PLASMA GAS REACTOR
    2.
    发明公开
    PLASMA GAS REACTOR 审中-公开

    公开(公告)号:US20230415117A1

    公开(公告)日:2023-12-28

    申请号:US18247835

    申请日:2021-10-08

    Abstract: The current invention relates to a plasma reactor comprising: a reactor space, an axial gas inlet suitable for fluid flow in an axial direction, said axial inlet comprising radial injection slits for discharging a jet of gaseous mixture into said reactor space, a downstream gas expansion disc, which extends radially from the coaxial inlet and is located downstream of said radial injection slits with respect to said axial direction, plasma generating means suitable for ionizing a gaseous medium within said reactor space, and a cylindrical reactor container, coaxial with said gas inlet, encompassing said reactor space, said reactor container comprising outlet means. The invention further relates to a multistage reactor. The invention also relates to the use of said plasma reactor.

    PLASMA REACTOR
    6.
    发明申请
    PLASMA REACTOR 审中-公开

    公开(公告)号:US20190055869A1

    公开(公告)日:2019-02-21

    申请号:US16079146

    申请日:2017-02-27

    Abstract: Provided is a plasma reactor capable of reliably generating plasma even in the event of inflow of water. The plasma reactor of the present invention includes a plasma panel stack 20, electrically conductive members 51 and 54, a case, and a mat 71. The plasma panel stack 20 has a structure in which electrode panels 30 are stacked, and generates plasma upon application of voltage between the adjacent electrode panels 30. The electrically conductive members 51 and 54 are electrically connected to discharge electrodes of the electrode panels 30. The case houses the plasma panel stack 20. The mat 71 intervenes between the case and the plasma panel stack 20 and fixes the plasma panel stack 20 to the case. The mat 71 is disposed apart from the electrically conductive members 51 and 54 so that gaps S1 and S2 are formed between the mat 71 and the electrically conductive members 51 and 54, respectively.

    POLYSILICON MANUFACTURING APPARATUS
    8.
    发明申请

    公开(公告)号:US20180229203A1

    公开(公告)日:2018-08-16

    申请号:US15750251

    申请日:2016-09-08

    Abstract: Provided is a polysilicon manufacturing apparatus including a reactor disposed on a base plate to form a reaction chamber, a pair of electrical feedthroughs installed on the base plate to be extended to the inside of the reaction chamber, rod filaments installed on the electrical feedthroughs in the reaction chamber and connected to each other by a rod bridge at the upper end to form a silicon rod by chemical vapor deposition of source gas introduced to a gas inlet, and a cooling jacket inserted to a through-hole provided at the upper side of the reactor to be supported to the base plate, connected to a gas outlet formed on the base plate by forming a gas passage discharging the gas after reaction, and introducing and circulating a low-temperature coolant to a coolant passage from the outside of the reactor by forming the coolant passage at the outside of the gas passage to discharge a high-temperature coolant to the outside of the reactor.

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