公开(公告)号：US20020104969A1

公开(公告)日：2002-08-08

申请号：US10113002

申请日：2002-03-28

Inventor： Zhong-Wei Chen

IPC: H01J037/141

CPC classification number: H01J37/28 ,  H01J37/141 ,  H01J2237/04756 ,  H01J2237/1035

Abstract: A swinging objective retarding immersion lens system and method therefore which provide a low voltage electron beam with high beam current, relatively high spatial resolution, a relative large scan field, and high signal collection efficiency. The objective lens includes a magnetic lens for generating a magnetic field in the vicinity of the specimen to focus the particles of the particle beam on the specimen, an electrode having a potential for providing a retarding field to the particle beam near the specimen to reduce the energy of the particle beam when the beam collides with the specimen; a deflection system including a plurality of deflection units situated along the beam axis for deflecting the particle beam to allow scanning on the specimen with large area, at least one of the deflection units located in the retarding field of the beam, the remainder of the deflection units located within the central bore of the magnetic lens; and a annular detection unit with a relatively small aperture, located underneath the primary beam define aperture, to capture secondary electron (SE) and backscattered electrons (BSE).

Abstract translation: 一种摆动物镜延迟浸没透镜系统及其方法，其提供具有高光束电流的低电压电子束，相对高的空间分辨率，相对大的扫描场和高的信号收集效率。 物镜包括用于在样本附近产生磁场以将粒子束的粒子聚焦在样本上的磁性透镜，具有向样本附近的粒子束提供延迟场的电位的电极，以减少 当光束与样品碰撞时，粒子束的能量; 偏转系统包括沿着光束轴线设置的多个偏转单元，用于偏转粒子束以允许对具有大面积的样本进行扫描，位于光束的延迟场中的至少一个偏转单元，偏转的剩余部分 位于磁性透镜的中心孔内的单元; 和具有相对较小孔径的环形检测单元，位于主光束下方限定孔，以捕获二次电子（SE）和反向散射电子（BSE）。

公开(公告)号：US06307312B1

公开(公告)日：2001-10-23

申请号：US09266090

申请日：1999-03-10

Applicant: Hitoshi Tanaka

Inventor： Hitoshi Tanaka

IPC: H01J2950

CPC classification number: H01J37/141 ,  H01J2237/1035 ,  H01J2237/3175

Abstract: An immersion lens comprising a first magnetic lens unit for generating a first magnetic field and a second magnetic lens unit for generating a second magnetic field is disclosed. The combined magnetic field of the first and second magnetic fields converges the electron beam between the first magnetic lens unit and the second magnetic lens unit. The immersion lens is reduced in size by configuring the second magnetic lens of a permanent magnet.

Abstract translation: 公开了一种包括用于产生第一磁场的第一磁性透镜单元和用于产生第二磁场的第二磁性透镜单元的浸没透镜。 第一和第二磁场的组合磁场在第一磁性透镜单元和第二磁性透镜单元之间会聚电子束。 通过配置永磁体的第二磁性透镜，浸没透镜的尺寸减小。

公开(公告)号：US5241176A

公开(公告)日：1993-08-31

申请号：US800357

申请日：1991-12-02

Applicant: Akira Yonezawa

Inventor： Akira Yonezawa

IPC: H01L21/66 ,  H01J37/141 ,  H01J37/28

CPC classification number: H01J37/141 ,  H01J2237/1035 ,  H01J2237/28

Abstract: An electron beam device having a single pole electromagnetic objective lens whose pole top face is positioned in front of a sample as viewed from the side of an electron beam source. A secondary electron detector is provided in the vicinity of the pole top face of an inner cylinder of the objective lens. The objective lens has a circular cylindrical or conical shape at the top of the objective lens and the vertical angle of the circular cylindrical or conical shape is 45.degree.-90.degree.. The working distance between the top of the objective lens and sample is less than 6 mm. It is possible to survey the sample with a resolving power corresponding to a dimension about one-half that of the prior art under low accelerating voltage conditions.

