公开(公告)号：US20100030522A1

公开(公告)日：2010-02-04

申请号：US12507385

申请日：2009-07-22

Applicant: Seiichi TSUCHIYA ,  Akinori Mine

Inventor： Seiichi TSUCHIYA ,  Akinori Mine

IPC: G06F15/00

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/24 ,  H01J2237/1504

Abstract: The charged particle beam writing apparatus includes a position deflection control circuit. First digital data that is to be used for circuit diagnosis is transmitted from the position deflection control circuit to the DAC amplifier unit at the same rate as a rate of writing on a product reticle and stored in a first maintenance memory. Second digital data is output from a digital section included in the DAC amplifier unit in response to the first digital data and stored in a second maintenance memory. A maintenance clock generator generates a clock signal and reads the first digital data stored in the first maintenance memory and the second digital data stored in the second maintenance memory. The first digital data thus read is compared with the second digital data thus read for each bit to diagnose the digital section.

Abstract translation: 带电粒子束写入装置包括位置偏转控制电路。 将要用于电路诊断的第一数字数据以与产品掩模版上的写入速率相同的速率从位置偏转控制电路传输到DAC放大器单元并存储在第一维护存储器中。 响应于第一数字数据，第二数字数据从包括在DAC放大器单元中的数字部分输出并存储在第二维护存储器中。 维护时钟发生器产生时钟信号并读取存储在第一维护存储器中的第一数字数据和存储在第二维护存储器中的第二数字数据。 将如此读取的第一数字数据与对于每个位读取的第二数字数据进行比较以诊断数字部分。

公开(公告)号：US20070138413A1

公开(公告)日：2007-06-21

申请号：US11563109

申请日：2006-11-24

Applicant: Takayuki ABE ,  Jun Yashima

Inventor： Takayuki ABE ,  Jun Yashima

IPC: G21K5/10

CPC classification number: H01J37/147 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/78 ,  H01J37/045 ,  H01J37/24 ,  H01J37/3023 ,  H01J37/3174 ,  H01J2237/0432 ,  H01J2237/1504 ,  H01J2237/30472

Abstract: A charged particle beam writing method includes irradiating a shot of a charged particle beam, and deflecting the charged particle beam of the shot using a plurality of deflectors arranged on an optical path of the charged particle beam to write a pattern on a target object, wherein any one of the plurality of deflectors controls deflection of a charged particle beam of a shot different from a shot which is controlled in deflection by another deflector in the same period.

Abstract translation: 带电粒子束写入方法包括照射带电粒子束的镜头，并且使用布置在带电粒子束的光路上的多个偏转器偏转拍摄的带电粒子束以将目标物体写入图案，其中 所述多个偏转器中的任何一个控制在相同的周期内不同于由另一偏转器偏转控制的镜头的镜头的带电粒子束的偏转。

公开(公告)号：US07227155B2

公开(公告)日：2007-06-05

申请号：US11241789

申请日：2005-09-30

Applicant: Benyamin Buller ,  William J. Devore ,  Juergen Frosien ,  Eugene Mirro, Jr. ,  Henry Pearce-Percy ,  Dieter Winkler

Inventor： Benyamin Buller ,  William J. Devore ,  Juergen Frosien ,  Eugene Mirro, Jr. ,  Henry Pearce-Percy ,  Dieter Winkler

IPC: H01J37/147

CPC classification number: H01J37/147 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/24 ,  H01J37/3174 ,  H01J2237/0432 ,  H01J2237/1504 ,  H01J2237/28

Abstract: An apparatus and method for deflecting electron beams with high precision and high throughput. At least one electrode of a deflecting capacitor is connected to a signal source via a coaxial cable. A termination resistor is further connected to the coaxial cable and the electrode at the joint of the coaxial cable and the electrode. The termination resistor has a resistance matched to the impedance of the coaxial cable and the electrode has an impedance matched to half of the impedance of the coaxial. The deflecting capacitors of the present invention have a minimized loss of precision due to eddy current. The spacing of electrodes in the deflecting capacitors is reduced by a factor of approximately two compared to the state-the-art system.

Abstract translation: 一种高精度高通量偏转电子束的装置和方法。 偏转电容器的至少一个电极通过同轴电缆连接到信号源。 终端电阻器还连接到同轴电缆和在同轴电缆和电极的接头处的电极。 终端电阻器具有与同轴电缆的阻抗匹配的电阻，并且电极具有与同轴电缆的阻抗的一半相匹配的阻抗。 本发明的偏转电容器由于涡电流而具有最小的精度损失。 与现有技术的系统相比，偏转电容器中的电极间距减小约2倍。

公开(公告)号：US20070034797A1

公开(公告)日：2007-02-15

申请号：US11528418

申请日：2006-09-28

Applicant: Yoshiaki Kohama

Inventor： Yoshiaki Kohama

IPC: G21K7/00

CPC classification number: H01J37/045 ,  G01N23/2251 ,  H01J37/26 ,  H01J37/265 ,  H01J37/28 ,  H01J37/304 ,  H01J2237/0203 ,  H01J2237/1504 ,  H01J2237/151 ,  H01J2237/221 ,  H01J2237/2817

Abstract: A beam source of an inspection apparatus discharges a beam, and a stage system holds a specimen and moves in at least one direction. A primary optical system directs the beam to the specimen, and a secondary optical system guides a secondary beam coming from the specimen. A sensor outputs an electric signal of the specimen image from the secondary beam, an image processor generates image information of the specimen by processing the electric signal output by the sensor, and a host computer generates an inspection timing signal for controlling the sensor to transfer the image information at a preset data transfer rate.

