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    Object observation apparatus and object observation
    31.
    再颁专利
    Object observation apparatus and object observation 有权

    公开(公告)号：USRE40221E1

    公开(公告)日：2008-04-08

    申请号：US10986576

    申请日：2004-11-12

    Applicant: Muneki Hamashima ,  Yoichi Watanabe ,  Yoshiaki Kohama

    Inventor： Muneki Hamashima ,  Yoichi Watanabe ,  Yoshiaki Kohama

    IPC: H01J37/28

    CPC classification number: H01J37/265 ,  G01N23/225 ,  H01J37/244 ,  H01J37/28 ,  H01J37/292 ,  H01J2237/2446 ,  H01J2237/2817

    Abstract: This invention relates to an object observation apparatus and observation method. The object observation apparatus is characterized by including a drivable stage on which a sample is placed, an irradiation optical system which is arranged to face the sample on the stage, and emits an electron beam as a secondary beam, an electron detection device which is arranged to face the sample, causes to project, as a primary beam, at least one of a secondary electron, reflected electron, and back-scattering electron generated by the sample upon irradiation of the electron beam, and generates image information of the sample, a stage driving device which is adjacent to the stage to drive the stage, and a deflector arranged between the sample and the electron detection device to deflect the secondary beam, the electron detection device having a converter arranged on a detection surface to convert the secondary beam into light, an array image sensing unit which is adjacent to the converter, has pixels of a plurality of lines each including a plurality of pixels on the detection surface, sequentially transfers charges of pixels of each line generated upon reception of light of an optical image obtained via the converter to corresponding pixels of an adjacent line at a predetermined timing, adds, every transfer, charges generated upon reception of light after the transfer at the pixels which received the charges, and sequentially outputs charges added up to a line corresponding to an end, and a control unit connected to the array image sensing unit to output a transfer signal for sequentially transferring charges of pixels of each line to an adjacent line, and the control unit having a stage scanning mode in which the array image sensing unit is controlled in accordance with a variation in projection position of the secondary beam projected on the electron detection device that is generated by movement of the stage device, and a deflector operation mode in which the array image sensing unit is controlled in accordance with a variation in projection position of the secondary beam projected on the detection device by the deflector.

    Scanning particle mirror microscope
    32.
    发明申请
    Scanning particle mirror microscope 审中-公开
    扫描粒子镜显微镜

    公开(公告)号：US20030020016A1

    公开(公告)日：2003-01-30

    申请号：US10127238

    申请日：2002-04-22

    Inventor： Jurgen Frosien

    IPC: H01J037/29

    CPC classification number: H01J37/292 ,  H01J2237/04756

    Abstract: A scanning particle mirror microscope and a method for imaging the surface of a specimen. The scanning particle mirror microscope includes a source for generating a primary particle beam, at least one lens arrangement for focussing the primary particle beam, a scan deflection system in order to deflect the primary particle beam over the specimen, and a detector for detecting particles. Furthermore, means are provided for generating a retarding field above the specimen, wherein the retarding field is adapted in that at least a part of the primary particle beam is reflected before it reaches the specimen and at least some of the reflected particles reach the detector. The scan deflection system is disposed really or virtually in the front focal plane of the lens arrangement.

    Abstract translation: 扫描粒子镜显微镜和用于对样品表面进行成像的方法。 扫描粒子镜显微镜包括用于产生一次粒子束的源，用于聚焦一次粒子束的至少一个透镜装置，用于将一次粒子束偏转到试样上的扫描偏转系统，以及用于检测颗粒的检测器。 此外，提供用于在样本上方产生延迟场的装置，其中延迟场适用于在初级粒子束的至少一部分到达样本之前被反射，并且至少一些反射粒子到达检测器。 扫描偏转系统真正或虚拟地设置在透镜装置的前焦平面中。

    Field emission electron gun
    33.
    发明授权
    Field emission electron gun 失效
    场发射电子枪

    公开(公告)号：US3766427A

    公开(公告)日：1973-10-16

    申请号：US3766427D

    申请日：1972-02-07

    Applicant: AMERICAN OPTICAL CORP

    Inventor： COATES V ,  WELTER L

    IPC: G01Q30/12 ,  H01J3/02 ,  H01J37/073 ,  H01J37/18 ,  H01J37/248 ,  H01J37/29 ,  H01J29/56

    CPC classification number: H01J37/073 ,  H01J3/021 ,  H01J37/18 ,  H01J37/248 ,  H01J37/292

