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    High resolution spectral measurement device
    31.
    发明申请
    High resolution spectral measurement device 有权
    高分辨率光谱测量装置

    公开(公告)号：US20020121608A1

    公开(公告)日：2002-09-05

    申请号：US10098975

    申请日：2002-03-15

    Inventor： Richard L. Sandstrom ,  Alexander I. Ershov ,  William N. Partlo ,  Igor V. Fomenkov ,  Scott T. Smith ,  Daniel J. W. Brown

    IPC: G01J001/42

    CPC classification number: G01J3/26 ,  G01J1/4257 ,  G01J3/02 ,  G01J3/0205 ,  G01J3/12 ,  G01J3/1804 ,  G01J3/22 ,  G01J9/02

    Abstract: A high resolution spectral measurement device. A preferred embodiment presents an extremely narrow slit function in the ultraviolet range and is very useful for measuring bandwidth of narrow-band excimer lasers used for integrated circuit lithography. Light from the laser is focused into a diffuser and the diffused light exiting the diffuser illuminates an etalon. A portion of its light exiting the etalon is collected and directed into a slit positioned at a fringe pattern of the etalon. Light passing through the slit is collimated and the collimated light illuminates a grating positioned in an approximately Littrow configuration which disburses the light according to wavelength. A portion of the dispursed light representing the wavelength corresponding to the selected etalon fringe is passed through a second slit and monitored by a light detector. When the etalon and the grating are tuned to the same precise wavelength a slit function is defined which is extremely narrow such as about 0.034 pm (FWHM) and about 0.091 pm (95 percent integral). The bandwidth of a laser beam can be measured very accurately by a directing portion of the laser beam into the insulator and scanning the laser wavelength over a range which includes the monochromator slit wavelength. In a second embodiment the second slit and the light detector is replaced by a photodiod array and the bandwidth of a laser beam is determined by analyzing a set of scan data from the photodiode array. Alternately, the laser wavelength can be fixed near the middle of the spectrum range of the grating spectrometer, and the etalon can be scanned.

    Abstract translation: 高分辨率光谱测量装置。 优选的实施例在紫外线范围内呈现非常窄的狭缝功能，并且对于测量用于集成电路光刻的窄带准分子激光器的带宽是非常有用的。 来自激光的光被聚焦成漫射器，并且离开扩散器的漫射光照射标准具。 将其从标准具出射的光的一部分收集并引导到位于标准具的边缘图案处的狭缝中。 通过狭缝的光线被准直，并且准直光照射位于大约Littrow配置中的光栅，其根据波长散发光。 表示对应于所选择的标准具条纹的波长的调度光​​的一部分通过第二狭缝并由光检测器监视。 当标准具和光栅调谐到相同的精确波长时，定义狭缝功能，其极窄，例如约0.034μm（FWHM）和约0.091μm（95％积分）。 通过激光束的引导部分进入绝缘体并且在包括单色器狭缝波长的范围内扫描激光波长，可以非常精确地测量激光束的带宽。 在第二实施例中，第二狭缝和光检测器由光电二极管阵列替代，并且通过分析来自光电二极管阵列的一组扫描数据来确定激光束的带宽。 或者，激光波长可以固定在光栅光谱仪的光谱范围附近，可以扫描标准具。

    High resolution etalon-grating spectrometer
    32.
    发明申请
    High resolution etalon-grating spectrometer 有权
    高分辨率标准光栅光谱仪

    公开(公告)号：US20020101589A1

    公开(公告)日：2002-08-01

    申请号：US10003513

    申请日：2001-10-31

    Inventor： Richard L. Sandstrom ,  Alexander I. Ershov ,  William N. Partlo ,  Igor V. Fomenkov ,  Daniel J. W. Brown

    IPC: G01J003/18

    CPC classification number: G01J3/12 ,  G01J1/4257 ,  G01J3/22 ,  G01J3/26 ,  G01J9/02

    Abstract: A high resolution etalon-grating spectrometer. A preferred embodiment presents an extremely narrow slit function in the ultraviolet range and is very useful for measuring bandwidth of narrow band excimer lasers used for integrated circuit lithography. Light from the laser is focused into a diffuser and the diffused light exiting the diffuser illuminates an etalon. A portion of its light exiting the etalon is collected and directed into a slit positioned at a fringe pattern of the etalon. Light passing through the slit is collimated and the collimated light illuminates a grating positioned in an approximately Littrow configuration which disburses the light according to wavelength. A portion of the dispursed light representing the wavelength corresponding to the selected etalon fringe is passed through a second slit and monitored by a light detector. When the etalon and the grating are tuned to the same precise wavelength a slit function is defined which is extremely narrow such as about 0.034 pm (FWHM) and about 0.091 pm (95 percent integral). The etalon and the grating are placed in a leak-fight enclosure filled with a gas, such as nitrogen or helium. The wavelength scanning of the spectrometer is done by changing the gas pressure in the enclosure during the scan.

