公开(公告)号：EP2716792A1

公开(公告)日：2014-04-09

申请号：EP12187384.8

申请日：2012-10-05

Applicant: FEI COMPANY

Inventor： Mulders, Hans ,  Randolph, Steven ,  Rue, Chad ,  Chandler, Clive

IPC: C23C16/48 ,  H01J37/317

CPC classification number: C23C16/486

Abstract: A process for deposition of high purity metal or metal oxide nano layers comprising:
directing a precursor fluid toward a substrate surface, and irradiating the substrate surface with a focused ion beam in the presence of the precursor fluid, the precursor fluid dissociating in the presence of the particle beam to deposit a metal or metal oxide on the substrate surface, characterized in that the focused ion beam comprises hydrogen or oxygen ions, and shaped nano layers of high purity metal obtainable by said process.

Abstract translation: 一种用于沉积高纯度金属或金属氧化物纳米层的方法，包括：将前体流体引向衬底表面，以及在存在前体流体的情况下用聚焦离子束照射衬底表面，所述前体流体在存在 所述粒子束在所述衬底表面上沉积金属或金属氧化物，其特征在于，所述聚焦离子束包括氢或氧离子以及通过所述方法可获得的成形纳米层的高纯度金属。

公开(公告)号：EP2481829A3

公开(公告)日：2012-09-12

申请号：EP12152793.1

申请日：2012-01-27

Applicant: FEI Company

Inventor： Randolph, Steven ,  Chandler, Clive

IPC: C23C16/04 ,  C23C16/34 ,  C23C16/40 ,  C23C16/48 ,  H01J37/317

CPC classification number: C23C16/486 ,  C23C16/047 ,  C23C16/18 ,  C23C16/34 ,  C23C16/407 ,  H01J2237/31732 ,  H01L21/28556 ,  H01L21/76877 ,  H01L21/76892

Abstract: An improved method of beam deposition to deposit a low-resistivity metal. Preferred embodiments of the present invention use a novel focused ion beam induced deposition precursor to deposit low-resistivity metallic material such as tin. Applicants have discovered that by using a methylated or ethylated metal such as hexamethylditin as a precursor, material can be deposited having a resistivity as low as 40 µΩ·cm.

公开(公告)号：EP2214200B1

公开(公告)日：2014-07-23

申请号：EP10152144.1

申请日：2010-01-29

Applicant: FEI COMPANY

Inventor： Randolph, Steven ,  Chandler, Clive

IPC: H01L21/3065 ,  H01L21/311 ,  H01L21/3213

CPC classification number: H01L21/306 ,  H01L21/3065 ,  H01L21/31116 ,  H01L21/32137

公开(公告)号：EP2214200A3

公开(公告)日：2011-08-10

申请号：EP10152144.1

申请日：2010-01-29

Applicant: FEI COMPANY

Inventor： Randolph, Steven ,  Chandler, Clive

IPC: H01L21/3065 ,  H01L21/311 ,  H01L21/3213

CPC classification number: H01L21/306 ,  H01L21/3065 ,  H01L21/31116 ,  H01L21/32137

Abstract: A method and apparatus for selective etching a substrate using a focused beam. For example, multiple gases may be used that are involved in competing beam-induced and spontaneous reactions, with the result depending on the materials on the substrate. The gases may include, for example, an etchant gas and an auxiliary gas that inhibits etching.

公开(公告)号：EP4064322A1

公开(公告)日：2022-09-28

申请号：EP22163312.6

申请日：2022-03-21

Applicant: FEI Company

Inventor： Gancarcik, Tomás ,  Dekan, Ivan ,  Krobot, David ,  Trnkócy, Tomás ,  Randolph, Steven ,  Geurts, Remco

IPC: H01J37/22 ,  B23K26/12

Abstract: Deposition of debris produced in laser ablation of a workpiece situated in a vacuum chamber is reduced by introduction a background gas into the vacuum chamber prior to or during laser ablation. The background gas can be introduced diffusely into the vacuum chamber and can reduce contamination of surfaces such as a surface of an optical window that faces the workpiece during processing. Directed introduction of a background gas can be used as well and in some cases the same or a different background gas is directed to a workpiece surface at the same or different pressure than that associated with diffuse introduction of the background gas to reduce contamination of the workpiece surface with laser ablation debris.

公开(公告)号：EP3243931B1

公开(公告)日：2020-04-15

申请号：EP16187654.5

申请日：2016-09-07

Applicant: FEI Company

Inventor： Kianinia, Mehran ,  Shimoni, Olga ,  Aharonovich, Igor ,  Lobo, Charlene ,  Toth, Milos ,  Randolph, Steven ,  Chandler, Clive

IPC: C23F4/02 ,  C25D5/02 ,  H01J37/18 ,  H01J37/30 ,  B82Y40/00 ,  G01N33/543 ,  H01J37/317

公开(公告)号：EP3113207A1

公开(公告)日：2017-01-04

申请号：EP15174195.6

申请日：2015-06-29

Applicant: FEI Company

Inventor： Parker, N. William ,  Straw, Marcus ,  Filevich, Jorge ,  Botman, Aurélien ,  Utlaut, Mark ,  Randolph, Steven ,  Chandler, Clive

IPC: H01J37/22

CPC classification number: H01J37/228 ,  H01J2237/31744

Abstract: A method and apparatus for directing light or gas or both to a specimen positioned within about 2 mm from the lower end of a charged particle beam column. The charged particle beam column assembly includes a platform defining a specimen holding position and has a set of electrostatic lenses each including a set of electrodes. The assembly includes a final electrostatic lens that includes a final electrode that is closest to the specimen holding position. This final electrode defines at least one internal passageway having a terminus that is proximal to and directed toward the specimen holding position.

