公开(公告)号：US20070187619A1

公开(公告)日：2007-08-16

申请号：US11276128

申请日：2006-02-15

Applicant: Peter Kellerman ,  Keneth Purser

Inventor： Peter Kellerman ,  Keneth Purser

IPC: H01J37/317 ,  H01J37/141

CPC classification number: H01J37/05 ,  H01J37/141 ,  H01J37/1472 ,  H01J37/3171 ,  H01J2237/0042 ,  H01J2237/057 ,  H01J2237/141 ,  H01J2237/142 ,  H01J2237/1508 ,  H01J2237/152 ,  H01J2237/31701 ,  H01J2237/31705

Abstract: An electromagnet and related ion implanter system including active field containment are disclosed. The electromagnet provides a dipole magnetic field within a tall, large gap with minimum distortion and degradation of strength. In one embodiment, an electromagnet for modifying an ion beam includes: a ferromagnetic box structure including six sides; an opening in each of a first side and a second opposing side of the ferromagnetic box structure for passage of the ion beam therethrough; and a plurality of current-carrying wires having a path along an inner surface of the ferromagnetic box structure, the inner surface including the first side and the second opposing side and a third side and a fourth opposing side, wherein the plurality of current-carrying wires are positioned to pass around each of the openings of the first and second opposing sides.

Abstract translation: 公开了一种包括活性场容纳的电磁体和相关离子注入机系统。 电磁铁在高大的间隙内提供偶极磁场，具有最小的变形和强度的降低。 在一个实施例中，用于修改离子束的电磁体包括：包括六个边的铁磁盒结构; 所述铁磁盒结构的第一侧和第二相对侧中的每一个中的开口用于使所述离子束通过其中; 以及多个载流线，其具有沿铁磁箱结构的内表面的路径，内表面包括第一侧和第二相对侧，以及第三侧和第四相对侧，其中多个载流 电线定位成绕过第一和第二相对侧的每个开口。

公开(公告)号：US20070085019A1

公开(公告)日：2007-04-19

申请号：US11240279

申请日：2005-09-30

Applicant: Thomas Jasinski ,  Dieter Winkler ,  William Eckes

Inventor： Thomas Jasinski ,  Dieter Winkler ,  William Eckes

IPC: H01J1/50

CPC classification number: H01J37/141 ,  H01J2237/002

Abstract: We have developed a method and apparatus for cooling electromagnetic lens coils of the kind used in charged particle beams. The method and apparatus provide not only a symmetrical cooling effect around the optical axis of the charged particle beam, but also provide improved uniformity of heat transfer. This improved uniformity enables control over the optical axis of the charged particle beam within about 1 nm for high current charged particle beam columns, wherein the current ranges from about 100 nanoamps to about 1000 nanoamps. The use of a squat and wide electromagnetic lens coil in combination with an essentially flat modular cooling panel, which provides uniform cooling to the electromagnetic lens coil, not only enables control over the optical axis of the charged particle beam, but also provides mechanical stability for the charged particle beam column.

Abstract translation: 我们开发了一种用于冷却带电粒子束中使用的电磁透镜线圈的方法和装置。 该方法和装置不仅提供了带电粒子束的光轴周围的对称冷却效果，而且提供了改善的传热均匀性。 这种改进的均匀性使得能够对高电流带电粒子束柱控制带电粒子束的光轴在约1nm内，其中电流范围为约100纳安 - 约1000纳帕。 使用蹲式和宽电磁透镜线圈与基本上平坦的模块化冷却面板组合，其提供对电磁透镜线圈的均匀冷却，不仅能够控制带电粒子束的光轴，而且还提供机械稳定性 带电粒子束柱。

公开(公告)号：US20060169924A1

公开(公告)日：2006-08-03

申请号：US11341839

申请日：2006-01-27

Applicant: Kenneth Purser ,  Harald Enge ,  Norman Turner

Inventor： Kenneth Purser ,  Harald Enge ,  Norman Turner

IPC: H01J37/08

CPC classification number: H01J37/141 ,  H01J37/14 ,  H01J37/147 ,  H01J37/1472 ,  H01J37/153 ,  H01J37/315 ,  H01J37/3171 ,  H01J2237/141 ,  H01J2237/1534 ,  H01J2237/31703