    Abstract translation: 高分辨率标准光栅光谱仪。 优选的实施例在紫外范围内呈现非常狭窄的狭缝功能，并且对于测量用于集成电路光刻的窄带准分子激光器的带宽是非常有用的。 来自激光的光被聚焦成漫射器，并且离开扩散器的漫射光照射标准具。 将其从标准具出射的光的一部分收集并引导到位于标准具的边缘图案处的狭缝中。 通过狭缝的光线被准直，并且准直光照射位于大约Littrow配置中的光栅，其根据波长散发光。 表示对应于所选择的标准具条纹的波长的调度光​​的一部分通过第二狭缝并由光检测器监视。 当标准具和光栅调谐到相同的精确波长时，定义狭缝功能，其极窄，例如约0.034μm（FWHM）和约0.091μm（95％积分）。 标准具和光栅放置在填充有气体（如氮气或氦气）的泄漏战斗箱中。 光谱仪的波长扫描通过在扫描期间改变外壳中的气体压力来完成。

    Spectrometer
    33.
    发明申请
    Spectrometer 有权
    光谱仪

    公开(公告)号：US20010024275A1

    公开(公告)日：2001-09-27

    申请号：US09801001

    申请日：2001-03-08

    Inventor： Toru Suzuki ,  Osamu Wakabayashi

    IPC: G01J003/28

    CPC classification number: G01J3/1809 ,  G01J3/1838 ,  G01J3/22

    Abstract: A spectrometer measures a spectrum of a light beam supplied from a light source so as to obtain fine information and coarse information of the spectrum easily. This spectrometer has a holographic grating, an Echelle grating, a rotation stage and a line sensor. In the case where a single pass beam is to be detected, a control processing unit controls the rotation stage so as to rotate the Echelle grating from the Littrow arrangement by a predetermined angle null1. On the other hand, in the case where a double pass beam is to be detected, the control processing unit controls the rotation stage so as to rotate the Echelle grating from the Littrow arrangement by a predetermined angle null2.

    Abstract translation: 光谱仪测量从光源提供的光束的光谱，以便容易地获得光谱的精细信息和粗略信息。 该光谱仪具有全息光栅，Echelle光栅，旋转台和线传感器。 在要检测单程光束的情况下，控制处理单元控制旋转阶段，以使Echelle光栅从Littrow布置旋转预定角度δ1。 另一方面，在要检测双通光束的情况下，控制处理单元控制旋转台，以便将梯形光栅从Littrow布置旋转预定角度δ2。

    Curved Grating Spectrometer and Wavelength Multiplexer or Demultiplexer with Very High Wavelength Resolution
    36.
    发明申请
    Curved Grating Spectrometer and Wavelength Multiplexer or Demultiplexer with Very High Wavelength Resolution 有权
    曲线光栅光谱仪和具有非常高波长分辨率的波分复用器或解复用器

    公开(公告)号：US20150070697A1

    公开(公告)日：2015-03-12

    申请号：US14482615

    申请日：2014-09-10

    Applicant: OptoNet, Inc.

    Inventor： Seng-Tiong Ho ,  Yingyan Huang

    IPC: G01J3/18 ,  G01J3/02 ,  G02B6/10 ,  G01J3/28

    CPC classification number: G01J3/18 ,  G01J3/0256 ,  G01J3/20 ,  G01J3/22 ,  G01J3/28 ,  G02B6/10 ,  G02B6/29326 ,  G02B6/29328 ,  H04B10/07

    Abstract: The present application discloses a system comprising a compact curved grating (CCG) and its associated compact curved grating spectrometer (CCGS) or compact curved grating wavelength multiplexer/demultiplexer (WMDM) module and a method for making the same. The system is capable of achieving a very small (resolution vs. size) RS factor. The location of the entrance slit and detector can be adjusted in order to have the best performance for a particular design goal. The initial groove spacing is calculated using a prescribed formula dependent on operation wavelength. The location of the grooves is calculated based on two conditions. The first one being that the path-difference between adjacent grooves should be an integral multiple of the wavelength in the medium to achieve aberration-free grating focusing at the detector or a first anchor output slit even with large beam diffraction angle from the entrance slit or input slit, the second one being specific for a particular design goal of a curved-grating spectrometer.

