公开(公告)号：US11817415B2

公开(公告)日：2023-11-14

申请号：US16308931

申请日：2017-05-23

Applicant: NITTO DENKO CORPORATION

Inventor： Satoshi Honda ,  Yuki Sugo ,  Nao Kamakura

IPC: C09J1/00 ,  H01L23/00 ,  C09J7/10 ,  C09J7/38 ,  C09J9/02 ,  C09J11/04 ,  H01J37/28 ,  H01L21/52 ,  H01L21/683 ,  H01L21/78 ,  C08K3/08 ,  C08K3/10 ,  C09J9/00

CPC classification number: H01L24/32 ,  C09J1/00 ,  C09J7/10 ,  C09J7/385 ,  C09J9/00 ,  C09J9/02 ,  C09J11/04 ,  H01J37/28 ,  H01L21/52 ,  H01L21/6836 ,  H01L21/78 ,  H01L24/27 ,  H01L24/83 ,  C08K3/08 ,  C08K3/10 ,  C09J2203/326 ,  C09J2301/408 ,  C09J2400/16 ,  H01L2224/48091 ,  H01L2224/73265 ,  H01L2224/83191 ,  H01L2224/83203 ,  H01L2924/01029 ,  H01L2924/01047 ,  H01L2924/01079 ,  H01L2224/48091 ,  H01L2924/00014

Abstract: Provided are a thermal bonding sheet capable of suppressing inhibition of sintering of sinterable metallic particles by an organic component, thereby imparting sufficient bonding reliability to a power semiconductor device, and a thermal bonding sheet with a dicing tape having the thermal bonding sheet. A thermal bonding sheet has a precursor layer that is to become a sintered layer by heating, and the precursor layer includes sinterable metallic particles and an organic component, the precursor layer has a phase separation structure that is a sea-island structure or a co-continuous structure, and in a SEM surface observation image on at least one surface of the precursor layer, a maximum value among each diameter of the largest inscribed circle for a region occupied by each phase of the phase separation structure is 1 μm or more and 50 μm or less.

公开(公告)号：US20230343548A1

公开(公告)日：2023-10-26

申请号：US18333637

申请日：2023-06-13

Applicant: Hitachi High-Tech Corporation

Inventor： Takuma YAMAMOTO

IPC: H01J37/22 ,  H01J37/244

CPC classification number: H01J37/222 ,  H01J37/244 ,  H01J37/28

Abstract: Even when the amount of overlay deviation between patterns located in different layers is large, correct measurement of the amount of overlay deviation is stably performed. The charged particle beam device includes a charged particle beam irradiation unit that irradiates a sample with a charged particle beam, a first detection unit that detects secondary electrons from the sample, a second detection unit that detects backscattered electrons from the sample, and an image processing unit that generates a first image including an image of a first pattern located on the surface of the sample based on an output of the first detection unit, and generates a second image including an image of a second pattern located in a lower layer than the surface of the sample based on an output of the second detection unit. A control unit adjusts the position of a measurement area in the first image based on a first template image for the first image, and adjusts the position of a measurement area in the second image based on a second template image for the second image.

公开(公告)号：US11798780B2

公开(公告)日：2023-10-24

申请号：US17563186

申请日：2021-12-28

Applicant: Hitachi High-Tech Corporation

Inventor： Toshiyuki Yokosuka ,  Chahn Lee ,  Hideyuki Kazumi ,  Hajime Kawano ,  Shahedul Hoque ,  Kumiko Shimizu ,  Hiroyuki Takahashi

IPC: H01J37/28 ,  H01J37/147 ,  H01J37/20 ,  H01J37/22

CPC classification number: H01J37/28 ,  H01J37/147 ,  H01J37/20 ,  H01J37/22 ,  H01J2237/2803 ,  H01J2237/2806 ,  H01J2237/2817 ,  H01J2237/2826 ,  H01J2237/3045

Abstract: The scanning charged particle beam microscope according to the present application is characterized in that, in acquiring an image of the FOV (field of view), interspaced beam irradiation points are set, and then, a deflector is controlled so that a charged particle beam scan is performed faster when the charged particle beam irradiates a position on the sample between each of the irradiation points than when the charged particle beam irradiates a position on the sample corresponding to each of the irradiation points (a position on the sample corresponding to each pixel detecting a signal). This allows the effects from a micro-domain electrification occurring within the FOV to be mitigated or controlled.

