公开(公告)号：US20230177715A1

公开(公告)日：2023-06-08

申请号：US17457622

申请日：2021-12-03

Applicant: FEI Company

Inventor： Umesh Adiga ,  Mark Biedrzycki

IPC: G06T7/70 ,  G06V10/25 ,  G06T7/00 ,  G06T7/13 ,  G06T3/40 ,  G06T7/30 ,  H01J37/31 ,  H01J37/22

CPC classification number: G06T7/70 ,  G06V10/25 ,  G06T7/0004 ,  G06T7/13 ,  G06T3/40 ,  G06T7/30 ,  H01J37/31 ,  H01J37/222 ,  G06T2207/30164 ,  G06T2207/30204 ,  G06T2207/10061

Abstract: Fiducial coordinates are obtained by aligning template with region of interest extracted from a workpiece image. Image values in the region of interest are projected along a template axis and the project values evaluated to establish a fiducial location which can be used as a reference location for locating workpiece areas for ion beam milling or other processing.

公开(公告)号：US11668720B2

公开(公告)日：2023-06-06

申请号：US16580376

申请日：2019-09-24

Applicant: FEI Company

Inventor： Albert Konijnenberg

IPC: G01N33/68 ,  G01N1/28 ,  G01N1/42 ,  G01N33/483

CPC classification number: G01N33/6851 ,  G01N1/2813 ,  G01N1/42 ,  G01N33/483

Abstract: The invention relates to a method of preparing a biological sample for study in an analysis device, said method comprising the steps of: providing a biological material to be studied; providing a sample holder that is configured to be placed in said analysis device; and transferring said biological material onto said sample holder for preparing said biological sample. According to the invention, the method comprises the steps of: acquiring a specimen of said biological material provided on said sample holder; transferring said specimen to a screening device for screening said specimen; and evaluating said biological sample based on results obtained by said screening device. With the method, time and resources may be more effectively used in studying biological samples, for example using charged particle microscopy in the form of cryo-EM.

公开(公告)号：US11651928B2

公开(公告)日：2023-05-16

申请号：US17364717

申请日：2021-06-30

Applicant: FEI Company

Inventor： James B McGinn

IPC: H01J37/08 ,  H01J37/02 ,  H01J37/26

CPC classification number: H01J37/026 ,  H01J37/08 ,  H01J37/26

Abstract: Disclosed herein are apparatuses and systems for reentrant fluid delivery techniques. An example system includes at least a fluid delivery conduit extending between first and second electrical potentials, wherein the fluid delivery conduit is formed into a tilted helical so that a fluid flowing through the fluid delivery conduit experiences an electric field reversal through each winding of the fluid delivery conduit.

公开(公告)号：US20230101108A1

公开(公告)日：2023-03-30

申请号：US17490522

申请日：2021-09-30

Applicant: FEI Company

Inventor： Ali MOHAMMADI-GHEIDARI ,  Peter Christiaan TIEMEIJER ,  Alexander HENSTRA ,  Tomas RADLICKA

IPC: H01J37/153 ,  H01J37/28 ,  H01J37/145 ,  H01J37/147

Abstract: An electron optical module for providing an off-axial electron beam with a tunable coma, according to the present disclosure includes a structure positioned downstream of an electron source and an electron lens assembly positioned between the structure and the electron source. The structure generates a decelerating electric field, and is positioned to prevent the passage of electrons along the optical axis of the electron lens assembly. The electron optical module further includes a micro-lens that is not positioned on the optical axis of the electron lens assembly and is configured to apply a lensing effect to an off-axial election beam. Aberrations applied to the off-axial electron beam by the micro-lens and the electron lens assembly combine so that a coma of the off-axial beam has a desired value in a downstream plane.

公开(公告)号：US20230099947A1

公开(公告)日：2023-03-30

申请号：US17491260

申请日：2021-09-30

Applicant: FEI Company

Inventor： Ondrej MACHEK ,  Pavel POTOCEK ,  Tereza KONECNÁ

IPC: G06K9/00 ,  G06K9/20 ,  G06K9/62 ,  G06T3/40 ,  G06N3/08

Abstract: Disclosed herein are charged particle microscopy (CPM) support systems, as well as related methods, computing devices, and computer-readable media. For example, in some embodiments, a CPM support apparatus may include: first logic to cause a CPM to generate a single image of a first portion of a specimen; second logic to generate a first mask based on one or more regions-of-interest provided by user annotation of the single image; and third logic to train a machine-learning model using the single image and the one or more regions-of-interest. The first logic may cause the CPM to generate multiple images of corresponding multiple additional portions of the specimen, and the second logic may, after the machine-learning model is trained using the single image and the one or more regions-of-interest, generate multiple masks based on the corresponding images of the additional portions of the specimen using the machine-learning model without retraining.

