中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

75 records (took 0.022 seconds)

    OPTICAL COMPONENT MADE OF QUARTZ GLASS FOR USE IN ArF EXCIMER LASER LITHOGRAPHY AND METHOD FOR PRODUCING THE COMPONENT
    43.
    发明申请
    OPTICAL COMPONENT MADE OF QUARTZ GLASS FOR USE IN ArF EXCIMER LASER LITHOGRAPHY AND METHOD FOR PRODUCING THE COMPONENT 有权
    在ArF EXCIMER激光光刻仪中使用的QUARTZ玻璃的光学元件及其制造方法

    公开(公告)号：US20160002092A1

    公开(公告)日：2016-01-07

    申请号：US14769382

    申请日：2014-02-19

    Applicant: HERAEUS QUARZGLAS GMBH & CO. KG

    Inventor： Bodo KUEHN

    IPC: C03C3/06 ,  G02B1/00 ,  C03B32/02 ,  C03C4/04 ,  C03B19/14

    CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B32/00 ,  C03B32/02 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2201/24 ,  C03C4/04 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/24 ,  C03C2203/54 ,  C03C2204/00 ,  G02B1/00 ,  G02B1/02 ,  Y02P40/57

    Abstract: An optical component made of synthetic quartz glass includes a glass structure substantially free of oxygen defect sites and having a hydrogen content of 0.1×1016 to 1.0×1018 molecules/cm3, an SiH group content of less than 2×1017 molecules/cm3, a hydroxyl group content of 0.1 to 100 wt. ppm, and an Active temperature of less than 1070° C. The optical component undergoes a laser-induced change in the refractive index in response to irradiation by a radiation with a wavelength of 193 nm using 5×109 pulses with a pulse width of 125 ns and a respective energy density of 500 μJ/cm2 at a pulse repetition frequency of 2000 Hz. The change totals a first measured value M193nm when measured using the applied wavelength of 193 nm and a second measured value M633nm when measured using a measured wavelength of 633 nm. The ratio M193nm/M633nm is less than 1.7.

    Abstract translation: 由合成石英玻璃制成的光学部件包括基本上不含氧缺陷部位的玻璃结构，氢含量为0.1×1016〜1.0×1018分子/ cm3，SiH基含量小于2×1017分子/ cm3， 羟基含量为0.1〜100wt。 ppm，并且有效温度低于1070℃。光学组件响应于波长为193nm的辐射的照射，使用脉冲宽度为125的5×109脉冲对激光引起的折射率变化 ns，相应的能量密度为500μJ/ cm2，脉冲重复频率为2000Hz。 当使用193nm的施加波长测量时，该变化达到第一测量值M193nm，并且当使用633nm的测量波长测量时，该变化达到第二测量值M633nm。 M193nm / M633nm的比例小于1.7。

    Internal vapour deposition process
    46.
    发明授权
    Internal vapour deposition process 有权
    内部气相沉积工艺

    公开(公告)号：US08443630B2

    公开(公告)日：2013-05-21

    申请号：US13082080

    申请日：2011-04-07

    Applicant: Igor Milicevic ,  Mattheus Jacobus Nicolaas Van Stralen ,  Johannes Antoon Hartsuiker ,  Eugen Aldea ,  Eric Aloysius Kuijpers

    Inventor： Igor Milicevic ,  Mattheus Jacobus Nicolaas Van Stralen ,  Johannes Antoon Hartsuiker ,  Eugen Aldea ,  Eric Aloysius Kuijpers

    IPC: C03B37/018

    CPC classification number: C03B37/0183 ,  C03B37/01807 ,  C03B2201/12 ,  C03B2201/24 ,  C03B2201/28 ,  C03B2201/31 ,  C03B2201/32 ,  C03B2201/42

    Abstract: A method for manufacturing a primary preform for optical fibers using an internal vapor deposition process, including the steps of: i) providing a hollow glass substrate tube having a supply side and a discharge side, ii) surrounding at least part of the hollow glass substrate tube by a furnace, iii) supplying a gas flow, doped or undoped, of glass-forming gases to the interior of the hollow glass substrate tube via the supply side thereof, iv) creating a reaction zone in which conditions such that deposition of glass will take place on the interior of the hollow glass tube are created, and v) moving the reaction zone back and forth in longitudinal direction over the hollow glass substrate tube between a reversal point located near the supply side and a reversal point located near the discharge side of the hollow glass substrate tube.

