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公开(公告)号：US20170322499A1
公开(公告)日：2017-11-09
申请号：US15661888
申请日：2017-07-27
Applicant: ASML Netherlands B.V.
Inventor： Michel RIEPEN , Dzmitry Labetski , Wilbert Jan Mestrom , Wim Ronald Kampinga , Jan Okke Nieuwenkamp , Jacob Brinkert , Henricus Jozef Castelijns , Nicolaas Ten Kate , Hendrikus Gijsbertus Schimmel , Hans Jansen , Dennis Jozef Maria Paulussen , Brian Vernon Virgo , Reinier Theodorus Martinus Jilisen , Ramin Badie , Albert Pieter Rijpma , Johannes Christiaan Leonardus Franken , Peter Van Putten , Gerrit Van Der Straaten
CPC classification number: G03F7/70983 , F15D1/0065 , G03F7/70008 , G03F7/70033 , G03F7/70916 , G21K1/06 , G21K5/08 , H05G2/005 , H05G2/008 , Y10T137/206
Abstract: A radiation source comprising a fuel source configured to deliver fuel to a location from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of liquid fuel under the influence of gravity in one or more desired directions.
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公开(公告)号：US20170242348A1
公开(公告)日：2017-08-24
申请号：US15589705
申请日：2017-05-08
Applicant: ASML NETHERLANDS B.V.
Inventor： Michel RIEPEN , Christiaan Alexander HOOGENDAM , Paulus Martinus Maria LIEBREGTS , Ronald VAN DER HAM , Wilhelmus Franciscus Johannes SIMONS , Daniël Jozef Maria DIRECKS , Paul Petrus Joannes BERKVENS , Eva MONDT , Gert-Jan Gerardus Johannes Thomas BRANDS , Koen STEFFENS , Han Henricus Aldegonda LEMPENS , Mathieus Anna Karel VAN LIEROP , Christophe DE METSENAERE , Marcio Alexandre Cano MIRANDA , Patrick Johannes Wilhelmus SPRUYTENBURG , Joris Johan Anne-Marie VERSTRAETE , Franciscus Johannes Joseph JANSSEN
IPC: G03F7/20
CPC classification number: G03F7/70866 , G03F7/70341
Abstract: A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.
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公开(公告)号：US20160195821A1
公开(公告)日：2016-07-07
申请号：US14911452
申请日：2014-07-22
Applicant: ASML NETHERLANDS B.V.
Inventor： Michel RIEPEN , Christianus Wilhelmus Johanne BERENDSEN , Anton Alexander DARHUBER , Hubertus Mattheus Joseph M WEDERSHOVEN , Josephus Catharina Henricus ZEEGERS
IPC: G03F7/20
CPC classification number: G03F7/70341
Abstract: An immersion lithographic apparatus is configured to subject a photosensitive layer on a substrate to a patterned beam of radiation via a liquid. The immersion lithographic apparatus includes a moveable object having a surface, a fluid handling system to control a presence of the liquid in a volume restricted by the surface, the fluid handling system, and a free surface of the liquid, the free surface extending between the surface and the fluid handling system; and a heating system configured to locally heat a portion of the liquid at a receding side of a periphery edge of the volume in contact with the surface, where the object is receding from the volume along a direction of movement of the object relative to the fluid handling system.
Abstract translation: 浸没式光刻设备被配置为经由液体使基板上的感光层经受图案化的辐射束。 浸没式光刻设备包括具有表面的可移动物体，流体处理系统，用于控制在由表面限制的体积中的液体的存在，流体处理系统和液体的自由表面，自由表面在 表面和流体处理系统; 以及加热系统，其被配置为在所述体积的与所述表面接触的周边边缘的后退侧局部加热所述液体的一部分，其中所述物体沿着所述物体相对于所述流体的运动方向从所述体积退出 处理系统。
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14.发明申请FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权流体处理结构，平面设备和设备制造方法公开(公告)号：US20160154321A1
公开(公告)日：2016-06-02
申请号：US15016041
申请日：2016-02-04
Applicant: ASML NETHERLANDS B.V.