公开(公告)号：US11605525B2

公开(公告)日：2023-03-14

申请号：US17117696

申请日：2020-12-10

Applicant: FEI Company

Inventor： James Vickers ,  Seema Somani ,  Cecelia Campochiaro ,  Yakov Bobrov

IPC: H01J37/302 ,  H01J37/304 ,  H01J37/305 ,  G01N23/2257 ,  H01J37/26 ,  G01R31/265 ,  G01R31/27 ,  G01R31/28 ,  G01R31/26 ,  H01J37/22 ,  H01J49/14

Abstract: Described herein are a system and method of preparing integrated circuits (ICs) so that the ICs remain electrically active and can have their active circuitry probed for diagnostic and characterization purposes using charged particle beams. The system employs an infrared camera capable of looking through the silicon substrate of the ICs to image electrical circuits therein, a focused ion beam system that can both image the IC and selectively remove substrate material from the IC, a scanning electron microscope that can both image structures on the IC and measure voltage contrast signals from active circuits on the IC, and a means of extracting heat generated by the active IC. The method uses the system to identify the region of the IC to be probed, and to selectively remove all substrate material over the region to be probed using ion bombardment, and further identifies endpoint detection means of milling to the required depth so as to observe electrical states and waveforms on the active IC.

公开(公告)号：US11569056B2

公开(公告)日：2023-01-31

申请号：US16667506

申请日：2019-10-29

Applicant: FEI Company

Inventor： Brad Larson ,  John Flanagan ,  Maurice Peemen

IPC: H01J37/22 ,  G06T7/00 ,  H01J37/28 ,  G01N21/956 ,  H04N19/149

Abstract: Methods and apparatuses are disclosed herein for parameter estimation for metrology. An example method at least includes optimizing, using a parameter estimation network, a parameter set to fit a feature in an image based on one or more models of the feature, the parameter set defining the one or more models, and providing metrology data of the feature in the image based on the optimized parameter set.

公开(公告)号：US20230003699A1

公开(公告)日：2023-01-05

申请号：US17364796

申请日：2021-06-30

Applicant: FEI Company

Inventor： Fabrice LACOUT ,  Peter SAUTER

IPC: G01N30/86 ,  G06N3/02

Abstract: Disclosed herein are chromatography instrument support systems, as well as related apparatuses, methods, computing devices, and computer-readable media. For example, in some embodiments, a chromatography instrument support apparatus may include: first logic to generate one or more peak locations for a chromatogram data set and to generate one or more baselines for the chromatogram data set, wherein an individual peak has an associated baseline, and wherein the first logic includes a machine-learning computational model that outputs estimated peak locations and estimated baselines; second logic to cause the display of the one or more peak locations and the one or more baselines concurrently with the display of the chromatogram data set; and third logic to, for individual peaks, generate an associated integrated value representing an area above the associated baseline and under a portion of the chromatogram data set corresponding to the individual peak.

公开(公告)号：US11538652B2

公开(公告)日：2022-12-27

申请号：US16686011

申请日：2019-11-15

Applicant: FEI Company

Inventor： Edwin Verschueren ,  Paul Tacx

IPC: H01J37/02 ,  H01J37/28 ,  H02N2/06

Abstract: To compensate for hysteresis in an actuator, a path between a first position and a second position can be selected, and a drive signal can be applied to an actuator element that includes a hysteresis-compensated portion to move an object along the selected path.

公开(公告)号：US20220392736A1

公开(公告)日：2022-12-08

申请号：US17880624

申请日：2022-08-03

Applicant: FEI Company

Inventor： Alexander Henstra ,  Pleun Dona

IPC: H01J37/153 ,  H01J37/28

Abstract: Systems for reducing the generation of thermal magnetic field noise in optical elements of microscope systems, are disclosed. Example microscopy optical elements having reduced Johnson noise generation according to the present disclosure comprises an inner core composed of an electrically isolating material, and an outer coating composed of an electrically conductive material. The product of the thickness of the outer coating and the electrical conductivity is less than 0.01Ω−1. The outer coating causes a reduction in Johnson noise generated by the optical element of greater than 2×, 3×, or an order of magnitude or greater. In a specific example embodiment, the optical element is a corrector system having reduced Johnson noise generation. Such a corrector system comprises an outer magnetic multipole, and an inner electrostatic multipole. The inner electrostatic multipole comprises an inner core composed of an electrically isolating material and an outer coating composed of an electrically conductive material.