公开(公告)号：US09171694B2

公开(公告)日：2015-10-27

申请号：US14532805

申请日：2014-11-04

Applicant: KLA-Tencor Corporation

Inventor： Christopher Sears

IPC: H01J37/147 ,  H01J37/141 ,  H01J37/12 ,  H01J37/153 ,  H01J37/10

CPC classification number: H01J37/1472 ,  H01J37/10 ,  H01J37/1471 ,  H01J37/153 ,  H01J2237/10 ,  H01J2237/1508 ,  H01J2237/1516 ,  H01J2237/2448 ,  H01J2237/2449 ,  H01J2237/2602 ,  H01J2237/28

Abstract: An electron beam device for inspecting a target substrate or specimen thereon includes a beam separator with an asymmetric quadrupole electrostatic deflector for improving field uniformity for a single direction of deflection. The asymmetric quadrupole electrostatic deflector includes two orthogonal electrode plates spanning roughly 60 degrees and two electrode plates spanning roughly 120 degrees, the two latter plates defining a unidirectional deflection field. The device generates a primary electron beam and focuses the primary electron beam along an optical axis into the target substrate. Secondary electrons detected at the target substrate are focused into a secondary electron beam. The beam separator with asymmetric quadrupole electrostatic deflector deflects the secondary electron beam away from the axis of the primary electron beam in the direction of deflection and into a detector array.

Abstract translation: 用于检查目标衬底或样本的电子束装置包括具有不对称四极静电偏转器的光束分离器，用于改善单个偏转方向的场均匀性。 不对称四极静电偏转器包括跨越大约60度的两个正交电极板和跨越大约120度的两个电极板，后两个板限定单向偏转场。 器件产生一次电子束，并将一次电子束沿光轴聚焦到目标衬底中。 在目标衬底处检测到的二次电子被聚焦成二次电子束。 具有不对称四极静电偏转器的光束分离器使二次电子束在偏转方向上偏离一次电子束的轴线并且进入检测器阵列。

公开(公告)号：US20150060654A1

公开(公告)日：2015-03-05

申请号：US14373123

申请日：2012-12-17

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Kotoko Urano ,  Tomonori Nakano ,  Yoichi Ose

IPC: H01J37/28 ,  G01Q40/00

CPC classification number: H01J37/28 ,  G01Q40/00 ,  H01J37/153 ,  H01J2237/1534 ,  H01J2237/28 ,  H01J2237/2809

Abstract: It is possible to determine an optimal parasitic aberration adjustment amount even when the relationship of the parasitic aberration adjustment amount with respect to the field intensity of multiple poles changes nonlinearly. To this end, in the present invention, an aberration correction amount is computed by measuring an aberration coefficient of an optical unit of a charged particle beam device, and at the same time, the present value of a power supply control value applied to an aberration corrector is measured. Then, the parasitic aberration adjustment amount for suppressing the amount of a parasitic aberration generated in the aberration corrector is computed on the basis of the aberration correction amount and the present value of the power supply control value.

Abstract translation: 即使当寄生像差调整量相对于多个磁场强度的关系非线性地变化时，也可以确定最佳的寄生像差调整量。 为此，在本发明中，通过测量带电粒子束装置的光学单元的像差系数来计算像差校正量，同时，应用于像差的电源控制值的当前值 校正器被测量。 然后，基于像差校正量和电源控制值的当前值来计算用于抑制像差校正器中产生的寄生像差量的寄生像差调整量。

公开(公告)号：US20150029593A1

公开(公告)日：2015-01-29

申请号：US14338542

申请日：2014-07-23

Applicant: JEOL Ltd.

