公开(公告)号：US06329769B1

公开(公告)日：2001-12-11

申请号：US09275786

申请日：1999-03-25

Applicant: Yoshihiko Naito

Inventor： Yoshihiko Naito

IPC: H01J2970

CPC classification number: B01D53/007 ,  B01D2259/812 ,  H01J3/26

Abstract: To provide an electron beam irradiation device capable of avoiding a problem of convergence of an electron beam at the maximum scanning points, and constantly obtaining an irradiated region of uniform energy density, an electron beam irradiation device comprising an electron beam source 12, an accelerating tube 13 for accelerating electrons emitted from said electron beam source, a focusing electromagnet 16 for applying a magnetic field to a high energy electron beam, which is formed by the accelerating tube, for controlling the beam diameter of the electron beam, and an electromagnet 17 for deflecting and scanning the beam-diameter-controlled electron beam by applying a magnetic field to the electron beam, wherein an electric current component IF which is synchronized with an electric current IS of the scanning electromagnet 17 is superimposed on an electric current IF of the focusing electromagnet 16, thereby controlling the electric current IF of the focusing electromagnet in a manner that said beam diameter becomes maximum at the maximum scanning points.

Abstract translation: 为了提供能够避免电子束在最大扫描点会聚的问题的电子束照射装置，并且不断地获得均匀的能量密度的照射区域，电子束照射装置包括电子束源12，加速管 13，用于加速从所述电子束源发射的电子;聚焦电磁体16，用于对由加速管形成的用于控制电子束的光束直径的高能电子束施加磁场;电磁体17，用于 通过向电子束施加磁场来偏转和扫描光束直径受控的电子束，其中与扫描电磁体17的电流IS同步的电流分量IF被叠加在聚焦的电流IF上 电磁体16，从而控制聚光电磁铁的电流IF 所述光束直径在最大扫描点处变得最大。

公开(公告)号：KR101773534B1

公开(公告)日：2017-08-31

申请号：KR1020127011610

申请日：2010-09-24

Applicant: 이온빔 어플리케이션스 에스.에이.

Inventor： 용건,이브

IPC: A61N5/01 ,  G21K1/093 ,  G21K5/04

CPC classification number: H01J3/26 ,  A61N5/01 ,  A61N5/10 ,  A61N5/1077 ,  A61N5/1081 ,  A61N2005/1087 ,  G21K1/093

Abstract: 본발명은방사선치료에사용되는입자치료장치, 더욱상세하게는갠트리의회전축에수직한입자빔을전달하는작은등선량중심갠트리에관한것이다. 갠트리는 3개의이중극자석들을포함한다. 마지막이중극자석의각도는 90°보다작으며이러한마지막이중극자석의대부분의바람직한굽힘각도는 60°이다.

Abstract translation: 本发明涉及用于放射治疗的颗粒治疗装置，更具体地涉及一种垂直于机架的旋转轴线递送粒子束的小的等剂量中心机架。 龙门架包括三个偶极磁铁。 最后一个偶极磁铁的角度小于90°，​​最后一个偶极磁铁的最佳弯曲角度为60°。

公开(公告)号：KR101570362B1

公开(公告)日：2015-11-19

申请号：KR1020140021360

申请日：2014-02-24

Applicant: 가부시키가이샤 뉴플레어 테크놀로지

Inventor： 미야모토노부오

IPC: H01J37/305 ,  H01L21/027

CPC classification number: H01J37/304 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/26 ,  H01J37/06 ,  H01J37/07 ,  H01J37/3174 ,  H01J2237/0653 ,  H01J2237/24585 ,  H01J2237/30461

Abstract: 본발명의일태양의캐소드의동작온도조정방법은, 캐소드를이용한전자빔원에서의이미션전류값과, 이러한이미션전류에있어서바이어스전압이포화되는캐소드의동작온도와의상관관계를근사한근사식을취득하고, 제 n 번째(n은자연수)의이미션전류값과캐소드의제 n 번째의동작온도가전자빔원에설정된상태에서, 캐소드로부터방출된전자빔의전류밀도를측정하고, 측정된전류밀도가허용범위내인지여부를판정하고, 전류밀도가허용범위내가아닐경우, 설정된제 n 번째의이미션전류값을제 n + 1 번째의이미션전류값으로변경하고, 근사식을이용하여, 제 n + 1 번째의이미션전류값에대응하는캐소드의동작온도를연산하고, 캐소드의제 n + 1 번째의동작온도로서전자빔원에설정하는것을특징으로한다.

