公开(公告)号：US20220375712A1

公开(公告)日：2022-11-24

申请号：US17769690

申请日：2020-09-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Weiming REN ,  Xuedong LIU ,  Zhong-wei CHEN ,  Xiaoyu JI ,  Xiaoxue CHEN ,  Weimin ZHOU ,  Frank Nan ZHANG

IPC: H01J37/02 ,  H01J37/28 ,  H01J37/244

Abstract: Systems and methods of providing a probe spot in multiple modes of operation of a charged-particle beam apparatus are disclosed. The method may comprise activating a charged-particle source to generate a primary charged-particle beam and selecting between a first mode and a second mode of operation of the charged-particle beam apparatus. In the flooding mode, the condenser lens may focus at least a first portion of the primary charged-particle beam passing through an aperture of the aperture plate to form a second portion of the primary charged-particle beam, and substantially all of the second portion is used to flood a surface of a sample. In the inspection mode, the condenser lens may focus a first portion of the primary charged-particle beam such that the aperture of the aperture plate blocks off peripheral charged-particles to form the second portion of the primary charged-particle beam used to inspect the sample surface.

公开(公告)号：US20220189726A1

公开(公告)日：2022-06-16

申请号：US17598841

申请日：2020-03-06

Applicant: ASML Netherlands B.V.

Inventor： Qingpo XI ,  Xuerang HU ,  Xuedong LIU ,  Weiming REN ,  Zhong-wei CHEN

IPC: H01J37/147 ,  H01J37/05

Abstract: A multi-beam inspection apparatus including an adjustable beam separator is disclosed. The adjustable beam separator is configured to change a path of a secondary particle beam. The adjustable beam separator comprises a first Wien filter and a second Wien filter. Both Wien filters are aligned with a primary optical axis. The first Wien filter and the second Wien filter are independently controllable via a first excitation input and a second excitation input, respectively. The adjustable beam separator is configured move the effective bending point of the adjustable beam separator along the primary optical axis based on the first excitation input and the second excitation input.

公开(公告)号：US20210391138A1

公开(公告)日：2021-12-16

申请号：US17353790

申请日：2021-06-21

Applicant: ASML Netherlands B.V.

Inventor： Xuedong LIU ,  Weiming REN ,  Shuai LI ,  Zhongwei CHEN

IPC: H01J37/147 ,  H01J37/28 ,  H01J37/04 ,  H01J37/153

Abstract: One modified source-conversion unit and one method to reduce the Coulomb Effect in a multi-beam apparatus are proposed. In the modified source-conversion unit, the aberration-compensation function is carried out after the image-forming function has changed each beamlet to be on-axis locally, and therefore avoids undesired aberrations due to the beamlet tilting/shifting. A Coulomb-effect-reduction means with plural Coulomb-effect-reduction openings is placed close to the single electron source of the apparatus and therefore the electrons not in use can be cut off as early as possible.

公开(公告)号：US20210384008A1

公开(公告)日：2021-12-09

申请号：US17373716

申请日：2021-07-12

Applicant: ASML Netherlands B.V.

Inventor： Shuai LI ,  Weiming REN ,  Xuedong LIU ,  Juying DOU ,  Xuerang HU ,  Zhongwei CHEN

IPC: H01J37/28 ,  H01J37/10

Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput and in flexibly varying observing conditions is proposed. The apparatus uses a movable collimating lens to flexibly vary the currents of the plural probe spots without influencing the intervals thereof, a new source-conversion unit to form the plural images of the single electron source and compensate off-axis aberrations of the plural probe spots with respect to observing conditions, and a pre-beamlet-forming means to reduce the strong Coulomb effect due to the primary-electron beam.

公开(公告)号：US20210217582A1

公开(公告)日：2021-07-15

申请号：US17251724

申请日：2019-06-07

Applicant: ASML Netherlands B.V.

Inventor： Martinus Gerardus, Maria, Johannes MAASSEN ,  Joost Jeroen OTTENS ,  Long MA ,  Youfei JIANG ,  Weihua YIN ,  Wei-Te LI ,  Xuedong LIU

IPC: H01J37/26 ,  H01J37/147 ,  H01J37/22 ,  H01J37/28

Abstract: An improved system and method for inspection of a sample using a particle beam inspection apparatus, and more particularly, to systems and methods of scanning a sample with a plurality of charged particle beams. An improved method of scanning an area of a sample using N charged particle beams, wherein Nis an integer greater than or equal to two, and wherein the area of the sample comprises a plurality of scan sections of N consecutive scan lines, includes moving the sample in a first direction. The method also includes scanning, with a first charged particle beam of the N charged particle beams, first scan lines of at least some scan sections of the plurality of scan sections moving towards a probe spot of the first charged particle beam. The method further includes scanning, with a second charged particle beam of the N charged particle beams, second scan lines of at least some scan sections of the plurality of scan sections moving towards a probe spot of the second charged particle beam.

