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    Spectrometer
    82.
    发明授权
    Spectrometer 失效
    光谱仪

    公开(公告)号：US06862092B1

    公开(公告)日：2005-03-01

    申请号：US09889010

    申请日：2000-01-07

    Applicant: Per Eld Ibsen ,  Bjarke Rose ,  Michael Rasmussen

    Inventor： Per Eld Ibsen ,  Bjarke Rose ,  Michael Rasmussen

    IPC: G01J3/00 ,  G01J3/18 ,  G01J3/28

    CPC classification number: G01J3/00 ,  G01J3/0256 ,  G01J3/0259 ,  G01J3/0278 ,  G01J3/0294 ,  G01J3/18 ,  G01J3/2803

    Abstract: A method and apparatus for measuring spectral information of light from at least one object includes at least one light detector and at least one transparent body. The transparent body has a front side that has an entrance aperture and at least one reflecting surface. The transparent body also has a back side that includes at least one reflecting surface and an exit surface. The detector is positioned near the exit surface. At least one of the front reflecting surface and the back reflecting surface includes a diffractive optical element arranged to receive diverging light from the aperture. A focusing element focuses diffracted light to the exit surface. The apparatus may comprise multiple channels and may also include a device for measuring a distance to the object.

    Abstract translation: 用于测量来自至少一个物体的光的光谱信息的方法和装置包括至少一个光检测器和至少一个透明体。 透明体具有前侧，具有入口孔和至少一个反射面。 透明体还具有包括至少一个反射表面和出射表面的背面。 检测器位于出口表面附近。 前反射表面和后反射表面中的至少一个包括衍射光学元件，其被布置成接收来自孔的发散光。 聚焦元件将衍射光聚焦到出射表面。 该装置可以包括多个通道，并且还可以包括用于测量到物体的距离的装置。

    System and method of broad band optical end point detection for film change indication
    83.
    发明授权
    System and method of broad band optical end point detection for film change indication 失效
    用于胶片变化指示的宽带光端点检测系统和方法

    公开(公告)号：US06806948B2

    公开(公告)日：2004-10-19

    申请号：US10112425

    申请日：2002-03-29

    Applicant: Vladimir Katz ,  Bella Mitchell

    Inventor： Vladimir Katz ,  Bella Mitchell

    IPC: G01N2100

    CPC classification number: B24B49/12 ,  B24B37/013 ,  G01B11/0625 ,  G01B11/0683 ,  G01J3/00

    Abstract: A system and method for detecting an endpoint during a chemical mechanical polishing process is disclosed that includes illuminating a first portion of a surface of a wafer with a first broad beam of light. A first reflected spectrum data is received. The first reflected spectrum of data corresponds to a first spectra of light reflected from the first illuminated portion of the surface of the wafer. A second portion of the surface of the wafer with a second broad beam of light. A second reflected spectrum data is received. The second reflected spectrum of data corresponds to a second spectra of light reflected from the second illuminated portion of the surface of the wafer. The first reflected spectrum data is normalized and the second reflected spectrum data is normalized. An endpoint is determined based on a difference between the normalized first spectrum data and the normalized second spectrum data.

    Abstract translation: 公开了一种用于在化学机械抛光工艺期间检测端点的系统和方法，其包括用第一宽光束照射晶片表面的第一部分。 接收到第一反射光谱数据。 数据的第一反射光谱对应于从晶片表面的第一照射部分反射的光的第一光谱。 具有第二宽光束的晶片表面的第二部分。 接收第二反射光谱数据。 数据的第二反射光谱对应于从晶片的表面的第二照射部分反射的光的第二光谱。 将第一反射光谱数据归一化，并将第二反射光谱数据归一化。 基于归一化的第一光谱数据和归一化的第二光谱数据之间的差来确定端点。

    System and method of broad band optical end point detection for film change indication
    84.
    发明申请
    System and method of broad band optical end point detection for film change indication 有权
    用于胶片变化指示的宽带光端点检测系统和方法

    公开(公告)号：US20040165177A1

    公开(公告)日：2004-08-26

    申请号：US10721136

    申请日：2003-11-24

    Applicant: LAM RESEARCH

    Inventor： Vladimir Katz ,  Bella Mitchell

    IPC: G01N021/00

    CPC classification number: B24B49/12 ,  B24B37/013 ,  G01B11/0625 ,  G01B11/0683 ,  G01J3/00

    Abstract: A system and method for detecting an endpoint is disclosed that includes illuminating a first portion of a surface of a wafer with a first broad beam of light. A first reflected spectrum data is received. The first reflected spectrum of data corresponds to a first spectra of light reflected from the first illuminated portion of the surface of the wafer. A second portion of the surface of the wafer with a second broad beam of light. A second reflected spectrum data is received. The second reflected spectrum of data corresponds to a second spectra of light reflected from the second illuminated portion of the surface of the wafer. The first reflected spectrum data is normalized and the second reflected spectrum data is normalized. An endpoint is determined based on a difference between the normalized first spectrum data and the normalized second spectrum data.

    Abstract translation: 公开了一种用于检测端点的系统和方法，其包括用第一宽光束照射晶片表面的第一部分。 接收到第一反射光谱数据。 数据的第一反射光谱对应于从晶片表面的第一照射部分反射的光的第一光谱。 具有第二宽光束的晶片表面的第二部分。 接收第二反射光谱数据。 数据的第二反射光谱对应于从晶片的表面的第二照射部分反射的光的第二光谱。 将第一反射光谱数据归一化，并将第二反射光谱数据归一化。 基于归一化的第一光谱数据和归一化的第二光谱数据之间的差来确定端点。

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