公开(公告)号：US20150129763A1

公开(公告)日：2015-05-14

申请号：US14395263

申请日：2013-04-11

Applicant: Hitachi High-Technologies Corporation

Inventor： Yusuke Ominami ,  Shinsuke Kawanishi ,  Tomohisa Ohtaki ,  Masahiko Ajima ,  Sukehiro Ito

IPC: H01J37/26 ,  H01J37/147 ,  H01J37/10

CPC classification number: H01J37/261 ,  H01J37/09 ,  H01J37/10 ,  H01J37/147 ,  H01J37/16 ,  H01J37/18 ,  H01J37/28 ,  H01J2237/0245 ,  H01J2237/043 ,  H01J2237/063 ,  H01J2237/10 ,  H01J2237/162 ,  H01J2237/164 ,  H01J2237/2003 ,  H01J2237/2448 ,  H01J2237/2602 ,  H01J2237/2605

Abstract: A charged particle beam device (1) includes a charged particle optical lens barrel (10), a support housing (20) equipped with the charged particle optical lens barrel (10) thereon, and an insertion housing (30) inserted in the support housing (20). A first aperture member (15) is disposed in the vicinity of the center of the magnetic field of an objective lens, and a second aperture member (15) is disposed so as to externally close an opening part provided at the upper side of the insertion housing (30). Further, when a primary charged particle beam (12) is irradiated to a sample (60) arranged under the lower side of the second aperture member (31), secondary charged particles thus emitted are detected by a detector (16).

Abstract translation: 带电粒子束装置（1）包括带电粒子光学透镜镜筒（10），在其上装有带电粒子光学透镜镜筒（10）的支撑壳体（20）和插入支撑壳体 （20）。 第一孔径构件（15）设置在物镜的磁场的中心附近，并且第二孔径构件（15）设置成外部封闭设置在插入件的上侧的开口部分 住房（30）。 此外，当将初级带电粒子束（12）照射到布置在第二孔径构件（31）的下侧下方的样品（60）时，由检测器（16）检测如此发射的二次带电粒子。

公开(公告)号：US20150044615A1

公开(公告)日：2015-02-12

申请号：US14446857

申请日：2014-07-30

Applicant: CANON KABUSHIKI KAISHA

Inventor： Kimitaka OZAWA ,  Isamu SETO

IPC: H01J37/317 ,  G03F7/20 ,  G03F7/30 ,  H01J37/302

CPC classification number: H01J37/3177 ,  G03F7/2059 ,  H01J37/3026 ,  H01J37/3175 ,  H01J2237/043 ,  H01J2237/04924 ,  H01J2237/06308

Abstract: A method generates drawing data for performing drawing on a substrate with a plurality of charged particle beams based on pattern data representing a pattern to be drawn on the substrate. The method includes: a grouping step of grouping the plurality of charged particle beams into a plurality of groups based on a displacement amount of an irradiation position of each of the plurality of charged particle beams from target position thereof; and a generating step of generating the drawing data by changing the pattern data with respect to each of the plurality of groups based on the displacement amount of each of the plurality of charged particle beams.

Abstract translation: 一种方法根据表示在基板上绘制的图案的图案数据，生成用于在具有多个带电粒子束的基板上进行绘图的绘图数据。 该方法包括：分组步骤，基于来自其目标位置的多个带电粒子束中的每一个的照射位置的位移量，将多个带电粒子束分组成多个组; 以及生成步骤，通过基于所述多个带电粒子束中的每一个的位移量来改变相对于所述多个组中的每个组的图案数据来生成所述绘图数据。

公开(公告)号：US20140217303A1

公开(公告)日：2014-08-07

申请号：US14249951

申请日：2014-04-10

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Josef Biberger ,  Ralph Pulwey ,  Volker Wieczorek

IPC: H01J37/147

CPC classification number: H01J37/265 ,  H01J37/045 ,  H01J37/1472 ,  H01J37/1474 ,  H01J37/28 ,  H01J2237/043 ,  H01J2237/063 ,  H01J2237/15 ,  H01J2237/2487 ,  H01J2237/2602

Abstract: A particle beam system includes a charged particle beam source, a beam blanking module connectable to a data network, a focusing lens, a first beam deflection module connectable to the data network, a calculation module configured to determine a deflection time; and an encoding module.

Abstract translation: 粒子束系统包括带电粒子束源，可连接到数据网络的束消隐模块，聚焦透镜，可连接到数据网络的第一光束偏转模块，被配置为确定偏转时间的计算模块; 和编码模块。

公开(公告)号：US20130300286A1

公开(公告)日：2013-11-14

申请号：US13828112

申请日：2013-03-14

Applicant: ARCAM AB

Inventor： Ulric Ljungblad ,  Mattias Svensson

IPC: H01J29/52

CPC classification number: H01J29/52 ,  B29C64/153 ,  B33Y10/00 ,  B33Y30/00 ,  H01J37/077 ,  H01J37/305 ,  H01J37/3178 ,  H01J2237/043 ,  H01J2237/3128 ,  H01J2237/31732

Abstract: Various embodiments of the present invention relate to a plasma electron source apparatus. The apparatus comprises a cathode discharge chamber in which a plasma is generated, an exit hole provided in said cathode discharge chamber from which electrons from the plasma are extracted by an accelerating field provided between said cathode discharge chamber and an anode, at least one plasma confinement device, and a switching mechanism for switching the at least one plasma confinement device between a first value allowing for electron extraction from the plasma and a second value prohibiting electron extraction from the plasma. Associated methods are also provided.