    Abstract: A field emission electron gun comprises a field emission tip as its source of electrons. A first anode is spaced downstream from the tip and when a voltage is applied between the first anode and the tip, electrons from the tip are accelerated toward the first anode. An opening in the first anode limits the angular spread of the electron beam. A second anode is spaced downstream from the first anode and when a voltage is applied between the second anode and the tip, the energy level of the electrons at the image or specimen plane is controlled. The electrostatic field between the first and the second anode brings the electron beam into focus. For protecting the field emission tip against high voltage discharges, a third electrode in the form of a shield surrounds the field emission tip and is maintained at or near the electrical potential of the tip. Within the shield is a fourth electrode which serves, when voltage is applied thereto, to draw electrons from the tip and to restore or maintain normal operating conditions for the field emission electron gun. An iongetter vacuum pump and a reactive sublimator vacuum pump are formed in the electron gun by evaporating a highly reactive element or getter material on the inner walls of the third electrode, which serves as a collector by inducing gas molecules which strike this surface to adhere thereto and to be imbedded therein. The inner walls of the third electrode react with reactive gasses present in the region of the tip and the fourth electrode. The ion getter pump operates by ionizing residual gas molecules which are then impelled by electric fields and are imbedded under the coating of sublimed getter material. The primary electron beam from the tip strikes the surface of the fourth electrode, thereby causing reflected and secondary electrons to be emitted from the surface, which electrons form an electron cloud capable of ionizing molecules within the chamber. The electron cloud is formed and the ionized gas molecules are collected by applying the appropriate potentials to the electrodes in the gun assembly. The third electrode may be cooled by a liquid nitrogen cooling system, which functions as a cryogenic vacuum pump. This cooling system can also be used to cool the tip in order to reduce the tip flicker noise resulting in greater stability of electron emission.

    Abstract translation: 场发射电子枪包括场发射尖端作为其电子源。 第一阳极与尖端间隔开，并且当在第一阳极和尖端之间施加电压时，来自尖端的电子朝向第一阳极被加速。 第一阳极中的开口限制电子束的角扩展。 第二阳极与第一阳极隔开下游，并且当在第二阳极和尖端之间施加电压时，控制图像或样本平面处的电子的能级。 第一和第二阳极之间的静电场使电子束聚焦。

    COMPOSITE BEAM APPARATUS
    35.
    发明申请
    COMPOSITE BEAM APPARATUS 审中-公开

    公开(公告)号：US20180076001A1

    公开(公告)日：2018-03-15

    申请号：US15696445

    申请日：2017-09-06

    Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

    Inventor： Tatsuya ASAHATA

    IPC: H01J37/02 ,  H05H3/00 ,  H01J37/29 ,  H01J37/141 ,  H01J37/305

    CPC classification number: H01J37/026 ,  H01J37/141 ,  H01J37/292 ,  H01J37/3056 ,  H01J2237/1405 ,  H05H3/00

    Abstract: Disclosed is a composite beam apparatus capable of suppressing the influence of charge build-up, or electric field or magnetic field leakage from an electron beam column when subjecting a sample to cross-section processing with a focused ion beam and then performing finishing processing with another beam. The Composite beam apparatus includes: an electron beam column irradiating an electron beam onto a sample; a focused ion beam column irradiating a focused ion beam onto the sample to form a cross section; a neutral particle beam column having an acceleration voltage set lower than that of the focused ion beam column, and irradiating a neutral particle beam onto the sample to perform finish processing of the cross section, wherein the electron beam column, the focused ion beam column, and the neutral particle beam column are arranged such that the beams of the columns cross each other at an irradiation point.

    Charged particle beam substrate inspection using both vector and raster scanning
    38.
    发明授权
    Charged particle beam substrate inspection using both vector and raster scanning 有权
    使用矢量和光栅扫描的带电粒子束基板检查

    公开(公告)号：US09466463B1

    公开(公告)日：2016-10-11

    申请号：US14085768

    申请日：2013-11-20

    Applicant: Mutibeam Corporation

    Inventor： David K. Lam ,  Kevin M. Monahan ,  Enden David Liu ,  Cong Tran ,  Theodore A. Prescop

    IPC: H01J49/00 ,  H01J37/28 ,  H01J37/317

    CPC classification number: H01J37/292 ,  H01J37/20 ,  H01J37/222 ,  H01J37/265 ,  H01J37/28 ,  H01J37/3045 ,  H01J37/3177 ,  H01J2237/30494 ,  H01J2237/31761

    Abstract: The present application discloses methods, systems and devices for using charged particle beam tools to inspect and perform lithography on a substrate using a combination of vectoring to move a beam to features to be imaged, and raster scanning to obtain an image of the feature(s). The inventors have discovered that it is highly advantageous to use an extra step, a fast raster scan to image the substrate at a lower resolution, to determine which features receive priority for inspection; this extra step can reduce total inspection time, enhance inspection results, and improve beam alignment and manufacturing yield. Using multiple beam-producing columns, with multiple control computers local to the columns, provides various synergies. Preferably, miniature, non-magnetic, electrostatically-driven columns are used.