公开(公告)号：US20210151280A1

公开(公告)日：2021-05-20

申请号：US17135915

申请日：2020-12-28

Applicant: ASML Netherlands B.V.

Inventor： Xuerang HU ,  Xuedong LIU ,  Zhong-Wei CHEN ,  Weiming REN

IPC: H01J37/153 ,  H01J37/14 ,  H01J37/147

Abstract: An improved source conversion unit of a charged particle beam apparatus is disclosed. The source conversion unit comprises a first micro-structure array including a plurality of micro-structures. The plurality of micro-structures is grouped into one or more groups. Corresponding electrodes of micro-structures in one group are electrically connected and driven by a driver to influence a corresponding group of beamlets. The micro-structures in one group may be single-pole structures or multi-pole structures. The micro-structures in one group have same or substantially same radial shifts from an optical axis of the apparatus. The micro-structures in one group have same or substantially same orientation angles with respect to their radial shift directions.

公开(公告)号：US20200321191A1

公开(公告)日：2020-10-08

申请号：US16834778

申请日：2020-03-30

Applicant: ASML Netherlands B.V.

Inventor： Weiming REN ,  Xuedong LIU ,  Xuerang HU ,  Zhong-wei CHEN

IPC: H01J37/317 ,  H01J37/145 ,  H01J37/244 ,  H01J37/20 ,  H01J37/147

Abstract: A multi-beam inspection apparatus supporting a plurality of operation modes is disclosed. The charged particle beam apparatus for inspecting a sample supporting a plurality of operation modes comprises a charged particle beam source configured to emit a charged particle beam along a primary optical axis, a movable aperture plate, movable between a first position and a second position, and a controller having circuitry and configured to change the configuration of the apparatus to switch between a first mode and a second mode. In the first mode, the movable aperture plate is positioned in the first position and is configured to allow a first charged particle beamlet derived from the charged particle beam to pass through. In the second mode, the movable aperture plate is positioned in the second position and is configured to allow the first charged particle beamlet and a second charged particle beamlet to pass through.

公开(公告)号：US20200227233A1

公开(公告)日：2020-07-16

申请号：US16833463

申请日：2020-03-27

Applicant: ASML Netherlands B.V.

Inventor： Kuo-Shih LIU ,  Xuedong LIU ,  Wei FANG ,  Jack JAU

IPC: H01J37/28 ,  H01J37/26

Abstract: Disclosed herein is a method comprising: generating a plurality of probe spots on a sample by a plurality of beams of charged particles; while scanning the plurality of probe spots across a region on the sample, recording from the plurality of probe spots a plurality of sets of signals respectively representing interactions of the plurality of beams of charged particles and the sample; generating a plurality of images of the region respectively from the plurality of sets of signals; and generating a composite image of the region from the plurality of images.

公开(公告)号：US20250027990A1

公开(公告)日：2025-01-23

申请号：US18713108

申请日：2022-10-26

Applicant: ASML Netherlands B.V.

Inventor： Datong ZHANG ,  Xiaoyu JI ,  Weiming REN ,  Xuedong LIU ,  Chia Wen LIN

IPC: G01R31/307 ,  H01J37/28

Abstract: Systems and methods of inspecting a sample using a charged-particle beam apparatus with enhanced probe current and high current density of the primary charged-particle beam are disclosed. The apparatus includes a charged-particle source, a first condenser lens configured to condense the primary charged-particle beam and operable in a first mode and a second mode, wherein: in the first mode, the first condenser lens is configured to condense the primary charged-particle beam, and in the second mode, the first condenser lens is configured to condense the primary charged-particle beam sufficiently to form a crossover along the primary optical axis. The apparatus further includes a second condenser lens configured to adjust a first beam current of the primary charged-particle beam in the first mode and adjust a second beam current of the primary charged-particle beam in the second mode, the second beam current being larger than the first beam current.

公开(公告)号：US20240347313A1

公开(公告)日：2024-10-17

申请号：US18751031

申请日：2024-06-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Zhidong DU ,  Xuedong LIU

IPC: H01J37/22

CPC classification number: H01J37/22 ,  H01J2237/022

Abstract: Systems and methods of removing a contaminant from an emitter tip of an electron source in an electron beam apparatus are disclosed. An electron beam apparatus may include an electron source comprising an emitter tip configured to emit electrons and an optical source configured to generate an optical beam illuminating a portion of the emitter tip to excite a surface mode of the optical beam, wherein the excited surface mode facilitates removal of a contaminant from a surface of the illuminated portion of the emitter tip. The excited surface mode may comprise a propagating surface wave or a localized surface wave. The emitter tip may comprise a grating structure, wherein a characteristic of the grating structure matches a wavevector of the optical beam.