公开(公告)号：US06894288B2

公开(公告)日：2005-05-17

申请号：US10394201

申请日：2003-03-24

Applicant: Helmut Müller ,  Daniel Tobias

Inventor： Helmut Müller ,  Daniel Tobias

IPC: H01J37/09 ,  H01J37/20 ,  H01J37/26 ,  H01J37/15 ,  G02B21/34

CPC classification number: H01J37/20 ,  H01J37/261

Abstract: The invention is directed to a manipulator for an optical apparatus including a particle-optical apparatus. The manipulator is especially a diaphragm or specimen manipulator in an electron microscope. The component (4), which is to manipulated, is accommodated by a transfer body (2) movable relative to a spatially-fixed component (1) and the transfer body (2) includes a composite material having a high thermal conductivity while simultaneously having a vanishing or negative thermal expansion coefficient in the direction of the connecting axis (B—B) between the component (4) and the spatially-fixed component (1).

Abstract translation: 本发明涉及一种包括粒子光学装置的光学装置的操纵器。 机械手特别是电子显微镜中的隔膜或样品操纵器。 待操作的部件（4）由相对于空间固定部件（1）可移动的传送体（2）容纳，并且传送体（2）包括具有高导热性的复合材料，同时具有 在部件（4）和空间固定部件（1）之间的连接轴线（BB）的方向上消失或负热膨胀系数。

公开(公告)号：US06875982B2

公开(公告)日：2005-04-05

申请号：US10604989

申请日：2003-08-29

Applicant: Stephen W. Bedell ,  John Bruley ,  Anthony G. Domenicucci ,  Devendra K. Sadana

Inventor： Stephen W. Bedell ,  John Bruley ,  Anthony G. Domenicucci ,  Devendra K. Sadana

IPC: G01N1/28 ,  G01N23/04 ,  H01J37/26

CPC classification number: G01N23/04 ,  G01N2001/2893 ,  H01J37/261 ,  H01J2237/2826

Abstract: A method and calibration standard for fabricating on a single substrate a series of crystalline pairs such that the d-spacing difference between the pairs will generate Moire fringes of the correct spacings to optimally calibrate the magnification settings of an electron microscope over a variety of magnification settings in the range of 5000× to 200,000×. The invention enables the tailoring of Moire fringe spacings to a desired magnification setting for calibration purposes by fabricating a series of patterns on a single substrate whereby each magnification setting is easily calibrated using a specific SGOI structure that is selected by a simple x-y translation across the top plan surface of the SGOI structure, therein eliminating the need for removing calibration samples in and out of the electron microscope. The method and calibration standard may be used for calibrating electron microscopes, such as, scanning transmission electron microscopes and transmission electron microscopes.

Abstract translation: 一种用于在单个基板上制造一系列晶体对的方法和校准标准，使得对之间的d间距差会产生正确间隔的莫尔条纹，以便通过各种放大设置最佳地校准电子显微镜的放大倍率设置 在5000x到200,000x的范围内。 通过在单个基板上制造一系列图案，本发明可以通过在单个基板上制造一系列图案来将莫尔条纹间距定制到所需的放大倍率设置，从而可以使用特定的SGOI结构轻松校准每个放大倍数设置，该SGOI结构通过顶部的简单xy平移 SGOI结构的平面表面，其中不需要将校准样品移入和移出电子显微镜。 该方法和校准标准可用于校准电子显微镜，例如扫描透射电子显微镜和透射电子显微镜。

公开(公告)号：US20030226975A1

公开(公告)日：2003-12-11

申请号：US10360605

申请日：2003-02-07

Applicant: JEOL Ltd.

Inventor： G. Martinez Lopez ,  Katsushige Tsuno

IPC: H01J037/147 ,  H01J049/44

CPC classification number: H01J37/261 ,  H01J2237/057 ,  H01J2237/262

Abstract: A Wien filter is provided in which a less amount of secondary aberration is produced than conventional. This filter has 12 poles. These poles have front ends facing the optical axis. These front ends have a 12-fold rotational symmetry about the optical axis within the XY-plane perpendicular to the optical axis.