    Abstract translation: 本申请公开了一种包括紧凑弯曲光栅（CCG）及其相关联的紧凑弯曲光栅光谱仪（CCGS）或紧凑弯曲光栅波长多路复用器/解复用器（WMDM）模块的系统及其制造方法。 该系统能够实现非常小的（分辨率vs.尺寸）RS因子。 可以调整入口狭缝和检测器的位置，以便为特定设计目标获得最佳性能。 使用取决于工作波长的规定公式计算初始槽间距。 基于两个条件计算凹槽的位置。 第一个是相邻凹槽之间的路径差应该是介质中的波长的整数倍，以便在检测器或第一锚定输出狭缝处聚焦的无像差光栅，即使具有来自入射狭缝的大的光束衍射角或 输入狭缝，第二个特定于弯曲光栅光谱仪的特定设计目标。

    Curved grating spectrometer and wavelength multiplexer or demultiplexer with very high wavelength resolution
    38.
    发明授权
    Curved grating spectrometer and wavelength multiplexer or demultiplexer with very high wavelength resolution 有权
    弯曲光栅光谱仪和具有非常高波长分辨率的波长多路复用器或解复用器

    公开(公告)号：US08854620B2

    公开(公告)日：2014-10-07

    申请号：US13911847

    申请日：2013-06-06

    Applicant: Seng-Tiong Ho

    Inventor： Seng-Tiong Ho ,  Yingyan Huang

    IPC: G01J3/28 ,  G02B6/293 ,  G01J3/20 ,  H04B10/07 ,  G01J3/22 ,  G01J3/02

    CPC classification number: H04B10/07 ,  G01J3/0256 ,  G01J3/20 ,  G01J3/22 ,  G02B6/29326 ,  G02B6/29328

    Abstract: The present application discloses a system comprising a compact curved grating (CCG) and its associated compact curved grating spectrometer (CCGS) or compact curved grating wavelength multiplexer/demultiplexer (WMDM) module and a method for making the same. The system is capable of achieving a very small (resolution vs. size) RS factor. In the invention, the location of the entrance slit and detector can be adjusted in order to have the best performance for a particular design goal. The initial groove spacing is calculated using a prescribed formula dependent on operation wavelength. The location of the grooves is calculated based on two conditions. The first one being that the path-difference between adjacent grooves should be an integral multiple of the wavelength in the medium to achieve aberration-free grating focusing at the detector or output slit (or output waveguide) even with large beam diffraction angle from the entrance slit or input slit (or input waveguide). The second one being specific for a particular design goal of a curved-grating spectrometer. In an embodiment, elliptical mirrors each with focal points at the slit and detector are used for each groove to obtain aberration-free curved mirrors.

    Abstract translation: 本申请公开了一种包括紧凑弯曲光栅（CCG）及其相关联的紧凑弯曲光栅光谱仪（CCGS）或紧凑弯曲光栅波长多路复用器/解复用器（WMDM）模块的系统及其制造方法。 该系统能够实现非常小的（分辨率vs.尺寸）RS因子。 在本发明中，可以调整入口狭缝和检测器的位置，以便为特定设计目标具有最佳性能。 使用取决于工作波长的规定公式计算初始槽间距。 基于两个条件计算凹槽的位置。 第一个是相邻槽之间的路径差应该是介质中的波长的整数倍，以便即使在入口处具有大的光束衍射角，也可以在检测器或输出狭缝（或输出波导）处聚焦的无像差光栅 狭缝或输入狭缝（或输入波导）。 第二个特定于曲面光栅光谱仪的特定设计目标。 在一个实施例中，每个具有狭缝和检测器处的​​焦点的椭圆镜用于每个凹槽，以获得无像差的曲面镜。

