公开(公告)号：JPS61223837A

公开(公告)日：1986-10-04

申请号：JP28953985

申请日：1985-12-24

Applicant: IBM

Inventor： CLECAK NICHOLAS J ,  GRANT BARBARA D ,  MILLER ROBERT D ,  TOMPKINS TERRY C ,  WILLSON CARLTON G

IPC: C08L101/00 ,  C08K5/00 ,  C08K5/53 ,  C08L33/00 ,  C08L33/02 ,  C08L61/10 ,  G03C1/72 ,  G03C5/16 ,  G03F7/016 ,  G03F7/038 ,  G03F7/039 ,  G03F7/20 ,  H01L21/027

公开(公告)号：JP2001228478A

公开(公告)日：2001-08-24

申请号：JP2001002426

申请日：2001-01-10

Applicant: IBM

Inventor： FUKUZAWA TADASHI ,  OBARA SAYURI ,  LEE VICTOR YEE WAY ,  MILLER ROBERT D ,  SCOTT JOHN CAMPBELL ,  SWANSON SALLY A

IPC: G02F1/061 ,  G02F1/1335 ,  G02F1/13357

Abstract: PROBLEM TO BE SOLVED: To provide a full color liquid crystal display using a photoluminescence(PL) fiber. SOLUTION: New architecture simplifies an LCD manufacture process by substituting a photolithography step for color filter manufacture to a fiber spinning technique at low cost and with high throughput. The new LCD architecture has the power efficiency higher than a conventional LCD. Following structures are included in the three structures of the LCD device using a photoluminescence(PL) fiber array. The first structure having the PL fiber array located behind an LC shutter (to a user), the second structure having the PL fiber array located on the LC shutter, and the third structure where the PL fiber array in located in an LC cell outside. In one of the structures of these, the fiber not only emits light, but performs the polarization of incident light.

公开(公告)号：WO2005122195A3

公开(公告)日：2006-06-22

申请号：PCT/US2005018196

申请日：2005-05-23

Applicant: IBM ,  HUANG ELBERT E ,  KIM HYUNGJUN ,  MILLER ROBERT D ,  NITTA SATYANARAYANA V ,  PURUSHOTHAMAN SAMPATH

Inventor： HUANG ELBERT E ,  KIM HYUNGJUN ,  MILLER ROBERT D ,  NITTA SATYANARAYANA V ,  PURUSHOTHAMAN SAMPATH

IPC: H01L21/302 ,  H01G13/00 ,  H01L21/311 ,  H01L21/312 ,  H01L21/314 ,  H01L21/316 ,  H01L21/768 ,  H01L23/522 ,  H01L23/532

CPC classification number: H01L21/76808 ,  H01L21/0217 ,  H01L21/0228 ,  H01L21/02282 ,  H01L21/3121 ,  H01L21/3125 ,  H01L21/3141 ,  H01L21/31608 ,  H01L21/31629 ,  H01L21/31695 ,  H01L21/76814 ,  H01L21/76834 ,  H01L21/76837 ,  H01L23/5222 ,  H01L23/5329 ,  H01L23/53295 ,  H01L2924/0002 ,  H01L2924/00

Abstract: Interconnect structures are fabricated by methods that comprise depositing a thin conformal passivation dielectric and/or diffusion barrier cap and/or hard mask by an atomic layer deposition or supercritical fluid based process.

Abstract translation: 通过包括通过原子层沉积或基于超临界流体的方法沉积薄的共形钝化介质和/或扩散阻挡盖和/或硬掩模的方法来制造互连结构。

公开(公告)号：JP2006216541A

公开(公告)日：2006-08-17

申请号：JP2006013182

申请日：2006-01-20

Applicant: Internatl Business Mach Corp ,  インターナショナル・ビジネス・マシーンズ・コーポレーションInternational Business Maschines Corporation

Inventor： EDELSTEIN DANIEL C ,  GATES STEPHEN M ,  GRILL ALFRED ,  LANE MICHAEL ,  LIN QINGHUANG ,  MILLER ROBERT D ,  NEUMAYER DEBORAH A ,  NGUYEN SON VAN

IPC: H01B3/00 ,  C23C16/42 ,  H01L21/312 ,  H01L21/314 ,  H01L21/316 ,  H01L21/768 ,  H01L23/522

Abstract: PROBLEM TO BE SOLVED: To provide a low-k dielectric material with increased cohesive strength for use in electronic structures including interconnect and sensing structures. SOLUTION: The low-k dielectric material includes atoms of Si, C, O, and H in which a fraction of the C atoms are bonded as Si-CH 3 functional groups, and another fraction of the C atoms are bonded as Si-R-Si, wherein R is phenyl, -[CH 2 ] n -, (n is greater than or equal to 1), HC=CH, C=CH 2 , C≡C or a [S] n linkage, (n is as defined above). COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供具有增加的内聚强度的低k电介质材料，用于包括互连和感测结构的电子结构中。 解决方案：低k电介质材料包括Si，C，O和H的原子，其中C原子的一部分键合为Si-CH 3 S / S官能团，另一部分 的C原子键合为Si-R-Si，其中R是苯基， - （n大于或等于1） ，HC = CH，C = CH 2 ，C≡C或[S] n 键，（n如上所定义）。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2004205505A

