公开(公告)号：US20190003887A1

公开(公告)日：2019-01-03

申请号：US15771338

申请日：2017-04-24

Applicant: HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY

Inventor： Xiangyou LI ,  Meng SHEN ,  Zhongqi HAO ,  Xinyan YANG ,  Jiaming LI ,  Xiaoyan ZENG ,  Yongfeng LU

IPC: G01J3/02 ,  G01J3/443 ,  G01J3/18

Abstract: The present invention belongs to the technical field of elemental analysis, and more particularly, relates to a dynamic calibration method for echelle spectrometer in laser-induced breakdown spectroscopy, comprising: S1: collecting a standard light source by using an echelle spectrometer; S2: in combination with a calibration function, calculating a pixel position coordinate ({circumflex over (x)}, ŷ) corresponding to a spectral wavelength ŵ; S3: performing dynamic searching and filtering near the pixel position coordinate ({circumflex over (x)}, ŷ) to obtain a set D of all pixel position coordinates, and adjusting all original intensity values in the set D to obtain intensity values F(Ix,y), and S4: calculating a spectral line intensity value after dynamic calibration by summing the adjusted intensity values F(Ix,y), thereby completing dynamic calibration of the result of the echelle spectrometer. The method in the present invention can overcome the shortcoming, i.e., the existing echelle spectrometer is only calibrated before measurement without solving the spectral line drift during use, increasing the absolute intensity of the wavelength and reducing the detection limit of the quantitative analysis, as well as improving the precision of the quantitative analysis of an element to be analyzed.

公开(公告)号：US20180372646A1

公开(公告)日：2018-12-27

申请号：US16065669

申请日：2016-12-30

Applicant: SHANGHAI INSTITUTE OF CERAMICS, CHINESE ACADEMY OF SCIENCES

Inventor： Zheng Wang ,  Chuchu Huang ,  Qing Li ,  Jiamei Mo

IPC: G01N21/67 ,  G01J3/443 ,  G01J3/10 ,  H05H1/46

Abstract: A solution cathode glow discharge plasma-atomic emission spectrum apparatus and method capable of performing direct gas sample introduction and used for detecting a heavy metal element. The solution cathode glow discharge plasma-atomic emission spectrum apparatus comprises a high-voltage power source, a ballast resistor, a hollow metal anode and a solution cathode. The hollow metal anode is connected to a positive electrode of the high-voltage power source by means of the ballast resistor, and the solution cathode is connected to a negative electrode of the high-voltage power source by means of a graphite electrode. The plasma apparatus is further configured in such a manner that a discharge region is formed between the hollow metal anode (10) and the solution cathode, and the hollow metal anode further serves as a sample introduction pipeline, so that gas to be detected enters the discharge region and is excited.

公开(公告)号：US20180301388A1

公开(公告)日：2018-10-18

申请号：US15947994

申请日：2018-04-09

Applicant: Tokyo Electron Limited

Inventor： Taro Ikeda ,  Yuki Osada

IPC: H01L21/66 ,  G01J3/443 ,  H01L21/3065 ,  H01J37/32 ,  H01L21/02 ,  C23C16/455

Abstract: Provided is a plasma processing apparatus including a microwave radiating mechanism configured to radiate microwaves output from a microwave output unit into a processing container. The microwave radiating mechanism includes: an antenna configured to radiate the microwaves; a dielectric member configured to transmit the microwaves radiated from the antenna, and form an electric field for generating surface wave plasma by the microwaves; a sensor provided in the microwave radiating mechanism or adjacent to the microwave radiating mechanism, and configured to monitor electron temperature of the generated plasma; and a controller configured to determine a plasma ignition state based on the electron temperature of the plasma monitored by the sensor.

公开(公告)号：US20180252650A1

公开(公告)日：2018-09-06

申请号：US15448069

申请日：2017-03-02

Applicant: Tokyo Electron Limited

Inventor： Daniel Morvay ,  Taejoon Han ,  Mirko Vukovic

IPC: G01N21/73 ,  H01J37/32 ,  G06T11/00 ,  G01J3/443 ,  H01L21/3065 ,  H01L21/67

CPC classification number: G01N21/73 ,  G01J3/443 ,  G01N21/68 ,  G01N2021/1787 ,  G01N2201/1293 ,  G06T11/003 ,  H01J37/32422 ,  H01J37/32972 ,  H01J2237/334 ,  H01L21/3065 ,  H01L21/67069

Abstract: Described herein are technologies to facilitate computed tomographic techniques to help identifying chemical species during plasma processing of a substrate (e.g., semiconductor wafer) using optical emission spectroscopy (OES). More particularly, the technology described herein uses topographic techniques to spatially resolves emissions and absorptions in at least two-dimension space above the substrate during the plasma processing (e.g., etching) of the substrate. With some implementations utilize optical detectors positioned along multiple axes (e.g., two or more) to receive incident incoming optical spectra from the plasma chamber during the plasma processing (e.g., etching) of the substrate. Because of the multi-axes arrangement, the incident incoming optical spectra form an intersecting grid.

公开(公告)号：US20180228012A1

公开(公告)日：2018-08-09

申请号：US15749430

申请日：2016-07-20

Applicant: Agilent Technologies, Inc.

