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    Method and apparatus for radiation curing
    31.
    发明授权
    Method and apparatus for radiation curing 失效
    辐射固化的方法和装置

    公开(公告)号：US07935391B2

    公开(公告)日：2011-05-03

    申请号：US11686973

    申请日：2007-03-16

    Applicant: Erich Wolf

    Inventor： Erich Wolf

    IPC: C08F2/46

    CPC classification number: B29C71/04 ,  B05D3/066 ,  B05D3/067 ,  B29C35/0888 ,  B29C2035/0827 ,  B29C2791/005

    Abstract: The invention relates to a method for the radiation curing of surfaces of workpieces, wherein the workpieces are held in a multiplicity of hermetically sealable and at least partly radiation-transparent holding fixtures and are fed consecutively in a cycle to an irradiation device (26), wherein the holding fixtures with the workpieces contained therein are purged with inert gas, and before irradiation or in an irradiation station inert gas is fed into a holding fixture and the holding fixture is purged with the inert gas and the gas displaced by purging is fed to a holding fixture at a previous stage of the operating cycle, for purging of the same, and an apparatus for implementation of the method.

    Abstract translation: 本发明涉及一种用于工件表面的辐射固化的方法，其中工件被保持在多个气密密封和至少部分透光的保持固定装置中，并且以循环方式连续供给至照射装置（26）， 其中容纳有工件的保持固定件用惰性气体吹扫，并且在照射之前或在照射站中，惰性气体被供给到保持固定装置中，并且用惰性气体吹扫保持夹具，并将通过清洗置换的气体供给到 在操作周期的前一阶段的保持夹具，用于清洗它们，以及用于实施该方法的装置。

    Method And Apparatus For Radiation Curing
    33.
    发明申请
    Method And Apparatus For Radiation Curing 失效
    辐射固化方法与装置

    公开(公告)号：US20070269609A1

    公开(公告)日：2007-11-22

    申请号：US11686973

    申请日：2007-03-16

    Applicant: Erich Wolf

    Inventor： Erich Wolf

    IPC: C08F2/46

    CPC classification number: B29C71/04 ,  B05D3/066 ,  B05D3/067 ,  B29C35/0888 ,  B29C2035/0827 ,  B29C2791/005

    Abstract: The invention relates to a method for the radiation curing of surfaces of workpieces, wherein the workpieces are held in a multiplicity of hermetically sealable and at least partly radiation-transparent holding fixtures and are fed consecutively in a cycle to an irradiation device (26), wherein the holding fixtures with the workpieces contained therein are purged with inert gas, and before irradiation or in an irradiation station inert gas is fed into a holding fixture and the holding fixture is purged with the inert gas and the gas displaced by purging is fed to a holding fixture at a previous stage of the operating cycle, for purging of the same, and an apparatus for implementation of the method.

    Abstract translation: 本发明涉及一种用于工件表面的辐射固化的方法，其中工件被保持在多个气密密封和至少部分透光的保持固定装置中，并且以循环方式连续供给至照射装置（26）， 其中容纳有工件的保持固定件用惰性气体吹扫，并且在照射之前或在照射站中，惰性气体被供给到保持固定装置中，并且用惰性气体吹扫保持夹具，并将通过清洗置换的气体供给到 在操作周期的前一阶段的保持夹具，用于清洗它们，以及用于实施该方法的装置。

    Method of treatment for water repellancy, thin film forming method and method of manufacturing organic EL device using this method, organic EL device, and electric device
    34.
    发明申请
    Method of treatment for water repellancy, thin film forming method and method of manufacturing organic EL device using this method, organic EL device, and electric device 审中-公开
    防水性的处理方法，薄膜形成方法以及使用该方法制造有机EL器件的方法，有机EL器件和电子器件

    公开(公告)号：US20030143339A1

    公开(公告)日：2003-07-31

    申请号：US10310162

    申请日：2002-12-05

    Applicant: SEIKO EPSON CORPORATION

    Inventor： Hidekazu Kobayashi

    IPC: B05D005/12 ,  B05D003/06

    CPC classification number: H01L51/56 ,  B05D3/066 ,  B05D5/083 ,  H01L27/3295 ,  H01L51/0038 ,  H01L51/0059

    Abstract: In a method of treating a substrate for water repellency, there is a method of coating with a fluor-alkyl processing agent in the atmosphere or in a vacuum, however this takes time, and foreign matter becomes attached. A substrate surface is irradiated with ultraviolet light while flowing a fluoridated gas thereover to treat for water repellency. Moreover a thin film is formed inside a partition by this method and an organic EL device if manufactured by a liquid phase method. To be specific, scrub cleaning, UV ozone cleaning, an ultraviolet fluoridization process, an organic film forming is performed using an ink jet method, a cathode film forming and a sealing are performed.

    Abstract translation: 在处理基材的斥水性的方法中，存在在大气中或真空中涂布氟烷基处理剂的方法，但是这需要时间，并且附着异物。 用紫外线照射基板表面，同时流过其上的氟化气体以处理疏水性。 此外，如果通过液相法制造，则通过该方法在隔板内形成薄膜和有机EL器件。 具体而言，使用喷墨法进行擦洗清洗，紫外线臭氧清洗，紫外线氟化处理，有机膜形成，进行阴极成膜和密封。

    Apparatus for forming resin coating on surface of article having three-dimensional structure
    35.
    发明授权
    Apparatus for forming resin coating on surface of article having three-dimensional structure 失效
    用于在具有三维结构的制品表面上形成树脂涂层的装置

    公开(公告)号：US5385611A

    公开(公告)日：1995-01-31

    申请号：US26399

    申请日：1993-03-04

    Applicant: Yoshihiro Matsumoto ,  Mitsuhiro Shinomoto ,  Yasunori Yagi

    Inventor： Yoshihiro Matsumoto ,  Mitsuhiro Shinomoto ,  Yasunori Yagi

    IPC: B05B13/02 ,  B05C3/10 ,  B05C9/12 ,  B05C9/14 ,  B05C13/02 ,  B05D3/04 ,  B05D3/06 ,  F26B15/10

    CPC classification number: B05D3/066 ,  B05C13/02 ,  B05C9/14 ,  B05D3/0486 ,  B05D3/068

    Abstract: An apparatus for forming a resin coating on the surface of an article having a three-dimensional structure, comprising: (i) a compartment (a) in which the surface of the article is coated with a resin solution, (ii) a compartment (b) in which said resin solution coated on said article is cured; and (iii) means for successively transporting said article through said compartments; wherein said compartment (b) is substantially shut off from the outside air and has an entrance and an exit for said article transport means, said entrance and said exit being provided with respect guide members having substantially the same cross-sectional configuration.

    Abstract translation: 一种用于在具有三维结构的制品的表面上形成树脂涂层的装置，包括：（i）其中制品的表面涂覆有树脂溶液的隔室（a），（ii）隔室（ b）其中涂覆在所述制品上的所述树脂溶液固化; 和（iii）用于将所述制品依次运送通过所述隔室的装置; 其中所述隔室（b）基本上与外部空气隔绝，并且具有用于所述物品输送装置的入口和出口，所述入口和所述出口设置有具有基本相同横截面构造的相应导向件。

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