公开(公告)号：US20230335373A1

公开(公告)日：2023-10-19

申请号：US18131891

申请日：2023-04-07

Applicant: Hitachi High-Tech Corporation

Inventor： Akio YAMAMOTO ,  Wen LI ,  Shunsuke MIZUTANI ,  Naoya ISHIGAKI

IPC: H01J37/244 ,  H01J37/28 ,  H01J37/26

CPC classification number: H01J37/244 ,  H01J37/28 ,  H01J37/265 ,  H01J2237/24475 ,  H01J2237/2448

Abstract: There is provided a technique capable of reducing deterioration of a back scattered electron (BSE) detector caused by a dark pulse. Charged particle beam apparatus includes: a plurality of BSE detectors configured to detect a BSE from a sample; and a controller. The controller acquires, within a period, a first peak time of a first peak included in an output signal from a first BSE detector among the plurality of BSE detectors, and a second peak time of a second peak included in an output signal from a second BSE detector other than the first BSE detector among the plurality of BSE detectors, determines, when the second peak is present where a time difference between the first peak time and the second peak time is within a threshold value, that the first peak is caused by the BSE, and determines, when the second peak is not present where the time difference is within the threshold value, that the first peak is caused by the dark pulse.

公开(公告)号：US20230335367A1

公开(公告)日：2023-10-19

申请号：US18028771

申请日：2020-11-10

Applicant: Hitachi High-Tech Corporation

Inventor： Takashi OHSHIMA ,  Hideo MORISHITA ,  Tatsuro IDE ,  Hiroyasu SHICHI ,  Yoichi OSE ,  Junichi KATANE

IPC: H01J37/06 ,  H01J37/28 ,  H01J37/244

CPC classification number: H01J37/06 ,  H01J37/28 ,  H01J37/244 ,  H01J2237/24535 ,  C23C14/14

Abstract: An activation mechanism is provided in an activation region of an electron gun, and includes a light source device 3 configured to irradiate a photocathode with excitation light, a heat generating element, an oxygen generation unit configured to generate oxygen by heating the heat generating element, and an emission current meter configured to monitor an emission current generated by electron emission when the photocathode 1 is irradiated with the excitation light from the light source device. In a surface activation process, the photocathode is irradiated with the excitation light from the light source device, an emission current amount of the photocathode is monitored by the emission current meter, the heat generating element is heated to generate oxygen by the oxygen generation unit, and the heating of the heat generating element is stopped when the emission current amount of the photocathode satisfies a predetermined stop criterion.

公开(公告)号：US11791130B2

公开(公告)日：2023-10-17

申请号：US17299153

申请日：2019-01-23

Applicant: Hitachi High-Tech Corporation

Inventor： Koichi Hamada ,  Megumi Kimura ,  Momoyo Enyama ,  Ryou Yumiba ,  Makoto Sakakibara ,  Kei Sakai ,  Satoru Yamaguchi ,  Katsumi Setoguchi ,  Masumi Shirai ,  Yasunori Takasugi

IPC: H01J37/28 ,  H01J37/153 ,  H01J37/22

CPC classification number: H01J37/28 ,  H01J37/153 ,  H01J37/222 ,  H01J2237/2817

Abstract: The objective of the present invention is to reduce differences between individual electron beam observation devices accurately by means of image correction. This method for calculating a correction factor for correcting images between a plurality of electron beam observation devices, in electron beam observation devices which generate images by scanning an electron beam across a specimen, is characterized by including: a step in which a first electron beam observation device generates a first image by scanning a first electron beam across first and second patterns, on either a specimen including the first pattern and the second pattern, having a different shape or size to the first pattern, or a first specimen including the first pattern and a second specimen including the second pattern; a step in which a second electron beam observation device generates a second image by scanning a second electron beam across the first and second patterns; and a step in which the first or second electron beam observation device calculates a correction factor at a peak frequency extracted selectively from first and second frequency characteristics calculated on the basis of the first and second images.

