HIGH VOLTAGE FEEDTHROUGH ASSEMBLY, TIME-RESOLVED TRANSMISSION ELECTRON MICROSCOPE AND METHOD OF ELECTRODE MANIPULATION IN A VACUUM ENVIRONMENT

    公开(公告)号:US20170229276A1

    公开(公告)日:2017-08-10

    申请号:US15503571

    申请日:2015-08-14

    Inventor: Julian HIRSCHT

    Abstract: A high voltage feedthrough assembly (100) for providing an electric potential in a vacuum environment comprises a flange connector (10) being adapted for a connection with a vacuum vessel (201), wherein the flange connector (10) has an inner side (11) facing to the vacuum vessel (201) and an outer side (12) facing to an environment of the vacuum vessel 201, a vacuumtight insulator tube (20) having a longitudinal extension with a first end (21) facing to the flange connector (10) and a second end (22) being adapted for projecting into the vacuum vessel (201), and an electrode device (30) coupled to the second end (22) of the insulator tube (20), wherein the electrode device (30) has a front electrode (31), including a photocathode or a field emitter tip and facing to the vacuum vessel (201) and a cable adapter (32) for receiving a high-voltage cable (214), wherein a flexible tube connector (40) is provided for a vacuum-tight coupling of the insulator tube (20) with the flange connector (10), and a manipulator device (50) is connected with the insulator tube (20) for adjusting a geometrical arrangement of the insulator tube (20) relative to the flange connector (10). Furthermore, an electron diffraction or imaging apparatus (transmission electron microscope, TEM) 200 for static and/or time-resolved diffraction, including (nano-) crystallography, and real space imaging for structural investigations including the high voltage feedthrough assembly (100) and a method of manipulating an electrode device (30) in a vacuum environment are described.

    Alignment and registration targets for multiple-column charged particle beam lithography and inspection
    90.
    发明授权
    Alignment and registration targets for multiple-column charged particle beam lithography and inspection 有权
    多列带电粒子束光刻和检查的对准和配准目标

    公开(公告)号:US09595419B1

    公开(公告)日:2017-03-14

    申请号:US14522563

    申请日:2014-10-23

    Abstract: The present application discloses methods, systems and devices for using charged particle beam tools to pattern and inspect a substrate. The inventors have discovered that it is highly advantageous to use patterns generated using the Hadamard transform as alignment and registration marks (Hadamard targets) for multiple-column charged particle beam lithography and inspection tools. Further, superior substrate alignment and layer-to-layer pattern registration accuracy can be achieved using Hadamard targets patterned in edge-proximal portions of the substrate that are typically stripped bare of resist prior to lithography, in addition to Hadamard targets patterned in inner substrate portions. High-order Hadamard targets can also be patterned and imaged to obtain superior column performance metrics for applications such as super-rapid beam calibration DOE, column matching, and column performance tracking. Superior alignment and registration, and column parameter optimization, allow significant yield gains.

    Abstract translation: 本申请公开了使用带电粒子束工具来图案化和检查衬底的方法,系统和装置。 本发明人已经发现使用Hadamard变换产生的图案作为用于多列带电粒子束光刻和检查工具的对准和对准标记(Hadamard靶)是非常有利的。 此外,除了在内部衬底部分中图案化的Hadamard靶之外,还可以使用在光刻之前通常剥离光刻胶的基板的边缘近端部分图案化的Hadamard靶,从而实现优异的衬底对准和层间图案配准精度 。 高阶Hadamard靶也可以进行图案化和成像,以获得诸如超快速光束校准DOE,色谱柱匹配和色谱柱性能跟踪等应用的卓越色谱柱性能指标。 优异的对齐和注册以及列参数优化,可显着提高收益。

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