公开(公告)号：US20240087844A1

公开(公告)日：2024-03-14

申请号：US18513481

申请日：2023-11-17

Applicant: ASML Netherlands B.V.

Inventor： Albertus Victor Gerardus MANGNUS

IPC: H01J37/244 ,  H01J37/147

CPC classification number: H01J37/244 ,  H01J37/1471

Abstract: The disclosed embodiments provide a various techniques for detecting secondary charged particles and backscatter charged particles, including accelerating charged particle sub-beams along sub-beam paths to a sample, repelling secondary charged particles from detector arrays, using mirror detector arrays, using multiple detector arrays, and providing devices and detectors which can switch between modes for primarily detecting charged particles and modes for primarily detecting secondary particles.

公开(公告)号：US20230154723A1

公开(公告)日：2023-05-18

申请号：US17359365

申请日：2019-12-06

Applicant: ASML Netherlands B.V.

Inventor： Yan REN ,  Albertus Victor Gerardus MANGNUS

IPC: H01J37/147 ,  H01J37/145 ,  H01J37/28 ,  H01J37/20 ,  H01J37/09 ,  G01N23/2251

CPC classification number: H01J37/1478 ,  H01J37/1474 ,  H01J37/145 ,  H01J37/28 ,  H01J37/20 ,  H01J37/09 ,  G01N23/2251 ,  H01J2237/0455 ,  H01J2237/2611 ,  H01J2237/151 ,  H01J2237/226 ,  H01J2237/04926 ,  H01J2237/103 ,  G01N2223/07 ,  G01N2223/418 ,  G01N2223/507

Abstract: Embodiments consistent with the disclosure herein include methods and a multi-beam apparatus configured to emit charged-particle beams for imaging a top and side of a structure of a sample, including: a deflector array including a first deflector and configured to receive a first charged-particle beam and a second charged-particle beam; a blocking plate configured to block one of the first charged-particle beam and the second charged-particle beam; and a controller having circuitry and configured to change the configuration of the apparatus to transition between a first mode and a second mode. In the first mode, the deflector array directs the second charged-particle beam to the top of the structure, and the blocking plate blocks the first charged-particle beam. And in the second mode, the first deflector deflects the first charged-particle beam to the side of the structure, and the blocking plate blocks the second charged-particle beam.

公开(公告)号：US20230154722A1

公开(公告)日：2023-05-18

申请号：US17361119

申请日：2019-12-17

Applicant: ASML Netherlands B.V.

Inventor： Arno Jan BLEEKER ,  Pieter Willem Herman DE JAGER ,  Maikel Robert GOOSEN ,  Erwin Paul SMAKMAN ,  Albertus Victor Gerardus MANGNUS ,  Yan REN ,  Adam LASSISE

IPC: H01J37/147 ,  H01J37/244 ,  H01J37/26 ,  H01J37/28

CPC classification number: H01J37/1474 ,  H01J37/244 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/2817 ,  H01J2237/2448 ,  H01J2237/24475

Abstract: Apparatuses and methods for charged-particle detection may include a deflector system configured to direct charged-particle pulses, a detector having a detection element configured to detect the charged-particle pulses, and a controller having a circuitry configured to control the deflector system to direct a first and second charged-particle pulses to the detection element; obtain first and second timestamps associated with when the first charged-particle pulse is directed by the deflector system and detected by the detection element, respectively, and third and fourth timestamps associated with when the second charged-particle pulse is directed by the deflector system and detected by the detection element, respectively; and identify a first and second exiting beams based on the first and second timestamps, and the third and fourth timestamps, respectively.

公开(公告)号：US20220199358A1

公开(公告)日：2022-06-23

申请号：US17601697

申请日：2020-03-25

Applicant: ASML Netherlands B.V.

Inventor： Maikel Robert GOOSEN ,  Albertus Victor Gerardus MANGNUS ,  Lucas KUINDERSMA

IPC: H01J37/22 ,  H01J37/28 ,  G06T7/00

Abstract: Embodiments consistent with the disclosure herein include methods for image enhancement for a multi-beam charged-particle inspection system. Systems and methods consistent with the present disclosure include analyzing signal information representative of first and second images, wherein the first image is associated with a first beam of a set of beams and the second image is associated with a second beam of the set of beams; detecting, based on the analysis, disturbances in positioning of the first and second beams in relation to a sample; obtaining an image of the sample using the signal information of the first and second beams; and correcting the image of the sample using the identified disturbances.

公开(公告)号：US20210249224A1

公开(公告)日：2021-08-12

申请号：US17054559

申请日：2019-05-24

Applicant: ASML NETHERLANDS B.V.

Inventor： Erwin Paul SMAKMAN ,  Albertus Victor Gerardus MANGNUS ,  Maikel Robert GOOSEN

IPC: H01J37/317 ,  H01J37/147 ,  H01J37/20 ,  H01J37/04 ,  H01J37/244

Abstract: An electron beam apparatus including: an electron beam source configured to generate an electron beam; a beam conversion unit including an aperture array configured to generate a plurality of beamlets from the electron beam, and a deflector unit configured to deflect one or more groups of the plurality of beamlets; and a projection system configured to project the plurality of beamlets onto an object, wherein the deflector unit is configured to deflect the one or more groups of the plurality of beamlets to impinge on the object at different angles of incidence, each beamlet in a group having substantially the same angle of incidence on the object.