Abstract translation: 一种用于将光或气体或两者引导到位于距带电粒子束柱的下端约2mm内的样本的方法和装置。 带电粒子束列组件包括限定样品保持位置的平台，并具有一组静电透镜，每组包括一组电极。 组件包括最终静电透镜，其包括最靠近样品保持位置的最终电极。 该最终电极限定至少一个内部通道，其具有靠近并指向试样保持位置的终端。

公开(公告)号：EP3037862A1

公开(公告)日：2016-06-29

申请号：EP15199728.5

申请日：2015-12-14

Applicant: FEI Company

Inventor： Randolph, Steven ,  Miyasaki, James ,  Straw, Marcus

IPC: G02B21/36 ,  G01N21/64 ,  H01J37/26

CPC classification number: H01J37/222 ,  G01N21/6428 ,  G01N21/6456 ,  G01N21/6458 ,  G01N21/6486 ,  G01N2021/6439 ,  G02B21/0032 ,  G02B21/0076 ,  G02B21/008 ,  G02B21/16 ,  G02B21/365 ,  H01J37/26 ,  H01J2237/221 ,  H01J2237/24578 ,  H01J2237/2611

Abstract: A method is provided for preparing a sample for correlative optical and electron imaging and correcting aberrations in the imaging process due to sample deformation. Dye-coated fiducial markers are distributed throughout the sample volume. The fiducial markers are preferably in the form of polystyrene nanospheres that are functionalized on their surface and subsequently treated with a fluorescent dye. The dye does not penetrate the sphere but only binds to the surface. By limiting the dye to the surface of the nanospheres, the shape of the spheres can be determined in iPALM and in charged particle images aiding in tracking of physical changes that may occur to the sample volume.

Abstract translation: 提供了一种用于制备由于样品变形而在成像过程中进行相关光学和电子成像和校正像差的样品的方法。 染料涂层的基准标记物分布在整个样品体积中。 基准标记物优选为聚苯乙烯纳米球的形式，其在其表面上官能化并随后用荧光染料处理。 染料不会穿透球体，而只能粘结在表面上。 通过将染料限制在纳米球的表面，可以在iPALM和带电粒子图像中确定球体的形状，帮助跟踪样品体积可能发生的物理变化。

公开(公告)号：EP2309020B1

公开(公告)日：2014-03-05

申请号：EP10178148.2

申请日：2010-09-22

Applicant: FEI COMPANY

Inventor： Lobo, Charlene ,  Toth, Milos ,  Randolph, Steven ,  Chandler, Clive

IPC: C23C14/00 ,  C23C14/04 ,  C23C14/22 ,  C23C14/46 ,  C23C14/54 ,  C23C14/58

CPC classification number: C23C14/0031 ,  C23C14/04 ,  C23C14/048 ,  C23C14/221 ,  C23C14/46 ,  C23C14/54 ,  C23C14/548 ,  C23C14/5846 ,  C23C14/5873

公开(公告)号：EP2570519A2

公开(公告)日：2013-03-20

申请号：EP12184772.7

申请日：2012-09-18

Applicant: FEI COMPANY

Inventor： Botman, Aurelien ,  Toth, Milos ,  Randolph, Steven ,  Narum, David

IPC: C25D5/02 ,  C25D5/04 ,  C25D17/00 ,  C25D5/00

CPC classification number: H01J37/20 ,  C25D5/003 ,  C25D5/02 ,  C25D5/026 ,  C25D5/04 ,  C25D17/005 ,  C25D17/10 ,  C25D17/12 ,  C25D21/04 ,  C25D21/12 ,  H01J37/18 ,  H01J37/222 ,  H01J37/28 ,  H01J2237/182 ,  H01J2237/2003 ,  H01J2237/202 ,  H01J2237/2801

Abstract: A charge transfer mechanism is used to locally deposit or remove material for a small structure. A local electrochemical cell is created without having to immerse the entire work piece in a bath. The charge transfer mechanism can be used together with a charged particle beam or laser system to modify small structures, such as integrated circuits or micro-electromechanical system. The charge transfer process can be performed in air or, in some embodiments, in a vacuum chamber.

Abstract translation: 电荷转移机制用于局部沉积或去除小结构的材料。 产生局部电化学电池，而不必将整个工件浸入浴中。 电荷转移机构可以与带电粒子束或激光系统一起使用以修改诸如集成电路或微机电系统的小结构。 电荷转移过程可以在空气中或在一些实施方案中在真空室中进行。