Abstract translation: 具有单极电磁物镜的电子束装置，其从电子束源的侧面观察时，其极顶面位于样品的前方。 二次电子检测器设置在物镜的内筒的极顶面附近。 物镜在物镜顶部呈圆柱形或圆锥形，圆柱形或圆锥形的垂直角为45°-90°。 物镜顶部与样品之间的工作距离小于6 mm。 可以在低加速电压条件下以与现有技术相当的一半尺寸的分辨能力来测量样品。

公开(公告)号：US20230207251A1

公开(公告)日：2023-06-29

申请号：US18167991

申请日：2023-02-13

Applicant: Carl Zeiss MultiSEM GmbH

Inventor： Stefan Schubert

IPC: H01J37/147 ,  H01J37/244 ,  H01J37/143

CPC classification number: H01J37/1478 ,  H01J37/244 ,  H01J37/143 ,  H01J2237/1035 ,  H01J2237/152 ,  H01J2237/153 ,  H01J2237/1502

Abstract: A multiple particle beam system comprises a magnetic immersion lens and a detection system. A cross-over of the second individual particle beams is provided in the secondary path between the beam switch and the detection system, and a contrast aperture with a central cutout for cutting out the secondary beams is arranged in the region of the cross-over. A contrast correction lens system with a first magnetic contrast correction lens is arranged between the objective lens and the contrast aperture. The contrast correction lens system is configured to generate a magnetic field with an adjustable strength and correct beam tilts of the secondary beams in the cross-over in relation to the optical axis of the multiple particle beam system. It is possible to obtain a more uniform contrast for different individual images and the contrast can be improved overall.

公开(公告)号：US20140070098A1

公开(公告)日：2014-03-13

申请号：US14021480

申请日：2013-09-09

Applicant: FEI Company

Inventor： Petr Sytar ,  Petr Hlavenka ,  Lubomir Tûma

IPC: H01J37/14

CPC classification number: H01J37/14 ,  H01J37/145 ,  H01J37/28 ,  H01J2237/1035 ,  H01J2237/24475 ,  H01J2237/24485 ,  H01J2237/248

Abstract: The invention relates to a compound objective lens for a Scanning Electron Microscope having a conventional magnetic lens excited by a first lens coil, an immersion magnetic lens excited by a second lens coil, and an immersion electrostatic lens excited by the voltage difference between the sample and the electrostatic lens electrode. For a predetermined excitation of the lens, the electron beam can be focused on the sample using combinations of excitations of the two lens coils. More BSE information can be obtained when the detector distinguishes between BSE's (202) that strike the detector close to the axis and BSE's (204) that strike the detector further removed from the axis.By tuning the ratio of the excitation of the two lens coils, the distance from the axis that the BSE's impinge on the detector can be changed, and the compound lens can be used as an energy selective detector.

Abstract translation: 本发明涉及一种用于扫描电子显微镜的复合物镜，其具有由第一透镜线圈激发的常规磁透镜，由第二透镜线圈激发的浸没磁透镜，以及由样品和 静电透镜电极。 对于透镜的预定激发，可以使用两个透镜线圈的激发的组合将电子束聚焦在样品上。 当检测器区分击穿靠近轴的检测器的BSE（202）和撞击检测器进一步从轴移除的BSE（204）之后，可以获得更多的BSE信息。 通过调整两个透镜线圈的激励的比率，可以改变从BSE撞击在检测器上的轴的距离，并且复合透镜可以用作能量选择性检测器。

公开(公告)号：US08461526B2

公开(公告)日：2013-06-11

申请号：US12958174

申请日：2010-12-01

Applicant: Marian Mankos ,  Liqun Han ,  Xinrong Jiang ,  Rex Runyon ,  Carmela Moreno

Inventor： Marian Mankos ,  Liqun Han ,  Xinrong Jiang ,  Rex Runyon ,  Carmela Moreno

IPC: G01N23/00

CPC classification number: H01J37/04 ,  H01J2237/0458 ,  H01J2237/0492 ,  H01J2237/063 ,  H01J2237/1035 ,  H01J2237/14 ,  H01J2237/186 ,  H01J2237/24535