Abstract translation: 本发明的各种实施方式涉及等离子体电子源装置。 该装置包括：阴极放电室，其中产生等离子体，设置在所述阴极放电室中的出射孔，来自等离子体的电子由所述阴极放电室和阳极之间的加速场提取，至少一个等离子体限制 装置和切换机构，用于在允许从等离子体提取电子的第一值和禁止从等离子体中提取电子的第二值之间切换至少一个等离子体约束装置。 还提供了相关的方法。

公开(公告)号：US20130068959A1

公开(公告)日：2013-03-21

申请号：US13623954

申请日：2012-09-21

Applicant: CANON KABUSHIKI KAISHA

Inventor： Takehiko SUZUKI ,  Yoshikiyo YUI

IPC: G21K5/00

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/244 ,  H01J2237/043 ,  H01J2237/24514

Abstract: A drawing apparatus includes: a detector configured to output a current in accordance with a pulse of a charged particle beam; and a processor including a capacitor and configured to detect a value of a voltage of the capacitor and to obtain an intensity of the pulse based on a value of a capacitance of the capacitor and the detected voltage value. The processor is configured to detect a current output from the detector in accordance with a charged particle beam incident thereon through a voltage drop, to supply a current having a value determined based on the detected current, to the capacitor to detect a value of a voltage of the capacitor, and to obtain the value of the capacitance based on the determined current value and the detected value of the voltage of the capacitor.

Abstract translation: 一种绘图装置，包括：检测器，被配置为根据带电粒子束的脉冲输出电流; 以及包括电容器的处理器，被配置为检测电容器的电压的值，并且基于电容器的电容值和检测到的电压值来获得脉冲的强度。 处理器被配置为根据通过电压降入射到其上的带电粒子束来检测来自检测器的电流输出，以将具有基于检测到的电流确定的值的电流提供给电容器，以检测电压值 并且基于所确定的电流值和电容器的电压的检测值来获得电容值。

公开(公告)号：US07692166B2

公开(公告)日：2010-04-06

申请号：US11762182

申请日：2007-06-13

Applicant: Masato Muraki ,  Haruo Yoda

Inventor： Masato Muraki ,  Haruo Yoda

IPC: H01J37/304 ,  H01L21/027

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/304 ,  H01J2237/043 ,  H01J2237/24507 ,  H01J2237/3045 ,  H01J2237/30455 ,  H01J2237/30477 ,  H01J2237/30483

Abstract: An exposure apparatus which draws a pattern on a substrate with a charged particle beam is disclosed. The exposure apparatus includes a detector which detects a charged particle beam, a deflector which deflects the charged particle beam to scan the substrate or the detector with the charged particle beam, and a controller which controls the deflector to scan each of a plurality of scanning ranges on the detector with the charged particle beam, and calculates, on the basis of the charged particle beam amount detected by the detector upon scanning the plurality of scanning ranges, the intensity distribution of the charged particle beam which strikes the detector.

Abstract translation: 公开了一种在具有带电粒子束的基板上绘制图案的曝光装置。 曝光装置包括检测带电粒子束的检测器，使带电粒子束偏转以利用带电粒子束扫描基板或检测器的偏转器，以及控制偏转器扫描多个扫描范围中的每一个的控制器 在具有带电粒子束的检测器上，并且基于扫描多个扫描范围时由检测器检测到的带电粒子束量计算撞击检测器的带电粒子束的强度分布。

公开(公告)号：US07375538B2

公开(公告)日：2008-05-20

申请号：US11166231

申请日：2005-06-27

Applicant: Mari Nozoe

Inventor： Mari Nozoe

IPC: G01R31/305

CPC classification number: H01J37/222 ,  G01R31/307 ,  H01J37/256 ,  H01J37/263 ,  H01J37/265 ,  H01J37/266 ,  H01J2237/043 ,  H01J2237/24564 ,  H01J2237/2594 ,  H01J2237/2813 ,  H01J2237/2817 ,  H01J2237/304

Abstract: Electron beam is irradiated to a wafer in the midst of steps at predetermined intervals by a plurality of times under a condition in which a junction becomes rearward bias and a difference in characteristic of a time period of alleviating charge in the rearward bias is monitored. As a result, charge is alleviated at a location where junction leakage is caused in a time period shorter than that of a normal portion and therefore, a potential difference is produced between the normal portion and a failed portion and is observed in a potential contrast image as a difference in brightness. By consecutively repeating operation of acquiring the image, executing an image processing in real time and storing a position and brightness of the failed portion, the automatic inspection of a designated region can be executed. Information of image, brightness and distribution of the failed portion is preserved and outputted automatically after inspection.