Abstract translation: 提供了一种维纳滤波器，其中比常规产生少量的二次像差。 该过滤器有12个极。 这些极具有面向光轴的前端。 这些前端在垂直于光轴的XY平面内围绕光轴具有12倍的旋转对称性。

公开(公告)号：US20030132382A1

公开(公告)日：2003-07-17

申请号：US10026379

申请日：2001-12-18

Inventor： Michael R. Sogard

IPC: G01N023/04

CPC classification number: G01N23/04 ,  H01J37/261 ,  H01J37/27 ,  H01J2237/262 ,  H01J2237/31776 ,  H01J2237/31798

Abstract: An inspection system (100) for inspecting a mask (101) to determine if the mask (101) has at least one desired transparent area (902) organized in a desired transparent pattern (908) and at least one desired opaque area (900) organized in a desired opaque pattern (906). The mask (101) includes an actual mask pattern (103C) having at least one actual transparent area (103A) and at least one actual opaque area (103B). In one embodiment, the inspection system can include a beamlet supply assembly (111) that (i) directs a shaped beamlet towards one of the actual areas (103A, 103B) of the mask (101), and/or (ii) directs a plurality of beamlets simultaneously towards the mask (101).

Abstract translation: 一种用于检查掩模（101）以确定掩模（101）是否具有以期望的透明图案（908）和至少一个期望的不透明区域（900）组织的至少一个所需透明区域（902）的检查系统（100） 以期望的不透明图案（906）组织。 掩模（101）包括具有至少一个实际透明区域（103A）和至少一个实际不透明区域（103B）的实际掩模图案（103C）。 在一个实施例中，检查系统可以包括一个小梁供应组件（111），其（i）将成形的小梁朝着面罩（101）的实际区域（103A，103B）中的一个引导，和/或（ii） 多个子束同时朝向掩模（101）。

公开(公告)号：US12125668B2

公开(公告)日：2024-10-22

申请号：US17431849

申请日：2020-02-25

Applicant: UNIVERSITEIT ANTWERPEN ,  IMEC VZW ,  UNIVERSITEIT GENT

Inventor： Wouter Van Putte ,  Jean-Pierre Timmermans ,  Jan Vanfleteren

IPC: H01J37/26 ,  B01J19/00

CPC classification number: H01J37/261 ,  B01J19/0046 ,  B01J2219/00432

Abstract: An electron microscopy grid, includes: (i) a perforated substrate, (ii) a support film on the perforated substrate, the support film having a thickness of 60 Å or less, and (iii) linkers attached on top of the support film. The linkers has at least one affinity group for immobilizing an analyte; wherein the linkers form a non-random pattern on the support film.

公开(公告)号：US12078791B2

公开(公告)日：2024-09-03

申请号：US17451498

申请日：2021-10-20

Applicant: Yangtze Memory Technologies Co., Ltd.

Inventor： Jun Liu ,  Yu Li ,  Yi Li ,  Yingfei Wang ,  Shiyan Wu ,  Qiangmin Wei

IPC: G02B21/36 ,  G02B21/16 ,  H01J37/26

CPC classification number: G02B21/367 ,  G02B21/16 ,  H01J37/261 ,  H01J2237/2802

Abstract: Aspects of the disclosure provide a method of tilting characterization. The method includes measuring a first tilting shift of structures based on a first disposition of the structures. The structures are formed in a vertical direction on a horizontal plane of a product. A second tilting shift of the structures is measured based on a second disposition of the structures. The second disposition is a horizontal flip of the first disposition. A corrected tilting shift is determined based on the first tilting shift and the second tilting shift.