    Abstract translation: 一种使用内部气相沉积工艺制造用于光纤的初级预制棒的方法，包括以下步骤：i）提供具有供给侧和排出侧的中空玻璃基板管，ii）至少部分中空玻璃基板 通过炉子管，iii）通过其供应侧向中空玻璃基底管的内部供应玻璃形成气体的掺杂或未掺杂的气流，iv）产生反应区，其中使玻璃沉积的条件 将产生在中空玻璃管​​的内部，并且v）使反应区域在纵向方向上前后移动到中空玻璃基板管之间，位于靠近供应侧的反转点和位于放电附近的反转点 一侧的中空玻璃基板管。

    Use of amorphous carbon film as a hardmask in the fabrication of optical waveguides
    49.
    发明授权
    Use of amorphous carbon film as a hardmask in the fabrication of optical waveguides 失效
    在制造光波导中使用无定形碳膜作为硬掩模

    公开(公告)号：US07079740B2

    公开(公告)日：2006-07-18

    申请号：US10799147

    申请日：2004-03-12

    Applicant: Laurent Vandroux ,  Herve Monchoix

    Inventor： Laurent Vandroux ,  Herve Monchoix

    IPC: G02B6/10

    CPC classification number: C03B19/143 ,  C03B19/1469 ,  C03B2201/10 ,  C03B2201/24 ,  C03B2201/28 ,  C03B2201/31 ,  Y02P40/57

    Abstract: Methods are provided for forming optical devices, such as waveguides, with minimal defect formation. In one aspect, the invention provides a method for forming a waveguide structure on a substrate surface including forming a cladding layer on the substrate surface, forming a core layer on the cladding layer, depositing an amorphous carbon hardmask on the core layer, forming a patterned photoresist layer on the amorphous carbon hardmask, etching the amorphous carbon hardmask, and etching the core material.

    Abstract translation: 提供了用于形成具有最小缺陷形成的光学器件（例如波导）的方法。 一方面，本发明提供了一种在基板表面上形成波导结构的方法，包括在基板表面上形成包覆层，在包层上形成芯层，在芯层上沉积无定形碳硬掩模，形成图案化 无定形碳硬掩模上的光致抗蚀剂层，蚀刻无定形碳硬掩模，并蚀刻芯材。

    Method for producing synthetic quartz glass and synthetic quartz glass article
    50.
    发明申请
    Method for producing synthetic quartz glass and synthetic quartz glass article 有权
    生产合成石英玻璃和合成石英玻璃制品的方法

    公开(公告)号：US20060059948A1

    公开(公告)日：2006-03-23

    申请号：US10535935

    申请日：2003-11-28

    Applicant: Tatsuhiro Sato ,  Takahiro Kaitou ,  Akira Fujinoki ,  Toshiyuki Kato ,  Tohru Segawa ,  Nobumasa Yoshida

    Inventor： Tatsuhiro Sato ,  Takahiro Kaitou ,  Akira Fujinoki ,  Toshiyuki Kato ,  Tohru Segawa ,  Nobumasa Yoshida

    IPC: C03C25/64

    CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/20 ,  C03B2201/24 ,  C03C2201/02 ,  C03C2201/11 ,  C03C2201/23 ,  C03C2201/24 ,  C03C2201/26

    Abstract: First of all, there is provided a production process of a synthetic quartz glass which has less impurity, has a high-temperature viscosity characteristic equal to or more than that of a natural quartz glass, and hardly deforms even in a high-temperature environment, and especially a production process of a highly heat resistant synthetic quartz glass which is free from the generation of bubbles and is dense. Secondly, there is provided a highly heat resistant synthetic quartz glass body which is easily obtained by the production process of the present invention, and especially a transparent or black quartz glass body which is free from the generation of bubbles, is dense, has high infrared absorption rate and emission rate, and has an extremely high effect for preventing diffusion of alkali metal. The process is a process of producing a highly heat resistant quartz glass body having an absorption coefficient at 245 nm of 0.05 cm−1 or more, and the silica porous body was subjected to a reduction treatment, followed by baking, thereby forming a dense glass body.

    Abstract translation: 首先，提供了杂质少，具有等于或高于天然石英玻璃的高温粘度特性的合成石英玻璃的制造方法，即使在高温环境下也几乎不变形， 特别是高度耐热的合成石英玻璃的生产过程，其不产生气泡并且致密。 其次，提供了通过本发明的制造方法容易获得的高耐热性合成石英玻璃体，特别是不产生气泡的透明或黑色石英玻璃体，具有高红外 吸收率和排放率，对防止碱金属的扩散具有极高的效果。 该方法是生产具有245nm的吸收系数为0.05cm -1以上的高耐热性石英玻璃体的工序，对二氧化硅多孔体进行还原处理，其次是 烘烤，从而形成致密的玻璃体。

Patent Agency Ranking