Abstract translation: 电子束在连接点成为向后偏置的状态下以预定间隔在步骤中照射到晶片，并且监视在向后偏置中减轻电荷的时间段的特性差。 结果，在比正常部分短的时间段内产生结漏电的位置处的电荷被减轻，因此在正常部分和失效部分之间产生电位差，并且在潜在对比图像中观察到电荷 作为亮度的差异。 通过连续重复获取图像的操作，实时执行图像处理并存储失败部分的位置和亮度，可以执行指定区域的自动检查。 故障部分的图像，亮度和分布信息在检查后自动保存并输出。

公开(公告)号：US20080078955A1

公开(公告)日：2008-04-03

申请号：US11540449

申请日：2006-09-29

Applicant: Michael A. Graf ,  Edward C. Eisner ,  William F. DiVergilio ,  Daniel R. Tieger

Inventor： Michael A. Graf ,  Edward C. Eisner ,  William F. DiVergilio ,  Daniel R. Tieger

IPC: H01J37/317 ,  H01J37/302

CPC classification number: H01J37/3171 ,  H01J37/08 ,  H01J37/3045 ,  H01J2237/043 ,  H01J2237/082 ,  H01J2237/24535 ,  H01J2237/24564 ,  H01J2237/24578 ,  H01J2237/30455 ,  H01J2237/30472

Abstract: An ion beam is rapidly switched off during ion implantation on detecting a beam instability. The ion beam is generated or provided by a non-arc discharge based ion source, such as an electron gun ion source or an RF ion source. The ion beam is scanned across a workpiece from a starting location toward an ending location. During the scanning, one or more beam characteristics are monitored, such as beam current, beam flux, shape, and the like. An instability is detected when one or more of the beam characteristics deviate from acceptable values or levels. The ion beam is rapidly turned off on the detected instability.

Abstract translation: 在离子注入期间，在检测到光束不稳定性时，离子束被快速关闭。 离子束由非电弧放电型离子源（例如电子枪离子源或RF离子源）产生或提供。 离子束从起始位置朝向终止位置跨工件扫描。 在扫描期间，监视一个或多个光束特性，例如光束电流，光束通量，形状等。 当一个或多个光束特性偏离可接受的值或水平时，检测到不稳定性。 在检测到的不稳定性下，离子束快速关闭。

公开(公告)号：US20060108542A1

公开(公告)日：2006-05-25

申请号：US10528548

申请日：2003-10-24

Applicant: Eiichi Ito ,  Masahiko Tsukuda

Inventor： Eiichi Ito ,  Masahiko Tsukuda

IPC: G01N23/00

CPC classification number: G11B7/261 ,  B82Y10/00 ,  B82Y40/00 ,  G21K5/04 ,  G21K5/10 ,  H01J37/3174 ,  H01J2237/043

Abstract: In an electron beam exposure method in which an article subjected to exposure and an electron beam irradiation spot are moved relative to each other at a continuous speed, the article is exposed at a plurality of irradiation intensities of an electron beam by changing a transmittance of an electron optical system for forming the electron beam irradiation spot on the article.

Abstract translation: 在电子束曝光方法中，经受曝光的物品和电子束照射点以连续的速度相对于彼此移动，物品通过改变电子束的透射率而以多个照射强度曝光 用于在物品上形成电子束照射点的电子光学系统。

公开(公告)号：US07015482B2

公开(公告)日：2006-03-21

申请号：US10354959

申请日：2003-01-31

Applicant: Yasunari Sohda ,  Yoshinori Nakayama ,  Osamu Kamimura ,  Masato Muraki ,  Masaki Takakuwa

Inventor： Yasunari Sohda ,  Yoshinori Nakayama ,  Osamu Kamimura ,  Masato Muraki ,  Masaki Takakuwa

IPC: G21K7/00 ,  G21K5/10

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/304 ,  H01J2237/043 ,  H01J2237/24405

Abstract: An electron beam writing system, using discrete electron beams in which the interval of the beams is larger than the size of the beams, generates plural electron beams, on/off controls each of the electron beams according to pattern data to be written, and deflects the electron beams together, thereby performing writing on a wafer. One side of a unit writing area of the electon beams is larger than substantially twice the interval of the electron beams or substantially an integral multiple thereof.

Abstract translation: 一种电子束写入系统，使用离散电子束，其中光束的间隔大于光束的大小，产生多个电子束，根据要写入的图形数据，对每个电子束进行开/关控制，并偏转 电子束在一起，从而在晶片上进行写入。 电子束的单位写入区域的一侧大于电子束的间隔的两倍或其基本上的整数倍。