公开(公告)号：US09520268B2

公开(公告)日：2016-12-13

申请号：US14795535

申请日：2015-07-09

Applicant: IMS Nanofabrication AG

Inventor： Elmar Platzgummer

IPC: G21K5/04 ,  H01J37/317 ,  H01J37/302 ,  G06F17/50 ,  H01J37/09 ,  H01J37/04

CPC classification number: H01J37/3177 ,  G06F17/5072 ,  G06F17/5081 ,  H01J37/045 ,  H01J37/09 ,  H01J37/3026 ,  H01J37/3175 ,  H01J2237/043 ,  H01J2237/3175 ,  H01J2237/31764

Abstract: An exposure pattern is computed for exposing a desired pattern on a target in a charged-particle multi-beam processing apparatus to match a reference writing tool, and/or for compensating a deviation of the imaging from a pattern definition device onto the target from a desired value of critical dimension along at least one direction in the image area on the target: The desired pattern is provided as a graphical representation suitable for the reference tool, on the image area on the target. A convolution kernel is used which describes a mapping from an element of the graphical representation to a group of pixels which is centered around a nominal position of said element. A nominal exposure pattern is calculated by convolution of the graphical representation with the convolution kernel, said nominal exposure pattern being suitable to create a nominal dose distribution on the target when exposed with the processing apparatus.

Abstract translation: 计算曝光图案以在带电粒子多光束处理装置中的目标上曝光期望图案以匹配参考写入工具，和/或用于从图案定义装置将图像偏离从图案定义装置补偿到目标上 在目标图像区域中至少沿一个方向的临界尺寸的期望值：所需图案作为适合参考工具的图形表示，在目标上的图像区域上提供。 使用卷积核，其描述从图形表示的元素到以所述元素的标称位置为中心的一组像素的映射。 通过图形表示与卷积核的卷积来计算标称曝光图案，所述标称曝光图案适于在用处理装置曝光时在目标上产生标称剂量分布。

公开(公告)号：US20160314934A1

公开(公告)日：2016-10-27

申请号：US15052881

申请日：2016-02-25

Applicant: ADVANTEST CORPORATION

Inventor： Akio YAMADA ,  Masahiro SEYAMA ,  Hideki NASUNO

IPC: H01J37/304 ,  H01J37/244 ,  H01J37/20 ,  H01J37/317

CPC classification number: H01J37/3045 ,  H01J37/20 ,  H01J37/244 ,  H01J37/3177 ,  H01J2237/043 ,  H01J2237/0435 ,  H01J2237/15 ,  H01J2237/2025 ,  H01J2237/20285 ,  H01J2237/30455 ,  H01J2237/31766 ,  H01J2237/31774

Abstract: To use a charged particle beam to form a complex and fine pattern by decreasing movement error of a stage, provided is an exposure apparatus comprising a beam generating section that generates a charged particle beam; a stage section that has a sample mounted thereon and moves the sample relative to the beam generating section; a detecting section that detects a position of the stage section; a predicting section that generates a predicted drive amount obtained by predicting a drive amount of the stage section based on a detected position of the stage section; and an irradiation control section that performs irradiation control for irradiating the sample with the charged particle beam, based on the predicted drive amount. Also provided is an exposure method.

Abstract translation: 为了使带电粒子束通过降低载物台的运动误差来形成复杂和精细的图案，提供了一种曝光装置，其包括产生带电粒子束的束产生部分; 具有安装在其上的样品并使样本相对于束生成部移动的台部， 检测部，其检测所述台部的位置; 预测部，其基于所述台部的检测位置生成预测所述台部的驱动量而得到的预测驱动量; 以及照射控制部，其根据预测的驱动量进行照射带电粒子束的样品的照射控制。 还提供了一种曝光方法。

公开(公告)号：US09184026B2

公开(公告)日：2015-11-10

申请号：US14626891

申请日：2015-02-19

Applicant: Mapper Lithography IP B.V.