Abstract translation: 检查装置的光束源射出光束，舞台系统保持试样并沿至少一个方向移动。 主光学系统将光束引导到样品，并且次级光学系统引导来自样品的次级光束。 传感器从副光束输出样本图像的电信号，图像处理器通过处理由传感器输出的电信号来生成样本的图像信息，并且主计算机生成检查定时信号，用于控制传感器传送 图像信息以预设的数据传输速率。

公开(公告)号：US07078713B2

公开(公告)日：2006-07-18

申请号：US10807770

申请日：2004-03-24

Applicant: Nicholas R. White

Inventor： Nicholas R. White

IPC: H01J37/317

CPC classification number: H01J37/3171 ,  H01J37/141 ,  H01J37/1471 ,  H01J37/1472 ,  H01J37/3172 ,  H01J2237/1504 ,  H01J2237/152 ,  H01J2237/30433 ,  H01J2237/31703

Abstract: An electromagnetic regulator assembly for the production of contiguous magnetic fields which are applied to a continuous ion beam is described. The assembly is structured for controlling the uniformity of traveling continuous ribbon-shaped beams; and allows for direct adjustment of the magnetic field gradient of the magnetic field as the parameter for increasing the current uniformity.

Abstract translation: 描述了用于产生施加到连续离子束的连续磁场的电磁调节器组件。 该组件被构造成用于控制行进的连续带状梁的均匀性; 并且允许直接调节磁场的磁场梯度作为增加电流均匀性的参数。

公开(公告)号：US20050082498A1

公开(公告)日：2005-04-21

申请号：US10807772

申请日：2004-03-24

Applicant: Nicholas White

Inventor： Nicholas White

IPC: H01J37/147 ,  H01J37/304 ,  H01J37/317

CPC classification number: H01J37/3171 ,  H01J37/1472 ,  H01J37/1474 ,  H01J37/3045 ,  H01J2237/1501 ,  H01J2237/1504 ,  H01J2237/1508 ,  H01J2237/152

Abstract: In a system for implanting workpieces with an accurately parallel scanned ion beam, a fine-control collimator construct is used to reduce the deviation of the scanned ion beam from a specified axis of parallelism and thereby improve its collimation. The shape of the fine-control collimator matches the ribbon shape of the beam and correction of parallelism in two orthogonal directions is possible. Measurement of the non-parallelism is accomplished by sampling the scanned beam in two planes and comparing timing information; and such measurement is calibrated to the orientation of the workpiece in the plane where ion implantation occurs. Measurement of non-uniformity in the doping profile is accomplished using the same means; and the scan waveform is adjusted to substantially remove any non-uniformity in the doping profile.

Abstract translation: 在用精确平行的扫描离子束注入工件的系统中，使用精细控制准直器构造来减少扫描的离子束与特定的平行轴的偏离，从而改进其准直。 精细准直器的形状与光束的色带形状匹配，并且可以在两个正交方向上校正平行度。 通过在两个平面中采样扫描光束并比较定时信息来实现非平行度的测量; 并且这样的测量被校准为在离子注入发生的平面中的工件的取向。 使用相同的方法测量掺杂分布中的不均匀性; 并且调整扫描波形以基本上消除掺杂分布中的任何不均匀性。

公开(公告)号：US20050017202A1

公开(公告)日：2005-01-27

申请号：US10807770

申请日：2004-03-24

Applicant: Nicholas White

Inventor： Nicholas White

IPC: H01J37/141 ,  H01J37/147 ,  H01J37/317

CPC classification number: H01J37/3171 ,  H01J37/141 ,  H01J37/1471 ,  H01J37/1472 ,  H01J37/3172 ,  H01J2237/1504 ,  H01J2237/152 ,  H01J2237/30433 ,  H01J2237/31703

Abstract: An electromagnetic regulator assembly for the production of contiguous magnetic fields which are applied to a continuous ion beam is described. The assembly is structured for controlling the uniformity of traveling continuous ribbon-shaped beams; and allows for direct adjustment of the magnetic field gradient of the magnetic field as the parameter for increasing the current uniformity.