Inventor： Michael Ron Hammer

IPC: H05H1/30 ,  H01J49/10 ,  G01J3/443

CPC classification number: H05H1/30 ,  G01J3/443 ,  H01J49/105 ,  H05H1/46 ,  H05H2001/4622

Abstract: A microwave chamber for plasma generation. The microwave chamber comprises a launch structure at a first end of the microwave chamber to accommodate a microwave source for producing microwave energy and a termination section at a second end of the microwave chamber opposite the first end. The termination section is configured to substantially block propagation of the microwave energy from the second end of the chamber. The microwave chamber further comprises an internal wall structure for guiding the microwave energy received within the microwave chamber at the first end toward the second end and defines a cavity. The internal wall structure comprises an impedance matching section intermediate the first end and the second end, and a capacitive loaded section intermediate the impedance matching section and the second end, wherein the capacitive loaded section comprises at least one ridge extending along a longitudinal axis of the chamber. The microwave chamber defines a first opening extending through a first wall of the capacitive loaded section and a second opening extending through a second wall of the capacitive loaded section. The second wall is opposite the first wall. The first opening and second opening are configured to cooperate with one another to receive a plasma torch in the capacitive loaded section along an axis extending through first opening and second opening and substantially perpendicular to the longitudinal axis of the chamber.

公开(公告)号：US20180220520A1

公开(公告)日：2018-08-02

申请号：US15882415

申请日：2018-01-29

Applicant: Sina Alavi ,  Javad Mostaghimi

Inventor： Sina Alavi ,  Javad Mostaghimi

IPC: H05H1/30 ,  H01J49/10 ,  G01N21/73 ,  G01J3/443

CPC classification number: H05H1/30 ,  G01J3/443 ,  G01N21/73 ,  H01J49/00 ,  H01J49/105 ,  H05H1/46

Abstract: A torch for use in inductively coupled plasma is described. In the torch, a torch tube has an angular accelerator where a flow of gas experiences an increase in angular velocity. The torch tube also has a conical end where the increased angular velocity of the gas is encouraged to accelerate into a cavity that can support the plasma. In various examples, the conical end of the torch tube comprising a conical gap that accelerates the axial velocity component of the gas flow.

公开(公告)号：US20180172593A1

公开(公告)日：2018-06-21

申请号：US15900044

申请日：2018-02-20

Applicant: SciAps, Inc.

Inventor： David R. Day

IPC: G01N21/71 ,  G01J3/443

CPC classification number: G01N21/718 ,  G01J3/0218 ,  G01J3/0264 ,  G01J3/0272 ,  G01J3/0291 ,  G01J3/443 ,  G01N2201/0221 ,  G01N2201/0833

Abstract: An analysis (e.g., LIBS) system includes a source of radiation, an optical emission path for the radiation from the source of radiation to a sample, and an optical detection path for photons emitted by the sample. A detector fiber bundle transmits photons to the spectrometer subsystem. At least one fiber of the fiber bundle is connected to an illumination source (e.g., an LED) for directing light via at least a portion of the detection path in a reverse direction to the sample for aligning, sample presence detection, localizing, and/or focusing based on analysis of the resulting illumination spot on the sample.

公开(公告)号：US20180161767A1

公开(公告)日：2018-06-14

申请号：US15579398

申请日：2016-06-03

Applicant: Eurecat S.A. ,  IFP Energies Nouvelles

Inventor： Thierry GAUTHIER ,  Charles Philippe LIENEMANN ,  Wilfried WEISS ,  Pierre DUFRESNE ,  Pauline GALLIOU

IPC: B01J38/72 ,  B01J27/19 ,  B01J29/40 ,  G01J3/443 ,  B07C5/36 ,  B07C5/342

Abstract: A method for separation of at least one catalyst or adsorbent from a homogeneous mixture of catalysts or adsorbents, used in a method for treatment of gas or hydrocarbon feedstock, in which the grains of catalysts or adsorbents are separated according to a sorting threshold corresponding to a content of the constituent element that is sought and defined by the user.

公开(公告)号：US20180143141A1

公开(公告)日：2018-05-24

申请号：US15816674

申请日：2017-11-17

Applicant: Tokyo Electron Limited

Inventor： Thomas Omstead ,  Ke-Hung Chen ,  Deepak Vedhachalam

IPC: G01N21/73 ,  G01J3/443

CPC classification number: G01N21/73 ,  G01J3/443

Abstract: Described herein are architectures, platforms and methods for detecting and analyzing anomalous events (i.e., arcing events) from spectral data gathered during a wafer fabrication process.

公开(公告)号：US20180130647A1

公开(公告)日：2018-05-10

申请号：US15865171

申请日：2018-01-08

Applicant: Applied Materials, Inc.

Inventor： Sairaju Tallavarjula ,  Kailash Pradhan ,  Huy Q. Nguyen ,  Jian Li

IPC: H01J37/32 ,  G01J3/443 ,  G01J3/28 ,  G01N21/27 ,  G01N21/66

CPC classification number: H01J37/32972 ,  G01J3/28 ,  G01J3/443 ,  G01N21/274 ,  G01N21/66 ,  H01J37/32935 ,  H01J2237/2482

Abstract: Methods for matching semiconductor processing chambers using a calibrated spectrometer are disclosed. In one embodiment, plasma attributes are measured for a process in a reference chamber and a process in an aged chamber. Using a calibrated light source, an optical path equivalent to an optical path in a reference chamber and an optical path in an aged chamber can be compared by determining a correction factor. The correction factor is applied to adjust a measured intensity of plasma radiation through the optical path in the aged chamber. Comparing a measured intensity of plasma radiation in the reference chamber and the adjusted measured intensity in the aged chamber provide an indication of changed chamber conditions. A magnitude of change between the two intensities can be used to adjust the process parameters to yield a processed substrate from the aged chamber which matches that of the reference chamber.