The polepieces of the magnetic deflector are in electrical communication with the electrode of the lens arrangement and are electrically insulated from the other part of the magnetic circuit.