公开(公告)号：US20180307135A1

公开(公告)日：2018-10-25

申请号：US15769338

申请日：2016-09-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Peter TEN BERGE ,  Everhardus Cornelis MOS ,  Richard Johannes Franciscus VAN HAREN ,  Peter Hanzen WARDENIER ,  Erik JENSEN ,  Bernardo KASTRUP ,  Michael KUBIS ,  Johannes Catharinus Hubertus MULKENS ,  Davis Frans Simon DECKERS ,  Wolfgang Helmut HENKE ,  Joungchel LEE

IPC: G03F1/72 ,  G03F7/20

CPC classification number: G03F1/72 ,  G03B27/68 ,  G03F7/70425 ,  G03F7/705 ,  G03F7/70625 ,  G03F7/70633

Abstract: A method including obtaining a measurement and/or simulation result of a pattern after being processed by an etch tool of a patterning system, determining a patterning error due to an etch loading effect based on the measurement and/or simulation result, and creating, by a computer system, modification information for modifying a patterning device and/or for adjusting a modification apparatus upstream in the patterning system from the etch tool based on the patterning error, wherein the patterning error is converted to a correctable error and/or reduced to a certain range, when the patterning device is modified according to the modification information and/or the modification apparatus is adjusted according to the modification information.

公开(公告)号：US20220027437A1

公开(公告)日：2022-01-27

申请号：US17496555

申请日：2021-10-07

Applicant: ASML Netherlands B.V.

Inventor： Everhardus Cornelis MOS ,  Velislava IGNATOVA ,  Erik JENSEN ,  Michael KUBIS ,  Hubertus Johannes Gertrudus SIMONS ,  Peter TEN BERGE ,  Erik Johannes Maria WALLERBOS ,  Jochem Sebastiaan WILDENBERG

IPC: G06F17/18 ,  G03F7/20 ,  G06F30/20

Abstract: A method including evaluating, with respect to a parameter representing remaining uncertainty of a mathematical model fitting measured data, one or more mathematical models for fitting measured data and one or more measurement sampling schemes for measuring data, against measurement data across a substrate, and identifying one or more mathematical models and/or one or more measurement sampling schemes, for which the parameter crosses a threshold.

公开(公告)号：US20210191286A1

公开(公告)日：2021-06-24

申请号：US17111050

申请日：2020-12-03

Applicant: ASML NETHERLANDS B.V.

Inventor： Jasper MENGER ,  Paul Cornelis Hubertus ABEN ,  Everhardus Cornelis MOS

IPC: G03F9/00

Abstract: Offline metrology measurements are performed on substrates that have been subjected to lithographic processing. Model parameters are calculated by fitting the measurements to an extended high-order substrate model defined using a combination of basis functions that include an edge basis function related to a substrate edge. A radial edge basis function may be expressed in terms of distance from a substrate edge. The edge basis function may, for example, be an exponential decay function or a rational function. Lithographic processing of a subsequent substrate is controlled using the calculated high-order substrate model parameters, in combination with low-order substrate model parameters obtained by fitting inline measurements to a low order model.

公开(公告)号：US20200319118A1

公开(公告)日：2020-10-08

申请号：US16905629

申请日：2020-06-18

Applicant: ASML Netherlands B.V.

Inventor： Wouter Lodewijk ELINGS ,  Franciscus Bernardus Maria VAN BILSEN ,  Christianus Gerardus Maria DE MOL ,  Everhardus Cornelis MOS ,  Hoite Pieter Theodoor TOLSMA ,  Peter TEN BERGE ,  Paul Jacques VAN WIJNEN ,  Leonard us Henricus Marie VERSTAPPEN ,  Gerald DICKER ,  Reiner Maria JUNGBLUT ,  Chung-Hsun LI

IPC: G01N21/95 ,  G01B11/14 ,  G01B11/02 ,  G01N21/956 ,  G03F7/20 ,  H01L21/66 ,  G05B19/418 ,  G01B11/00 ,  G01B11/26

Abstract: In the measurement of properties of a wafer substrate, such as Critical Dimension or overlay a sampling plan is produced defined for measuring a property of a substrate, wherein the sampling plan comprises a plurality of sub-sampling plans. The sampling plan may be constrained to a predetermined fixed number of measurement points and is used to control an inspection apparatus to perform a plurality of measurements of the property of a plurality of substrates using different sub-sampling plans for respective substrates, optionally, the results are stacked to at least partially recompose the measurement results according to the sample plan.

公开(公告)号：US20200081353A1

公开(公告)日：2020-03-12

申请号：US16493835

申请日：2018-03-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Hubertus Johannes Gertrudus SIMONS ,  Everhardus Cornelis MOS ,  Xiuhong WEI ,  Reza MAHMOODI BARAM ,  Hadi YAGUBIZADE ,  Yichen ZHANG

IPC: G03F7/20

Abstract: A device manufacturing method includes: exposing a first substrate using a lithographic apparatus to form a patterned layer having first features; processing the first substrate to transfer the first features into the first substrate; determining displacements of the first features from their nominal positions in the first substrate; determining a correction to at least partly compensate for the displacements; and exposing a second substrate using a lithographic apparatus to form a patterned layer having the first features, wherein the correction is applied for or during the exposing the second substrate.