Inventor： Hidetaka Sawada ,  Yu Jimbo

IPC: G02B27/00

CPC classification number: G02B27/0037 ,  G01N23/20 ,  G02B27/42 ,  G02B27/4205 ,  G21K1/08 ,  H01J3/04 ,  H01J3/12 ,  H01J3/26 ,  H01J37/05 ,  H01J37/147 ,  H01J37/1472 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/1532 ,  H01J2237/1534

Abstract: A spherical aberration corrector is offered which permits a correction of deviation of the circularity of at least one of an image and a diffraction pattern and a correction of on-axis aberrations to be carried out independently. The spherical aberration corrector (100) is for use with a charged particle beam instrument (1) for obtaining the image and the diffraction pattern and has a hexapole field generating portion (110) for producing plural stages of hexapole fields, an octopole field superimposing portion (120) for superimposing an octopole on at least one of the plural stages of hexapole fields to correct deviation of the circularity of at least one of the image and diffraction pattern, and a deflection portion (130) for deflecting a charged particle beam.

Abstract translation: 提供了一种球面像差校正器，其允许校正图像和衍射图案中的至少一个的圆度的偏差和单独进行的轴上像差校正。 球面像差校正器（100）用于带电粒子束仪器（1），用于获得图像和衍射图案，并具有用于产生多级六极场的六极场产生部分（110），八极场叠加部分 （120），用于将至少一个六极场中的至少一个叠加八极杆，以校正图像和衍射图案中的至少一个的圆度的偏差，以及用于偏转带电粒子束的偏转部分（130）。

公开(公告)号：US08933425B1

公开(公告)日：2015-01-13

申请号：US13287682

申请日：2011-11-02

Applicant: Christopher F. Bevis

Inventor： Christopher F. Bevis

IPC: H01J37/317

CPC classification number: H01J37/153 ,  H01J37/3007 ,  H01J37/3174 ,  H01J37/3175 ,  H01J2237/0435 ,  H01J2237/1534 ,  H01J2237/303 ,  H01J2237/3175 ,  H01J2237/31774 ,  H01J2237/31788 ,  H01J2237/31789

Abstract: One embodiment relates to an apparatus for aberration correction in an electron beam lithography system. An inner electrode surrounds a pattern generating device, and there is at least one outer electrode around the inner electrode. Each of the inner and outer electrodes has a planar surface in a plane of the pattern generating device. Circuitry is configured to apply an inner voltage level to the inner electrode and at least one outer voltage level to the at least one outer electrode. The voltage levels may be set to correct a curvature of field in the electron beam lithography system. Another embodiment relates to an apparatus for aberration correction used in an electron based system, such as an electron beam inspection, or review, or metrology system. Other embodiments, aspects and features are also disclosed.

Abstract translation: 一个实施例涉及一种用于电子束光刻系统中的像差校正的装置。 内部电极围绕图案生成装置，并且在内部电极周围存在至少一个外部电极。 内电极和外电极中的每一个在图案生成装置的平面中具有平坦表面。 电路被配置为将内部电压电平施加到所述内部电极，并且至少一个外部电压电平施加到所述至少一个外部电极。 可以设置电压电平以校正电子束光刻系统中的曲率。 另一实施例涉及用于电子系统中的像差校正装置，例如电子束检查或检查或计量系统。 还公开了其它实施例，方面和特征。

公开(公告)号：US20140367586A1

公开(公告)日：2014-12-18

申请号：US13920284

申请日：2013-06-18

Applicant: Jürgen FROSIEN ,  Benjamin John COOK

Inventor： Jürgen FROSIEN ,  Benjamin John COOK

IPC: H01J37/04

CPC classification number: H01J37/045 ,  H01J37/1478 ,  H01J37/153 ,  H01J37/263 ,  H01J2237/1534 ,  H01J2237/281 ,  H01J2237/2815

Abstract: A charged particle beam device is described. In one aspect, the charged particle beam device includes a charged particle beam source, and a switchable multi-aperture for generating two or more beam bundles from a charged particle beam which includes: two or more aperture openings, wherein each of the two or more aperture openings is provided for generating a corresponding beam bundle of the two or more beam bundles; a beam blanker arrangement configured for individually blanking the two or more beam bundles; and a stopping aperture for blocking beam bundles. The device further includes a control unit configured to control the individual blanking of the two or more beam bundles for switching of the switchable multi-aperture and an objective lens configured for focusing the two or more beam bundles on a specimen or wafer.