Abstract: A method and apparatus satisfying growing demands for improving the precision of angle of incidence of implanting ions that impact a semiconductor wafer and the precision of ribbon ion beams for uniform doping of wafers as they pass under an ion beam. The method and apparatus are directed to the design and combination together of novel magnetic ion-optical transport elements for implantation purposes. The design of the optical elements makes possible: (1) Broad-range adjustment of the width of a ribbon beam at the work piece; (2) Correction of inaccuracies in the intensity distribution across the width of a ribbon beam; (3) Independent steering about both X and Y axes; (4) Angle of incidence correction at the work piece; and (5) Approximate compensation for the beam expansion effects arising from space charge. In a practical situation, combinations of the elements allow ribbon beam expansion between source and work piece to 350 millimeter, with good uniformity and angular accuracy. Also, the method and apparatus may be used for introducing quadrupole fields along a beam line.

Abstract translation: 一种满足日益增长的要求的方法和装置，用于提高冲击半导体晶片的注入离子入射角的精度以及当离子束通过时晶片的均匀掺杂的带状离子束的精度。 该方法和装置涉及用于植入目的的新型磁离子 - 光学传输元件的设计和组合。 光学元件的设计成为可能：（1）宽幅调节工件上的带状光束的宽度; （2）纠正带状横梁宽度的强度分布不准确; （3）关于X轴和Y轴的独立转向; （4）工件入射角校正; 和（5）空间费用引起的光束膨胀效应的近似补偿。 在实际情况下，这些元件的组合允许源和工件之间的带状光束膨胀到350毫米，具有良好的均匀性和角度精度。 此外，该方法和装置可用于沿着光束线引入四极场。

公开(公告)号：US20050263715A1

公开(公告)日：2005-12-01

申请号：US11136668

申请日：2005-05-25

Applicant: Mamoru Nakasuji ,  Tohru Satake ,  Hirosi Sobukawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Nobuharu Noji

Inventor： Mamoru Nakasuji ,  Tohru Satake ,  Hirosi Sobukawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Nobuharu Noji

IPC: H01J37/141 ,  H01J37/28

CPC classification number: H01J37/141 ,  H01J2237/1534 ,  H01J2237/28

Abstract: An electron beam system or a method for manufacturing a device using the electron beam system in which an electron beam can be irradiated at a high current density and a ratio of transmittance of a secondary electron beam of an image projecting optical system can be improved and which can be compact in size. The surface of the sample S is divided into plural stripe regions which in turn are divided into rectangle-shaped main fields. The main field is further divided into plural square-shaped subfields. The irradiation with the electron beams and the formation of a two-dimensional image are repeated in a unit of the subfields. A magnetic gap formed by the inner and outer magnetic poles of the objective lens is formed on the side of the sample, and an outer side surface and an inner side surface of each of the inner magnetic pole and the outer magnetic pole, respectively, forming the magnetic gap have each part of a conical shape with a convex having an angle of 45° or greater with respect to the optical axis.

Abstract translation: 可以提高电子束系统或使用其中以高电流密度照射电子束并且可以提高图像投影光学系统的二次电子束的透射率的电子束系统的装置的方法，并且哪些 可以紧凑的尺寸。 样品S的表面被分成多个条纹区域，其又分成矩形主场。 主场进一步分为多个方形子场。 以子场为单位重复照射电子束和形成二维图像。 在物体侧形成由物镜的内，外磁极形成的磁隙，分别形成内磁极和外磁极的外侧面和内侧面，形成 磁隙具有相对于光轴具有45°或更大角度的凸起的圆锥形状的每一部分。

公开(公告)号：US06946663B2

公开(公告)日：2005-09-20

申请号：US10811494

申请日：2004-03-26

Applicant: Eiji Kawai

Inventor： Eiji Kawai

IPC: H01J3/22 ,  H01J9/14 ,  H01J9/236 ,  H01J37/10 ,  H01J37/141 ,  H01J49/00 ,  G21K1/08 ,  H01J3/14

CPC classification number: H01J37/141 ,  H01J9/236 ,  Y10S430/143

Abstract: A method of efficiently fabricating a multipole lens. The multipole lens has plural polar elements and an annular holding member. Each polar element has a held portion. The annular holding member is provided with through-holes for holding the held portions of the polar elements. A resin is injected into the through-holes in the holding member via openings formed in the holding member, the openings being in communication with the through-holes. The injected resin is cured, thus holding the held portions of the polar elements to the holding member within the through-holes.