公开(公告)号：KR1020060125994A

公开(公告)日：2006-12-07

申请号：KR1020050047526

申请日：2005-06-03

Applicant: 씨이비티 주식회사

Inventor： 김호섭 ,  김병진

IPC: G02B3/00 ,  G02B21/00 ,  G02B7/00

CPC classification number: H01J3/18 ,  H01J3/26 ,  H01J37/12 ,  H01J2237/0492 ,  H01J2237/1205 ,  H01J37/147

Abstract: A micro-column of simple structure is provided to simplify the configuration of the micro-column by coupling a deflector with a focus lens. A micro-column of simple structure includes an electron emission source(11) and a lens unit(13). More than two lens layers are included in the lens unit, so that the lens unit performs both a source lens action and a focusing action at the same time. The lens unit performs a deflector action by using at least one deflector-type lens layer. The micro-column is made of multiple electron columns. The multiple electron columns are formed in a wafer type.

Abstract translation: 提供简单结构的微柱，以通过将偏转器与聚焦透镜耦合来简化微柱的构造。 简单结构的微柱包括电子发射源（11）和透镜单元（13）。 透镜单元中包括两个以上的透镜层，使得透镜单元同时执行源透镜动作和聚焦动作。 透镜单元通过使用至少一个偏转器型透镜层来执行偏转器动作。 微柱由多个电子柱制成。 多个电子柱以晶片形式形成。

公开(公告)号：KR101405357B1

公开(公告)日：2014-06-13

申请号：KR1020130015832

申请日：2013-02-14

Applicant: 선문대학교 산학협력단

Inventor： 오태식 ,  김호섭 ,  김대욱 ,  안승준

IPC: H01J37/147 ,  H01J37/06

CPC classification number: H01J3/26 ,  H01J3/021 ,  H01J3/12 ,  H01J3/14 ,  H01J3/18 ,  H01J3/30 ,  H01J37/04 ,  H01J2237/1205

Abstract: The present invention relates to a micro electron optical column comprising an electron emitter emitting an electron using the electric field electron emission theory; an output electrode part inducing the electron emission on the emitter; and a focusing electrode part flexibly applying a voltage according to the operating distance to control the focusing force of an electronic beam generated from the electron emitter; an acceleration electrode part accelerating the electron emitted by the output electrode part; a limit electrode controlling the amount and size of an electronic beam of the electron accelerated by the acceleration electrode part; and a deflector deflecting the electronic beam on the target.

Abstract translation: 本发明涉及一种微电子光学柱，包括使用电场电子发射理论发射电子的电子发射体; 一个在发射极上引发电子发射的输出电极部分; 以及根据所述操作距离灵活地施加电压的聚焦电极部分，以控制从所述电子发射器产生的电子束的聚焦力; 加速电极部，加速由所述输出电极部发射的电子; 限制电极，控制由加速电极部加速的电子束的电子束的数量和尺寸; 以及使电子束偏转到靶上的偏转器。

公开(公告)号：KR100973337B1

公开(公告)日：2010-07-30

申请号：KR1020050047526

申请日：2005-06-03

Applicant: 씨이비티 주식회사

Inventor： 김호섭 ,  김병진

IPC: G02B3/00 ,  G02B21/00 ,  G02B7/00

CPC classification number: H01J3/18 ,  H01J3/26 ,  H01J37/12 ,  H01J2237/0492 ,  H01J2237/1205

Abstract: 본 발명은 전자 방출원 및 렌즈를 포함하는 초소형 전자칼럼에 관한 것으로, 보다 상세하게는 전자 방출원 및 렌즈들의 정렬 및 조립을 보다 용이하게 할 수 있도록 하는 구조의 초소형 전자칼럼에 관한 것이다.
본 발명에 따른 전자 방출원, 소스 렌즈 및 디플렉터를 포함하는 전자칼럼은, 상기 소스 렌즈가 두 개 이상의 렌즈층으로 구성되어 포커싱 역할을 겸하는 것을 특징으로 한다. 또한 상기 소스 렌즈의 렌즈층 중 하나 이상이 디플렉터 형 렌즈 층으로 구성되어 디플렉터 역할을 함께 하는 것을 특징으로 한다.

公开(公告)号：KR100456237B1

公开(公告)日：2004-11-09

申请号：KR1020020072975

申请日：2002-11-22

Applicant: 한국전자통신연구원

Inventor： 최상국 ,  김대용 ,  강동열

IPC: H01J37/147

CPC classification number: H01J9/02 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/26 ,  H01J37/1477 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/1516 ,  H01J2237/31793

Abstract: The present invention relates to a deflector of a micro-column electron beam apparatus and method for fabricating the same, which forms a seed metal layer and a mask layer on both sides of a substrate, and exposes some of the seed metal layer on which deflecting plates, wirings and pads are to be formed by lithography process using a predetermined mask. The wirings and pads are formed by plating metal on the exposed portion, and some of the metal layer is also exposed on which the deflecting plates are to be formed using a predetermined mask, and then the metal is plated with desired thickness, thereby the deflecting plates are completed. Therefore, by forming plurality of deflecting plates on both sides of the substrate at the same time through plating process, alignment between the deflecting plates formed on both sides of the substrate can be exactly made, and by fabricating a deflector integrated with the substrate and deflecting plates in a batch process, productivity and reproducibility is improved. In addition, since the deflecting plates, wirings and pads are directly formed on the substrate, structural safety is improved and thereby durability is also improved.

