Coating agents having improved runoff tendency
    71.
    发明授权
    Coating agents having improved runoff tendency 有权
    涂层剂具有改善的径流倾向

    公开(公告)号:US09404011B2

    公开(公告)日:2016-08-02

    申请号:US13642630

    申请日:2011-03-30

    Abstract: Coating compositions comprising at least one hydroxyl-containing compound (A), at least one isocyanato-containing compound (B) and at least one urea-group-containing compound (H) different from (B), compound (H) comprising at least one structural unit selected from the group consisting of a structural unit (I) a structural unit (II) a structural unit (III) —NR′″—C(O)—N(X—SiR″x(OR′)3-x)n(X′—SiR″y(OR′)3-y)m, and combinations of two or more of the foregoing, compound (H) being obtained by reacting an isocyanato-containing compound (HG) with amino-containing compounds, wherein in compound (H) more than 90 mol % of the isocyanate groups originally present in (HG) have undergone reaction to form the structural units (I), (II), (III), or combinations thereof, where R′, R′″=hydrogen, alkyl, cycloalkyl, aryl or aralkyl; R, R″=alkyl, cycloalkyl, aryl or aralkyl; X, X′=linear and/or branched alkyl or cycloalkyl radical; x, y, n, m=0 to 2; and m+n=2.

    Abstract translation: 包含至少一种含羟基的化合物(A),至少一种含异氰酸酯基的化合物(B)和至少一种不同于(B)的含脲基化合物(H),化合物(H) 选自结构单元(I),结构单元(II),结构单元(III)-NR'-C(O)-N(X-SiR“x(OR')3 - )的结构单元 x)n(X'-SiR“y(OR')3-y)m和上述两种或更多种的组合,化合物(H)是通过含异氰酸酯基的化合物(HG)与含氨基的化合物 化合物,其中在(HG)中原子存在的大于90摩尔%的异氰酸酯基团的化合物(H)中已经发生反应以形成结构单元(I),(II),(III)或其组合,其中R' R'“=氢,烷基,环烷基,芳基或芳烷基; R,R“=烷基,环烷基,芳基或芳烷基; X,X'=直链和/或支链烷基或环烷基; x,y,n,m = 0〜2; m + n = 2。

    Substrate processing apparatus, and substrate processing method
    76.
    发明授权
    Substrate processing apparatus, and substrate processing method 有权
    基板处理装置和基板处理方法

    公开(公告)号:US09099513B2

    公开(公告)日:2015-08-04

    申请号:US13062740

    申请日:2009-09-01

    Applicant: Kimio Kogure

    Inventor: Kimio Kogure

    CPC classification number: H01L21/68721 C23C14/042 C23C14/50 H01L21/68735

    Abstract: A substrate processing apparatus includes a tray, a mask and a rotary stage. The tray includes a substrate support configured to support an outer edge portion of a substrate, a mask support provided on an outer periphery side of the substrate support and projected above the substrate support, and a recess provided between the substrate support and the mask support. The mask covers the recess and the substrate support of the tray. The rotary stage includes an electrostatic adsorption surface and a tray mounting portion provided on an outer periphery side of the electrostatic adsorption surface and below the electrostatic adsorption surface. The outer edge portion of the substrate is projected toward the tray mounting portion side from the electrostatic adsorption surface. The substrate support is spaced below the outer edge portion of the substrate. The mask is spaced above the outer edge portion of the substrate.

    Abstract translation: 基板处理装置包括托盘,掩模和旋转台。 托盘包括被配置为支撑基板的外边缘部分的基板支撑件,设置在基板支撑件的外周侧上并突出在基板支撑件上方的掩模支撑件,以及设置在基板支撑件和掩模支撑件之间的凹部。 面罩覆盖托盘的凹槽和基片支架。 旋转台包括静电吸附面和设置在静电吸附面的外周侧并位于静电吸附面下方的托盘安装部。 基板的外缘部从静电吸附面向托盘安装部侧突出。 衬底支撑件在衬底的外边缘部分下方间隔开。 掩模在衬底的外边缘部分上方间隔开。

    ELECTROSTATIC COATING METHOD AND GUN FOR ELECTROSTATIC COATING
    77.
    发明申请
    ELECTROSTATIC COATING METHOD AND GUN FOR ELECTROSTATIC COATING 审中-公开
    静电涂料的静电涂层方法和喷枪

    公开(公告)号:US20150165474A1

    公开(公告)日:2015-06-18

    申请号:US14362524

    申请日:2012-09-18

    Inventor: Yoshinobu Tamura

    CPC classification number: B05D1/04 B05B5/025 B05B5/03 B05D1/045 B05D7/52

    Abstract: Provided is an electrostatic coating method using a conductor such as a metal or a conductive resin as a coating target surface 21, the method including coating the coating target surface 21 with a charged paint by ejecting the charged paint from a spray gun 1 in a state where generation of an electrostatic field between a spray gun 1 and the coating target surface 21 is prevented and generation of free ions is prevented.

    Abstract translation: 提供了使用诸如金属或导电树脂的导体作为涂覆目标表面21的静电涂覆方法,该方法包括通过从处于状态的喷枪1喷射带电涂料而用带电涂料涂覆涂覆目标表面21 其中防止了喷枪1和涂覆目标表面21之间的静电场的产生,并且防止了游离离子的产生。

    Electrostatic abrasive particle coating apparatus and method
    78.
    发明授权
    Electrostatic abrasive particle coating apparatus and method 有权
    静电磨料颗粒涂布装置及方法

    公开(公告)号:US09040122B2

    公开(公告)日:2015-05-26

    申请号:US14289011

    申请日:2014-05-28

    Abstract: A method of applying particles to a backing having a make layer on one of the backing's opposed major surfaces. The method including the steps of: supporting the particles on a feeding member having a feeding surface such that the particles settle into one or more layers on the feeding surface; the feeding surface and the backing being arranged in a non-parallel manner; and translating the particles from the feeding surface to the backing and attaching the particles to the make layer by an electrostatic force.

    Abstract translation: 将颗粒施加到在背衬的相对的主表面之一上具有成层的背衬的方法。 该方法包括以下步骤:将颗粒支撑在具有进料表面的进料构件上,使得颗粒沉积在进料表面上的一个或多个层中; 馈送表面和背衬以不平行的方式布置; 并将颗粒从进料表面平移到背衬,并通过静电力将颗粒附着到制备层上。

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