Abstract translation: 一种有效地制造多极镜的方法。 多极透镜具有多个极性元件和环形保持构件。 每个极性元件具有保持部分。 环形保持构件设置有用于保持极性元件的保持部分的通孔。 通过形成在保持构件中的开口将树脂注入到保持构件的通孔中，开口与通孔连通。 注入的树脂被固化，从而将极性元件的保持部分保持在通孔内的保持构件。

公开(公告)号：US06852982B1

公开(公告)日：2005-02-08

申请号：US10621103

申请日：2003-07-14

Applicant: Martinus Petrus Maria Bierhoff ,  Cornelis Sander Kees Kooijman ,  Colin August Sanford

Inventor： Martinus Petrus Maria Bierhoff ,  Cornelis Sander Kees Kooijman ,  Colin August Sanford

IPC: G21K1/093 ,  G21K5/04 ,  H01J37/141 ,  H01J37/21 ,  H01J37/28 ,  H01J37/14

CPC classification number: H01J37/07 ,  H01J37/141 ,  H01J37/28

Abstract: In one embodiment of the present invention, a magnetic lens is provided that can generate a substantially constant amount of average heat power over a pre-selected range of resultant magnetic field strengths. The lens is configured to do this with multiple, asymmetric (different turns) coil sections that can produce a desired range of field strengths, and at the same time, maintain a sufficiently constant temperature signature when the average total power is maintained constant thereby eliminating unreasonable delays in lens operation when the resultant field strength is changed. The asymmetric lens structure allows for the smaller coil to be made with less relative inductance thereby making it more responsive and amenable for an AC drive signal and thus dynamic focusing applications if desired. Thus, a magnetic lens is now provided that can produce a range of magnetic beam-focusing field strengths, implement dynamic focusing, and not impose unreasonable delay for thermal stabilization between changes in magnetic field strength.

Abstract translation: 在本发明的一个实施例中，提供了一种磁性透镜，其能够在所得磁场强度的预选范围内产生基本上恒定的平均热功率。 透镜被配置为用多个不对称（不同匝数）的线圈部分来实现，该线圈部分可以产生期望的场强范围，并且同时在平均总功率保持恒定时保持足够恒定的温度特征，从而消除不合理 当得到的场强改变时，透镜操作的延迟。 非对称透镜结构允许以较小的相对电感制造较小的线圈，从而使其对于AC驱动信号更有反应性和适应性，并且因此如果需要，则动态聚焦应用。 因此，现在提供了可以产生一定范围的磁束聚焦场强的磁透镜，实现动态聚焦，并且不会对磁场强度变化之间的热稳定施加不合理的延迟。

公开(公告)号：US06747279B2

公开(公告)日：2004-06-08

申请号：US10182437

申请日：2002-10-03

Applicant: Pavel Adamec

Inventor： Pavel Adamec

IPC: H01J3710

CPC classification number: H01J37/1471 ,  H01J37/141 ,  H01J37/28

Abstract: An improved objective lens for a charged particle beam device is constituted by, among other things, a magnetic lens that creates a first magnetic field for focussing the charged particle beam onto the specimen. Furthermore, a deflector is integrated into the magnetic lens by providing at least one additional coil arrangement that creates a second magnetic field used to deflect the charged particle beam. Thereby, the second magnetic field is guided through at least one of the pole pieces of the magnetic lens. The present invention also provides an improved column for a charged particle beam device including the improved objective lens.

Abstract translation: 用于带电粒子束装置的改进的物镜由除其他之外的磁性透镜构成，该磁透镜产生用于将带电粒子束聚焦到样本上的第一磁场。 此外，偏转器通过提供至少一个额外的线圈装置而被集成到磁性透镜中，该线圈装置产生用于偏转带电粒子束的第二磁场。 由此，第二磁场被引导通过磁性透镜的极片中的至少一个。 本发明还提供了一种用于包括改进的物镜的带电粒子束装置的改进的列。

公开(公告)号：US06740877B2

公开(公告)日：2004-05-25

申请号：US10406455

申请日：2003-04-04

Applicant: Tetsuya Sawahata ,  Mitsugu Sato

Inventor： Tetsuya Sawahata ,  Mitsugu Sato

IPC: G01N2300

CPC classification number: H01J37/256 ,  G01N23/2252 ,  H01J37/141 ,  H01J2237/2561