    Multiband spatial heterodyne spectrometer and associated methods
    39.
    发明授权
    Multiband spatial heterodyne spectrometer and associated methods 有权
    多频段空间外差谱仪及相关方法

    公开(公告)号：US08154732B2

    公开(公告)日：2012-04-10

    申请号：US12111108

    申请日：2008-04-28

    Applicant: Andrew Bodkin ,  Andrew I. Sheinis

    Inventor： Andrew Bodkin ,  Andrew I. Sheinis

    IPC: G01B9/02 ,  G01J3/45

    CPC classification number: G01J3/36 ,  G01J3/02 ,  G01J3/021 ,  G01J3/22 ,  G01J3/2823 ,  G01J3/453

    Abstract: A multiband spatial heterodyne spectrometer for determining spectra in first and second wavelength bands has a beam splitter configured to split incident light and to direct the incident light upon a first and a second diffraction grating. The gratings are configured for Littrow reflection of incident light of the first wavelength band at a first order and Littrow reflection of incident light of the second wavelength band at a second order. Light reflected by the first and the second diffraction grating forms diffraction patterns that are imaged by an electronic camera. A dispersive device such as a prism or diffraction grating separates the imaged interference patterns onto separate rows of pixel sensors corresponding to the wavelength bands. A processing device receives information from the detector and computes spectra therefrom. In embodiments, the spectrometer is configured to compute hyperspectral images of a target.

    Abstract translation: 用于确定第一和第二波长带中的光谱的多频带空间外差光谱仪具有分束器，其配置成分离入射光并将入射光引导到第一和第二衍射光栅上。 光栅被配置为以第一阶次的第一波长带的入射光和第二波长带的入射光的Littrow反射的二次反射。 由第一和第二衍射光栅反射的光形成由电子照相机成像的衍射图案。 诸如棱镜或衍射光栅的色散装置将成像的干涉图案分离成对应于波长带的单独的像素传感器行。 处理装置从检测器接收信息并从其计算光谱。 在实施例中，光谱仪被配置为计算目标的高光谱图像。

    Spectrometer assembly
    40.
    发明授权
    Spectrometer assembly 有权
    光谱仪组装

    公开(公告)号：US08102527B2

    公开(公告)日：2012-01-24

    申请号：US12665665

    申请日：2008-05-09

    Applicant: Helmut Becker-Ross ,  Michael Okruss ,  Stefan Florek

    Inventor： Helmut Becker-Ross ,  Michael Okruss ,  Stefan Florek

    IPC: G01J3/28

    CPC classification number: G01J3/22 ,  G01J3/02 ,  G01J3/0208 ,  G01J3/08 ,  G01J3/1809 ,  G01J3/2823 ,  G01J3/32

    Abstract: The invention relates to a spectrometer arrangement (10) having a spectrometer for producing a spectrum of radiation from a radiation source on a detector (34), comprising an optical imaging Littrow arrangement (18, 20) for imaging the radiation entering the spectrometer arrangement (16) in an image plane, a first dispersion arrangement (28, 30) for the spectral decomposition of a first wavelength range of the radiation entering the spectrometer arrangement, a second dispersion arrangement (58, 60) for the spectral decomposition of a second wavelength range of the radiation entering the spectrometer arrangement, and a common detector (34) arranged in the image plane of the imagine optics, characterized in that the imaging optical arrangement (18, 20) comprises an element (20) that can be moved between two positions (20, 50), wherein the radiation entering the spectrometer arrangement in the first position is guided via the first dispersion arrangement and in the second position via the second dispersion arrangement.

    Abstract translation: 本发明涉及一种具有用于在检测器（34）上产生来自辐射源的辐射光谱的光谱仪的光谱仪装置（10），该光谱仪包括用于对进入光谱仪装置的辐射进行成像的光学成像Littrow布置（18,20） 16），用于对进入光谱仪装置的辐射的第一波长范围进行光谱分解的第一色散装置（28,30），用于第二波长的光谱分解的第二色散装置（58,60） 进入光谱仪布置的辐射的范围以及布置在想象光学器件的图像平面中的公共检测器（34），其特征在于，成像光学装置（18,20）包括可在两者之间移动的元件（20） 位置（20,50），其中在第一位置进入分光计装置的辐射经由第一分散装置被引导，并且经由 第二分散布置。

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