Abstract translation: 描述带电粒子束装置。 一方面，带电粒子束装置包括带电粒子束源和用于从带电粒子束产生两个或更多个束束的可切换多孔，其包括：两个或更多个孔口，其中两个或更多个 提供孔径开口以产生两个或更多束束的相应束束; 束消除器配置，其被配置为单独地消隐所述两个或更多个束束; 以及用于阻挡束束的止动孔。 该装置还包括控制单元，该控制单元被配置为控制用于切换可切换多孔的两个或更多束束的单独消隐，以及被配置用于将两束或更多束束聚焦在样本或晶片上的物镜。

公开(公告)号：US08785880B2

公开(公告)日：2014-07-22

申请号：US14102838

申请日：2013-12-11

Applicant: JEOL Ltd.

Inventor： Hidetaka Sawada ,  Fumio Hosokawa

IPC: G21K1/08 ,  H01J3/14 ,  H01J3/26 ,  H01J49/42

CPC classification number: H01J37/153 ,  H01J37/26 ,  H01J2237/12 ,  H01J2237/1405 ,  H01J2237/1534

Abstract: The chromatic aberration corrector (100) has a first multipole element (110) for producing a first electromagnetic field and a second multipole element (120) for producing a second electromagnetic field. The first multipole element (110) first, second, and third portions (110a, 110b, 110c) arranged along an optical axis (OA) having a thickness and producing a quadrupole field in which an electric quadrupole field and a magnetic quadrupole field are superimposed. In the first and third portions (110a, 110c), the electric quadrupole field is set stronger than the magnetic quadrupole field. In the second portion (110b), the magnetic quadrupole field is set stronger than the electric quadrupole field. The second portion (110b) produces a two-fold astigmatism component that is opposite in sign to two-fold astigmatism components produced by the first portion (110a) and third portion (110c).

Abstract translation: 色差校正器（100）具有用于产生第一电磁场的第一多极元件（110）和用于产生第二电磁场的第二多极元件（120）。 第一多极元件（110）沿着具有厚度并且产生四极场的光轴（OA）布置的第一，第二和第三部分（110a，110b，110c），其中电四极场和四极磁场被叠加 。 在第一和第三部分（110a，110c）中，电四极场被设置为比四极四极场强。 在第二部分（110b）中，将四极四极场设置得比电四极场强。 第二部分（110b）产生与由第一部分（110a）和第三部分（110c）产生的两折像散分量相反的双折射散光成分。

公开(公告)号：US08748818B2

公开(公告)日：2014-06-10

申请号：US13759029

申请日：2013-02-04

Applicant: Mochii, Inc.

Inventor： Christopher Su-Yan Own ,  Andrew Bleloch ,  William Andregg

IPC: H01J37/26 ,  G01N23/02

CPC classification number: H01J37/263 ,  H01J37/153 ,  H01J37/26 ,  H01J37/261 ,  H01J2237/2614 ,  H01J2237/262

Abstract: A transmission electron microscope includes an electron beam source to generate an electron beam. Beam optics are provided to converge the electron beam. An aberration corrector corrects the electron beam for at least a spherical aberration. A specimen holder is provided to hold a specimen in the path of the electron beam. A detector is used to detect the electron beam transmitted through the specimen. The transmission electron microscope may operate in an incoherent mode and may be used to locate a sequence of objects on a molecule.

Abstract translation: 透射电子显微镜包括用于产生电子束的电子束源。 光束被提供以会聚电子束。 像差校正器校正至少球面像差的电子束。 提供试样保持器以将样品保持在电子束的路径中。 检测器用于检测透过样品的电子束。 透射电子显微镜可以以非相干模式操作，并且可以用于在分子上定位物体的序列。

公开(公告)号：US08723134B2

公开(公告)日：2014-05-13

申请号：US12914252

申请日：2010-10-28

Applicant: Roland Janzen

Inventor： Roland Janzen

IPC: H01J37/153

CPC classification number: H01J37/153 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/12 ,  H01J37/26 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/121 ,  H01J2237/1516 ,  H01J2237/1532

Abstract: A correction device for a charged particle beam device for decreasing, correcting or inverting (that is adjusting) the spherical aberration of a charged particle beam is described. The correction principle is similar to that of common multipole-Correctors. But unlike common devices of that kind this new correction device gets along entirely with plane apertures having specially shaped holes in order to supply the multipoles required for correction and is therefore predestined for miniaturization and the use in multi column devices.