公开(公告)号：US20230317408A1

公开(公告)日：2023-10-05

申请号：US17711785

申请日：2022-04-01

Applicant: Intel Corporation

Inventor： Xianghong Tong ,  Martin Von Haartman ,  Wen-Hsien Chuang ,  Zhiyong Ma ,  Hyuk Ju Ryu ,  Prasoon Joshi ,  May Ling Oh ,  Jennifer Huening ,  Shuai Zhao ,  Charles Peterson ,  Ira Jewell ,  Hasan Faraby

IPC: H01J37/26 ,  H01J37/28 ,  H01J37/244

CPC classification number: H01J37/265 ,  H01J37/28 ,  H01J37/244 ,  H01J2237/2443 ,  H01J2237/2814 ,  H01J2237/2801 ,  H01J2237/221

Abstract: Pulsed beam prober systems, devices, and techniques are described herein related to providing a beam detection frequency that is less than a electrical test frequency. An electrical test signal at the electrical test frequency is provided to die under test. A pulsed beam is applied to the die such that the pulsed beam has packets of beam pulses or a frequency delta with respect to the electrical test frequency. The packets of beam pulses or the frequency delta elicits a detectable beam modulation in an imaging signal reflected from the die such that the imaging signal is modulated at a detection frequency less than the electrical test frequency.

公开(公告)号：US20230317404A1

公开(公告)日：2023-10-05

申请号：US17757133

申请日：2022-01-26

Applicant: FOCUS-EBEAM TECHNOLOGY (BEIJING) CO., LTD.

Inventor： Shuai LI

IPC: H01J37/147 ,  H01J37/28 ,  H01J37/244 ,  H01J37/10

CPC classification number: H01J37/1474 ,  H01J37/10 ,  H01J37/244 ,  H01J37/28

Abstract: Provided is an electron beam system, including: an electron source, configured to generate an electron beam; a first beam guide, configured to accelerate the electron beam; a second beam guide, configured to accelerate the electron beam; a first control electrode arranged between the first beam guide and the second beam guide, configured to change movement directions of backscattered electrons and secondary electrons generated by the electron beam acting on a specimen to be tested; a first detector arranged between the first beam guide and the first control electrode, configured to receive the backscattered electrons generated by the electron beam acting on the specimen to be tested. The first control electrode according to the embodiments of the present disclosure changes the movement directions of the backscattered electrons and secondary electrons generated by the electron beam generated by the electron source acting on the specimen to be tested, so that the first detector arranged between the first beam guide and the first control electrode can receive pure backscattered electrons generated by the electron beam acting on the specimen to be tested.

公开(公告)号：US20230317400A1

公开(公告)日：2023-10-05

申请号：US18121931

申请日：2023-03-15

Applicant: JEOL Ltd.

Inventor： Kyouichi Kamino ,  Tomohisa Fukuda ,  Norikazu Arima ,  Yasuyuki Okano ,  Keiichi Yamamoto

IPC: H01J37/067 ,  H01J37/18 ,  H01J37/28

CPC classification number: H01J37/067 ,  H01J37/18 ,  H01J37/28

Abstract: Provided is a charged particle beam source having an emitter that can be replaced easily. The charged particle beam source includes an electron gun chamber; a first unit including both a supportive insulative member mechanically supporting a cable and a first set of terminals electrically connected to the cable; and a second unit including both the emitter that releases charged particles and a second set of terminals electrically connected to the emitter. The chamber has a side wall provided with a through-hole in which the first unit is secured. The second unit can be detachably mounted to the first unit. Within the chamber, the emitter is placed on an optical axis, so that the first and second sets of terminals are brought into contact with each other.

公开(公告)号：US20230313644A1

公开(公告)日：2023-10-05

申请号：US17708802

申请日：2022-03-30

Applicant: Saudi Arabian Oil Company

Inventor： Qiwei Wang ,  Tao Chen ,  Hameed H. Al-Badairy

IPC: E21B37/06 ,  C09K8/528 ,  E21B43/20 ,  G01N23/20091 ,  H01J37/28 ,  G01N33/18

CPC classification number: E21B37/06 ,  C09K8/528 ,  E21B43/20 ,  G01N23/20091 ,  H01J37/28 ,  G01N33/1853 ,  G01N1/4077

Abstract: A method and system of treatment with scale inhibitor, including adding scale inhibitor to source water to give injection water, conveying the injection water in a surface conduit to an injection well for injection into an oil reservoir in a subterranean formation, pumping the injection water through a wellbore of the injection well into the oil reservoir, obtaining a sample of the injection water (including suspended solids), and analyzing the suspended solids.