Abstract: According to the present invention, there are newly provided in a scanning electron microscope with an in-lens system a first low-magnification mode that sets the current of the object lens to be zero or in a weak excitation state, and a second low-magnification mode that sets the current of the object lens to be a value that changes in proportion to the square root of the accelerating voltage. The scanning electron microscope has a configuration wherein normal sample image (secondary electron image) observation is performed in the first low-magnification mode, and it switches the first low-magnification mode to the second low-magnification mode when X-ray analysis is performed. As a result, both sample image (secondary electron image) observation and X-ray analysis can be performed in low-magnification mode.

公开(公告)号：US20030230727A1

公开(公告)日：2003-12-18

申请号：US10405500

申请日：2003-04-03

Applicant: LEICA MICROSYSTEMS LITHOGRAPHY LTD.

Inventor： John Tingay ,  Brian Raferty ,  Nigel Crosland

IPC: H01J037/141

CPC classification number: H01J37/141 ,  H01F5/02 ,  H01F7/202 ,  H01F27/22 ,  H01J37/147

Abstract: A device for influencing an electron beam, especially a deflector unit for an electron beam lithography machine, comprises a plurality of coil formers (12b) each with a bore (16) defining a passage for the beam and each carrying coils (18, 19) operable to generate magnetic fields for deflecting the path of the beam when passing through the passage. Each former is made of a high-strength ceramic material having a high thermal conductivity and low coefficient of thermal expansion so that, with respect to a given output of heat by the associated coils during quasi-continuous operation for repeated beam deflection during pattern writing, the heat is dissipated at such a rate as to preclude thermal expansion of the coils and thus avoid distortion of the magnetic fields generated by the coils.

Abstract translation: 用于影响电子束的装置，特别是用于电子束光刻机的偏转器单元，包括多个线圈形成器（12b），每个线圈形成器具有限定用于梁的通道的孔（16）和每个承载线圈（18,19） 可操作地产生用于在穿过通道时偏转梁的路径的磁场。 每个前者由具有高热导率和低热膨胀系数的高强度陶瓷材料制成，使得相对于相关线圈的给定输出的热量在用于模式写入期间的重复光束偏转的准连续操作期间， 热量以这样的速度消散，以防止线圈的热膨胀，从而避免由线圈产生的磁场的变形。

公开(公告)号：US20030218135A1

公开(公告)日：2003-11-27

申请号：US10438040

申请日：2003-05-14

Inventor： Mitsuyoshi Sato ,  Akira Yonezawa ,  Seiji Morita

IPC: H01J003/14

CPC classification number: H01J37/141 ,  H01J2237/28

Abstract: In order to ensure that an electromagnetic field lens is capable of high-resolution observation using a magnetic field lens without leakage of magnetic flux, there is provided a magnetic field superimposing-type lens 1 for focusing an electron beam onto a sample 3 so as to irradiate the sample 3 is provided with an upper magnetic pole 213 a long way from the sample 3 and a lower side magnetic pole 214 close to the sample 3, with electrical insulation being provided between the upper magnetic pole 213 and the lower magnetic pole 214 by a ferrite insulator 215 provided between the upper magnetic pole 213 and the lower magnetic pole 214 in an integral manner with the magnetic poles so that the upper magnetic pole 213 and the lower magnetic pole 214 may be held at different potentials. There is therefore no leak in flux from between the upper magnetic pole 213 and the lower-magnetic pole 214, the chromatic aberration coefficient Cc can be made small, and high-resolution observation of the sample can be achieved.

Abstract translation: 为了确保电磁场透镜能够使用磁场透镜进行高分辨率观察而不漏磁通，设置有用于将电子束聚焦到样品3上的磁场叠加型透镜1，以便 照射样品3设置有距离样品3很远的上磁极213和靠近样品3的下侧磁极214，电绝缘通过上磁极213和下磁极214之间设置在上磁极213和下磁极214之间， 铁氧体绝缘体215以与磁极成一体的方式设置在上磁极213和下磁极214之间，使得上磁极213和下磁极214可以保持在不同的电位。 因此，在上磁极213和下磁极214之间不存在磁通泄漏，可以使色差系数Cc小，并且可以实现样品的高分辨率观察。