METHOD FOR PRODUCING SUBSTRATE WITH TRANSPARENT ELECTRODE, AND SUBSTRATE WITH TRANSPARENT ELECTRODE
    4.
    发明申请
    METHOD FOR PRODUCING SUBSTRATE WITH TRANSPARENT ELECTRODE, AND SUBSTRATE WITH TRANSPARENT ELECTRODE 审中-公开
    用透明电极生产衬底的方法和具有透明电极的衬底

    公开(公告)号:US20150225837A1

    公开(公告)日:2015-08-13

    申请号:US14424961

    申请日:2013-08-23

    Abstract: A resin substrate with a transparent electrode having a low resistance, and a manufacturing method thereof including: a deposition step wherein a transparent electrode layer of indium tin oxide is formed on a transparent film substrate by a sputtering method, and a crystallization step wherein the transparent electrode layer is crystallized. In the deposition step, a sputtering deposition is performed using a sputtering target containing indium oxide and tin oxide, while a sputtering gas containing argon and oxygen is introduced into a chamber. It is preferable that an effective exhaust rate S, calculated from a rate Q of the sputtering gas introduced into the chamber and a pressure P in the chamber by a formula S (L/second)=1.688×Q (sccm)/P (Pa), is 1,200-5,000 (L/second). It is also preferable that a resistivity of the transparent electrode layer is less than 3×10−4 Ωcm.

    Abstract translation: 一种具有低电阻的透明电极的树脂基板及其制造方法,包括:沉积步骤,其中通过溅射法在透明膜基板上形成氧化铟锡的透明电极层,以及结晶步骤,其中透明 电极层结晶。 在沉积步骤中,使用包含氧化铟和氧化锡的溅射靶进行溅射沉积,同时将含有氩和氧的溅射气体引入室中。 优选的是,从引入室中的溅射气体的速率Q和室内的压力P通过公式S(L /秒)= 1.688×Q(sccm)/ P(Pa)计算出的有效排气速度S )为1,200-5,000(L /秒)。 还优选的是,透明电极层的电阻率小于3×10-4&OHgr·cm。

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