公开(公告)号：US20120056099A1

公开(公告)日：2012-03-08

申请号：US13224773

申请日：2011-09-02

Applicant: Uwe BEHRENS ,  Thomas STEPHANI

Inventor： Uwe BEHRENS ,  Thomas STEPHANI

IPC: H01J3/14

CPC classification number: H05H7/02 ,  A61N5/10 ,  A61N5/1077 ,  A61N2005/1087 ,  H01J3/14 ,  H05H13/005 ,  H05H2007/122 ,  H05H2277/11

Abstract: Systems and methods are provided to perform efficient, automatic adjustment of cyclotron beam currents within a wide range for multiple treatment layers within the same patient and treatment session. In one embodiment, efficient adjustment is achieved by using beam current attenuation by an electrostatic vertical deflector installed in the inner center of the cyclotron. The beam current may, for example, be adjusted by the high voltage applied to the electrostatic vertical deflector. In front of each treatment the attenuation curve of the vertical deflector is recorded. Based on this attenuation curve, the vertical deflector voltage for the needed beam current of each irradiation layer is interpolated. With this procedure the beam current could be automatically adjusted in minimal time over a wide range while maintaining a high level of precision.

Abstract translation: 提供系统和方法以在相同的患者和治疗期间内的多个处理层的宽范围内对回旋加速器束电流进行有效的自动调节。 在一个实施例中，通过使用安装在回旋加速器的内部中心的静电垂直偏转器来使用束流衰减来实现有效的调节。 例如，束电流可以通过施加到静电垂直偏转器的高电压来调节。 在每次处理前，记录垂直偏转器的衰减曲线。 基于该衰减曲线，对每个照射层所需的束电流的垂直偏转器电压进行插值。 通过该程序，可以在很宽的范围内以最小的时间自动调整光束电流，同时保持高精度。

公开(公告)号：US08067748B2

公开(公告)日：2011-11-29

申请号：US12497829

申请日：2009-07-06

Applicant: Vladimir Balakin

Inventor： Vladimir Balakin

IPC: H05H13/02 ,  H05H13/04

CPC classification number: A61N5/1049 ,  A61N2005/1061 ,  A61N2005/1087 ,  H01J3/14 ,  H05H7/10 ,  H05H13/04

Abstract: The invention comprises a charged particle beam acceleration and optional extraction method and apparatus used in conjunction with charged particle beam radiation therapy of cancerous tumors. Novel design features of a synchrotron are described. Particularly, turning magnets, edge focusing magnets, concentrating magnetic field magnets, and extraction elements are described that minimize the overall size of the synchrotron, provide a tightly controlled proton beam, directly reduce the size of required magnetic fields, directly reduces required operating power, and allow continual acceleration of protons in a synchrotron even during a process of extracting protons from the synchrotron.

Abstract translation: 本发明包括带电粒子束加速度和与癌性肿瘤的带电粒子束放射治疗结合使用的任选的提取方法和装置。 描述了同步加速器的新颖设计特征。 特别地，描述了转子磁体，边缘聚焦磁体，集中磁场磁体和提取元件，其使得同步加速器的总体尺寸最小化，提供严格控制的质子束，直接减小所需磁场的尺寸，直接减少所需的操作功率， 并且即使在从同步加速器提取质子的过程中也允许同步加速器中的质子的持续加速。

公开(公告)号：US07960693B2

公开(公告)日：2011-06-14

申请号：US12220321

申请日：2008-07-23

Applicant: Richard Syms ,  Alan Finlay

Inventor： Richard Syms ,  Alan Finlay

IPC: H01J49/42

CPC classification number: H01J3/14 ,  H01J49/0018 ,  H01J49/065

Abstract: Microengineered stacked ring electrode assemblies capable of acting as either RF or DC ion guides in an ion optical system, and method of fabricating same are described. The electrodes are fabricated using planar processing as sets of grooved, proud features formed in a layer of material lying on an insulating substrate. Two such structures are then stacked together to form a set of diaphragm electrodes with closed pupils. Arrangements for fabrication by patterning, etching and bonding are described, together with methods for tapering the electrode pupils or otherwise varying the ion path.

Abstract translation: 描述了能够在离子光学系统中用作RF或DC离子导向器的微工程堆叠环形电极组件及其制造方法。 这些电极使用平面加工制造成为在位于绝缘衬底上的材料层中形成的一组带槽的引人注目的特征。 然后将两个这样的结构堆叠在一起以形成具有闭合瞳孔的一组隔膜电极。 描述通过图案化，蚀刻和接合进行制造的布置以及用于使电极瞳孔逐渐变细或以其它方式改变离子路径的方法。

公开(公告)号：US07940894B2

公开(公告)日：2011-05-10

申请号：US12492515

申请日：2009-06-26

Applicant: Vladimir Balakin

Inventor： Vladimir Balakin

IPC: H01J35/06 ,  H01J35/14 ,  A61N5/10

CPC classification number: A61N5/1049 ,  A61N2005/1061 ,  A61N2005/1087 ,  H01J3/14 ,  H05H7/10 ,  H05H13/04

Abstract: The system uses an X-ray imaging system having an elongated lifetime. Further, the system uses an X-ray beam that lies in substantially the same path as a charged particle beam path of a particle beam cancer therapy system. The system creates an electron beam that strikes an X-ray generation source located proximate to the charged particle beam path. By generating the X-rays near the charged particle beam path, an X-ray path running collinear, in parallel with, and/or substantially in contact with the charged particle beam path is created. The system then collects X-ray images of localized body tissue region about a cancerous tumor. Since, the X-ray path is essentially the charged particle beam path, the generated image is usable for precisely target the tumor with a charged particle beam.