Inventor： Marco Jan-Jaco Wieland

IPC: H01J37/30 ,  H01J37/302 ,  G21K5/04 ,  H01J37/317 ,  H01J37/04

CPC classification number: H01J37/3174 ,  H01J37/045 ,  H01J37/3007 ,  H01J37/3026 ,  H01J37/3177 ,  H01J2237/043 ,  H01J2237/0435 ,  H01J2237/31769

Abstract: The invention relates to a method for performing charged particle beam proximity effect correction, comprising the steps of: receiving a digital layout pattern to be patterned onto a target using one or more charged particle beams; selecting a base proximity function comprising a sum of an alpha and a beta proximity function, wherein said alpha proximity function models a short range proximity effect and said beta proximity function models a long range proximity effect, wherein a constant η is defined as a ratio between the beta proximity function and the alpha proximity function in said sum, with 0

Abstract translation: 本发明涉及一种用于执行带电粒子束邻近效应校正的方法，包括以下步骤：使用一个或多个带电粒子束将待图案化的数字布局图案接收到目标上; 选择包括α和β接近度函数之和的基本接近函数，其中所述α接近函数模拟短距离邻近效应，并且所述β接近函数模拟远距离邻近效应，其中恒定和近似函数 被定义为所述总和中β接近函数和α接近函数之间的比率，其中0 <＆eegr; <1; 确定对应于所述基本邻近效应函数的修改的接近度函数，其中所述α邻近函数已被Dirac delta函数代替，并且使用电子处理器执行所述数字布局图案与所述修改的接近函数的去卷积，以产生经校正的 布局模式。

公开(公告)号：US20150303026A1

公开(公告)日：2015-10-22

申请号：US14663971

申请日：2015-03-20

Applicant: NuFlare Technology, Inc.

Inventor： Haruyuki NOMURA

IPC: H01J37/147 ,  H01J37/10 ,  H01J37/04

CPC classification number: H01J37/1471 ,  H01J37/045 ,  H01J37/10 ,  H01J2237/043 ,  H01J2237/063 ,  H01J2237/06375 ,  H01J2237/1502

Abstract: An electron beam writing apparatus includes an electron gun system to emit an electron beam, a height adjustment unit, arranged at the downstream side compared to the electron gun system with respect to the optical axis direction, to variably adjust a height position of the electron gun system, an electron lens, arranged at the downstream side compared to the height adjustment unit with respect to the optical axis direction, to converge the electron beam, a lens control unit to control, for each variably adjusted and changed height position of the electron gun system, the electron lens such that the electron beam forms a crossover at a predetermined position, and an objective lens, arranged at the downstream side compared to the electron lens with respect to the optical axis direction, to focus the electron beam having passed the electron lens.

Abstract translation: 电子束写入装置包括与电子枪系统相对于光轴方向布置在下游侧的发射电子束的电子枪系统，高度调节单元，以可变地调节电子枪的高度位置 系统，电子透镜，相对于光轴方向布置在与高度调节单元相比的下游侧，以使电子束会聚;透镜控制单元，用于控制电子枪的每个可变调节和改变的高度位置 系统，使电子束在预定位置形成交叉的电子透镜，以及与电子透镜相对于光轴方向配置在下游侧的物镜，以聚焦通过电子的电子束 镜片。

公开(公告)号：US20150255249A1

公开(公告)日：2015-09-10

申请号：US14638786

申请日：2015-03-04

Applicant: NuFlare Technology, Inc.

Inventor： Munehiro OGASAWARA

IPC: H01J37/317 ,  H01J37/04 ,  H01J37/30

CPC classification number: H01J37/3177 ,  H01J37/045 ,  H01J37/3007 ,  H01J2237/043 ,  H01J2237/0492 ,  H01J2237/12

Abstract: A multi charged particle beam writing apparatus includes an aperture member to form multiple beams, a blanking plate in which there are arranged a plurality of blankers to respectively perform blanking deflection for a corresponding beam in the multiple beams having passed through a plurality of openings of the aperture member, a blanking aperture member to block each beam having been deflected to be in OFF state by at least one of the plurality of blankers, a first grating lens, using the aperture member as gratings, to correct spherical aberration of the charged particle beam, and a correction lens configured to correct high order spherical aberration produced by the first grating lens.