Abstract: In one embodiment, a first vacuum chamber of an electron beam column has an opening which is positioned along an optical axis so as to pass a primary electron beam that travels down the column. A source that emits electrons is positioned within the first vacuum chamber. A beam-limiting aperture is configured to pass a limited angular range of the emitted electrons. A magnetic immersion lens is positioned outside of the first vacuum chamber and is configured to immerse the electron source in a magnetic field so as to focus the emitted electrons into the primary electron beam. An objective lens is configured to focus the primary electron beam onto a beam spot on a substrate surface so as to produce scattered electrons from the beam spot. Controllable deflectors are configured to scan the beam spot over an area of the substrate surface. Other features and embodiments are also disclosed.

Abstract translation: 在一个实施例中，电子束列的第一真空室具有沿着光轴定位的开口，以便通过沿着该列行进的一次电子束。 发射电子的源被定位在第一真空室内。 光束限制孔被配置成通过发射电子的有限角度范围。 磁浸透镜位于第一真空室的外部，并且被配置为将电子源浸入磁场中，以将发射的电子聚焦到一次电子束中。 物镜被配置为将一次电子束聚焦到衬底表面上的束斑上，以便从束斑产生散射的电子。 可控制偏转器被配置为在衬底表面的区域上扫描束斑。 还公开了其它特征和实施例。

公开(公告)号：US20130087703A1

公开(公告)日：2013-04-11

申请号：US13699054

申请日：2011-05-18

Applicant: Takashi Onishi ,  Shunichi Watanabe ,  Mikio Ichihashi

Inventor： Takashi Onishi ,  Shunichi Watanabe ,  Mikio Ichihashi

IPC: H01J37/26

CPC classification number: H01J37/261 ,  H01J3/021 ,  H01J9/39 ,  H01J9/505 ,  H01J37/065 ,  H01J37/073 ,  H01J37/26 ,  H01J2237/022 ,  H01J2237/06341 ,  H01J2237/1035 ,  H01J2237/14 ,  H01J2237/182 ,  Y02W30/828

Abstract: In an electron microscope having a magnetic field immersion type cold-FE electron gun, the electron gun and the electron microscope are provided with high observation efficiency and the focal distance of the electron gun does not change during use. The degree of vacuum in the electron gun is improved with a getter pump for stabilization. Further, observation efficiency is improved by cleaning the electron source periodically and returning to recorded optical conditions on the occasion.

Abstract translation: 在具有磁场浸渍型冷FE电子枪的电子显微镜中，电子枪和电子显微镜具有高观察效率，并且电子枪的焦距在使用期间不改变。 使用吸气泵来稳定电子枪中的真空度得到改善。 此外，通过周期性地清洁电子源并返回记录的光学条件来改善观察效率。

公开(公告)号：US20120145917A1

公开(公告)日：2012-06-14

申请号：US12968221

申请日：2010-12-14

Applicant: ZHONGWEI CHEN ,  WEIMING REN ,  KENICHI KANAI ,  XUEDONG LIU

Inventor： ZHONGWEI CHEN ,  WEIMING REN ,  KENICHI KANAI ,  XUEDONG LIU

IPC: H01J3/32

CPC classification number: H01J37/141 ,  H01J37/28 ,  H01J2237/1035 ,  H01J2237/1415 ,  H01J2237/1534

Abstract: An apparatus basically uses a simple and compact multi-axis magnetic lens to focus each of a plurality of charged particle beams on sample surface at the same time. In each sub-lens module of the multi-axis magnetic lens, two magnetic rings are respectively inserted into upper and lower holes with non-magnetic radial gap. Each gap size is small enough to keep a sufficient magnetic coupling and large enough to get a sufficient axial symmetry of magnetic scale potential distribution in the space near to its optical axis. This method eliminates the non-axisymmetric transverse field in each sub-lens and the round lens field difference among all sub-lenses at the same time; both exist inherently in a conventional multi-axis magnetic lens. In the apparatus, some additional magnetic shielding measures such as magnetic shielding tubes, plates and house are used to eliminate the non-axisymmetric transverse field on the charged particle path from each charged particle source to the entrance of each sub-lens and from the exit of each sub-lens to the sample surface.