Abstract translation: 该系统使用具有延长寿命的X射线成像系统。 此外，该系统使用位于与粒子束癌治疗系统的带电粒子束路径基本相同的路径中的X射线束。 该系统产生电子束，该电子束撞击位于带电粒子束路径附近的X射线产生源。 通过在带电粒子束路径附近产生X射线，产生与带电粒子束路径并联并且/或基本上与带电粒子束路径接触的X射线路径。 然后系统收集关于癌性肿瘤的局部的身体组织区域的X射线图像。 由于X射线路径基本上是带电粒子束路径，所以生成的图像可用于用带电粒子束精确地靶向肿瘤。

公开(公告)号：US20100193681A1

公开(公告)日：2010-08-05

申请号：US12365354

申请日：2009-02-04

Applicant: Marvin L. Vestal

Inventor： Marvin L. Vestal

IPC: H01J49/40 ,  H01J49/00 ,  H01J3/14

CPC classification number: H01J3/14 ,  H01J49/004 ,  H01J49/061 ,  H01J49/40

Abstract: A mass spectrometer includes a pulsed ion source that generates an ion beam comprising a plurality of ions. A first timed ion selector passes a first group of ions. A first ion mirror generates a reflected ion beam comprising the first group of ions that at least partially compensates for an initial kinetic energy distribution of the first group of ions. A second timed ion selector passes a second group of ions. A second ion mirror generates a reflected ion beam comprising the second group of ions that at least partially compensates for an initial kinetic energy distribution of the second group of ions. A timed ion deflector deflects the second group of ions to a detector assembly comprising at least two ion detectors which detects the deflected ion beam.

Abstract translation: 质谱仪包括产生包含多个离子的离子束的脉冲离子源。 第一定时离子选择器通过第一组离子。 第一离子镜产生包含至少部分地补偿第一组离子的初始动能分布的第一组离子的反射离子束。 第二个定时离子选择器通过第二组离子。 第二离子镜产生包含至少部分地补偿第二组离子的初始动能分布的第二组离子的反射离子束。 定时离子偏转器将第二组离子偏转到包括至少两个检测偏转离子束的离子检测器的检测器组件。

公开(公告)号：US20100006770A1

公开(公告)日：2010-01-14

申请号：US12497829

申请日：2009-07-06

Applicant: Vladimir Balakin

Inventor： Vladimir Balakin

IPC: H01J3/14 ,  A61N5/00 ,  A61N5/10

CPC classification number: A61N5/1049 ,  A61N2005/1061 ,  A61N2005/1087 ,  H01J3/14 ,  H05H7/10 ,  H05H13/04

Abstract: The invention comprises a charged particle beam acceleration and optional extraction method and apparatus used in conjunction with charged particle beam radiation therapy of cancerous tumors. Novel design features of a synchrotron are described. Particularly, turning magnets, edge focusing magnets, concentrating magnetic field magnets, and extraction elements are described that minimize the overall size of the synchrotron, provide a tightly controlled proton beam, directly reduce the size of required magnetic fields, directly reduces required operating power, and allow continual acceleration of protons in a synchrotron even during a process of extracting protons from the synchrotron.

Abstract translation: 本发明包括带电粒子束加速度和与癌性肿瘤的带电粒子束放射治疗结合使用的任选的提取方法和装置。 描述了同步加速器的新颖设计特征。 特别地，描述了转子磁体，边缘聚焦磁体，集中磁场磁体和提取元件，其使得同步加速器的总体尺寸最小化，提供严格控制的质子束，直接减小所需磁场的尺寸，直接减少所需的操作功率， 并且即使在从同步加速器提取质子的过程中也允许同步加速器中的质子的持续加速。

公开(公告)号：US20080121826A1

公开(公告)日：2008-05-29

申请号：US11272527

申请日：2005-11-11

Applicant: Jathan W. Manley ,  Jan Jelinek

Inventor： Jathan W. Manley ,  Jan Jelinek

IPC: H01J40/14 ,  H01J5/16 ,  H01J3/14 ,  G02B27/00

CPC classification number: G01S3/784 ,  G01S3/789 ,  G02B3/0056 ,  H01J3/14 ,  H01L27/14618 ,  H01L31/0232 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A system and method for laser source detection. An exemplary embodiment of the system includes a first array of lenses, a second array of opto devices (including light sources and light detectors), and at least one processor. Energy from the light source may be detected at the array of opto devices having lenses at known positions, to allow the approximate location of the laser source to be determined. Upon determining the source, responsive action may be taken. If the incoming laser is from a friendly party, a friendly-party notification may be provided. If the incoming laser is from an enemy, reciprocal targeting or false reflections may be employed.