Abstract translation: 多带电粒子束写入装置包括形成多个光束的孔径构件，其中布置有多个遮挡件，以分别对通过多个光束的多个光束的多个光束中的相应光束执行消隐偏转 孔径构件，用于阻挡已经被多个遮挡件中的至少一个偏转到处于关闭状态的每个光束的消隐孔径构件，使用孔径构件作为光栅的第一光栅透镜，以校正带电粒子束的球面像差 以及配置为校正由第一光栅透镜产生的高阶球面像差的校正透镜。

公开(公告)号：US09064671B2

公开(公告)日：2015-06-23

申请号：US13828112

申请日：2013-03-14

Applicant: Arcam AB

Inventor： Ulric Ljungblad ,  Mattias Svensson

IPC: H05H1/54 ,  H01J29/52 ,  B29C67/00 ,  H01J37/077 ,  H01J37/305 ,  H01J37/317

CPC classification number: H01J29/52 ,  B29C64/153 ,  B33Y10/00 ,  B33Y30/00 ,  H01J37/077 ,  H01J37/305 ,  H01J37/3178 ,  H01J2237/043 ,  H01J2237/3128 ,  H01J2237/31732

Abstract: Various embodiments of the present invention relate to a plasma electron source apparatus. The apparatus comprises a cathode discharge chamber in which a plasma is generated, an exit hole provided in said cathode discharge chamber from which electrons from the plasma are extracted by an accelerating field provided between said cathode discharge chamber and an anode, at least one plasma confinement device, and a switching mechanism for switching the at least one plasma confinement device between a first value allowing for electron extraction from the plasma and a second value prohibiting electron extraction from the plasma. Associated methods are also provided.

Abstract translation: 本发明的各种实施方式涉及等离子体电子源装置。 该装置包括：阴极放电室，其中产生等离子体，设置在所述阴极放电室中的出射孔，来自等离子体的电子由所述阴极放电室和阳极之间的加速场提取，至少一个等离子体限制 装置和切换机构，用于在允许从等离子体提取电子的第一值和禁止从等离子体中提取电子的第二值之间切换至少一个等离子体约束装置。 还提供了相关的方法。

公开(公告)号：US20150144801A1

公开(公告)日：2015-05-28

申请号：US14562954

申请日：2014-12-08

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Josef Biberger ,  Ralph Pulwey ,  Volker Wieczorek

IPC: H01J37/26 ,  H01J37/147 ,  H01J37/04

CPC classification number: H01J37/265 ,  H01J37/045 ,  H01J37/1472 ,  H01J37/1474 ,  H01J37/28 ,  H01J2237/043 ,  H01J2237/063 ,  H01J2237/15 ,  H01J2237/2487 ,  H01J2237/2602

Abstract: A method of operating a particle beam system includes digitally controlling first and second digitally controlled modules of the particle beam system, and sending digital command data to the first and second digitally controlled modules. The digital command data include at least a first command for the first digitally controlled module and at least a second command for the second digitally controlled module. The digital command data is generated based on information representing: a) a time when the first command is to be executed by the first digitally controlled module; and b) a time when the second command is to be executed by the second digitally controlled module.

Abstract translation: 操作粒子束系统的方法包括数字控制粒子束系统的第一和第二数字控制模块，以及向第一和第二数字控制模块发送数字命令数据。 数字命令数据至少包括第一数字控制模块的第一命令和至少第二数字控制模块的第二命令。 基于表示以下信息生成数字命令数据：a）第一数字控制模块执行第一命令的时间; 以及b）第二命令由第二数字控制模块执行的时间。

公开(公告)号：US08968535B2

公开(公告)日：2015-03-03

申请号：US12967304

申请日：2010-12-14

Applicant: John MacNeil ,  Paul George Bennett

Inventor： John MacNeil ,  Paul George Bennett

IPC: C23C14/00 ,  C25B11/00 ,  C25B13/00 ,  H01J27/02 ,  C23C14/34 ,  C23C14/46 ,  H01J37/24 ,  H01J37/305

CPC classification number: H01J27/022 ,  C23C14/3485 ,  C23C14/46 ,  H01J37/243 ,  H01J37/305 ,  H01J2237/004 ,  H01J2237/043 ,  H01J2237/08 ,  H01J2237/304

Abstract: This invention relates an ion beam source (10) for use with a non-electrical conducting target (14) including a grid (13) for extracting ions and a power supply for supplying pass power to the grid (13) to extract the ions.