公开(公告)号：US20240249905A1

公开(公告)日：2024-07-25

申请号：US18409499

申请日：2024-01-10

Applicant: FEI Company

Inventor： Alexander Henstra ,  Ali Mohammadi-Gheidari

IPC: H01J37/04 ,  H01J37/26

CPC classification number: H01J37/04 ,  H01J37/261

Abstract: Charged particle optical devices, systems, and methods are provided. A charged particle optical device can include a dispersing element disposed substantially on a beam axis, the dispersing element being configured to disperse particles of a beam of charged particles by energy in a dispersal plane parallel with the beam axis. The charged particle optical device can include a selector, disposed on the beam axis at a position substantially corresponding to a first crossover plane. The charged particle optical device can include an undispersing element. The charged particle optical device can include a cutoff disposed on the beam axis downstream of the selector at a position substantially corresponding to a second crossover plane on the beam axis. The second crossover plane can be downstream of the first crossover plane. The cutoff can include a material that is opaque to electrons and defining an aperture substantially aligned with the beam axis.

公开(公告)号：US20240203685A1

公开(公告)日：2024-06-20

申请号：US18068769

申请日：2022-12-20

Applicant: FEI Company

Inventor： Bart Buijsse ,  Pleun Dona

IPC: H01J37/20 ,  H01J37/26 ,  H01J37/28

CPC classification number: H01J37/20 ,  H01J37/261 ,  H01J37/28

Abstract: Systems, methods, and components of charged particle microscopes affording improved contrast in dose sensitive samples are described. A pole piece for an electron microscope can include a body, being substantially concentric with a central axis. The body can define an upper surface, substantially normal to the central axis, a lower surface, substantially normal to the central axis, a central aperture formed in the body from the upper surface to the lower surface. The central aperture can be substantially rotationally symmetrical about the central axis. The body can define a lateral surface, inclined relative to the central axis and tapering toward the upper surface and a plurality of lateral apertures formed in the body from the lateral surface to the central aperture. The plurality of lateral apertures can be arrayed substantially symmetrically about the central axis.

公开(公告)号：US20240153737A1

公开(公告)日：2024-05-09

申请号：US17981141

申请日：2022-11-04

Applicant: KLA Corporation

Inventor： Xinrong Jiang ,  Youfei Jiang ,  Ralph Nyffenegger ,  Michael Steigerwald

IPC: H01J37/28 ,  H01J37/26

CPC classification number: H01J37/28 ,  H01J37/261

Abstract: A system and method of a tilt-column electron beam imaging system is disclosed. The system may include an imaging sub-system. The imaging sub-system may include a plurality of electron beam sources configured to generate a plurality of beamlets. The imaging sub-system may further include a plurality of tilt-illumination columns, where a respective tilt-illumination column is configured to receive a respective beamlet from a respective electron beam source. For the system and method, a first tilt axis of a first tilt-illumination column may be orientated along a first angle and at least one additional tilt axis of at least one additional tilt-illumination column may be orientated along at least one additional angle different from the first angle, where each of the plurality of beam lets pass through a first common crossover volume.

公开(公告)号：US20240128050A1

公开(公告)日：2024-04-18

申请号：US18477251

申请日：2023-09-28

Applicant: FEI Company

Inventor： Yuchen DENG ,  Holger KOHR ,  Bart VAN KNIPPENBERG ,  Peter TIEMEIJER ,  Lingbo YU

IPC: H01J37/26 ,  H01J37/295

CPC classification number: H01J37/261 ,  H01J37/295 ,  H01J2237/2803 ,  H01J2237/2814

Abstract: A method of automated data acquisition for a transmission electron microscope, the method comprising: obtaining a reference image of a sample at a first magnification; for each of a first plurality of target locations identified in the reference image: steering an electron beam of the transmission electron microscope to the target location, obtaining a calibration image of the sample at a second magnification greater than the first magnification, and using image processing techniques to identify an apparent shift between an expected position of the target location in the calibration image and an observed position of the target location in the calibration image, training a non-linear model using the first plurality of target locations and the corresponding apparent shifts; based on the non-linear model, calculating a calibrated target location for a next target location; steering the electron beam to the calibrated target location and obtaining an image at a third magnification greater than the first magnification.