Abstract translation: 一种用于激光源检测的系统和方法。 该系统的示例性实施例包括第一透镜阵列，第二光学器件阵列（包括光源和光检测器）以及至少一个处理器。 可以在具有在已知位置处的透镜的光学器件的阵列处检测来自光源的能量，以允许确定激光源的大致位置。 在确定来源时，可以采取响应式的动作。 如果进来的激光来自友好方，可能会提供友好方通知。 如果进来的激光来自敌人，则可以采用相互对准或假反射。

公开(公告)号：US07282727B2

公开(公告)日：2007-10-16

申请号：US11187519

申请日：2005-07-22

Applicant: Michael W. Retsky

Inventor： Michael W. Retsky

IPC: H01J3/14

CPC classification number: H01J3/02 ,  F41H11/02 ,  F41H11/12 ,  F41H11/136 ,  F41H13/00 ,  F41H13/0043 ,  F42B33/065 ,  H01J3/026 ,  H01J3/14

Abstract: A method and apparatus is disclosed for an electron beam directed energy device. The device consists of an electron gun with one or more electron beams. The device includes one or more accelerating plates with holes aligned for beam passage. The plates may be flat or preferably shaped to direct each electron beam to exit the electron gun at a predetermined orientation. In one preferred application, the device is located in outer space with individual beams that are directed to focus at a distant target to be used to impact and destroy missiles. The aimings of the separate beams are designed to overcome Coulomb repulsion. A method is also presented for directing the beams to a target considering the variable terrestrial magnetic field. In another preferred application, the electron beam is directed into the ground to produce a subsurface x-ray source to locate and/or destroy buried or otherwise hidden objects including explosive devices.

Abstract translation: 公开了一种用于电子束定向能量装置的方法和装置。 该装置由具有一个或多个电子束的电子枪组成。 该装置包括一个或多个加速板，其具有用于梁通道对准的孔。 板可以是平坦的或优选地成形以引导每个电子束以预定取向离开电子枪。 在一个优选的应用中，设备位于外部空间中，其中各个射束被引导以聚焦在远距离目标处以用于撞击和摧毁导弹。 单独梁的目的是克服库仑排斥。 还提出了一种考虑到可变地面磁场将光束引导到目标的方法。 在另一个优选的应用中，电子束被引导到地面中以产生地下x射线源来定位和/或破坏包括爆炸装置在内的隐藏的物体。

公开(公告)号：US20190189383A1

公开(公告)日：2019-06-20

申请号：US16285475

申请日：2019-02-26

Applicant: NANOX IMAGING PLC

Inventor： KOICHI IIDA ,  HIDENORI KENMOTSU ,  JUN YAMAZAKI ,  HITOSHI MASUYA

IPC: H01J3/14 ,  H01J35/14 ,  H01J1/304 ,  H01J3/02 ,  H01J29/46 ,  G01N23/046 ,  H01J35/06 ,  H01J31/12 ,  G01T1/161

CPC classification number: H01J35/065 ,  G01N23/046 ,  G01N2223/204 ,  G01N2223/419 ,  G01T1/161 ,  H01J1/3042 ,  H01J3/021 ,  H01J3/027 ,  H01J3/14 ,  H01J29/467 ,  H01J31/127 ,  H01J35/14 ,  H01J2235/068

Abstract: Controlling total emission current of an electron emitting construct in an x-ray emitting device by providing a cathode, providing multiple active areas each active area having a gated cone electron source, including multiple emitter tips arranged in an array, a gate electrode, and a gate interconnect lead connected to the gate electrode, providing an x-ray emitting construct comprising an anode, the anode being an x-ray target, situating the x-ray emitting construct facing the active areas face each other, selecting a set of active areas, and activating selected active areas by conductively connecting a voltage source to their associated the gate electrode interconnect lead.

公开(公告)号：US20180143332A1

公开(公告)日：2018-05-24

申请号：US15813777

申请日：2017-11-15

Applicant: Plasma-Therm LLC

Inventor： Leslie Michael Lea ,  Linnell Martinez ,  Michael Morgan ,  Russell Westerman

IPC: G01T1/28 ,  H01J49/02 ,  H01J3/14

CPC classification number: G01T1/28 ,  H01J3/14 ,  H01J37/32357 ,  H01J37/32422 ,  H01J37/32577 ,  H01J37/32633 ,  H01J37/32871 ,  H01J49/02 ,  H01L21/78

Abstract: The present invention provides a method for using ion filtering to adjust the number of ions delivered to a substrate. The method comprising a process chamber being provided that is operatively connected to a plasma source. The substrate is provided on a substrate support that is provided within the process chamber. An electrical bias source is provided that is operatively connected to an aperture plate that is provided in the process chamber. The substrate on the substrate support is processed using a plasma generated using the plasma source. A variable bias voltage from the electrical bias source is applied to the aperture plate during the plasma processing of the substrate. The plasma processing of the substrate can further comprise exposing the substrate to a plasma time division multiplex process which alternates between deposition and etching on the substrate.