Abstract translation: 微柱电子束装置的偏转器及其制造方法技术领域本发明涉及一种微柱电子束装置的偏转器及其制造方法，其在衬底的两侧上形成种金属层和掩模层，并且暴露出部分偏转的籽晶金属层 板，布线和焊盘将通过使用预定掩模的光刻工艺形成。 通过在暴露部分上电镀金属而形成布线和焊盘，并且使用预定掩模将一些金属层也暴露在其上将形成偏转板的金属层上，然后金属以所需厚度电镀，由此偏转 板完成。 因此，通过电镀工艺同时在衬底的两侧形成多个偏转板，可以准确地形成在衬底两侧形成的偏转板之间的对准，并且通过制造与衬底整合的偏转器并偏转 在批量生产过程中，生产力和再现性得到提高。 另外，由于偏转板，配线和衬垫直接形成在衬底上，所以结构安全性得到改善，从而也提高了耐久性。

公开(公告)号：TWI426530B

公开(公告)日：2014-02-11

申请号：TW099140509

申请日：2010-11-24

Applicant: 三菱電機股份有限公司 ,  MITSUBISHI ELECTRIC CORPORATION

Inventor： 片寄雅 ,  KATAYOSE, TADASHI

IPC: G21K1/093 ,  G21K5/04 ,  A61N5/10

CPC classification number: A61N5/1077 ,  A61N5/1043 ,  A61N2005/1087 ,  G21K5/02 ,  H01J3/26

公开(公告)号：JP6166910B2

公开(公告)日：2017-07-19

申请号：JP2013036257

申请日：2013-02-26

Applicant: 株式会社ニューフレアテクノロジー

Inventor： 宮本 房雄

IPC: H01L21/027 ,  G03F7/20 ,  H01J37/305 ,  H01J37/06 ,  H01J37/04

CPC classification number: H01J37/304 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/26 ,  H01J37/06 ,  H01J37/07 ,  H01J37/3174 ,  H01J2237/0653 ,  H01J2237/24585 ,  H01J2237/30461

公开(公告)号：JP2014022297A

公开(公告)日：2014-02-03

申请号：JP2012162258

申请日：2012-07-23

Applicant: Hitachi High-Technologies Corp ,  株式会社日立ハイテクノロジーズ

Inventor： DOI HIDETO ,  IKEGAMI AKIRA ,  KAZUMI HIDEYUKI

IPC: H01J37/153 ,  H01J37/147 ,  H01J37/28

CPC classification number: H01J3/26 ,  H01J3/14 ,  H01J37/1478 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/1501 ,  H01J2237/1508

Abstract: PROBLEM TO BE SOLVED: To provide a charged particle beam device which, in a relatively simple configuration, corrects off-axis chromatic aberration and deflection coma aberration at the same time.SOLUTION: The present invention is a charged particle beam device provided with a tilting purpose deflector 08 disposed between a charged particle source 01 and an objective lens 09 and used to tilt a charged particle beam, the charged particle beam device having a first optical element 07 including an electromagnetic quadrupole which generates dispersion to suppress the dispersion caused by deflection by the tilting purpose deflector 08 and provided with a second optical element comprising the deflector 06 for deflecting the charged particle beam incident upon the first optical element 07 or an electromagnetic quadrupole which causes dispersion different from the dispersion generated by the first optical element to occur in the charged particle beam.

Abstract translation: 要解决的问题：提供一种带电粒子束装置，其以相对简单的构造同时校正离轴色差和偏转彗形像差。解决方案：本发明是一种带电粒子束装置，其具有倾斜 设置在带电粒子源01和物镜09之间并用于倾斜带电粒子束的目的偏转器08，带电粒子束装置具有包括电磁四极杆的第一光学元件07，其产生色散以抑制由偏转引起的色散 倾斜目的偏转器08并且设置有第二光学元件，该第二光学元件包括用于偏转入射在第一光学元件07上的带电粒子束的偏转器06或电磁四极杆，其导致与由第一光学元件产生的色散不同的色散发生在 带电粒子束。