Abstract translation: 描述了用于产生施加到连续离子束的连续磁场的电磁调节器组件。 该组件被构造成用于控制行进的连续带状梁的均匀性; 并且允许直接调节磁场的磁场梯度作为增加电流均匀性的参数。

公开(公告)号：US06420700B2

公开(公告)日：2002-07-16

申请号：US09826913

申请日：2001-04-06

Applicant: Yoshihisa Ooaeh ,  Kenichi Kawakami

Inventor： Yoshihisa Ooaeh ,  Kenichi Kawakami

IPC: H01J37304

CPC classification number: H01J37/147 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/21 ,  H01J37/3045 ,  H01J37/3174 ,  H01J2237/024 ,  H01J2237/1502 ,  H01J2237/1504 ,  H01J2237/216 ,  H01J2237/30472

Abstract: A method of exposing a wafer to a charged-particle beam by directing to the wafer the charged-particle beam deflected by a deflector includes the steps of arranging a plurality of first marks at different heights, focusing the charged-particle beam on each of the first marks by using a focus coil provided above the deflector, obtaining a focus distance for each of the first marks, obtaining deflection-efficiency-correction coefficients for each of the first marks, and using linear functions of the focus distance for approximating the deflection-efficiency-correction coefficients to obtain the deflection-efficiency-correction coefficients for an arbitrary value of the focus distance. A device for carrying out the method is also set forth.

Abstract translation: 通过将晶片引导到晶片，通过偏转器偏转的带电粒子束将晶片暴露于带电粒子束的方法包括以下步骤：在不同的高度处布置多个第一标记，将带电粒子束聚焦在每个 通过使用设置在偏转器上方的聚焦线圈的第一标记，获得每个第一标记的聚焦距离，获得每个第一标记的偏转效率校正系数，并且使用焦距的线性函数来近似偏转 - 效率校正系数，以获得针对焦距的任意值的偏转效率校正系数。 还提出了一种用于执行该方法的装置。

公开(公告)号：US5631113A

公开(公告)日：1997-05-20

申请号：US435157

申请日：1995-05-05

Applicant: Takamasa Satoh ,  Hiroshi Yasuda ,  Akio Yamada ,  Junichi Kai ,  Yoshihisa Oae ,  Keiji Yamada ,  Toru Oshima

Inventor： Takamasa Satoh ,  Hiroshi Yasuda ,  Akio Yamada ,  Junichi Kai ,  Yoshihisa Oae ,  Keiji Yamada ,  Toru Oshima

IPC: H01L21/027 ,  H01J37/153 ,  G03L5/00 ,  H01J37/00

CPC classification number: H01J37/153 ,  H01J2237/1504 ,  H01J2237/1532 ,  H01J2237/3175

Abstract: An electron-beam exposure system includes an astigmatic compensation circuit that increases a voltage applied across a pair of electrodes forming an electrostatic sub-deflector and simultaneously decreases a voltage applied across another pair of electrodes forming the same electrostatic sub-deflector with a same magnitude as in the case of increasing the voltage, wherein the magnitude of the voltage change is changed in response to the deflection of the electron-beam caused by a main deflector.

Abstract translation: 电子束曝光系统包括像散补偿电路，其增加施加在形成静电副偏转器的一对电极上的电压，并且同时降低施加在形成相同静电副偏转器的另一对电极上施加的电压，其具有与 在增加电压的情况下，其中电压变化的大小响应于由主偏转器引起的电子束的偏转而改变。

公开(公告)号：US5600146A

公开(公告)日：1997-02-04

申请号：US561906

申请日：1995-11-22

Applicant: Joseph A. Felker ,  Thomas C. Russell

Inventor： Joseph A. Felker ,  Thomas C. Russell

IPC: H01J37/147 ,  H01J37/24 ,  H01J37/317 ,  H04N3/16

CPC classification number: H01J37/1477 ,  H01J2237/1504 ,  H01J2237/1516

Abstract: Circuitry that controls a multiple-plate charged particle beam deflection arrangement includes a Digital Signal Processor (DSP) acting through a separate accumulating Arithmetic Logic Unit (ALU) connected to each of the plates. For each line to be scanned, at the commencement of the scanning of the line, the DSP delivers to each accumulating ALU a separate signal composed of a digital number representing an initial value (if any) and a digital number representing a step size. During each subsequent cycle of a clock, each accumulating ALU successively adds the step size to a resulting cumulative sum. This cumulative sum depends upon the initial value (if any) plus the step size multiplied by the number of cycles that have elapsed since the initial cycle.

Abstract translation: 控制多板带电粒子束偏转装置的电路包括通过连接到每个板的单独的累加算术逻辑单元（ALU）而起作用的数字信号处理器（DSP）。 对于要扫描的每条线，在扫描线路的开始时，DSP向每个累加ALU递送由表示初始值（如果有的话）的数字数字和表示步长的数字数字组成的单独信号。 在时钟的每个后续周期期间，每个累积ALU连续地将步长加到结果累积和。 该累积和取决于初始值（如果有的话）加上步长乘以自初始循环以来经过的循环次数。