Abstract translation: 描述了用于减少，校正或反转（即调整）带电粒子束的球面像差的带电粒子束装置的校正装置。 校正原理与普通多极校正器相似。 但是与这种常见的装置不同，这种新的校正装置完全与具有特殊形状的孔的平面孔相交，以便提供校正所需的多极，因此被预定为用于小型化和在多列装置中的使用。

公开(公告)号：US20140103201A1

公开(公告)日：2014-04-17

申请号：US13663692

申请日：2012-10-30

Applicant: Aleksandra Kramer ,  Stefan Lanio

Inventor： Aleksandra Kramer ,  Stefan Lanio

IPC: H01J3/18 ,  H01J3/20

CPC classification number: G21K1/093 ,  H01J37/153 ,  H01J2237/1532 ,  H01J2237/1534 ,  H01J2237/28

Abstract: A method of compensating mechanical, magnetic and/or electrostatic inaccuracies in a scanning charged particle beam device is described. The method includes an alignment procedure, wherein the following steps are conducted: compensating 4-fold astigmatism with an element having at least 8-pole compensation capability, wherein the aligning and compensating steps of the alignment procedure act on a charged particle beam with beam dimensions in two orthogonal directions each of at least 50 μm and coaxially aligned with at least the element having at least the 8-pole compensation capability.

Abstract translation: 描述了在扫描带电粒子束装置中补偿机械，磁性和/或静电不准确性的方法。 该方法包括对准过程，其中进行以下步骤：用具有至少8极补偿能力的元件补偿4折像散，其中对准过程的对准和补偿步骤作用于具有束尺寸的带电粒子束 在至少50μm的两个正交方向上，并且至少与具有至少8极补偿能力的元件同轴对准。

公开(公告)号：US08648318B2

公开(公告)日：2014-02-11

申请号：US13071225

申请日：2011-03-24

Applicant: Pieter Kruit ,  Yanxia Zhang ,  Martijn J. Van Bruggen ,  Stijn Willem Herman Karel Steenbrink

Inventor： Pieter Kruit ,  Yanxia Zhang ,  Martijn J. Van Bruggen ,  Stijn Willem Herman Karel Steenbrink

IPC: H01J37/317 ,  H01J37/147 ,  H01J37/26

CPC classification number: H01J37/12 ,  H01J37/153 ,  H01J2237/04924 ,  H01J2237/1205 ,  H01J2237/121 ,  H01J2237/317

Abstract: The invention relates to a multiple beam charged particle optical system, comprising an electrostatic lens structure with at least one electrode, provided with apertures, wherein the effective size of a lens field effected by said electrode at a said aperture is made ultimately small. The system may comprise a diverging charged particle beam part, in which the lens structure is included. The physical dimension of the lens is made ultimately small, in particular smaller than one mm, more in particular less than a few tens of microns. In further elaboration, a lens is combined with a current limiting aperture, aligned such relative to a lens of said structure, that a virtual aperture effected by said current limiting aperture in said lens is situated in an optimum position with respect to minimizing aberrations total.

Abstract translation: 本发明涉及一种多束带电粒子光学系统，其包括具有至少一个具有孔的电极的静电透镜结构，其中由所述孔处的所述电极实现的透镜场的有效尺寸最小化。 该系统可以包括发散的带电粒子束部分，其中包括透镜结构。 透镜的物理尺寸最终变小，特别是小于1mm，更特别地小于几十微米。 在进一步的阐述中，透镜与限流孔结合，相对于所述结构的透镜对准，所述透镜中由所述电流限制孔影响的虚拟孔位于最小化像差总数的最佳位置。