Abstract translation: 本发明涉及一种用于非导电靶（14）的离子束源（10），其包括用于提取离子的栅格（13）和用于向栅格（13）提供通过电力以提取离子的电源。

公开(公告)号：US08963081B2

公开(公告)日：2015-02-24

申请号：US14190289

申请日：2014-02-26

Applicant: Canon Kabushiki Kaisha

Inventor： Kota Iwasaki

IPC: H01J49/40 ,  H01J49/06

CPC classification number: H01J49/061 ,  H01J37/05 ,  H01J49/40 ,  H01J2237/043 ,  H01J2237/057

Abstract: When a time-of-flight mass selector having a chopper using a deflector selects the masses of the ions, an ion beam is deflected. As a result, at least a part of the ion beams diagonally pass through an aperture electrode with respect to the axis. Accordingly, there has been a problem that a position on an object irradiated with a cluster ion beam, results in moving. This mass selector includes: a flight tube having an equipotential space that makes a charged substance fly therein; a deflector that is installed in a downstream side with respect to the flight tube in a direction in which the charged substance flies; a first aperture electrode that is installed in a downstream side with respect to the deflector in a direction in which the charged substance flies; and a second aperture electrode that is installed in between the deflector and the first aperture electrode.

Abstract translation: 当具有使用偏转器的斩波器的飞行时间质量选择器选择离子的质量时，离子束被偏转。 结果，至少一部分离子束相对于轴线对角地穿过孔电极。 因此，存在用聚簇离子束照射的物体上的位置导致移动的问题。 该质量选择器包括：具有使带电物质在其中飞行的等电位空间的飞行管; 偏转器，其安装在相对于所述飞行管的下游侧，所述偏转器沿所述带电物质飞行的方向; 第一孔电极，其安装在相对于所述偏转器的下游侧，所述第一孔电极沿所述带电物质飞行的方向; 以及安装在偏转器和第一孔径电极之间的第二孔径电极。

公开(公告)号：US08723136B2

公开(公告)日：2014-05-13

申请号：US13626736

申请日：2012-09-25

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Josef Biberger ,  Ralph Pulwey ,  Volker Wieczorek

IPC: G21K5/02

CPC classification number: H01J37/265 ,  H01J37/045 ,  H01J37/1472 ,  H01J37/1474 ,  H01J37/28 ,  H01J2237/043 ,  H01J2237/063 ,  H01J2237/15 ,  H01J2237/2487 ,  H01J2237/2602

Abstract: A method of operating a particle beam system includes determining a deflection amount and a deflection time of a beam deflection module connected to a data network. The method also includes determining an un-blank time of a beam blanking module connected to the data network, and determining a blank time of the beam blanking module connected to the data network. The method further includes generating a data structure which includes plural data records, wherein each data record includes a command representing an instruction for at least one of the modules, and a command time representing a time at which the instruction is to be sent to the data network. In addition, the method includes sorting the records of the data structure by command time, and generating a set of digital commands based on the data structure. Moreover, the method includes sending the digital commands of the set to the network in an order corresponding to an order of the sorted records.

Abstract translation: 操作粒子束系统的方法包括确定连接到数据网络的光束偏转模块的偏转量和偏转时间。 该方法还包括确定连接到数据网络的波束消隐模块的非空白时间，以及确定连接到数据网络的波束消隐模块的空白时间。 该方法还包括生成包括多个数据记录的数据结构，其中每个数据记录包括表示至少一个模块的指令的命令，以及表示将指令发送到数据的时间的命令时间 网络。 此外，该方法包括通过命令时间对数据结构的记录进行排序，并且基于数据结构生成一组数字命令。 此外，该方法包括以与排序记录的顺序对应的顺序将集合的数字命令发送到网络。