公开(公告)号：US20160299438A1

公开(公告)日：2016-10-13

申请号：US15093523

申请日：2016-04-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Everhardus Cornelis MOS ,  Erik Mathijs Maria Crombag ,  Ajith Ganesan

IPC: G03F7/20 ,  G06F3/0482

CPC classification number: G06F3/0482 ,  G03F7/70508 ,  G03F7/70616

Abstract: A method of displaying a plurality of graphical user interface elements, each graphical user interface element representing a step in a measurement design, setup and/or monitoring process and each graphical user interface element enabling access by the user to further steps in the measurement design, setup and/or monitoring process for the associated step of the graphical user interface element, and displaying an indicator associated with one or more of the plurality of graphical user elements, the indicator indicating that a step in the measurement design, setup and/or monitoring process is not completed and/or that a key performance indicator associated with a step in the measurement design, setup and/or monitoring process has passed a threshold.

Abstract translation: 一种显示多个图形用户界面元素的方法，每个图形用户界面元素表示测量设计，建立和/或监视过程中的步骤，以及使得用户能够访问测量设计中的进一步步骤的每个图形用户界面元素， 用于图形用户界面元素的相关步骤的设置和/或监视过程，以及显示与多个图形用户元素中的一个或多个相关联的指示符，该指示符指示测量设计，建立和/或监视中的步骤 过程未完成和/或与测量设计，设置和/或监视过程中的步骤相关联的关键绩效指标已经通过阈值。

公开(公告)号：US20220260925A1

公开(公告)日：2022-08-18

申请号：US17738093

申请日：2022-05-06

Applicant: ASML NETHERLANDS B.V.

Inventor： Wim Tjibbo TEL ,  Bart Peter Bert SEGERS ,  Everhardus Cornelis MOS ,  Emil Peter SCHMITT-WEAVER ,  Yichen ZHANG ,  Petrus Gerardus VAN RHEE ,  Xing Lan LIU ,  Maria KILITZIRAKI ,  Reiner Maria JUNGBLUT ,  Hyunwoo YU

IPC: G03F7/20 ,  G06N3/02

Abstract: A method, involving determining a first distribution of a first parameter associated with an error or residual in performing a device manufacturing process; determining a second distribution of a second parameter associated with an error or residual in performing the device manufacturing process; and determining a distribution of a parameter of interest associated with the device manufacturing process using a function operating on the first and second distributions. The function may include a correlation.

公开(公告)号：US20220236647A1

公开(公告)日：2022-07-28

申请号：US17635290

申请日：2020-07-16

Applicant: ASML NETHERLANDS B.V.

Inventor： Marc HAUPTMANN ,  Cornelis Johannes Henricus LAMBREGTS ,  Amir Bin ISMAIL ,  Rizvi RAHMAN ,  Allwyn BOUSTHEEN ,  Raheleh PISHKARI ,  Everhardus Cornelis MOS ,  Ekaterina Mikhailovna VIATKINA ,  Roy WERKMAN ,  Ralph BRINKHOF

IPC: G03F7/20

Abstract: A method of controlling a semiconductor manufacturing process, the method including: obtaining first metrology data based on measurements performed after a first process step; obtaining second metrology data based on measurements performed after the first process step and at least one additional process step; estimating a contribution to the process of: a) a control action which is at least partially based on the second metrology data and/or b) the at least one additional process step by using at least partially the second metrology data; and determining a Key Performance Indicator (KPI) or a correction for the first process step using the first metrology data and the estimated contribution.

公开(公告)号：US20190285992A1

公开(公告)日：2019-09-19

申请号：US16463057

申请日：2017-11-06

Applicant: ASML NETHERLANDS B.V.

Inventor： Richard Johannes Franciscus VAN HAREN ,  Victor Emanuel CALADO ,  Leon Paul VAN DIJK ,  Roy WERKMAN ,  Everhardus Cornelis MOS ,  Jochem Sebastiaan WILDENBERG ,  Marinus JOCHEMSEN ,  Bijoy RAJASEKHARAN ,  Erik JENSEN ,  Adam Jan URBANCZYK

IPC: G03F7/20

Abstract: A method to change an etch parameter of a substrate etching process, the method including: making a first measurement of a first metric associated with a structure on a substrate before being etched; making a second measurement of a second metric associated with a structure on a substrate after being etched; and changing the etch parameter based on a difference between the first measurement and the second measurement.

公开(公告)号：US20190271919A1

公开(公告)日：2019-09-05

申请号：US16461044

申请日：2018-05-23

Applicant: ASML NETHERLANDS B.V.

Inventor： Davit HARUTYUNYAN ,  Fei JIA ,  Frank STAALS ,  Fuming WANG ,  Hugo Thomas LOOIJESTIJN ,  Cornelis Johannes RIJNIERSE ,  Maxim PISARENCO ,  Roy WERKMAN ,  Thomas THEEUWES ,  Tom VAN HEMERT ,  Vahid BASTANI ,  Jochem Sebastian WILDENBERG ,  Everhardus Cornelis MOS ,  Erik Johannes Maria WALLERBOS

IPC: G03F7/20

Abstract: A method, system and program for determining a fingerprint of a parameter. The method includes determining a contribution from a device out of a plurality of devices to a fingerprint of a parameter. The method including: obtaining parameter data and usage data, wherein the parameter data is based on measurements for multiple substrates having been processed by the plurality of devices, and the usage data indicates which of the devices out of the plurality of the devices were used in the processing of each substrate; and determining the contribution using the usage data and parameter data.