Inventor： Rogier Hendrikus Magdalena CORTIE , Paulus Martinus Maria LIEBREGTS , Michel RIEPEN , Fabrizio EVANGELISTA
IPC: G03F7/20
CPC classification number: G03F7/70341
Abstract: A fluid handling structure for a lithographic apparatus is disclosed, the fluid handling structure successively has, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: an elongate opening or a plurality of openings arranged in a first line that, in use, are directed towards a substrate and/or a substrate table configured to support the substrate; a gas knife device having an elongate aperture in a second line; and an elongate opening or a plurality of openings adjacent the gas knife device.
Abstract translation: 公开了一种用于光刻设备的流体处理结构，流体处理结构在从被配置为将浸没流体包含在流体处理结构外部区域的空间的边界处依次具有：细长开口或多个开口 在使用中的第一线指向被配置为支撑衬底的衬底和/或衬底台; 气刀设备，其具有在第二线中的细长孔; 以及与气刀装置相邻的细长开口或多个开口。
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公开(公告)号：US20160026085A1
公开(公告)日：2016-01-28
申请号：US14871795
申请日：2015-09-30
Applicant: ASML NETHERLANDS B.V.
Inventor： Bob STREEFKERK , Sjoerd Nicolaas Lambertus DONDERS , Roelof Frederik DE GRAAF , Christiaan Alexander HOOGENDAM , Hans JANSEN , Martinus Hendikus Antonius LEENDERS , Paulus Martinus Maria LIEBREGTS , Jeroen Johannes Sophia Maria MERTENS , Jan-Gerard Cornelis VAN DER TOORN , Michel RIEPEN
IPC: G03F7/20
CPC classification number: G03F7/2041 , G03F7/3085 , G03F7/70058 , G03F7/70341 , G03F7/70825 , G03F7/70875 , G03F7/70916 , G03F2007/2067 , H01L21/0274 , H01L21/67098
Abstract: An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.
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Patent Agency Ranking
公开(公告)号：US20140375973A1
公开(公告)日：2014-12-25
申请号：US14484076
申请日：2014-09-11
Applicant: ASML NETHERLANDS B.V.
Inventor： Bob STREEFKERK , Sjoerd Nicolaas Lambertus DONDERS , Roelof Frederik DE GRAAF , Christiaan Alexander HOOGENDAM , Hans JANSEN , Martinus Hendrikus Antonius LEENDERS , Paulus Martinus Maria LIEBREGTS , Jeroen Johannes Sophia Maria MERTENS , Jan-Gerard Cornelis VAN DER TOORN , Michel RIEPEN
IPC: G03F7/20
CPC classification number: G03F7/2041 , G03F7/3085 , G03F7/70058 , G03F7/70341 , G03F7/70825 , G03F7/70875 , G03F7/70916 , G03F2007/2067 , H01L21/0274 , H01L21/67098
Abstract: An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.
Abstract translation: 浸没式光刻设备设置有液体限制结构，其限定至少部分地被配置为在投影系统和衬底之间容纳液体的空间。 为了减少正在成像的衬底的边缘（其可能导致在浸没液体中包含气泡）的交叉，使得平行于衬底的平面中的空间的横截面积小至 可能。 最小的理论尺寸是由投影系统成像的目标部分的尺寸。 在一个实施例中，投影系统的最终元件的形状也被改变为在平行于基底的截面与目标部分的横截面上具有相似的尺寸和/或形状。
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公开(公告)号：US20180101102A1
公开(公告)日：2018-04-12
申请号：US15838634
申请日：2017-12-12
Applicant: ASML NETHERLANDS B.V.
Inventor： Rogier Hendrikus Magdalena CORTIE , Paulus Martinus Maria LIEBREGTS , Michel RIEPEN , Fabrizio EVANGELISTA
IPC: G03F7/20
CPC classification number: G03F7/70341
Abstract: A fluid handling structure for a lithographic apparatus is disclosed, the fluid handling structure successively has, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: an elongate opening or a plurality of openings arranged in a first line that, in use, are directed towards a substrate and/or a substrate table configured to support the substrate; a gas knife device having an elongate aperture in a second line; and an elongate opening or a plurality of openings adjacent the gas knife device.
