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    91.
    发明专利
    未知

    公开(公告)号：DE59605450D1

    公开(公告)日：2000-07-20

    申请号：DE59605450

    申请日：1996-10-17

    Applicant: BASF AG

    Inventor： FISCHER MARTIN

    IPC: B01J31/02 ,  B01J31/40 ,  B01J38/00 ,  C07D307/28

    Abstract: PCT No. PCT/EP96/04504 Sec. 371 Date Apr. 21, 1998 Sec. 102(e) Date Apr. 21, 1998 PCT Filed Oct. 17, 1996 PCT Pub. No. WO97/15392 PCT Pub. Date May 1, 1997An improved process is provided for the recovery of catalyst components from oligomeric impurities which are formed during the industrial preparation of 2,5-dihydrofuran by the catalytic isomerization of vinyl oxirane followed by an essential separation of the oligomeric by-products which otherwise cause deactivation of the catalyst. The catalyst components consist essentially of (a) an onium iodide and (b) a Lewis acid selected from the group consisting of the chloride, bromide or iodide of the metals zinc, tin, cobalt and bismuth, preferably zinc, where the catalyst optionally includes a donor ligand. This separation is carried out by the steps of extracting the initial product mixture containing zinc, cobalt or bismuth halides as Lewis acids with hydrocarbons or chlorinated hydrocarbons containing from 5 to 14 carbon atoms in order to form two separate phases on standing, separating off the extraction solvent phase which contains the dissolved catalyst and then recovering the separated catalyst by distilling off the extraction solvent. The recovery of tin iodide requires the presence of a special onium halide component such as phosphazenium or phosphazanium halides, preferably the iodides, having a high molecular weight and especially those which contain from 16 to 72 carbon atoms while remaining soluble in the extracting agent.

    IMPROVED PROCESS FOR PREPARING CYCLOPROPYLACETYLENE
    93.
    发明专利
    IMPROVED PROCESS FOR PREPARING CYCLOPROPYLACETYLENE 未知

    公开(公告)号：CA2283118A1

    公开(公告)日：1998-09-17

    申请号：CA2283118

    申请日：1998-02-18

    Applicant: BASF AG

    Inventor： STAMM ARMIN ,  FISCHER MARTIN ,  HENNINGSEN MICHAEL ,  SIEGEL WOLFGANG

    IPC: C07C1/30 ,  C07C13/04 ,  C07C17/00 ,  C07C17/18 ,  C07C22/00 ,  C07F9/535

    Abstract: The invention concerns a process for halogenating cyclopropylmethyl ketone with at least one dihalogen triorganophosphorane of the general formula (I): R3PHal2, in which the R groups can be the same or different and designate a saturated or unsaturated aliphatic C1-C20 hydrocarbon group, a phenyl or C1-C4 alkylphenyl group which can optionally be further substituted by one to two fluorine, chlorine and/or nitro groups, P means phosphorus and Hal means chlorine, bromine or iodine, at 80 to 130 ~C, the dihalogen triorganophosphorane of the general formula (I) being prepared in situ from triorganophosphane oxide or triorganophosphane sulphide of the general formula (II), R3PA, in which R has the meaning given under formula (I) and A stands for oxygen or sulphur, with a halogenation reagent. The process is characterized in that the triorganophosphane oxide or triorganophosphane sulphide is used in catalytic amounts. The invention also concerns the halogenation product of the cyclopropyl ketone obtained according to this process and a process for reacting it to form cyclopropylacetylene.

    96.
    发明专利
    未知

    公开(公告)号：AT148696T

    公开(公告)日：1997-02-15

    申请号：AT94901917

    申请日：1993-11-30

    Applicant: BASF AG

    Inventor： BOECK STEFAN ,  HERZOG KLAUS ,  FISCHER ROLF ,  VOGEL HERBERT ,  FISCHER MARTIN

    IPC: C07D301/10 ,  B01J23/50 ,  B01J23/96 ,  B01J38/12 ,  B01J38/16 ,  C07D303/04

    Abstract: PCT No. PCT/EP93/03352 Sec. 371 Date Mar. 17, 1995 Sec. 102(e) Date Mar. 17, 1995 PCT Filed Nov. 30, 1993 PCT Pub. No. WO94/13653 PCT Pub. Date Jun. 23, 19943,4-Epoxy-1-butene is prepared by the gas phase epoxidation of 1,3-butadiene by means of oxygen or oxygen-containing gases over silver-containing catalysts and isolation of the 3,4-epoxy-1-butene from the reaction exit mixture by performing the gas phase epoxidation in the presence of from 6 to 80 mol % of water vapor, based on the gas mixture supplied to the reactor.

    RADIATION SENSITIVE MIXTURE AND PRODUCTION OF RELIEF PATTERNS
    97.
    发明专利
    RADIATION SENSITIVE MIXTURE AND PRODUCTION OF RELIEF PATTERNS 未知

    公开(公告)号：CA1334898C

    公开(公告)日：1995-03-28

    申请号：CA597191

    申请日：1989-04-19

    Applicant: BASF AG

    Inventor： SCHWALM REINHOLD ,  BOETTCHER ANDREAS ,  FISCHER MARTIN ,  BINDER HORST

    IPC: G03F7/004 ,  G03F7/039 ,  G03F7/38 ,  H01L21/027

    Abstract: A radiation sensitive mixture useful for producing relief patterns contains (a) a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions and (b) an organic compound whose solubility in an aqueous alkaline developer is increased by the action of acid and which contains at least one acid cleavable group and additionally a group which forms a strong acid on irradiation, and in addition (c) a nonphotosensitive organic compound which contains at least one acid cleavable bond and the solubility of which in an aqueous alkaline developer is increased by the action of acid, or (d) a nonphotosensitive organic compound which contains at least one acid cleavable bond and which by the action of acid decomposes in such a way as to be completely removable by treatment at from 60 to 120.degree.C

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