    Abstract translation: 本申请公开了使用带电粒子束工具来使用矢量化的组合来检测和执行光刻的方法，系统和装置，以将光束移动到要成像的特征，以及光栅扫描以获得特征的图像 ）。 本发明人已经发现，使用额外的步骤是非常有利的，快速光栅扫描以较低的分辨率对衬底进行成像，以确定哪些特征接受检查的优先级; 这个额外的步骤可以减少总检查时间，增强检测结果，并提高光束对准和制造产量。 使用多个光束产生色谱柱，多个控制计算机在本地列，提供了各种协同作用。 优选地，使用微型，非磁性，静电驱动的列。

    Apparatus for Preparing a Sample for Microscopy
    39.
    发明申请
    Apparatus for Preparing a Sample for Microscopy 有权
    准备样品用于显微镜的装置

    公开(公告)号：US20160027612A1

    公开(公告)日：2016-01-28

    申请号：US14341284

    申请日：2014-07-25

    Applicant: E.A. Fischione lnstruments, lnc.

    Inventor： Paul E. Fischione ,  Michael F. Boccabella

    IPC: H01J37/305 ,  H01J37/29 ,  H01J37/28 ,  H01J37/20 ,  H01J37/304

    CPC classification number: H01J37/3056 ,  H01J37/20 ,  H01J37/28 ,  H01J37/292 ,  H01J37/304 ,  H01J2237/30466 ,  H01J2237/31745 ,  H01J2237/31749

    Abstract: An apparatus for preparing a sample for microscopy is provided that has a milling device that removes material from a sample in order to thin the sample. An electron beam that is directed onto the sample is present along with a detector that detects when the electron beam has reached a preselected threshold transmitted through or immediately adjacent the sample. Once the detector detects the electron beam has reached this threshold, the milling device terminates the milling process.

    Abstract translation: 提供了一种用于制备用于显微镜的样品的装置，其具有从样品中除去材料的研磨装置以使样品变薄。 引导到样品上的电子束与检测器一起存在，该检测器检测电子束何时达到通过或紧邻样品透射的预选阈值。 一旦检测器检测到电子束达到该阈值，铣削装置终止铣削过程。

    Charged particle radiation apparatus
    40.
    发明授权
    Charged particle radiation apparatus 有权
    带电粒子辐射装置

    公开(公告)号：US09153418B2

    公开(公告)日：2015-10-06

    申请号：US14461051

    申请日：2014-08-15

    Applicant: Hitachi High-Technologies Corporation

    Inventor： Fumihiro Sasajima ,  Yoshihiro Kimura ,  Akihiro Miura

    IPC: H01J37/26 ,  G21K5/04 ,  G01N23/225 ,  H01J37/244 ,  H01J37/29

    CPC classification number: H01J37/265 ,  G01N23/2251 ,  G01N2223/6116 ,  H01J37/244 ,  H01J37/292 ,  H01J37/3178

    Abstract: A charged particle radiation apparatus includes a control device that switches between a first charged particle beam and a second charged particle beam, the first charged particle beam being scanned to acquire an image and a waveform signal, the second charged particle beam being scanned over a sample before the scan of the first charged particle beam and used to charge the sample more than the first charged particle beam; wherein the control device is configured to acquire at least one of signal waveform data and image data about a pattern formed on the sample in accordance with a scan performed on the sample by the second charged particle beam, and to stop, when the acquired data has proved to be indicative of a predetermined state, the scan of the second charged particle beam.

    Abstract translation: 带电粒子辐射装置包括：控制装置，其在第一带电粒子束和第二带电粒子束之间切换，第一带电粒子束被扫描以获取图像和波形信号，第二带电粒子束在样本上扫描 在扫描第一带电粒子束之前并且用于对样品充电多于第一带电粒子束; 其中，所述控制装置被配置为根据对由所述第二带电粒子束对所述样本执行的扫描，获取关于在所述样本上形成的图案的信号波形数据和图像数据中的至少一个，并且当所获取的数据具有 被证明是预定状态的指示，第二带电粒子束的扫描。

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