公开(公告)号：US20120138791A1

公开(公告)日：2012-06-07

申请号：US12958174

申请日：2010-12-01

Applicant: Marian MANKOS ,  Liqun HAN ,  Xinrong JIANG ,  Rex RUNYON ,  Carmela MORENO

Inventor： Marian MANKOS ,  Liqun HAN ,  Xinrong JIANG ,  Rex RUNYON ,  Carmela MORENO

IPC: G01N23/00 ,  H01J1/50

CPC classification number: H01J37/04 ,  H01J2237/0458 ,  H01J2237/0492 ,  H01J2237/063 ,  H01J2237/1035 ,  H01J2237/14 ,  H01J2237/186 ,  H01J2237/24535

Abstract: In one embodiment, a first vacuum chamber of an electron beam column has an opening which is positioned along an optical axis so as to pass a primary electron beam that travels down the column. A source that emits electrons is positioned within the first vacuum chamber. A beam-limiting aperture is configured to pass a limited angular range of the emitted electrons. A magnetic immersion lens is positioned outside of the first vacuum chamber and is configured to immerse the electron source in a magnetic field so as to focus the emitted electrons into the primary electron beam. An objective lens is configured to focus the primary electron beam onto a beam spot on a substrate surface so as to produce scattered electrons from the beam spot. Controllable deflectors are configured to scan the beam spot over an area of the substrate surface. Other features and embodiments are also disclosed.

Abstract translation: 在一个实施例中，电子束列的第一真空室具有沿着光轴定位的开口，以便通过沿着该列行进的一次电子束。 发射电子的源被定位在第一真空室内。 光束限制孔被配置成通过发射电子的有限角度范围。 磁浸透镜位于第一真空室的外部，并且被配置为将电子源浸入磁场中，以将发射的电子聚焦到一次电子束中。 物镜被配置为将一次电子束聚焦到衬底表面上的束斑上，以便从束斑产生散射的电子。 可控制偏转器被配置为在衬底表面的区域上扫描束斑。 还公开了其它特征和实施例。

公开(公告)号：US07759653B2

公开(公告)日：2010-07-20

申请号：US12130879

申请日：2008-05-30

Applicant: Zhong-Wei Chen ,  Xuedong Liu ,  Xu Zhang ,  Weiming Ren ,  Juying Dou

Inventor： Zhong-Wei Chen ,  Xuedong Liu ,  Xu Zhang ,  Weiming Ren ,  Juying Dou

IPC: H01J37/00 ,  H01J37/28

CPC classification number: H01J37/28 ,  H01J37/141 ,  H01J2237/0475 ,  H01J2237/1035

Abstract: The present invention includes an electron beam device for examining defects on semiconductor devices. The device includes an electron source for generating a primary electron beam, wherein the total acceleration potential is divided and is provided across the ground potential. Also included is at least one condenser lens for pre-focusing the primary electron beam, an aperture for confining the primary electron beam to ameliorate electron-electron interaction, wherein the aperture is positioned right underneath the last condenser lens, and a SORIL objective lens system for forming immersion magnetic field and electrostatic field to focus the primary beam onto the specimen in the electron beam path. A pair of grounding rings for providing virtual ground voltage potential to those components within the electron beam apparatus installed below a source anode and above a last polepiece of the SORIL objective lens.

Abstract translation: 本发明包括用于检查半导体器件上的缺陷的电子束装置。 该装置包括用于产生一次电子束的电子源，其中总加速电位被分开并提供在地电位之间。 还包括至少一个用于预聚焦一次电子束的聚光透镜，用于限制一次电子束以改善电子 - 电子相互作用的孔，其中孔位于最后的聚光透镜的正下方，以及SORIL物镜系统 用于形成浸没磁场和静电场，以将主光束聚焦在电子束路径中的样本上。 一对接地环，用于为安装在源极阳极和SORIL物镜的最后一个极点之上的电子束装置内的那些部件提供虚拟接地电压电位。