公开(公告)号：US20240339292A1

公开(公告)日：2024-10-10

申请号：US18748758

申请日：2024-06-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Yan REN ,  Marijke SCOTUZZI ,  Albertus Victor Gerardus MANGNUS ,  Erwin Paul SMAKMAN

IPC: H01J37/244 ,  H01J37/10 ,  H01J37/28

CPC classification number: H01J37/244 ,  H01J37/10 ,  H01J37/28

Abstract: There is provided a charged particle device for a charged particle inspection apparatus for projecting an array of sub-beams towards a sample, the charged particle device comprising: a charged particle optical element and a detector. The charged particle optical element has an up-beam surface having a plurality of openings to generate an array of sub-beams from a charged particle beam. In the charged particle optical element are defined: sub-beam apertures and monitoring apertures. The sub-beam aperture extend through the charged particle element for paths of the array of sub-beams towards a sample. The monitoring aperture extends through the charged particle element. The detector is in the monitoring aperture. At least part of the detector is down-beam of the up-beam surface. The detector measures a parameter of a portion of the charged particle beam incident on the detector.

公开(公告)号：US20240280517A1

公开(公告)日：2024-08-22

申请号：US18569504

申请日：2022-06-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Albertus Victor Gerardus MANGNUS

IPC: G01N23/2206 ,  G01N23/203 ,  G01N23/2251

CPC classification number: G01N23/2206 ,  G01N23/203 ,  G01N23/2251

Abstract: A detector for use in a charged particle device for an assessment apparatus to detect charged particles from a sample, wherein the detector includes: a backscatter detector component set to a backscatter bias electric potential and configured to detect higher energy charged particles; and a secondary detector component set to a secondary bias electric potential and configured to detect lower energy charged particles, wherein there is a potential difference between the backscatter bias electric potential and the secondary bias electric potential.

公开(公告)号：US20240087835A1

公开(公告)日：2024-03-14

申请号：US18517642

申请日：2023-11-22

Applicant: ASML Netherlands B.V.

Inventor： Albertus Victor Gerardus MANGNUS

IPC: H01J37/05 ,  H01J37/12 ,  H01J37/21

CPC classification number: H01J37/05 ,  H01J37/12 ,  H01J37/21 ,  H01J2237/036 ,  H01J2237/04756 ,  H01J2237/151 ,  H01J2237/216

Abstract: The present disclosure provides a charged particle optical device for a charged particle system. The device projects an array of charged particle beams towards a sample. The device comprises a control lens array to control a parameter of the array of beams; and an objective lens array to project the array of beams onto the sample, the objective lens array being down beam of the control lens. The objective lens array comprises: an upper electrode; and a lower electrode arrangement that comprises an up-beam electrode and a down-beam electrode. The device is configured to apply an upper potential to the upper electrode, an up-beam potential to the up-beam electrode and a down-beam potential to the down-beam electrode. The potentials are controlled to control the landing energy of the beams on the sample and. to maintain focus of the beams on the sample at the landing energies.

公开(公告)号：US20220199355A1

公开(公告)日：2022-06-23

申请号：US17566518

申请日：2021-12-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Albertus Victor Gerardus MANGNUS ,  Maikel Robert GOOSEN

IPC: H01J37/153 ,  H01J37/28

Abstract: Disclosed among other aspects is a charged particle inspection system including a phaseplate configured and arranged to modify the local phase of charged particles in a beam to reduce the effects of lens aberrations. The phaseplate is made up of an array of apertures with the voltage and/or a degree of obscuration of the apertures being controlled individually or in groups.

公开(公告)号：US20240331968A1

公开(公告)日：2024-10-03

申请号：US18742934

申请日：2024-06-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Yan REN ,  Albertus Victor Gerardus MANGNUS ,  Marijke SCOTUZZI ,  Erwin Paul SMAKMAN

IPC: H01J37/147 ,  H01J37/09 ,  H01J37/10 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/1471 ,  H01J37/09 ,  H01J37/10 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/0453 ,  H01J2237/24578

Abstract: A charged-particle apparatus generates a plurality of sub-beams from a source beam of charged particles and direct the sub-beams downbeam toward a sample position. The charged-particle apparatus comprises a charged particle source, an aperture array, and a charged particle optical component. The charged-particle source comprises an emitter to emit a source beam of charged particles along a divergent path. The aperture array is positioned in the divergent path so the aperture array generates sub-beams from the source beam. The charged-particle-optical component acts on the source beam upbeam of the aperture array. The charged-particle-optical component comprises a multipole and/or a charged-particle lens. The multipole operates on the source beam to vary the position of the divergent path at the aperture array. The multipole may vary a cross-sectional shape of the divergent path at the aperture array. The charged-particle-optical lens compensates for variations in distance between the emitter and the aperture array.