公开(公告)日：2004-07-22

申请号：JP2003417329

申请日：2003-12-15

Applicant: Internatl Business Mach Corp ,  インターナショナル・ビジネス・マシーンズ・コーポレーションInternational Business Maschines Corporation

Inventor： BROCK PHILLIP J ,  DIPIETRO RICHARD A ,  FENDER NICOLETTE S ,  MILLER ROBERT D ,  SWANSON SALLY A ,  WALLRAFF GREGORY M

IPC: C12N15/09 ,  G01N33/543 ,  G01N33/547

CPC classification number: G01N33/54393 ,  G01N33/54353

Abstract: PROBLEM TO BE SOLVED: To provide a series of surface coupled linker molecules able to be brought into an optically active form used for preparing a bio-molecule microarray.
SOLUTION: A composition contains a solid substrate, an organic coupling group having one terminal part coupled to the solid substrate and having at least another terminal part containing an alcoholic or carbonyl functional group, and a protection group unstable against an acid selected from a group comprising an acetal or a ketal coupled to the alcoholic or carbonyl functional group. The present invention describes also a composition containing the solid substrate, the organic coupling group having the one terminal part coupled to the solid substrate, and having at least another terminal part containing an aldehyde. The present invention provides also a composition containing the solid substrate, and at least one photoacid generator or sensitizer coupled to the solid substrate.
COPYRIGHT: (C)2004,JPO&NCIPI

公开(公告)号：JP2001290264A

公开(公告)日：2001-10-19

申请号：JP2001039108

申请日：2001-02-15

Applicant: IBM

Inventor： DONALD C HOFER ,  SCOTT A MCDONALD ,  ARUPAN P MAHARUWARA ,  MILLER ROBERT D ,  JOSEPH MITCHELL ,  WALLRAFF GREGORY M

IPC: C08K5/55 ,  C08L25/04 ,  C08L33/12 ,  C08L101/02 ,  G03F7/004 ,  G03F7/039 ,  G03F7/26 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a resist composition which is transparent in the wavelength range of UV to a shorter wave and can utilize oxygen reactive ion etching using an additive in place of phenols. SOLUTION: The photoresist composition contains a polymer having an acid labile group, hydroxycarborane and a photo-acid generating agent. When the composition is used as an upper layered resist for two-layer thin film imaging lithography, the resist has superior transmittance to an illuminant of a wavelength in the extreme-ultraviolet region and has superior workability in the production of a semiconductor device.

公开(公告)号：CA1221864A

公开(公告)日：1987-05-19

申请号：CA499173

申请日：1986-01-08

Applicant: IBM

Inventor： CLECAK NICHOLAS J ,  GRANT BARBARA D ,  MILLER ROBERT D ,  TOMPKINS TERRY C ,  WILLSON C GRANT

IPC: C08L101/00 ,  C08K5/00 ,  C08K5/53 ,  C08L33/00 ,  C08L33/02 ,  C08L61/10 ,  G03C1/72 ,  G03C5/16 ,  G03F7/016 ,  G03F7/038 ,  G03F7/039 ,  G03F7/20 ,  H01L21/027 ,  G03C1/54

Abstract: HIGH-CONTRAST, HIGH RESOLUTION DEEP ULTRAVIOLET LITHOGRAPHIC RESISTS A lithographic resin for use with deep ultraviolet radiation comprises a weakly acidic resin and an alpha phosphoryl substituted diazo carbonyl compound as a sensitizer.

公开(公告)号：DE2338281A1

公开(公告)日：1974-02-21

申请号：DE2338281

申请日：1973-07-27

Applicant: IBM

Inventor： MILLER ROBERT D ,  YOUNG WILLIAM R ,  AVIRAM ARIEH ,  HALLER IVAN

IPC: C07D323/00 ,  C07F9/11 ,  C09K19/58 ,  G02F1/137 ,  B01D9/00

Abstract: 1395678 Liquid crystal compositions INTERNATIONAL BUSINESS MACHINES CORP 4 July 1973 [3 Aug 1972] 31854/73 Heading C4X [Also in Division C2] To a nematic liquid crystal material is added an organic dopant which provides ions in which the charge is effectively distributed over several atoms and is shielded from the charge of the counterions by a non-poar shell, whereby the resistivity of the nematic material is reduced, and as described in relation to dynamic scattering materials, the threshold voltage is reduced and the cut-off frequency raised. In some cases the undoped material does not exhibit dynamic scattering. The dopant, preferably forming 0À01 to 5% by weight of the composition, may contain large organic ions, or be a precursor thereof, or may be a compound containing chelated alkali metal ions. In the latter class the chelating agent may be dicyclohexyl-18-crown- 6 ether such being reacted with any one of a number of alkali metal salts of organic anions, or the dibenzo-18-crown-6 ether analogues. The former class appears to consist of generally unrelated materials, e.g. hexaphenylethane; tetrabutylammonium tetraphenylforide; and quinhydrone. The dopant may also be tributylphosphine oxide lithium bromide or triphenylphosphine oxide lithium bromide.