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公开(公告)号：US20170248854A1
公开(公告)日：2017-08-31
申请号：US15470491
申请日：2017-03-27
Applicant: ASML NETHERLANDS B.V.
Inventor： Bob STREEFKERK , Sjoerd Nicolaas Lambertus DONDERS , Roelof Frederik DE GRAAF , Christiaan Alexander HOOGENDAM , Martinus Hendrikus Antonius LEENDERS , Jeroen Johannes Sophia Maria MERTENS , Michel RIEPEN
IPC: G03F7/20
CPC classification number: G03F7/70341
Abstract: An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.
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公开(公告)号：US20160274467A1
公开(公告)日：2016-09-22
申请号：US14442415
申请日：2013-10-23
Applicant: ASML NETHERLANDS B.V.
Inventor： Hendrikus Gijsbertus SCHIMMEL , Michel RIEPEN , Reinier Theodorus Martinus JULISEN , Dennis DE GRAAF
CPC classification number: G03F7/70058 , G03F7/70033 , G03F7/70916 , H05G2/005 , H05G2/006 , H05G2/008
Abstract: A radiation source suitable for providing radiation to a lithographic apparatus generates radiation from a plasma (12) generated from a fuel (31) within an enclosure comprising a gas. The plasma generates primary fuel debris collected as a fuel layer on a debris-receiving surface ((33a), (33b)). The debris-receiving surface is heated to a temperature to maintain the fuel layer as a liquid, and to provide a reduced or zero rate of formation gas bubbles within the liquid fuel layer in order to reduce contamination of optical surfaces (14) by secondary debris arising from gas bubble eruption from the liquid fuel layer. Additionally or alternatively, the radiation source may have a debris receiving surface positioned and/or oriented such that substantially all lines normal to the debris receiving surface do not intersect an optically active surface of the radiation source.
Abstract translation: 适于向光刻设备提供辐射的辐射源产生从包括气体的外壳内的燃料（31）产生的等离子体（12）的辐射。 等离子体产生作为燃料层收集的碎屑接收表面（（33a），（33b））上的主要燃料碎片。 碎片接收表面被加热到一个温度以将燃料层保持为液体，并且在液体燃料层内提供降低或零速率的地层气泡，以便减少光学表面（14）由二次碎屑的污染 来自液体燃料层的气泡喷发。 附加地或替代地，辐射源可以具有定位和/或定向的碎片接收表面，使得基本上所有垂直于碎片接收表面的线不与辐射源的光学活性表面相交。
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20.发明申请公开(公告)号：US20160048085A1
公开(公告)日：2016-02-18
申请号：US14882241
申请日：2015-10-13
Applicant: ASML NETHERLANDS B.V.
Inventor： Theodorus Petrus Maria CADEE , Johannes Henricus Wilhelmus JACOBS , Nicolaas TEN KATE , Erik Roelof LOOPSTRA , Aschwin Lodewijk Hendricus Johannes VERMEER , Jeroen Johannes Sophia Maria MERTENS , Christianus Gerardus Maria DE MOL , Marcel Johannus Elisabeth Hubertus MUITJENS , Antonius Johannus VAN DER NET , Joost Jeroen OTTENS , Johannes Anna QUAEDACKERS , Maria Elisabeth REUHMAN-HUISKEN , Marco Koert STAVENGA , Patricius Aloysius Jacobus TINNEMANS , Martinus Cornelis Maria VERHAGEN , Jacobus Johannus Leonardus Hendricus VERSPA Y , Frederik Eduard DE JONG , Koen GOORMAN , Boris MENCHTCHIKOV , Herman BOOM , Stoyan NIHTIANOV , Richard MOERMAN , Martin Frans Pierre SMEETS , Bart Leonard Peter SCHOONDERMARK , Franciscus Johannes Joseph JANSSEN , Michel RIEPEN
IPC: G03F7/20
CPC classification number: G03F7/70808 , G03F7/70341 , G03F7/70841 , G03F7/70875
Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.
Abstract translation: 描述了一种光刻设备，其具有液体供应系统，其被配置为至少部分地填充光刻设备的投影系统和具有液体的基板之间的空间，布置成基本上容纳该空间内的液体的阻挡构件和加热器。
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