Apparatus for irradiation with charged particle beams
    81.
    发明授权
    Apparatus for irradiation with charged particle beams 失效
    用于带电粒子束照射的装置

    公开(公告)号:US4479060A

    公开(公告)日:1984-10-23

    申请号:US454027

    申请日:1982-12-28

    CPC classification number: H01J37/10 H01J37/252

    Abstract: An apparatus according to the present invention for irradiating a specimen with charged particle beams comprises a single charged particle generating source from which the charged particle beams formed of electrons and negative ions, respectively, can be simultaneously derived; a specimen holder on which the specimen is placed; and charged particle irradiation means which is interposed between the charged particle generating source and the specimen holder in order to focus the charged particle beams and to irradiate the surface of the specimen with the focused beams, and which includes at least one magnetic lens and at least one electrostatic lens that are individually disposed.

    Abstract translation: 根据本发明的用于用带电粒子束照射样本的装置包括单个带电粒子发生源,可以同时衍生由电子和负离子形成的带电粒子束; 放置样品的样品架; 以及带电粒子照射装置,其被插入在带电粒子发生源和样本保持器之间,以便聚焦带电粒子束并用聚焦束照射样本的表面,并且至少包括至少一个磁性透镜 一个静电透镜单独设置。

    Apparatus and method for determining the spatial distribution of constituents and contaminants of solids
    83.
    发明授权
    Apparatus and method for determining the spatial distribution of constituents and contaminants of solids 失效
    用于确定固体物质和污染物的空间分布的装置和方法

    公开(公告)号:US3767925A

    公开(公告)日:1973-10-23

    申请号:US3767925D

    申请日:1972-03-08

    CPC classification number: G01N23/2073 H01J37/252

    Abstract: The spatial distribution of constituents and contaminants in a solid is determined either by (1) scanning the surface of the solid with a focused ion or neutral particle beam to sputter excited particles from the surface, resulting in photon emissions characteristic of the sputtered particles, and detecting the photon emissions over the scan period, or by (2) flooding the surface with a diffuse beam, and photographically recording the distribution of photon emissions. Continued sputtering results in removal of surface material and detection of the photon count rate or a sequence of photographs taken during each successive scan period indicates the distribution of constituents and contaminants in the bulk of the solid as a function of distance from the surface.

    Abstract translation: 固体中成分和污染物的空间分布由(1)用聚焦离子或中性粒子束扫描固体的表面以从表面溅射激发的粒子来确定溅射粒子的光子发射特性, 在扫描周期内检测光子发射,或者(2)用漫射光束淹没该表面,并照相记录光子发射的分布。 继续溅射导致去除表面材料并且检测光子计数速率或在每个连续扫描周期期间拍摄的照片序列表示作为与表面的距离的函数的固体的大部分中的成分和污染物的分布。

    Electron-beam micro-analyzer with an auger electron detector
    84.
    发明授权
    Electron-beam micro-analyzer with an auger electron detector 失效
    具有AUGER电子探测器的电子束微分析仪

    公开(公告)号:US3760180A

    公开(公告)日:1973-09-18

    申请号:US3760180D

    申请日:1972-10-12

    Applicant: SIEMENS AG

    Inventor: WEBER U

    Abstract: An electron-beam micro-analyzer for investigating solid test specimens and radiation penetrable test specimens is disclosed. The micro-analyzer has an electron-beam generator for directing a focussed electron beam unto the test specimen to release Auger electrons therefrom. An electron spectrometer then separates the released Auger electrons according to the respective kinetic energies thereof and an electron detector detects the Auger electrons of specified energy separated in the spectrometer. The electron-beam generator has a field-emission point cathode having a small radius of curvature and an anode having an opening for passing the electron beam therethrough. A voltage supply applys a voltage to develop an electric field between the anode and the point cathode of sufficient strength to excite the cathode to electron field emission. A deceleration lens disposed intermediate the anode and the test specimen reduces the velocity of the electrons of the electron beam passing from the opening of the anode.

    Abstract translation: 公开了一种用于研究固体试样和辐射穿透试样的电子束微分析仪。 微分析仪具有电子束发生器,用于将聚焦的电子束引导到测试样品以从其中释放俄歇电子。 然后电子光谱仪根据其分别的动能分离释放的俄歇电子,电子检测器检测在光谱仪中分离出的特定能量的俄歇电子。 电子束发生器具有具有小的曲率半径的场发射点阴极和具有用于使电子束通过的开口的阳极。 电压源施加电压以在阳极和点阴极之间产生足够强度的电场,以激发阴极到电子场发射。 设置在阳极和测试样本之间的减速透镜降低了从阳极的开口通过的电子束的电子的速度。

    Magnetic lenses
    85.
    发明授权
    Magnetic lenses 失效
    磁性镜片

    公开(公告)号:US3659097A

    公开(公告)日:1972-04-25

    申请号:US3659097D

    申请日:1971-02-16

    Applicant: NAT RES DEV

    Abstract: Apparatus having a generator of a beam of charged particles and magnetic focusing means in which a beam of charged particles is brought to a focus between the source and the focusing means so that radiation from a target placed at the focus can be received by a radiation detector within a substantial solid angle, bounded by said magnetic focusing means and the beam of charged particles. Preferably the focusing means is an electrically conducting coil of substantially flat or shallow conical form having a conical half-angle of not less than 75*.

    Abstract translation: 具有带电粒子束的发生器和磁聚焦装置的装置,其中带电粒子束被带到源和聚焦装置之间的焦点,使得放置在焦点处的来自靶的辐射可以被辐射检测器 在大致立体角内,由所述磁性聚焦装置和带电粒子束限定。

    Magnetic deflection system for electron analysis devices
    86.
    发明授权
    Magnetic deflection system for electron analysis devices 失效
    用于电子分析装置的磁性偏转系统

    公开(公告)号:US3629578A

    公开(公告)日:1971-12-21

    申请号:US3629578D

    申请日:1969-01-27

    Applicant: PHILIPS CORP

    Inventor: POOLE JAN B LE

    Abstract: A magnetic deflecting system for deflecting a beam of charged particles comprising a pair of mirror symmetrical pole-pieces on opposite sides of a plane of symmetry passing through a principal ray of the beam. The surfaces of the pole-pieces have contours which define a space between the pole-pieces which varies stepwise in the direction of the main ray with a centrally constricted portion which defines a region of highest field strength. The deflection system has a field strength at which the main ray entering the deflection system, which ray extends at least partly in the direction of the constricted space between the pole-pieces, follows a curve which passes in front of the pole-pieces in the region of the highest magnetic field strength. Means are provided to produce a field strength distribution at the area of the minimum distance of the curve from the region of the highest field strength which, measured in the direction towards the highest field strength, exhibits at that area a locally stronger field strength gradient. This field strength distribution affects the beam so that a curvature of image lines transverse to the plane of symmetry in a plane transverse to the main ray is counteracted, i.e., electron-optical aberrations are reduced.

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